Irradiation plus annealing-induced 1.20 eV emission band in p-type GaAs

The effect of 2.2 MeV electron irradiation and subsequent annealings on the luminescence of tellurium-compensated p-type GaAs crystals is studied and analyzed. A comparatively strong emission band peaked at hv_m near 1.20 eV (induced by radiative electron recombination in Te_AsV_Ga pairs) appears in irradiated annealed (at T ≧ 250 °C) compensated p-type GaAs. The data obtained testify about the following: a) electron irradiation of GaAs creates stable (at T ≦ 200 °C) defects not only in the arsenic sublattice of GaAs, but in its gallium sublattice too; b) radiation plus annealing (r.p.a.)-induced Te_AsV_Ga pairs are characterized by a rather high (compared to that for grown-in Te_As V_Ga pairs) probability of electron radiative transitions in them. The electrical characterization of the r.p. a.-induced 1.20 eV radiative centres (Te_AsV_Ga pairs) is given.     

Electrical Characterization of Irradiation plus Annealing – induced VAsZnGa Pairs in p-type GaAs (Zn) Crystals

Effect of fast electron irradiation (E =2.2 Mev, ϕ_c = 1 × 10¹⁶ el/cm²) and subsequent annealings (T = 150 to 350 °C, t = 10 to 600 min) of zinc-doped p-type GaAs crystals on the formation and dissociation of V_AsZn_Ga, pairs is studied. An analysis of the formation and dissociation kinetics of V_AsZn_Ga pairs permitted to find the diffusion coefficient of radiation-induced arsenic vacancies D(D = 1.5 × 10⁻¹⁸, 1 × 10⁻¹⁷ and 5 × 10⁻¹⁷ cm²/s at 150, 175 and 200 °C accordingly), their migration energy ϵ_m(ϵ_m = 1.1 eV), the binding energy of V_AsZn_Ga, pairs ϵ_b(ϵ_b = 0.5 eV), and also their dissociation energy ϵ_d(ϵ_d = 1.6 eV).     

Effect of Fast Electron Irradiation and Annealing on the Luminescence in GaAs(Zn) crystals. Irradiation-induced 1.26 and 1.39 eV Emission Bands

The effect of 2.2 MeV electron irradiation and subsequent annealings on the photoluminescence in zinc-doped p-type GaAs crystals is studied and analyzed. Rather strong emission bands peaked at hv_m (77 K) near 1.26 eV (induced by electron irradiation) and 1.39 eV (induced by annealing of irradiated crystals) are observed. Evidence is presented that the 1.26 and 1.39 eV emission bands occur due to radiative electronic transitions in As_iZn_Ga and V_AsZn_Ga pairs induced by irradiation and annealing of irradiated crystals, accordingly. The observed variations in the intensities of the 1.26 and 1.39 eV emission bands upon irradiation and subsequent annealings of GaAs(Zn) crystals are explained in terms of irradiation and annealing-induced variations in the amount of 1.26 and 1.39 eV radiative centres resulting from: a) the effective interaction of mobile radiation-induced defects in the arsenic sublattice with zinc atoms leading to the formation of As_iZn_Ga and V_AsZn_Ga pairs; b) the thermal dissociation of As_iZn_Ga and V_AsZn_Ga pairs on individual components.     

The Nature of As-related Defects in Semi-Insulating GaAs Bulk Crystals

The behaviour of As-related defects in SI (semi-insulating) GaAs are studied from the viewpoint of the origination of As-related precipitates, generation and evolution of EL2 during postgrowth and the possible defect interactions involved EL2 variation under As overpressure annealing. The precipitates were identified as elemental As and As-rich GaAs polycrystalline grains and their features depend on the growth process. A defect interaction model has been proposed on the generation/annihilation of EL2 assigned as As_Ga V_As V_Ga complex respect to non-stoichiometry such as As_i V_Ga and V_As.     

Effect of Neutron Irradiation and Annealing on the Intensity of the Copper Related 1.01 eV Emission Band in n-type GaAs

Effect of neutron irradiation (E = 2 MeV, ϕ ≤ 10¹⁵ n/cm²) and subsequent annealing (T ≤ 700 °C, t = 30 min) on the intensity of the copper-related peaked at hvm =1.01 eV emission band in n-type GaAs (n₀ = 2 × 10¹⁸ cm⁻³) is studied. A strong irradiation-induced increase of the above emission intensity was observed testifying about the irradiation-stimulated growth in the concentration of copper-related 1.01 eV radiative centres (Cu_GaV_As pairs). A model is presented to explain this effect.     

Investigation of the nature of point defects in in Te-doped gallium antimonide

Precision lattice constant and density measurements held on gallium antimonide single crystals grown from stoichiometric melts showed that doping of such crystals with Te lead to the intensification of Ga-supersaturated solid solution decomposition process with initial Frenkel defect (Ga_i + V_Ga) production. It is supposed that Te_sb — simple donors form complexes with V_Ga which are believed to be acceptors. Doping of GaSb with Te up to the levels above 2 · 10¹⁸ cm⁻³ leads to partial decomposition of GaSb(Te) solid solution supersaturated with Te.     

Native Point Defects and Nonstoichiometry in GaAs (II) Mechanism of Formation and Degradation of Semiinsulating Properties of Undoped Gallium Arsenide Crystals

The nature of the main electron trap, EL2, in undoped semiinsulating GaAs crystals have been studied both qualitatively and quantitatively. It has been shown that point defects which, most probably, are responsible for the EL2 level are antisite As_Ga defects or (As_i V_Gs) complexes which are indistinguishable from the thermodynamic standpoint. The enthalpy and entropy of As_Ga formation according to the reaction As_As + V_Ga ⇄ As_Ga + V_As are equal to 0.5 eV and −7k, respectively.     

Low temperature investigations of e−-irradiated GaAs

Positron lifetime measurements have been performed on electron irradiated chromium doped semi-insulating GaAs as a function of annealing between 139 and 908 K. Trapping at negatively charged Ga_As defects and by a vacancy mixture dominated by trivacancies took place in the as-irradiated state. Upon annealing around 210 K divacancies were formed from the trivacancies as caused by migrating arsenic interstitials. Complete trapping prevailed up to 530 K but decreased then rapidly at higher temperatures due to the migration of divacancies which also remove the Ga_As defects.     

Compensation of CdTe by Doping With Gallium

Semi‐insulating CdTe single crystals doped with Ga were grown from the vapour phase by the modified Markov technique MMT. The study of the resistivity map in the cross‐sections cut a long the growth direction has been performed. The compensation phenomenon is analysed in the framework of the three levels Fermi‐statistic model. It is shown that a semi‐insulation behaviour throughout the ingot is due to the compensation of shallow impurities by the deep level. From the low ‐temperature photolum inescence spectra it was concluded that shallow donors (Ga_Cd) are partly compensated by (Ga_Cd‐V_Cd)^‐and (Ga_Cd‐Cd_Te) complexes and by residual acceptors (Na_Cd, Cu_Cd) . The microscopic structure of (Ga_Cd‐Cd_Te) complexis proposed based on the value of its local phonon mode and the growth conditions. A native defect like Te_Cd which has a deep level near the middle‐band‐gap is suppose to give a stable compensation and a tolerance for variation in shallow impurity concentrations.     

Structural and Electrical Characterization of Ag3Ga5Te9 and Ag3In5Se9 Crystals

X-ray powder diffraction studies revealed that Ag₃Ga₅Te₉ and Ag₃In₅Se₉ crystallize in orthorhombic and tetragonal systems, respectively. The temperature dependent conductivity and Hall effect measurements have been carried out between 65—480 K. Ag₃Ga₅Te₉ exhibits p-type conduction with a room temperature conductivity of 4.3 × 10^—4 (Ω · cm)^—1 and mobility less than 1 cm²/V · s. Ag₃In₅Se₉ was identified to be n-type with room temperature conductivity 7.2 × 10^—5 (Ω · cm)^—1 and mobility 20 cm²/V · s. From temperature dependence of the conductivity three different impurity ionization energies were obtained for both compounds. The anomalous behavior observed in the temperature dependence of mobility was attributed to the different features of the microstructure.     

High temperature arsenic doping of CdHgTe epitaxial layers

Experimental results on solid‐state arsenic doping of the n‐type bulk and ISOVPE epitaxial Cd_XHg_1‐XTe (X = 0.19 ÷ 0.3) alloys are presented. The arsenic doped thin epitaxial Cd_xHg_1‐xTe films (n_As ≈ 5 · 10¹⁶ ÷ 1 · 10²⁰ cm^‐3; d = 2 ÷ 5 μm) obtained by RF sputtering in a mercury glow discharge were used as As diffusion sources. The arsenic diffusion and activation were carried out at temperatures T = 500 ÷ 600 °C under Hg vapour pressure. Immediately after the high temperature treatment all samples were annealed to annihilate point defects. The SIMS analysis was used for determination of the quantitative admixture distribution of As in the diffusion area. The arsenic electrical activity has been evaluated by means of differential Hall, resistivity and thermoemf measurements. The analysis of experimental data obtained as well as their comparison with previously obtained results has been performed. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Direct measurement of isothermal compressibility of amorphous semiconductors

The isothermal compressibilities of the chalcogenide glasses Te₁₅Ge₃As₂, Te₁₅Ge₂As₃ and As₂Se₃ have been measured to 5 kbar by direct measurement of the change in sample length using a differential transformer placed inside the hydrostatic pressure vessel. Calibration data was obtained from the measurement of the compressibilities of alkali halide single crystals. For Te₁₅Ge₃As₂, the isothermal compressibility was found to be 6.00 × 10^?12 ? 0.7 × 10^?22P cm²/dyne; for Te₁₅Ge₂As₃, 5.58 × 10^?12 + 0.3 × 10^?22P cm²/dyne; for As₂Se₃, 6.30 × 10^?12 ? 0.8 × 10^?22P cm²/dyne where P is the pressure in dynes/cm². Errors are near 5%.     

Network topological thresholds in gallium doped As–Te glasses – Electrical and thermal investigations

Electrical switching and differential scanning calorimetric studies are undertaken on bulk As₂₀Te_80−xGa_x glasses, to elucidate the network topological thresholds. It is found that these glasses exhibit a single glass transition (T_g) and two crystallization reactions (T_c1 & T_c2) upon heating. It is also found that there is only a marginal change in T_g with the addition of up to about 10% of Ga; around this composition an increase is seen in T_g which culminates in a local maximum around x = 15. The decrease exhibited in T_g beyond this composition, leads to a local minimum at x = 17.5. Further, the As₂₀Te_80−xGa_x glasses are found to exhibit memory type electrical switching. The switching voltages (V_T) increase with the increase in gallium content and a local maximum is seen in V_T around x = 15. V_T is found to decrease with x thereafter, exhibiting a local minimum around x = 17.5. The composition dependence of T_c1 is found to be very similar to that of V_T of As₂₀Te_80−xGa_x glasses. Based on the present results, it is proposed that the composition x = 15 and x = 17.5 correspond to the rigidity percolation and chemical thresholds, respectively, of As₂₀Te_80−xGa_x glasses.     

A study of the vacancy-defect distribution in a GaAs/AlxGa1−xAs multi-layer structure grown at low temperature

We have grown a multilayer structure of GaAs and Al_xGa_1−xAs (x=0.25) by molecular beam epitaxy at low substrate temperature (250°C) in order to investigate the effects of annealing on arsenic precipitation and vacancy-defect formation. The as-grown heterostructure contained ∼5×10¹⁷ cm⁻³ gallium vacancies, but information about the individual layers was lost because the layer width (∼45 nm) was smaller than the average positron diffusion length (∼70 nm). Annealing at 500 and 600°C showed increases in the S-parameter (above the bulk value) of ∼2.5% and ∼1.5%, respectively, smaller than for a single LT-GaAs layer (∼3–4%). We explain this phenomenon by suggesting that the excess arsenic which migrates from the material with the higher precipitate/matrix energy (LT-Al_xGa_1−xAs) reduces the gallium vacancy concentration in the LT-GaAs and hence the S-parameter. This hypothesis is supported by SIMS data which shows a build-up of As in the LT-GaAs layers, and TEM images which indicate that arsenic precipitation occurs to a greater extent in the LT-GaAs than in the LT-Al_xGa_1−xAs.     

Thermal diffusivity measurements on As-Te-Ga glasses by photo-thermal deflection technique: Composition dependence and topological thresholds

The thermal diffusivity (α) of As₂₀Te_80−xGa_x glasses (7.5 ? x ? 18.5) has been measured using photo-thermal deflection (PTD) technique. It is found that the thermal diffusivity is comparatively lower for As₂₀Te_80−xGa_x glasses, which is consistent with the memory type of electrical switching exhibited by these samples. Further, the thermal diffusivity of As₂₀Te_80−xGa_x glasses is found to increase with the incorporation of gallium initially (for x ? 9), which is consistent with the metallicity of the additive. This increase in α results in a maximum at the composition x = 9; beyond x = 9, a decrease is seen in α leading to a minimum at the composition x = 15. The observed composition dependence of thermal diffusivity of As₂₀Te_80−xGa_x glasses has been found to be similar to that of Al₂₀As_xTe_100−x glasses, based on which it is proposed that As₂₀Te_80−xGa_x glasses exhibit an extended stiffness transition with compositions x = 9 and x = 15 being its onset and completion, respectively. Also, the composition x = 17.5 at which a second maximum is seen in the thermal diffusivity has been identified to be the chemical threshold (CT) of the As₂₀Te_80−xGa_x glassy system, as at CT, the glass is configurationally closest to the crystalline state and the scattering of the diffusing thermal waves is minimal for the chemically ordered phase.     

The field effect in amorphous chalcogenides: An investigation of localized states and electronic transport

The temperature dependence of the field effect response permits an unambiguous determination of the identity of those states responsible for electrostatic screening in the amorphous chalcogenides. We observe (1) in As₂Te₃, field effect screening by localized states at the Fermi level at low temperatures (～ 10¹⁹ cm^?3 eV^?1) and by mobile charge carriers (～ 10¹⁸ cm^?3 at 300 K) at high temperatures, and a transition from p-type to two-carrier (primarily n-type) conductivity as the temperature is raised above ～320 K; (2) in As₂SeTe₂, screening by mobile charge carriers (～ 10¹⁸ cm^?3 at 300 K) with strongly type conductivity; (3) in As₂Se₂Te, screening by localized states at the Fermi level (～ 10¹⁹ cm^?3 eV^?1) with strongly p-type conductivity; and (4) in Sb₂Te₃, a very high density of localized states at the Fermi level (～ 2 × 10²⁰ cm^?3 eV^?1) with both electron and hole contributions to the conductivity. Correlation with thermoelectric power results suggests that the p-type conductivity in As₂Te₃ is due to near-equal contributions from two processes: hopping in localized states plus extended state conduction. Aging and annealing behavior is described with the aid of a “chaotic potential model” that appears to be able to account for large changes in mobile carrier density that leave the conductivity unaltered.     

Role of oxygen vacancies in the origin of ferromagnetism in Mn‐doped ZnO

The relationship between the oxygen vacancy and ferromagnetism in Mn‐doped ZnO has been studied based on the first‐principles calculations. Three possible charge states of oxygen vacancies, i.e., neutral (V_O⁰), 1+ (V_O¹⁺) and 2+ (V_O²⁺) are considered. Results show that the lattice relaxations around oxygen vacancies are large difference under different charge states. It is found that V_O¹⁺ and V_O²⁺ oxygen vacancies induce ferromagnetism. However, Mn‐doped ZnO system shows ferromagnetism with V_O⁰ oxygen vacancies in hydrogenated environment, the ferromagnetism is attributed to the interstitial H, which forms a bridge bond and mediates d ‐d coupling and stabilizes the ferromagnetic state. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Crystallization and local order of bulk AsxTe1−x glasses

The crystallization and the local order of the bulk As_xTe_1?x (0.2 ? × ? 0.8) glasses have been investigated by DSC, X-ray and Mössbauer methods. During the crystallization a metastable phase has been observed between 0.35 ? × ? 0.5 and it was identified as fcc AsTe. The local surrounding of these As_xTe_1?x glasses characterized by the ¹²⁵Te Mössbauer measurements were compared with those of the stable monoclinic As₂Te₃, hexagonal Te and metastable fcc AsTe.     

Optical properties of thin films of system (As2Se3)80−x(As2Te3)x(SnTe)20 prepared by PLD

Thin amorphous films from system (As₂Se₃)_80−x(As₂Te₃)_x(SnTe)₂₀ were prepared by pulsed laser deposition (PLD) from their bulk glasses and their optical properties were studied by spectral ellipsometry. Spectral dependencies of refractive index, absorption and extinction coefficient and optical gap (1.41–1.66 eV for (As₂Se₃)_80−x(As₂Te₃)_x(SnTe)₂₀ with x = 20 resp. x = 0) were calculated from optical tansmittance, from ellipsometric data by Tauc method. High values of refractive index n₀ (2.49–2.60) and of non-linear χ⁽³⁾ coefficient of index of refraction (4.9–7.5 × 10⁻¹² esu for the glass (As₂Se₃)_80−x(As₂Te₃)_x(SnTe)₂₀ with x = 0 resp. x = 20) made studied thin films of system (As₂Se₃)_80−x(As₂Te₃)_x(SnTe)₂₀ promising candidates for application in optics and optoelectronics.     

Quenching by Copper Atoms of the EL2-induced Luminescence in GaAs

It is shown that the introduction of copper atoms into GaAs crystals containing antistructure defects EL2 (isolated arsenic atoms on gallium sites As_Ga) leads to a practically complete disappearance of the EL2-induced luminescence bands peaked at 0.63 and 0.68eV. This effect is connected with the passivation of the EL2 defects (i.e. with the substantial decrease in their concentration) because of their interaction with copper atoms (they become bound by copper atoms) resulting in an appearance of electrically inactive AS_GaCU_Ga complexes.