掺Er/Pr的GaN薄膜深能级的研究

利用深能级瞬态谱(DLTS)、傅里叶变换红外光谱(FT-IR)对GaN以及GaN掺Er/Pr的样品进行了 电学和光学特性分析.研究发现未掺杂的GaN样品只在导带下0.270eV处有一个深能级；GaN注 入Er经900℃,30min退火后的样品出现了四个深能级，能级位置位于导带下0.300 eV,0.188 eV,0.600 eV 和0.410 eV；GaN注入Pr经1050℃,30min退火后的样品同样出现了四个深能级 ，能级位置位于导带下0.280 eV,0.190 eV,0.610 eV 和0.390 eV；对每一个深能级的来源 进行了讨论.光谱研究表明，掺Er的GaN样品经900℃,30min退火后，可以观察到Er的1538nm 处的发光，而且对能量输运和发光过程进行了讨论. 关键词： GaN Er Pr 深能级     

基于离子注入技术的ZnMnO半导体材料的制备及光谱表征

通过离子注入技术制备了ZnMnO半导体材料，研究离子注入剂量与退火对材料光谱性质的影 响.Raman光谱研究发现，575cm^-1处声子模展宽是由高剂量Mn注入引起的缺陷所 致，退火样品528cm^-1振动模来自Mn相关的杂质振动.室温光致发光谱表明，退 火对高剂量注入样品的可见发光带有增强作用. 关键词： ZnMnO 离子注入 Raman光谱 室温光致发光     

退火对磁控溅射HfSi_xO_y薄膜光学性质的影响

采用射频反应磁控溅射方法在硅衬底制备了HfSixOy薄膜,用X射线光电子能谱(XPS)分析了HfSixOy薄膜的成分,用X射线衍射(XRD)检测了薄膜的结构,并用椭圆偏振光谱仪研究了退火处理对薄膜光学性质的影响。XRD谱显示,HfSixOy薄膜经700℃高温退火处理后仍为非晶态,而在900℃高温退火处理后出现晶化。采用Tauc-Lorentz(TL)色散模型对测试得到的曲线进行拟合并分析得出薄膜的光学常数,结果表明,薄膜的折射率随退火温度的升高而增加,而消光系数随退火温度的升高呈降低趋势。薄膜的光学带隙随着退火温度的升高增加,采用外推法得到薄膜沉积态和经500℃,700℃,900℃退火后的带隙分别为5.62,5.65,5.68,5.98eV。     

分子束外延HgCdTe材料的光致发光研究

报道了分子束外延生长 Ｈｇ０．６８ Ｃｄ０．３２ Ｔｅ 材料的光致发光测量结果。研究了原生样品和退火处理样品、以及氮离子注入样品的低温光致发光特征。对光致发光的测试结果进行拟合得到的禁带宽度, 与用红外透射谱得到的薄膜禁带宽相近; 其半峰宽和带尾能量较小, 显示了较高的薄膜质量。样品经过退火后带尾能量降低, 双晶衍射的半峰宽也有明显的变窄     

氧离子注入纳米金刚石薄膜的微结构和电化学性能研究

在纳米金刚石薄膜中注入剂量为1012cm-2的氧离子,并进行700,800,900和1000?C的真空退火处理,系统研究薄膜的微结构和电化学性能结果表明,氧离子注入未退火(O120)和氧离子注入1000?C退火(O121000)电极的电势窗口分别为4.60 V和3.61 V,远大于其他电极的电势窗口,并且这两个样品的电极传质效率较高,说明氧离子注入和高温退火有利于提高电极的传质效率.红外光谱测试表明,样品O120和O121000的表面没有碳氢基团终止层,而其他样品均含有氢终止层,说明氧离子注入和高温退火破坏了薄膜表面含碳氢基团的氢终止层,提高了薄膜的电化学性能Raman光谱测试结果表明,金刚石含量较高、内应力较小和非晶石墨相无序化程度较大的样品具有较好的电化学性能;并且薄膜晶界处的非晶碳的团簇数量或者尺寸减小,样品的电化学性能提高.     

离子注入法制备GaN∶Er薄膜的Raman光谱分析

对离子注入法制备的u-,n-和p-GaN∶Er三种类型的薄膜样品进行了Raman光谱分析。Er+注入GaN样品后新出现了293,362和670 cm-1等波数的Raman峰,其中293 cm-1处的Raman峰被指认为无序激活的Raman散射(DARS),362 cm-1和670 cm-1处的Raman峰可能与离子注入后形成的GaN晶格缺陷有关。上述GaN∶Er样品在800℃退火前后的E₂(high)特征峰均向高频方向移动,表明薄膜晶格中均存在着压应力。采用洛伦兹拟合分析了Raman光谱中组成A₁(LO)模式峰的未耦合LO模与等离子体激元耦合模LPP+在不同样品中的出现情况,定性指出了GaN∶Er系列样品中载流子浓度的变化规律。     

氧离子注入微晶金刚石薄膜的微结构与光电性能研究

本文系统研究了氧离子注入剂量和退火温度对含有Si-V发光中 心的微晶金刚石薄膜的微结构和光电性能的影响. 结果表明, 氧离子注入并在较高温度退火有利于提高薄膜中Si-V中心的发光强度. 当氧离子注入剂量从10¹⁴ cm^-2增加到10¹⁵ cm^-2时, 薄膜中Si-V发光强度增强. Hall效应测试结果表明退火后薄膜的面电阻率降低. 不同温度退火时, 氧离子注入薄膜的Si-V发光强度较强时, 薄膜的面电阻率增加, 说明Si-V发光中心不利于提高薄膜的导电性能. Raman光谱测试结果表明, 薄膜中缺陷数量的增多会增强Si-V的发光强度, 而降低薄膜的导电性能. 关键词： 金刚石薄膜 氧离子注入 电学性能 Si-V缺陷     

硫离子注入纳米金刚石薄膜的微结构和电化学性能

采用热丝化学气相沉积法制备纳米金刚石薄膜,并对薄膜进行硫离子注入和真空退火处理.系统研究了退火温度对薄膜微结构和电化学性能的影响.结果表明,硫离子注入有利于提升薄膜的电化学可逆性.在800°C及以下温度退火时,薄膜中晶界处的非晶碳相逐渐向反式聚乙炔相转变,致使电化学性能逐渐变差.当退火温度上升到900°C时, Raman光谱和TEM结果显示此时薄膜中金刚石相含量较多且晶格质量较好,晶界中的反式聚乙炔发生裂解; X射线光电子能谱结果表明,此时C—O键、C=O键、p—p*含量显著增多; Hall效应测试显示此时薄膜迁移率与载流子浓度较未退火时明显升高;在铁氰化钾电解液中氧化还原峰高度对称,峰电位差减小至0.20 V,电化学活性面积增加到0.64 mC/cm~2,电化学可逆性远好于600, 700, 800°C退火时的样品.     

GaN和GaN:Mg外延膜低温拉曼谱的对比研究

对液氮温度下六方相GaN和掺Mg的P型GaN薄膜的拉曼谱进行了对比研究。除对两个样品中主晶格振动模进行了对比分析外,着重讨论了位于247 cm-1的散射峰的产生机制。结果表明GaN:Mg的谱中该峰的散射强度随温度升高先增大再减小,在500K以上消失且对样品重新降温到78K观察此峰不再出现,因此认为它是缺陷产生的振动模。而GaN样品中经同样加热降温的过程此峰仍然存在,说明两个样品中该峰的产生机制不同。此外,在GaN:Mg的谱中还观察到Mg诱导的局域振动模。     

硅基硒纳米颗粒的发光特性研究

由于尺寸缩小引起的量子效应, 硒(Se) 材料的低维纳米结构具有更高的光响应和低的阈值激射等特性, 因此成为纳米电子与纳米光电子器件领域一个重要的研究方向. 本文通过对非晶硒薄膜的快速热退火来制备硒纳米颗粒, 退火温度在100–180℃之间时, 结晶后的硒纳米颗粒均为三角晶体结构, 其颗粒尺寸随退火温度的增加而线性增大. 光致发光谱测试发现三个发光峰, 分别位于1.4eV, 1.7eV和1.83eV. 研究发现位于1.4eV处的发光峰来源于非晶硒缺陷发光, 位于1.83eV处的发光峰来源于晶体硒的带带跃迁发光; 而位于1.7eV处的发光峰强度随激发功率增强而指数增大, 且向短波长移动, 该发光峰应该来源于非晶硒与硒纳米颗粒界面处的施主-受主对复合发光. 关键词： 硅基 硒纳米颗粒 光致发光 施主-受主对     

The effects of post-thermal annealing on the optical parameters of indium-doped ZnO thin films

Indium-doped ZnO thin films are deposited on quartz glass slides by RF magnetron sputtering at ambient temper- ature. The as-deposited films are annealed at different temperatures from 400 C to 800 C in air for 1 h. Transmittance spectra are used to determine the optical parameters and the thicknesses of the films before and after annealing using a nonlinear programming method, and the effects of the annealing temperatures on the optical parameters and the thickness are investigated. The optical band gap is determined from the absorption coefficient. The calculated results show that the film thickness and optical parameters both increase first and then decrease with increasing annealing temperature from 400 C to 800 C. The band gap of the as-deposited ZnO:In thin film is 3.28 eV, and it decreases to 3.17 eV after annealing at 400 C. Then the band gap increases from 3.17 eV to 3.23 eV with increasing annealing temperature from 400 C to 800 C.     

Effect of thermal annealing on r.f. sputtering-deposited nanocrystalline GaN<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>As<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript> thin films

GaNAs thin films were deposited on Corning glass substrates by radio frequency (r.f.) sputtering in molecular nitrogen ambient. The stoichiometry in the GaNAs alloy was controlled by changing the nitrogen incorporation in the film during the growth process, through the variation of the r.f. power in the range 30–80 watts which produced films with N concentrations in the range: x = 0.85–0.90. The structural and optical properties of the GaNAs thin films were studied by X-ray diffraction (XRD), photoacoustic (PA) and photoluminescence (PL) spectroscopies. XRD measurements show a broad diffraction band with a peak close to the (002) diffraction line of the GaN hexagonal phase, and a slight shoulder at the position corresponding to the (111) GaAs cubic phase. The PA absorption spectra showed a remarkable shift to higher energies of the absorption edge as the r.f. power decreases corresponding to the films with higher N concentrations. Thermal annealing of the GaNAs films at temperatures of 450 °C produced a GaAs nanocrystalline phase with grain sizes in the range 10–13 nm, as confirmed by the XRD measurements that showed a well-defined peak in the (111) GaAs direction, and also by the PA spectra which showed an absorption band at energies around 1.45 eV due to the quantum confinement effects. PL spectra of thermal-annealed GaNAs films showed a very intense emission at 1.5 eV which we have associated to transitions between the first electron excited level and acceptor states in the GaAs nanocrystallites.     

Some optical properties of amorphous and crystalline antimony trisulphide thin films

The change in optical properties accompanying the amorphous crystalline transition has been studied for antimony trisulphide thin films. The real and imaginary parts of the dielectric constant are found to be much lower for amorphous films at lower photon energies, possibly because of a large number of defect states which would mostly disturb the top of the valence band and the conduction band comprised, respectively, of chalcogen lone pair and antibonding states. The crystalline material shows some structure in the imaginary part of the dielectric constant that corresponds to interband transitions, and apparently the direct band edge is at 1.88 eV. In the edge region the power law absorption has been observed in the amorphous material from which the extrapolated optical gap has been found to be 1.7 eV.     

Optical properties of InN—the bandgap question

The recent controversy on the bandgap of InN is addressed, with reference to optical data on single crystalline thin film samples grown on sapphire. The optical absorption spectra deduced from transmission data or spectroscopic ellipsometry are consistent with a lowest bandgap around 0.7 eV in the low doping limit. Further, these data from a number of different independent authors and samples give values for the absorption coefficient within a factor 2 well above the absorption edge, supporting an intrinsic direct bandgap process. The presence of Mie resonances due to In inclusions in the InN matrix affects the shape of the absorption above the edge, but is less relevant for the discussion of the bandgap for pure InN. The alternative model of a deep level to conduction band transition requires the presence of a deep donor at a concentration close to 10²⁰ cm⁻³; in addition this concentration has to be the same within a factor 2 in all samples studied so far. This appears implausible, and no such deep donor could so far be identified from SIMS data in the highest quality samples studied. The line shape of the photoluminescence spectra can be quite well reproduced in a model for the optical transitions from the conduction band states to localized states above the valence band, including the Coulomb effects of the impurity potentials. A value of 0.69 eV for the bandgap of pure InN is deduced at 2 K. For samples that appear to be only weakly degenerate n-type two narrow peaks are observed in the photoluminescence at low temperature, assigned to conduction band—acceptor transitions. These peaks can hardly be explained in the deep level model. Recent cathodoluminescence data on highly n-doped InN films showing that the emission appears to be concentrated around In inclusions can also be explained as near bandgap recombination, considering the plausible enhancement due to interface plasmons. Finally, recent photoluminescence data on quantum structures based on InN and InGaN with a high In content appear to be consistent with moderate upshifts of the emission from a 0.7 eV value due to electron confinement.     

Al掺杂原子分数及退火温度对ZnO薄膜光学特性的影响

 采用溶胶凝胶法在（0001）Al₂O₃衬底上制备了不同掺杂原子分数的ZnO:Al薄膜,在Ar气氛中进行了600～950 ℃不同温度的退火处理,研究了掺杂原子分数和退火温度对薄膜光致发光、光吸收和透射的影响。结果显示,薄膜的紫外峰强度随掺杂原子分数和退火温度的提高而增强,与缺陷相关的绿光强度却随着掺杂原子分数和退火温度的提高而降低;薄膜光学带隙随掺杂原子分数的提高从3.21 eV增大到3.25 eV;光吸收在可见光区随着退火温度的升高而增大,在紫外区却随着退火温度的升高而减小,透射与吸收的变化规律相反;薄膜吸收边随退火温度的升高出现轻微的红移。     

Bi3.15Eu0.85Ti3O12铁电薄膜的结构与光学性能

采用化学溶液沉积法在石英衬底上制备了Bi_3.15Eu_0.85Ti₃O₁₂ (BEuT) 铁电薄膜,研究了 BEuT薄膜的结构和光学性能。XRD结果表明,不同温度退火的BEuT皆形成铋层状钙钛矿型结构,其晶粒尺寸随着退火温度的升高而增大,与SEM观察结果一致。对BEuT薄膜的拉曼光谱研究表明,Eu³⁺主要取代钙钛矿层中的Bi³⁺位。光学透过率曲线显示,在大于500 nm的波段,各BEuT薄膜的透过率均比较高,其禁带宽度约为 3.69 eV。BEuT薄膜的发光随着退火温度的升高而增强,这可归因于其结晶状况的改善。     

Optical and Structural Properties of Mn-Doped GaN Grown by Metal Organic Chemical Vapour Deposition

Mn-doped GaN epitaxial films were grown by metal organic chemical vapour deposition （MOCVD）. Microstructural properties of films are investigated using Raman scattering. It is found that with increasing Mn-dopants levels, longitudinal optical phonon mode A1 （LO） of films is broadened and shifted towards lower frequency. This phenomenon possibly derives from the difference in bonding strength between Ga-N pairs and Mn-N pairs in host lattice. In addition, optical properties of films are investigated using cathodoluminescence and absorption spectroscopy. Mn-related both emission band around 3.0eV and absorption bands around 1.5 and 2.95eV are observed. By studies on structural and optical properties of Mn-doped GaN, we find that Mn ions substitute for Ga sites in host lattice. However, carrier-mediated ferromagnetic exchange seems unlikely due to deep levels of Mn acceptors.     

Optical and magnetic properties of (Ga1−xMnx)N/GaN digital ferromagnetic heterostructures

(Ga_1−xMn_x)N/GaN digital ferromagnetic heterostructures (DFHs) and (Ga_1−xMn_x)N/GaN grown on GaN buffer layers by using molecular beam epitaxy have been investigated. The photoluminescence (PL) spectra showed band-edge exciton transitions. They also showed peaks corresponding to the neutral donor-bound exciton and the exciton transitions between the conduction band and the Mn acceptor, indicative of the Mn atoms acting as substitution. The magnetization curves as functions of the magnetic field at 5 K indicated that the saturation magnetic moment in the (Ga_1−xMn_x)N/GaN DFHs decreased with increasing Mn mole fraction and that the saturation magnetic moment and the coercive field in the (Ga_1−xMn_x)N/GaN DFHs were much larger than those in (Ga_1−xMn_x)N thin films. These results indicate that the (Ga_1−xMn_x)N/GaN DFHs hold promise for potential applications in spintronic devices.     

Ferromagnetism in noncompensated (Mn,Ga)-codoped ZnO films

Mn/Ga noncompensated codoped ZnO films were prepared on c-cut sapphire substrates via pulsed laser deposition. The structural, magnetic, transport, and optical properties of the films were then investigated. Addition of the Ga donor increases the electron concentration and enhances the magnetization in these films because of the net negative charge of the special noncompensated codoping, which can adjust the carrier concentration as well as the magnetic moment. Moreover, the Fermi level moves into the conduction band because of the increase in electron concentration, which results in an increase in the optical band gap value, from 3.28 eV for the undoped ZnO film to 3.61 eV for the (Mn,Ga)-codoped ZnO film.