Distribution of polymer deposition in plasma polymerization. I. Acetylene,ethylene, and the effect of carrier gas

Factors which influence the distribution of polymer deposition in an electrodeless glow-discharge system were investigated for acetylene and ethylene. Under the conditions in which “full glow” is maintained, the distribution of polymer deposition from pure monomer flow systems is nearly independent of flow rate of monomer or of the system pressure in discharge, but is largely determined by the characteristic (absolute) polymerization rates (not deposition rate) of the monomers. Acetylene has a high tendency to deposit polymer near the monomer inlet, whereas ethylene deposits polymer more uniformly in wider areas in the reactor. The addition of carrier gas such as argon or partially copolymerizing gas such as N₂, H₂, and CCl₂F₂ was found to narrow the distribution of polymer deposition. The distribution of polymer deposition is also influenced by a glow characteristic which is dependent on flow rate and discharge power.     

Critical evaluation of conditions of plasma polymerization

Under conditions of plasma polymerization, we are dealing with the “reactive” or “self-exhausting” rather than the “nonreactive” or “non-self-exhausting” gas phase (plasma). Therefore, many parameters that define the gas phase, such as system pressure and monomer flow rate, which are measured in the nonplasma state (before glow discharge is initiated), do not apply to a steady state of plasma, the conditions under which most of the studies on plasma polymerization are carried out. Consequently, information based on: (1) the polymer deposition rate measured at a fixed flow rate and discharge power, (2) the dependence of deposition rate on flow rate at fixed discharge power, or (3) the dependence of deposition rate on discharge power at fixed flow rate, does not provide meaningful data that can be used to compare the characteristic nature of various organic compounds in plasma polymerization. The significance and true meaning of experimental parameters applicable to conditions of plasma polymerization are discussed. The most important feature is that plasma polymerizations of various organic compounds should be compared at comparable levels of composite discharge power parameter W/FM, where W is discharge power, F is the monomer flow rate (given in moles), and M is the molecular weight of a monomer.     

Plasma polymerization of tetrafluoroethylene. IV. Comparison of ethylene and tetrafluoroethylene by measurement of electron temperature and density of positive ions

The double probe method was applied to plasma of tetrafluoroethylene (TFE) and ethylene and the electron temperature (T_e) and density of positive ions (n_p) were measured at various discharge wattages. The probe current-probe voltage diagrams for TFE were different from those for ethylene. The shape of its diagram indicates that a considerable number of negative ions exist in TFE plasma. The levels of n_p for TFE were also nearly six times greater than those for ethylene at the same discharge current. The dependence of TFE polymer deposition and the chemical structure of the polymer, based on ESCA data on discharge current, was related to T_e and n_p measured by the probe method. The values of T_e and n_p may not be directly related to the polymer formation in a plasma; the method provides a direct measure of plasma energy density where plasma polymerization takes place, whereas it cannot be accurately estimated by the input energy of a discharge. It was found that plasma energy density based on (n_pT_e) for TFE plasma and that for ethylene differ significantly at the same level of input parameter (W/FM), where W is the discharge wattage, F is the volume flow rate, and M is the molecular weight of the monomer.     

Distribution of polymer deposition in plasma polymerization. III. Effect of discharge power

Distribution of polymer deposition in an inductively coupled rf discharge system is studied as a function of level of discharge power with acetylene and styrene as monomers. When a fixed flow rate is used, the discharge power has a relatively small effect on the pattern of distribution of polymer deposition as long as values of W/FM, where W is discharge wattage, F is flow rate, and M is molecular weight of monomer, are maintained above a critical level to maintain full glow in the reaction tube. It has been shown that plasma polymerization of two monomers which have different molecular weights can be compared in a fair manner by selecting conditions to yield similar value of W/FM.     

Comparisons of glow-discharge polymerizations among tetramethylsilane,dimethyldimethoxysilane, and tetramethoxysilane

Glow-discharge polymerizations among tetramethylsilane, dimethyldimethoxysilane, and tetramethoxysilane were compared by elemental analyses and infrared spectroscopy. The elemental composition of the polymers prepared from the three monomers depended strongly on the operational conditions necessary to sustain a glow discharge, i.e., the W/FM parameter, where W is the rf power, F is the flow rate of the monomer, and M is the molecular weight of the monomer. Methoxy groups were more susceptible to glow discharge than methyl groups. Differences in chemical structure among these monomers appeared in the polymer structures formed when the glow-discharge polymerization was carried out at a low value of the W/FM parameter, while the differences disappeared at high values of the W/FM parameter, for analogous polymers. Substitution with methoxy groups was favorable for the formation of polymers of low carbon content only when the glow-discharge polymerization was performed at low values of W/FM.     

Plasma polymerization of fluoromethanes

Methane and fluoromethanes (CH_nF_4−n, 1 ≤ n ≤ 3) were subjected to an rf glow discharge plasma. All the fluoromethanes (including methane) polymerized in the plasma and formed thin films. The deposition rate of the fluoromethanes depended on their monomer structure: CH₂F₂, of which the F/H ratio is unity, showed the greatest deposition rate. The elimination of H and F atoms as H—F was found to be a key factor for the polymerization of fluoromethanes. The chemical composition of the polymerized film, measured with X-ray photoelectron spectroscopy and glow discharge emission spectroscopy, was also found to be strongly dependent on monomer structure. © 1998 John Wiley & Sons, Inc. J. Polym. Sci. A Polym. Chem. 36: 2043–2050, 1998     

Plasma polymerization. III. An ESCA investigation of polymers synthesized by excitation of inductively coupled RF plasmas in perfluorocyclohexa-1,3- and 1,4-dienes,and in perfluorocyclohexene

The plasma polymers prepared from perfluorocyclohexa-1,3-diene, perfluorocyclohexa-1,4-diene, and perfluorocyclohexene have been investigated by ESCA. The carbon-to-fluorine stoichiometries of the diene-derived polymers are similar and close to that of the starting material. The polymer prepared from perfluorocyclohexene is depleted in fluorine compared to the fluorine content of the “monomer.” The polymers prepared in nonglow regions are also studied and shown to be high in C F₂ derived species. The results are compared with those for perfluorobenzene and perfluorocyclohexane, and the polymerization rates are in the order C₆F₆ > C₆F₈ 1,3 ～ 1,4 > C₆F₁₀ ～ C₆F₁₂. The variations in composition of the plasma polymer as revealed by ESCA as a function of the polymerization conditions are discussed.     

Monitoring the deposition process of metal-doped polymer films using optical emission spectroscopy

Simultaneous plasma polymerization of halocarbons (CF₄ and C₂F₃Cl) and sputtering of metals (Au and Al) or cosputtering [Au + polytetrafluoroethylene (PTFE, Teflon)] have been performed by means of an RF (20 MHz) glow discharge excited by a planar magnetron. The optical emission spectroscopy (OES) has been used for monitoring the deposition process of metal-doped polymer films. The light emission intensity ratios of the relevant species in the plasma volume are given in connection with the characteristics of the films prepared.     

The Role of Halogens in the Plasma Polymerization of Hydrocarbons

Vinyl chloride, vinyl fluoride, and tetrafluoroethylene were polymerized in a radio frequency electric glow discharge. It was found that when compared with the unhalogenated simple hydrocarbons, the rates of polymer deposition are in the order vinyl chloride, acetylene, tetrafluoroethylene, vinyl fluoride, ethylene. This observation can be rationalized by considering the ease with which free radical and unsaturated species can be formed in the plasma. IR spectra show that the structures of plasma-polymerized vinyl chloride and vinyl fluoride are in many respects similar to the plasma-polymerized hydrocarbon. The spectrum of plasma-polymerized tetrafluoroethylene, however, does not resemble that of conventional polytetrafluoroethylene. Addition of dichlorodifluoromethane to the monomer stream dramatically increased the polymer deposition rate; the effect is more subdued for chloromethane and is negligible for tetrafluoromethane. Elemental analysis indicates that little of the added halogens is present in the resultant polymers. Thus the halogenated compounds appear to act as a gas phase catalyst for the plasma polymerization of hydrocarbons.     

Distribution of polymer deposition in plasma polymerization. II. Effect of reactor design

The effects of relative positions of the monomer inlet and the r.f. coil, and of the inlet and outlet, on the distribution of polymer deposition in plasma polymerization of ethylene were investigated using an electrodeless glow discharge by a 13.5-MHz radiofrequency source. The diffusional transport of active species created under the r.f. coil, diffusional transport of polymer forming species, and flow of gas in the system are important factors that determine the distributions of polymer deposition observed in plasma polymerization of ethylene. The mechanisms of polymer deposition are discussed in conjunction with postulated plasma polymerization mechanisms.     

Penetration of plasma surface modification into porous media. III. Multiple samples exposed to CF4 and C2F4 low temperature cascade arc torch

The depth and possible mechanisms of the penetration of surface modification into porous media by a low temperature cascade are torch are investigated. Two different modes of such penetration (“flow controlled” and “diffusion controlled”) are evaluated. Three porous samples [stacks of 10 sheets of nonwoven fabrics of poly(ethylene terephthalate)each], placed at an axial distance of 24, 28, and 32 cm from the cascade are anode, are exposed to a low temperature cascade arc torch containing argon and CF₄ or C₂F₄, and surface properties of each of the sheets within treated porous samples are examined by ESCA. It is shown that interaction of chemically reactive species, created in the low temperature cascade arc torch, with the surface is not limited to the surface directly contacted by the torch. The flow controlled penetration is more pronounced for the outer layers, while diffusion controlled penetration is within the inner layers of the porous structure. Substantial differences in the fluorination effect of CF₄ (nonpolymer forming gas) and C₂F₄ (polymer forming gas) discharges for the second and third stacks are observed, that can be explained by the fact that the major effect of the CF₄ cascade arc torch treatment is based on the reaction of reactive species with the surface polymer molecules. The effect of C₂F₄ cascade arc torch treatment is based on the reactions of reactive species with polymers as well as reactions of reactive species themselves at the surface (plasma polymerization). Reactivity of the species created in C₂F₄ discharge is much higher compared to that created in CF₄ discharge, which is one of the major factors influencing penetration trends of low temperature cascade arc treatment into porous media. © 1995 John Wiley & Sons, Inc.     

Plasma polymerization of tetrafluoroethylene. III. Reproducibility and effects of substrate and reactor materials

Plasma polylmerization occurs in plasmas surrounded by surfaces and polymer formation is one of the complicated interactions that take place between active species and molecules which constitute surfaces and gas phases. Effects of reactor wall, substrate materials, flow rate, and discharge power on polymer formation, and properties of polymer deposits were investigated by ESCA, IR (infrared) spectroscopy, and the measurement of system pressure. The effect of surface is important at the initial stage of plasma polymerization which can be easily detected by the system pressure change; however, integrated properties such as IR spectroscopy and the deposition rate show the effect in a less pronounced manner. ESCA, which reflects the properties of surface (approximately 20 A? in depth), showed the effect of surface in an even less sensitive manner. The amount and properties (including the effects of surfaces) are dependent on plasma polymerization parameter W/FM(W, wattage; F, volume flow rate; and M, molecualar weight of monomer) and the location of deposition within a reactor. IR and ESCA data clearly showed the dependence of polymer properties on W/FM; i.e., increase of W and decrease of M to be equivalent. When all these factors were kept under control, the reproducibility of plasma polymerization was found to be excellent.     

Plasma polymerization investigated by the substrate temperature dependence

Plasma polymerization of tetra fluoroethylene (TFE), perfluoro-2-butyl-tetrahydrofuran (PFBTHF), ethylene, and styrene were investigated in various combinations of monomer flow rates and discharge wattages for the substrate temperature range of ?50 to 80°C. The polymer deposition rates can be generally expressed by k₀ = Ae^?bt, where k₀ is the specific deposition rate given by k₀ = (deposition rate)/(mass flow rate of monomer), A is the preexponential factor representing the extrapolated value of k₀ at zero absolute temperature, and b is the temperature-dependence coefficient. It was found that the value of b is not dependent on the condensibility of monomer but depends largely on the group of monomer; that is, perfluorocarbons versus hydrocarbons. The values of A are dependent on domains of plasma polymerization. In the energy deficient region A is given by A = α(W/FM)ⁿ, where α is the proportionality constant, W is discharge wattage, FM is the mass flow rate, and n is close to unity. In the monomer deficient region A becomes a constant. The kinetic equation is discussed in view of the bicyclic rapid step-growth polymerization mechanisms.     

A study of surface dynamics of polymers. III. Surface dynamic stabilization by plasma polymerization

As demonstrated in Part II of this series of studies, the hydrophobic character of CF₄ plasma-treated Nylon 6 and poly(ethylene terephthalate) (PET) decay with time of water immersion, and the rate of decay can be used as a measure for the surface mobility of (substrate) polymers. The same method of using fluorine-containing moieties introduced by CF₄ plasma treatment as surface labeling is applied to investigate the influence of a thin layer of plasma polymer of methane applied onto the surface of those polymers. An ultrathin layer of plasma polymer provides a barrier to the rotational and diffusional migration of the introduced chemical moieties from the surface into the bulk of the film. The influence of operational parameters of plasma polymerization on the surface dynamic stability are examined by measuring the decay rate constants for (subsequently) CF₄ plasma-treated samples. The rate constant was found to decrease sharply with increasing value of plasma energy input manifested by J/kg monomer, and no decay was observed as the energy input reached a threshold value (about 6.5 GJ/kg for PET, about 7.0 GJ/kg for Nylon 6), indicating that unperturbable surfaces can be created by means of plasma polymerization.     

Plasma polymerization of some organic compounds and properties of the polymers

Plasma polymerizations (under 13.5-MHz radiofrequency inductively coupled glow discharge) of some organic compounds are investigated by their properties (elemental analysis, surface energy, and infrared spectra) and their relations to the concentrations of free radicals in the polymers as detected by electron spin resonance (ESR) spectroscopy. Monomers that have been investigated are hexamethyldisiloxane, tetrafluoroethylene, acetylene, acetylene/N₂, acetylene/H₂O, acetylene/N₂/H₂O, allene, allene/N₂, allene/H₂O, allene/N₂/H₂O, ethylene, ethylene/N₂, ethylene oxide, propylamine, allylamine, propionitrile, and acrylonitrile. Plasma-polymerized polymers generally contain oxygen, even if the starting monomers do not contain oxygen. This oxygen incorporation is related to the free-radical concentration in the polymer. Molecular nitrogen copolymerizes with other organic monomers such as acetylene, allene, and ethylene, and their properties are very similar to those of plasma-polymerized polymers from nitrogen-containing compounds such as amines and nitriles. The addition of water to the monomer mixture reduces in a dramatic manner the concentration of free radicals in the polymer and consequently the oxygen-incorporation after the polymer is exposed to air. The concentrations of free radicals (by ESR) are directly correlated to the change of the properties of plasma-polymerized polymers with time of exposure to the atmosphere. These changes are primarily the introduction of carbonyl (and possibly hydroxyl) groups. The addition of water to the plasma introduces these groups during the polymerization.     

Polymerization of tetrafluoroethylene initiated by fluorinated petroleum coke

The polymerization of tetrafluoroethylene initiated by the inorganic polymer fluorocarbon material CF_0.95 prepared by the high-temperature fluorination of petroleum coke has been studied. The kinetics of the process has been examined, and the dependences of the rate of polymerization and the yield of polymer on monomer pressure and temperature have been considered. The free-radical mechanism of the process is established by ESR. The kinetic features of initiation and polymerization leading to an exponential growth in rate in the initial non-steady-state portion of kinetic curves are discussed.     

Glow discharge polymerization of tetramethylsilane investigated by infrared spectroscopy and ESCA

The influence of operating conditions (W/FM parameter: W input energy of rf power; F flow rate of monomer; M molecular weight of monomer) on glow discharge polymerization of tetramethylsilane (TMS) was investigated by infrared spectroscopy and ESCA. Elemental analyses showed that the compositions of the polymers formed strongly depended on the level of the W/FM parameter, i.e., whether the W/FM value was more or less than 190 MJ/kg. The infrared spectra indicated that these polymers were composed of Si? H, Si? O, Si? C, Si? CH₃, and Si? CH₂ groups, and that there was no significant difference in structural features between polymers prepared at W/FM parameters of more or less than 190 MJ/kg. ESCA spectra (C_1s and Si_2p core-level spectra) showed that the polymers included carbonized carbon, aliphatic carbon Si? C, C? O, Si? O, and SiO₂ species, and that the sum of carbonized and aliphatic carbons reached more than 50%. Raising the W/FM value increased the formation of the carbonized carbon but did not influence the formation of Si units such as Si? C and Si? O groups. From this evidence the rupture of Si? CH₃ bonds in the polymer forming process is emphasized. The magnitude of the W/FM parameter may be related to the detachment of hydrogen from the aliphatic carbon units.     

Application of mass spectrometry to the study of fluoropolymers. II. The copolymer from trifluoronitrosomethane (CF3NO) and tetrafluoroethylene (C2F4)

The techniques of mass spectrometry have been applied to the copolymer from tri-fluoronitrosomethane (CF₃NO) and tetrafluoroethylene (C₂F₄). The copolymer yields spectra of a repetitive nature, typical of the repeating units in the polymer chain. Molecules with masses up to m/e 6400 can be distilled from the unfractionated polymer which is stable up to 220°C. Interpretation of the mass spectrum suggests a linear structure for the regular polymer.     

Plasma fluorination of polyolefins

ESCA and contact angle measurements were used to characterize the surfaces of Polyethylene and polypropylene films exposed to SF₆, CF₄, and C₂F₆ plasmas. None of these gases polymerized in the plasma. However, all plasma treatments grafted fluorinated functionalities directly to the polymer surfaces. SF₆ plasmas graft fluorine atoms to a polyolefin surface. CF₄ plasmas also react by a mechanism dominated by fluorine atoms, but with some contribution from CF_x-radical reactions. Although C₂F₆ does not polymerize, the mechanism of grafting is still dominated by the reactions of CF_x radicals. For all gases studied, the lack of polymerization is attributed to competitive ablation and polymerization reactions occurring under conditions of ion bombardment.     

Plasma homo- and copolymerizations of tetrafluoroethylene and chlorotrifluoroethylene

The plasma homo- and copolymerizations of tetrafluoroethylene (TFE) and chlorotrifluoroethylene (CTFE) in a capacitively coupled tubular reactor (TR) with external electrodes were studied by means of microgravimetry and FT-IR and XPS analyses. The deposition rates for CTFE/TFE plasma copolymers, as well as the ratios of IR absorbances at 1180 and 1225 cm⁻¹, and the XPS-derived Cl/C and F/C ratios, varied regularly with mol % CTFE in the feed, all of which results were dependent upon the rf power at which the plasma copolymerizations were conducted. The deposition rates for the plasma homopolymers of TFE (PPTFE) and CTFE (PPTCFE) depended markedly on rf power (W) and monomer molar flow rate (F). The F/C ratio for PPTFE was nearly independent of the composite parameter,W/FM (whereM is the monomer molecular weight), while for PPCTFE, the F/C ratio decreased significantly and the Cl/C ratio increased slightly with increase inW/FM. The percentage of carbon as CF₃ was 20–24% in PPTFE and 7–14% in PPCTFE. Plots of deposition rate versusW/FM for PPTFE and PPCTFE obtained in a TR differed considerably from corresponding plots in the literature for the same homopolymers prepared in a glass-cross or bell-jar reactor.