Fabrication of the hydrogen resistive ferroelectric film of the (Pb0.72La0.28)Ti0.93O3/Pb(Zr0.52Ti0.48)O3/(Pb0.72La0.28)Ti0.93O3 heterostructure by a pulsed laser deposition method

(Pb_0.72La_0.28)Ti_0.93O₃ (PLT)/Pb(Zr_0.52Ti_0.48)O₃ (PZT)/PLT heterostructure was fabricated by using a pulsed laser deposition method. After depositing this structure, the hydrogen annealing process was performed in the forming gas (95% N₂ + 5% H₂) at a substrate temperature of 400 °C for 30 min to study the effects of hydrogen passivation.The heterostructure was not degraded by the hydrogen annealing in contrast with the case of PZT film without buffer layers. This heterostructure showed almost no degradation in terms of the remanent polarization even after the H₂ annealing, while the PZT film exhibited 64% reduction, which is from 20.1 to 7.3 μC/cm² after the annealing. The leakage current was decreased by an order in the case of the heterostructure, while the leakage current of the PZT film increased by an order.These can be explained that the PLT bottom buffer layer works as a seeing layer to help the PZT growth and the top PLT buffer layer acts as a barrier for penetrating hydrogen atoms.     

A study of the properties and microstructure of Ni81Fe19 ultrathin films with MgO

The anisotropic magnetoresistance (AMR) of a Ta (5 nm)/MgO (3 nm)/Ni₈₁Fe₁₉ (10 nm)/MgO (2 nm)/Ta (3 nm) film with MgO-Nano Oxide Layer (NOL) increases dramatically from 1.05% to 3.24% compared with a Ta (5 nm)/Ni₈₁Fe₁₉ (10 nm)/Ta (3 nm) film without the MgO-NOL layer after annealing at 380 °C for 2 h. Although the MgO destroys the NiFe (1 1 1) texture, it enhances the specular electron scattering of the conduction electrons at the NOL interface and suppresses the interface reactions and diffusion at the Ta/NiFe and NiFe/Ta interfaces. The NiFe (1 1 1) texture was formed after the annealing, resulting in a higher AMR ratio. X-ray photoelectron spectroscope results show that Mg and Mg²⁺ were present in the MgO_x films.     

Effect of annealing in an external magnetic field on the microstructure and magnetic properties of the Fe/FePt/Pt multilayer system

The effect of annealing in an external magnetic field applied perpendicular to the plane of the film on the kinetics of Ll ₀ phase transformation of the microstructure and the magnetic properties of the Fe(2 nm)/FePt(20 nm)/Pt(2 nm) multilayer system has been investigated. The relations between the hysteresis loop shape, magnetic correlation length, and structural disorders, which are characteristic of magnetic information carriers, have been analyzed. It has been found that the annealing of the Fe(2 nm)/FePt(20 nm)/Pt(2 nm) multilayer system at a temperature of 470°C in an external magnetic field of 3500 Oe, which is applied perpendicular to the film plane, leads to the formation of a face-centered tetragonal structure of the Ll ₀ phase in the FePt film, which is characterized by the high coercivity H _c , the (001) preferred texture, the magnetic anisotropy perpendicular to the film plane, small sizes of FePt grains in the film, and weak exchange coupling between the particles. The energy of the external magnetic field encourages the process of transformation of the FePt film into the Ll ₀ phase. Thus, a method has been developed for fabricating multilayer films based on the FePt Ll ₀ phase with the parameters necessary for information carrier materials with perpendicular-type magnetic recording.     

Very high coercivities of top-layer diffusion Au/FePt thin films

The Au/FePt samples were prepared by depositing a gold cap layer at room temperature onto a fully ordered FePt layer, followed by an annealing at 800 °C for the purpose of interlayer diffusion. After the deposition of the gold layer and the high-temperature annealing, the gold atoms do not dissolve into the FePt Ll₀ lattice. Compared with the continuous FePt film, the TEM photos of the bilayer Au(60 nm)/FePt(60 nm) show a granular structure with FePt particles embedded in Au matrix. The coercivity of Au(60 nm)/FePt(60 nm) sample is 23.5 kOe, which is 85% larger than that of the FePt film without Au top layer. The enhancement in coercivity can be attributed to the formation of isolated structure of FePt ordered phase.     

Bias voltage dependence of inverted magnetoresistance on the annealing temperature in MgO-based magnetic tunnel junctions

MgO-based magnetic tunnel junctions (MTJs) with a layer sequence Ir₂₂Mn₇₈ or Fe₅₀Mn₅₀ (10 nm)/CoFe (2 nm)/Ru (0.85 nm)/CoFeB (0.5?t<2 nm)/MgO (2.5 nm)/CoFeB (3 nm) have been fabricated. The bias voltage dependence of tunneling magnetoresistance (TMR) is given as a function of the annealing temperature for these MTJs, which shows the TMR ratio changes its sign from inverted to normal at a critical bias voltage (V_C) when an unbalanced synthetic antiferromagnetic stack CoFe/Ru/CoFeB is used. V_Cs change with the thickness of the pinned CoFeB and annealing temperature, which implies one can achieve different V_Cs by artificial control. The asymmetric V_C values suggest that a strong density-of-states modification occurs at bottom oxide/ferromagnet interface.     

一种改善红光顶发射OLED色纯度及角度依赖特性的方法研究

在Si/SiO₂衬底上生长金属银作为阳极,4,4,4-tris(3-methylphenylpheny-lamino)-triphenylamine(m-MTDATA):MoOx/m-MTDATA/N,N-bis-(1-naphthyl)-N,N-diphenyl-1,1-biphenyl-4,4-diamine(NPB)作为空穴注入及传输层,发光层采用4,4-N,N-dicarbazole-biphenyl(CBP)掺杂磷光染料(1-(phenyl)isoquinoline)iridium(III) acetylanetonate(Ir(piq)₂(acac))的结构,4,7-di-phenyl-1,10-phenanthroline(BPhen)作为空穴阻挡层及电子传输层,阴极为LiF(1 nm)/Al(2 nm)/Ag(20 nm)复合阴极结构.通过在光取出的复合阴极上方生长一层CBP光学覆盖层,有效地改善了复合阴极膜系的透射率,从而改善了顶发射结构的光学耦合输出特性,在提高器件的正向发光效率的同时还使色坐标往深红光区移动.并且生长光学覆盖层结构的器件角度依赖特性明显得到改善,这对于制作高显示质量的显示器件具有重要意义.在原有结构的基础上增加20 nm的NPB掺杂磷光染料Ir(piq)₂(acac)作发光层,从而得到双发光层结构为NPB:Ir(piq)₂(acac)(1%,20 nm)/CBP:Ir(piq)₂(acac)(1%, 20 nm).由于NPB具有较高的空穴迁移率,避免了由于光学厚度的增加而引起器件工作电压的大幅升高,而双发光层的结构有利于增大激子复合区域,提高辐射复合几率,减少非辐射损耗,实现主客体之间高效的三线态能量传递,相对单发光层顶发射结构,双发光层结构不仅提高了器件的发光效率,而且改善了器件的色坐标.     

Role of annealing on morphological,linear and nonlinear properties of nanoparticle of Tris [2-phenylpyridinato-C2, N] Iridium III films prepared by electron beam evaporator

Tris(2-phenylpyridinato-C₂, N] Iridium III, Ir(ppy)₃, is experimentally investigated as a novel deposited thin film. Ir(ppy)₃ thin films were fabricated by the electron beam evaporator technique. X-ray diffraction (XRD) of Ir(ppy)₃ powder is investigated to be polycrystalline with triclinic crystal. XRD pattern of Ir(ppy)₃ film and the annealed film is analyzed, and the average of crystallite size slightly increases with thermal annealing from 14 to 40 nm. The linear optical parameters were estimated and found that the annealing effect on lattice dielectric constants, dispersion energy, oscillator energy, and the ratio of carrier concentration to its effective mass. The Urbach energy and optical energy gap are estimated at different thermal annealing. On the other hand, dielectric constants and optical conductivity were estimated and found that the annealing plays a remarkable role in the increasing of their values. The calculated values of third-order susceptibility were increased by thermal annealing. Thus, the thermal annealing can be utilized as a tool to modify the optical properties of Ir(ppy)₃ films, which can be used in many important applications such as high capacity communication network.     

Surface-modified lead–zirconium-titanate system for solution-processed ferroelectric-gate thin-film transistors

We propose the use of a La₂O₃ (LO) film as the capping layer for improvement of a semiconductor/insulator interface in a solution-processed indium–tin–oxide (ITO) ferroelectric-gate thin-film transistor (FGT) device. It is demonstrated that the LO layer acts as a good barrier film not only for preventing the interdiffusion between the ITO semiconductor and lead–zirconium-titanate (PZT) insulator layers, but also for stabilizing the PZT surface structure. The fabricated FGT device exhibited high I _on/I _off, large M _w, high μ _FE and improved retention time of about 10⁹, 3.5 V, 7.94 cm²?V^?1?s^?1 and 1 day, respectively, which are comparable to or better than those obtained with FGTs fabricated by means of conventional vacuum processes. We also point out that the key origin of the interface improvement is likely due to the incorporation of La into the PZT system, forming a La surface-modified PZT system which is more stable than the pure PZT in terms of Pb volatility and formation of oxygen vacancies.     

基于铱配合物材料的高效高稳定性有机发光二极管

使用基于重金属Ir的新磷光材料(tpbi)₂Ir(acac)，制备了多层结构有机发光二极管器件: ITO/CuPc (40 nm)/α-NPD (45 nm)/CBP: (tpbi)₂Ir(acac) (3%, 30nm)/BCP(20 nm)/Alq₃ (20 nm)/LiF (1 nm)/Al (100 nm).测试了材料的寿命、光谱吸收性质和器件的I-V-L特性.器件在低电压下电流符合热发射注入模型，高电压下I-V呈线形关系.不同偏压下器件发光光谱稳定，多峰拟合结果表明器件光谱由α-NPD发光峰(450 nm)，(tpbi)₂Ir(acac)主发光峰(518 nm)和肩峰(543 nm)构成.驱动电压为6 V时，器件效率达到最大12.1 lm/W，此时亮度为136 cd/m²，器件亮度最大为13500 cd/m²，此时效率为0.584 lm/W. 关键词： 有机发光二极管 磷光 效率 I-V-L特性')" href="#">I-V-L特性 光谱     

Enhancement of in-plane magnetic anisotropy in (111)-oriented Co0.8Fe2.2O4 thin film by deposition of PZT top layer

The CoFe₂O₄ and Co_0.8Fe_2.2O₄ single layer (CFO) as well as PZT/CoFe₂O₄ and PZT/Co_0.8Fe_2.2O₄ bilayer thin films were grown using the pulsed laser deposition technique on Pt(111)/Si substrates at 600 °C. All films had a perfect (111)-orientation and the degree of orientation of CFO films was improved by the deposition of a PZT top layer. Precision X-ray diffraction analysis (avoiding the shift of peaks due to sample misalignment) revealed that the CFO films on Pt(111)/Si substrate were under an out-of-plane contraction and the deposition of a PZT top layer led to the increase in the out-of-plane contraction. The (111)-oriented CFO single layer films had a strong in-plane magnetic anisotropy as a result of orientation as well as the stress-induced magnetic anisotropy. The magnetic properties of CFO film were altered by the deposition of a PZT top layer leading to the enhancement of in-plane magnetic anisotropy. The enhanced in-plane magnetic anisotropy was more detectable in PZT/Co_0.8Fe_2.2O₄ rather than PZT/CoFe₂O₄ bilayer film, which could be expected from its higher magnetocrystalline as well as magnetostriction constants.     

Formation of W/HfO2/Si gate structures using in situ magnetron sputtering and rapid thermal annealing

The W(150 nm)/HfO₂(5 nm)/Si(100) structures prepared in a single vacuum cycle by rf magnetron sputtering were subjected to rapid thermal annealing in argon. It is found that at an annealing temperature of 950°C, the tungsten oxide WO _x phase and the hafnium silicate HfSi _x O _y phase grow at the W/HfO₂ and HfO₂/Si(100) interfaces, respectively. Herewith, the total thickness of the oxide layeris 30% larger than that of the initial HfO₂ film. In addition, a decrease in the specific capacitance in accumulation C _max and in the dielectric constant k (from 27 to 23) is observed. At an annealing temperature of 980°C, intensive interaction between tungsten and HfO₂ takes place, causing the formation of a compositionally inhomogeneous Hf _x Si _y W _z O oxide layer and further decrease in C _max. It is shown that a considerable reduction in the leakage currents occurs in the W/HfO₂/X/Si(100) structures, where X is a nitride barrier layer.     

A method of determining the charge trapped at the interfaces of a metal/ferroelectric/metal thin-film structure

A method is developed for determining the trap density at the metal/ferroelectric interfaces in a completely depleted ferroelectric film with two Schottky barriers. The method is based on the recharging of traps induced by an external pulsed bias. The ranges of the bias fields and of the parameters of the metal/ferro-electric/metal structure for which analytical solution of the Poisson equation is possible are found. Using this method and measurements of the transient current, the density of the charge trapped at the upper and lower interfaces of Pt(Ir)/PZT/Ir(Ti/SiO₂/Si) capacitors is determined. The interface charge as estimated from the trap density proved to be much smaller than the residual polarization of the PZT film. The observed correlation between the symmetry of the interface trap charges and the symmetry of the hysteresis loops and switching currents indicates the reliability of the estimation of the trap density determined using the proposed method.     

The improvement of pyroelectric properties of PZT thick films on Si substrate by TiOx barrier layer

The effects of TiO_x diffusion barrier layer thickness on the microstructure and pyroelectric characteristics of PZT thick films were studied in this paper. The TiO_x layer was prepared by thermal oxidation of Ti thin film in air and the PZT thick films were fabricated by electrophoresis deposition method (EPD). To demonstrate the barrier effect of TiO_x layer, the electrode/substrate interface and Si content in PZT thick films were characterized by scanning electron microscope (SEM) and X-ray energy dispersive spectroscopy (EDS), respectively. The TiO_x barrier thickness shows significant influence on the bottom electrode and the pyroelectric performance of the PZT thick films. The average pyroelectric coefficient of PZT films deposited on 400 nm TiO_x layer was about 8.94 × 10⁻⁹ C/(cm² K), which was improved by 70% than those without diffusion barrier layer. The results showed in this study indicate that TiO_x barrier layer has great potential in fabrication of PZT pyroelectric device.     

Study on triplet exciton diffusion length of mCP in phosphorescent organic light-emitting devices using electroluminescent spectra

Electroluminescent (EL) spectra was employed to probe the triplet exciton diffusion length (L_T) of a commonly used host material of N,N′-dicarbazolyl-3,5-benzene (mCP) in phosphorescent organic light-emitting devices (OLEDs). By varying the film thickness of bis [2-(4-tertbutylphenyl) benzothiazolato-N,C²], iridium (acetylacetonate) [(t-bt)₂Ir(acac)] phosphor doped layer within 30 nm thick mCP layer, a series of devices were fabricated to investigate the EL characteristics. The results showed that with the increasing doped layer thickness (d), both (t-bt)₂Ir(acac) emission peaks at 562 nm and mCP emission centered at 403 nm were observed. Moreover, the relationship between mCP EL intensity and d was detected. The L_T was induced by an abrupt decrease in variation of mCP EL intensity when d is increased from 10 to 15 nm, and the reason to cause this phenomenon was investigated. The L_T of mCP approximately to 15 nm was perfectly consistent to the result of 16±1 nm, which was calculated by the traditional steady-state diffusion model.     

An XPS study and electrical properties of Pb1.1Zr0.53Ti0.47O3/PbO/Si (MFIS) structures according to the substrate temperature of the PbO buffer layer

PbO and PZT thin films were deposited on the p-type (1 0 0) Si substrate by the rf magnetron sputtering method with PbO and Pb_1.1Zr_0.53Ti_0.47O₃ targets for the application of the metal-ferroelectric-insulator-semiconductor (MFIS) structure. The MFIS structures with the PbO buffer layer show the good electric properties including a high memory window and a low leakage current density. The maximum value of the memory window is 2.0 V under the applied voltage of 9 V for the Pt/PZT (200 nm, 400 °C)/PbO (80 nm)/Si structures with the PbO buffer layer deposited at the substrate temperature of 300 °C. From the X-ray photoelectron spectroscopy (XPS) results, we could confirm that the substrate temperature of PbO affects the chemical states of the interface between the PbO buffer layer and Si substrate, which results in the inter-diffusion of Pb and the formation of the intermediate phases (PbSiO₃). And the existence of the undesired SiO₂ layer, which is the low dielectric layer, was confirmed at the surface region of the Si substrate by the XPS depth profile analysis.     

Magnetic properties and microstructure study of high coercivity Au/FePt/Au trilayer thin films

High-coercivity Au(60 nm)/FePt(δ nm)/Au(60 nm) trilayer samples were prepared by sputtering at room temperature, followed by post annealing at different temperatures. For the sample with δ=60 nm, L1₀ ordering transformation occurs at 500 °C. Coercivity (H_c) is increased with the annealing temperature in the studied range 400–800 °C. The H_c value of the trilayer films is also varied with thickness of FePt intermediate layer (δ), from 27 kOe for δ=60 nm to a maximum value of 33.5 kOe for δ=20 nm. X-ray diffraction data indicate that the diffusion of Au atoms into the FePt L1₀ lattice is negligible even after a high-temperature (800 °C) annealing process. Furthermore, ordering parameter is almost unchanged as δ is reduced from 60 to 15 nm. Transmission electron microscope (TEM) photos indicate that small FePt Ll₀ particles are dispersed amid the large-grained Au. We believe that the high coercivity of the trilayer sample is attributed to the small and uniform grain sizes of the highly ordered FePt particles which have perfect phase separation with Au matrix.     

磁控溅射方法制备垂直取向FePt/BN颗粒膜

用磁控溅射在热单晶MgO(100)基片上制备了［FePt/BN］多层膜，经真空热处理后，得到具有垂直取向L1₀-FePt/BN颗粒膜.X射线衍射结果和磁性测量的结果表明，［FePt(2nm)/BN(0.5nm)］₁₀和［FePt(1nm)/BN(0.25nm)］₂₀多层膜经700℃热处理1h后，均具有较好的(001)取向.［FePt(1nm)/BN(0.25nm)］₂₀垂直矫顽力达到522kA/m，剩磁比达到0.99，开关场分布S达到0.94，FePt晶粒平均尺寸约15—20nm，适合用于将来超高密度的垂直磁记录介质. 关键词： 磁控溅射 垂直磁记录 0-FePt/BN纳米颗粒膜')" href="#">L1₀-FePt/BN纳米颗粒膜     

Fiber laser annealing of nanocrystalline PZT thick film prepared by aerosol deposition

Nanocrystalline PZT thick films (1 mm square and over 10 μm thick) directly deposited onto stainless-steel substrates (PZT/SUS) by aerosol deposition (AD) technique and then annealed using focused laser beam with a fiber laser to suppress thermal damage to the back sides of the PZT/SUS and substrate near the film edge and to retain the dielectric and/or ferroelectric properties of the PZT/SUS. Compared with CO₂ laser annealing, fiber laser annealing suppressed thermal damage to the substrate. Compared with PZT/SUS annealed at 600 °C using an electric furnace, PZT/SUS annealed at 600 °C using a fiber laser showed superior properties, namely, dielectric constant ? > 1200 at a frequency of 100 Hz, remanent polarization P_r > 30 μC/cm², and coercive field strength E_c < 50 kV/cm at a frequency of 10 Hz. Furthermore, the grain growth for the PZT/SUS formed by AD technique and annealed by fiber laser irradiation was occurred within the laser spot size.     

Failure behavior of ITO diffusion barrier between electroplating Cu and Si substrate annealed in a low vacuum

A structure of Cu/ITO(10 nm)/Si was first formed and then annealed at various temperatures for 5 min in a rapid thermal annealing furnace under 10⁻² Torr pressure. In Cu/ITO(10 nm)/Si structure, the ITO(10 nm) film was coated on Si substrate by sputtering process and the Cu film was deposited on ITO film by electroplating technique. The various Cu/ITO(10 nm)/Si samples were characterized by a four-point probe, a scanning electron microscope, an X-ray diffractometer, and a transmission electron microscope. The results showed that when the annealing temperature increases near 600 °C the interface between Cu and ITO becomes unstable, and the Cu₃Si particles begin to form; and when the annealing temperature increases to 650 °C, a good many of Cu₃Si particles about 1 μm in size form and the sheet resistance of Cu/ITO(10 nm)/Si structure largely increases.     

利用BCP层调节白色磷光有机电致发光器件色度的研究

制备了三种结构的白色有机电致发光器件，通过比较得出：在发光层中间插入2，9-二甲基-4，7-二苯基-1，10-菲咯啉(BCP)能有效控制载流子在不同发光层的分布，进而对器件色度进行调节；而掺杂磷光染料Ir(ppy)₃作敏化剂能有效提高器件的效率. 结构为:氧化铟锡/聚乙烯基咔唑∶N，N′-二(1-萘基)-N，N′-二苯基-1，1′-联苯-4-4′-二胺(30nm)/二-(2-甲基-8-羟基喹啉)-4-联苯酚铝：3.0 wt%2，5，8，11-tetra-tertbutylperylene(TBPe)(30nm)/BCP(5.0nm)/4,4N,N二咔唑基二苯：5.0 wt%Ir(ppy)₃:2.0 wt%红荧烯(15nm)/BCP(10nm)/Mg:Ag的器件色度和效率俱佳. 其在17V工作电压下具有的亮度为4670cd/m²，对应色坐标为(0.31,0.37). 器件具有的最大外量子效率为1.4%，当驱动电压从5.0V升高到17V，器件色坐标严格位于白光色域区内. 关键词： 磷光染料 阻挡层 白光 双发光层