拓扑绝缘体薄膜和有限尺寸效应

拓扑绝缘体是近年来发现的一类新的量子材料,已成为凝聚态物理的研究热点领域.厚度仅几纳米的拓扑绝缘体薄膜不但具有奇特的物理性质,而且还是拓扑绝缘体应用于平面器件的基础.文章以Bi2Se3为例,介绍了Bi2Se3家族拓扑绝缘体薄膜的分子束外延生长以及其能带、自旋结构和拓扑性质随层厚的演化.这些结果为人工调控拓扑绝缘体的电子结构和物理性质提供了指导.     

磁性拓扑绝缘体中的量子化反常霍尔效应——无需外磁场的量子化霍尔效应

文章从平常霍尔效应出发,介绍了反常霍尔效应及其内秉物理机制,并在此基础上介绍了其量子化版本——量子化反常霍尔效应.然后从拓扑有序态的角度,重点讨论了量子化反常霍尔效应与量子霍尔效应、量子自旋霍尔效应、拓扑绝缘体等之间的区别与内在联系.最后介绍了通过在拓扑绝缘体(Bi2Se3,Bi2Te3和Sb2Te3)薄膜中掺杂过渡金属元素(Cr或Fe)实现量子化反常霍尔效应的方法.     

拓扑绝缘体薄膜生长与栅电压调控输运特性研究

文章讨论了三维拓扑绝缘体制备和输运性质研究方面的进展情况.首先介绍了拓扑绝缘体体材料和薄膜的制备,并介绍了文章作者利用分子束外延方法,在硅表面以及高介电常数材料钛酸锶表面生长高质量拓扑绝缘体Bi2Se3薄膜的工作.然后介绍了拓扑绝缘体输运研究的现状,以及文章作者在栅电压调控拓扑绝缘体外延薄膜的化学势和输运性质方面的研究成果.     

Bi(110)薄膜在NbSe_2衬底上的扫描隧道显微镜研究

二维拓扑绝缘体因其特殊的能带结构带来的新奇物理性质,成为近年来凝聚态物理的研究热点.尤其是在引入超导电性之后,二维拓扑绝缘体中可能存在马约拉纳费米子(Majorana fermion),因此在量子计算方面具有重大应用前景.在Bi(111)薄膜被证实为二维拓扑绝缘体之后, Bi(110)薄膜引起了广泛关注,然而其拓扑性质还存在争议.本文利用分子束外延技术在室温低生长速率环境下成功制备出了高质量的单晶Bi(110)薄膜.通过扫描隧道显微镜测量发现,薄膜以约8个原子层厚度为分界,从双层生长转变为单层生长模式.结合隧道谱测量发现,在NbSe_2衬底上生长的Bi(110)薄膜因为近邻效应而具有明显的超导性质,但并未显示出拓扑边缘态的存在.此外,对薄膜中特殊的量子阱态现象也进行了讨论.     

基于Si掺杂Sb2Te3薄膜的相变存储器研究

采用磁控三靶(Si,Sb及Te)共溅射法制备了Si掺杂Sb2Te3薄膜,作为对比,制备了Ge2Sb2Te5和Sb2Te3薄膜,并且采用微加工工艺制备了单元尺寸为10μm×1Oμm的存储器件原型来研究器件性能.研究表明,Si掺杂提高了Sb2Te3薄膜的晶化温度以及薄膜的晶态和非晶态电阻率,使得其非晶态与晶态电阻率之比达到106,提高了器件的电阻开/关比;同Ge2Sb2Te5薄膜相比,16at%Si掺杂Sb2Te3薄膜具有较低的熔点和更高的晶态电阻率,这有利于降低器件的RESET电流.研究还表明,采用16at%Si掺杂Sb2Te3薄膜作为存储介质的存储器器件原型具有记忆开关特性,可以在脉高3V、脉宽500 ns的电脉冲下实现SET操作,在脉高4 V、脉宽20 ns的电脉冲下实现RESET操作,并能实现反复写/擦,而采用Ge2Sb2Te5薄膜的相同结构的器件不能实现RESET操作.     

基于Ge2Sb1.5Bi0.5Te5可饱和吸收体的锁模光纤激光器

Ge2Sb1.5Bi0.5Te5薄膜具有宽光谱吸收和高稳定性的特点.在金镜上采用磁控溅射制备了40 nm厚的Ge2Sb1.5Bi0.5Te5薄膜,将其在150℃下退火20 min,退火后Ge2Sb1.5Bi0.5Te5由非晶态转变为晶态.测试发现晶态Ge2Sb1.5Bi0.5Te5可饱和吸收体的调制深度提高到了原来的1...     

《自然·物理》报道拓扑绝缘体/高温超导体近邻效应研究最新成果

清华大学物理系周树云研究组、陈曦/薛其坤研究组和清华大学高等研究院姚宏研究员,最近在拓扑绝缘体和高温超导体异质界面的超导近邻效应研究中取得重要进展.他们首次利用分子束外延（MBE）在高温超导体Bi2Sr2CaCu2O8＋d（BSCCO）上制备出高质量Bi2Se3拓扑绝缘体薄膜,     

椭偏法测量拓扑绝缘体的复折射率

采用椭偏法测量了拓扑绝缘体Bi2Te3单晶的复折射率.运用经典的德鲁德和托克-洛伦兹模型分别对拓扑绝缘体的表面态和体态进行拟合,获得了其折射率和消光系数,并且分析了色散曲线的变化规律.实验结果表明:Bi2Te3拓扑绝缘体的体态具有类半导体特性(含带隙),折射率在近红外波段可达7以上;表面态具有类金属特性,厚度约为2.52nm.     

单轴压力下Ge2X2Te5(X=Sb,Bi)薄膜拓扑相变的第一性原理研究

随着拓扑绝缘体的发现, 材料拓扑物性的研究成为凝聚态物理研究的热点领域. 本文基于第一性原理计算, 研究了化合物Ge₂X₂Te₅ (X=Sb, Bi) 的块体结构和二维单层和双层薄膜结构的拓扑物性, 以及单双层薄膜在垂直方向单轴压力下的拓扑量子相变. 研究发现, A型原子序列排列的这两种化合物都是拓扑绝缘体, 其单层薄膜都是普通金属, 而双层薄膜都是拓扑金属, 单层和双层薄膜在单轴加压过程中都没有发生拓扑量子相变; 这两种化合物的B型原子序列的晶体是普通绝缘体, 其所对应的薄膜, Ge₂Sb₂Te₅单层是普通金属, 双层薄膜和Ge₂Bi₂Te₅的单层和双层薄膜均为普通绝缘体, 但是在单轴加压过程中B 型原子序列所对应的单层和双层薄膜都转变为拓扑金属.     

高灵敏度Sb基量子阱2DEG的霍尔器件（英文）

用分子束外延技术将高灵敏度的In As/Al Sb量子阱结构的Hall器件赝配生长在Ga As衬底上。设计了由双δ掺杂构成的Hall器件的新结构,有效地提高了器件的面电子浓度。与传统的没有掺杂的In As/Al Sb量子阱结构的Hall器件相比,室温下器件电子迁移率从15 000 cm~2·V~(-1)·s~(-1)提高到16 000 cm~2·V~(-1)·s~(-1)。AFM测试表明材料有好的表面形态和结晶质量。从77 K到300 K对Hall器件进行霍尔测试,结果显示器件不同温度范围有不同散射机构。双δ掺杂结构形成高灵敏度、高二维电子气(2DEG)浓度的In As/Al Sb异质结Hall器件具有广阔的应用前景。     

Ultrafast dynamics of BixSb1-x film studied by femtosecond pump-probe technique

The Bi_xSb_1-x film is an important phase change material. The ultrafast dynamics of Bi_xSb_1-x film is studied by the femtosecond pump-probe technique with an 80 fs pulsed laser. Experimental results show that the reflectivity change increases with the fluence of the pump laser. The fast increase of the reflectivity occurs between 100 and 800 fs. Subsequently, the slower recovery of the reflectivity on a time scale of 1.24-18.3 ps is detected. We also found that the reflectivity change can be greatly affected by the ratio between Bi and Sb composition in Bi_xSb_1-x materials with x = 0.2 and 0.88. These experimental results should be helpful for developing new devices with ultrafast dynamics of Bi_xSb_1-x film and ultrafast optical switching.     

Characterization of Mn-doped Sb1.5Bi0.5Te3 single crystals

Abstract

Single crystals of (Sb_0.75Bi_0.25)_2-xMn_xTe₃ (x = 0.0–0.05) were characterized by X-ray diffraction, measurements of reflectance in the plasma resonance frequency region, Hall coefficient, electrical conductivity, and Seebeck coefficient. It was found that Mn atoms in the crystal structure of Sb_1.5Bi_0.5Te₃ behave like acceptors; the increase in the hole concentration is explained by the formation of substitutional defects of Mn'_Sb and Mn'_Bi in the crystal lattice of the studied crystals.     

Electrodeposition of BixSb2−xTey thermoelectric thin films from nitric acid and hydrochloric acid systems

The electrochemical behaviors of Bi^III, Te^IV and Sb^III single ions and their mixtures were investigated in nitric acid and hydrochloric acid system separately. Based on which, Bi_xSb_2−xTe_y thermoelectric films were prepared by potentiostatic electrodeposition from the solutions with different concentrations of Bi^III, Te^IV and Sb^III in the two acid systems. The morphologies, compositions, structures, Seebeck coefficients and resistivities of the deposited thin films were characterized and compared by ESEM (or FESEM), EDS, XRD, Seebeck coefficient measurement system and four-probe resistivity measuring device respectively. The results show that although Bi_xSb_2−xTe_y thermoelectric thin film which structure is consistent with the standard pattern of Bi_0.5Sb_1.5Te₃ can be gained in both of the two acid solutions by adjusting the deposition potential, their morphologies and thermoelectric properties have big differences in different acid solutions.     

Influence of silver on the galvanomagnetic properties and energy spectrum of mixed (Bi1− x Sbx)2Te3 crystals

An investigation is made of the temperature dependences of the resistivity in the range 4.2–300 K, the Hall effect, and the Shubnikov-de Haas effect in magnetic fields up to 40 T in (Bi_{1? x} Sb_x)₂Te₃Ag_y single crystals (0 ≤ x ≤ 0.75). Doping (Bi_{1? x} Sb_x)₂Te₃ crystals with silver showed that in Sb₂Te₃ and (Bi_{1? x} Sb_x)₂Te₃ crystals unlike Bi₂Te₃ silver exhibits acceptor properties. The angular and concentration dependences of the Shubnikov-de Haas effect were studied in (Bi_{1? x} Sb_x)₂Te₃Ag_y. It was established that the anisotropy of the ellipsoids of the upper valence band in Bi_0.5Sb_1.5Te₃ remains unchanged as a result of silver doping.     

Bi-Sb-Te基热电薄膜温差电池离子束溅射制备与表征

本文采用离子束溅射Bi/Te和Sb/Te二元复合靶,直接制备n型Bi₂Te₃热电薄膜和p型Sb₂Te₃热电薄膜.在退火时间同为1 h的条件下,对所制备的Bi₂Te₃薄膜和Sb₂Te₃薄膜进行不同温度的退火处理,并对其热电性能进行表征.结果表明,在退火温度为150 ℃时,制备的n型Bi₂Te₃关键词： 薄膜温差电池 2Te₃薄膜')" href="#">Sb₂Te₃薄膜 2Te₃薄膜')" href="#">Bi₂Te₃薄膜 离子束溅射     

La1－xPrxMnO3(x=0.1，0.2)薄膜庞磁电阻性质的研究

一种新的庞磁电阻氧化物薄膜La_1-xPr_xMnO₃(x=0.1，0 .2)薄膜用脉冲激光沉积(PLD)方法生长在(100)SrTiO₃单晶基底上.XRD结果显示 薄膜具有很好的外延单晶取向.电输运和磁性质的研究表明薄膜具有显著的庞磁电阻效应(CM R)效应，其中磁电阻比率达95％(在5T的磁场下).X射线光电子能谱(XPS)的结果表明薄膜体 系中Pr离子的价态为+4价，因此该薄膜很可能是电子掺杂的庞磁电阻体系. 关键词： 脉冲激光沉积 1-xPr_xMnO₃')" href="#">La_1-xPr_xMnO₃ 电子 掺杂 庞磁电阻     

Three- and two-dimensional topological insulators in Pb2Sb2Te5, Pb2Bi2Te5, and Pb2Bi2Se5 layered compounds

The electronic structure of ternary compounds Pb₂Sb₂Te₅, Pb₂Bi₂Te₅, and Pb₂Bi₂Se₅, which have a layered structure that consists of nine-layer atomic blocks separated by van der Waals gaps, has been theoretically studied. It has been shown that all studied compounds are three-dimensional topological insulators. The possibility of the existence of a two-dimensional topological insulator has been found in ultrathin (0001) Pb₂Sb₂Te₅ and Pb₂Bi₂Te₅ films. Oscillations of the ℤ₂ topological invariant with an increase in the film thickness have been observed in the latter compound.     

Thermal sensors based on Sb<Subscript>2</Subscript>Te<Subscript>3</Subscript> and (Sb<Subscript>2</Subscript>Te<Subscript>3</Subscript>)<Subscript>70</Subscript>(Bi<Subscript>2</Subscript>Te<Subscript>3</Subscript>)<Subscript>30</Subscript> thin films

Thin films of Sb₂Te₃ and (Sb₂Te₃)₇₀(Bi₂Te₃)₃₀ alloy and have been deposited on precleaned glass substrate by thermal evaporation technique in a vacuum of 2?×?10^?6 Torr. The structural study was carried out by X-ray diffractometer, which shows that the films are polycrystalline in nature. The grain size, microstrain and dislocation density were determined. The Seebeck coefficient was determined as the ratio of the potential difference across the films to the temperature difference. The power factor for the (Sb₂Te₃)₇₀ (Bi₂Te₃)₃₀ and (Sb₂Te₃) is found to be 19.602 and 1.066 of the film of thickness 1,500 Å, respectively. The Van der-Pauw technique was used to measure the Hall coefficient at room temperature. The carrier concentration was calculated and the results were discussed.     

Fermi surface and thermoelectric power of (Bi1−x Sbx)2Te3<Ag, Sn> mixed crystals

The Fermi surface anisotropy of (Bi_1?x Sb_x)₂Te₃ single crystals (0.25 ≤ x ≤ 1) was studied by analyzing the angular dependence of the frequency of Shubnikov-de Haas oscillations and the effect of tin and silver doping on the thermoelectric power in these crystals in the temperature range 77 ≤ T ≤ 300 K. It was shown that silver doping of (Bi_1?x Sb_x)₂Te₃ mixed crystals produces acceptors, while silver in Bi₂Te₃ acts as a donor. Tin also exhibits acceptor properties. Both tin and silver doping of p-(Bi_1?x Sb_x)₂Te₃ mixed crystals decrease the thermoelectric power due to an increase in the hole concentration.     

高压合成AgSbTe2-Sb2Te3的热电性能研究

 利用高压方法,合成了富Sb₂Te₃的AgSbTe₂热电材料(AgSbTe₂)_1-x(Sb₂Te₃)_x (0≤x≤0.3),并对其结构和热电性质进行了研究。结果表明：(AgSbTe₂)_1-x(Sb₂Te₃)_x样品为近单相的AgSbTe₂材料;随着制备压力和Sb₂Te₃掺杂量的增加,(AgSbTe₂)_1-x(Sb₂Te₃)_x的电阻率大幅降低;Seebeck系数在高压作用下变小,而少量掺杂Sb₂Te₃却能提高Seebeck系数;在高压和微量掺杂Sb₂Te₃的共同作用下,AgSbTe₂的功率因子得到了提高;2.0 GPa高压下,制备的Ag_0.9Sb_1.1Te_2.1的品质因子达到0.466,接近Bi₂Te₃的品质因子。