Direct Fabrication Methods of Surface Relief Electro-Optic Gratings in Azo-Polymer Films

Two fabrication methods of surface relief electro-optic (EO) gratings in azo-polymer films are described: surface deformation by a continuous wave laser and laser ablation by a pulse laser. In the fabrication process, the periodic intensity modulation of laser beams is formed by an interference fringe or a phase mask. The surface relief EO grating is fabricated by poling the surface relief grating (SRG) after the SRG fabrication process. The linear dependence of an applied voltage in the modulation efficiency of the first-order diffraction beam is observed. The proposed methods are effective for highly-efficient surface relief EO grating fabrication.     

Direct Fabrication of Surface Relief Holographic Diffusers in Azobenzene Polymer Films

We propose a direct fabrication of light diffusers using azobenzene polymer films. Holographic recordings of surface relief diffusers are formed on the polymer film by exposure to an Nd:YAG laser (532 nm) through source diffusion materials. No post-treatment is needed, and it can be erased by heating or irradiating uniform laser beam. Diffusion pattern can be controlled by the polarization of the laser. Transmittance of over 88% is obtained at the wavelength of 633 nm.     

Numerical Analysis of Photoinduced Surface Relief Grating Formation by Particle Method

The time evolution of photoinduced surface relief grating formation on azobenzene polymer films is analyzed by particle method for fluid mechanics. The surface relief grating is grown by using two beams interference with various polarization states numerically and compared with experimental results. The force acted on the dipole by electromagnetic field and surface force are considered as the driving force for photoinduced mass transport. The improved surface tension model is proposed in order to calculate curvature coefficient. The numerical results are coincided with experimental results qualititatively.     

Hologram recording in glass and direct reconstruction using visible-wavelength laser beam

We propose a method of hologram recording in a glass plate by corona charging. The holographic recording materials used in this study are conventional soda-lime glass and azobenzene polymer film. A Fourier transform hologram on an azobenzene polymer film coated on the glass plate is recorded in the glass plate by corona charging. After removing the polymer film, the hologram recorded in the plate can be reconstructed using a visible-wavelength laser beam. The first-order diffraction efficiency of the hologram at a wavelength of 532 nm is 0.03%; the efficiency depends on the depth of the surface relief structure on the azobenzene polymer film and the corona-charging time. The hologram recorded in the glass plate has high environmental resistance.     

偶氮苯衍生物的全息光存储和双折射特性研究

对6-（4-（（4-（十八烷氧基-）苯基）二氮烯基）苯氧基）-1-己醇（E-1-ol）的光致变色、双折射和全息光存储特性进行了研究.以488 nm的氩离子（Ar+）激光为抽运光,632.8 nm 的氦氖（He-Ne）激光为探测光,研究了透射信号强度随时间的变化关系;在10 mW~160 mW的范围内,研究了透射信号强度的最大值随抽运光功率的变化;经计算,在各抽运光功率下,获得的光致双折射值（δn）达10－2量级,最大激光功率下,获得的δn为2.8×10－2.对透射信号强度随时间的变化曲线进行了理论拟合,得出曲线的上升和下降符合双指数增长和衰减,时间响应常量分别是：上升阶段：t1=4.8 s,t2=85.8 s;下降阶段：t1=1.9 s,t2=27.6 s.用等强度s偏振的两束Ar+激光为写入光, He-Ne光为读出光,研究了衍射信号强度随时间的变化及写入光功率改变时,衍射信号强度最大值与写入光功率的变化关系;对衍射信号强度随时间变化的动力学过程进行了理论拟合,得出光栅生长和衰减也有快和慢两个过程,光栅生长时间响应常量为：t1=3.9 s,t2=33.9 s,光栅衰减时间响应常量为 t1=1.8 s,t2=60.1 s.     

一种新型偶氮化合物中的高效率实时全息光栅的实验研究

合成了一种新的含偶氮基的三元共聚物，由于在主链中链接柔性基团，使其具有相对较低的玻璃化温度，在６３３ｎｍ处光感生双折射δｎ值可达１０＾－３量级。实验上获得了几个乃至几百微米厚的具有高光学无效性的薄膜，在６３３ｎｍ波长处写一息光栅的实时单光束衍射效率可达１０％以上。     

复杂三维场景数字全息图隐藏面问题研究

从数字全息图制作原理出发,分析了隐藏面对数字全息图再现像的影响,得出在制作复杂场景数字全息图时必须进行消隐.在此基础上提出了一种消隐方法,通过寻找连接全息面上每一采样点与场景中每一采样点之间的虚拟光线与场景的交点中到全息面距离最短的交点集来消隐.最后给出了这种方法的原理和计算机模拟结果.     

复杂三维场景数字全息图消隐快速算法

提出了一种考虑人眼分辨率的快速消隐算法,它按照人眼观察场景时的不同位置将全息图划分成相应的区域,只对每个区域的中心点进行消隐,再用消隐后的数据作为整个区域的场景数据制作数字全息图.当区域尺寸小到一定程度时,对于人眼来说,中心消隐和逐点消隐的效果相当,而消隐速度大大提高.计算机模拟及实验表明,该方法在不降低全息图再现像质的前提下,将消隐速度提高了约105倍.     

Analysis of Volume Hologram Using Fresnel Coefficient Matrix

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Replicated Polymer Light Guide Interconnector with Depth Modified Surface Relief Grating Couplers

Planar light guide plate with one in-coupling and N out-coupling surface relief gratings is designed to perform as optical backplane broadcasting system for board-to-board connections. The performance of the element is analyzed theoretically with rigorous electromagnetic theory and results are confirmed experimentally. In addition, optical backplane elements have been replicated using conventional injection molding and UV-replication techniques.     

透明导电薄膜ITO对浅面浮雕VCSEL的影响

对于顶面出光的浅面浮雕VCSEL结构,有源区的电流密度分布的不均性制约着单模稳定性的提高。为此,提出了一种新型结构:氧化铟锡透明导电薄膜(ITO)浅面浮雕VCSEL。该结构不仅能够增大高阶模式的阈值增益,还能够提高基模的增益,实现基模对高阶模式的稳定抑制。研究了ITO的厚度对阈值增益的影响及ITO对VCSEL有源区电流密度分布的影响。研究结果表明:在ITO的厚度为半波长的整数倍时,基模对高阶模式的限制作用最强;ITO通过改善VCSEL有源区的电流密度分布,达到了增大基模的增益和降低高阶模式增益的目的,同时还降低了串联电阻和外电压。     

一种离轴计算全息图在凹非球面检测中的应用

为了精确检测大口径非球面面型质量,将CGH作为补偿器应用于凹非球面的离轴全息检测系统中.根据计算全息图的离轴全息检测系统检测凹非球面的基本原理,分析了离轴CGH的计算、制作过程,实现了对口径为150 mm,近轴半径为1499.7 mm,非球面系数为-1的凹非球面镜的检测.实验结果与轮廓仪检测结果吻合得很好.     

Contribution of Absorptive and Refractive Gratings to Mixed Holograms Using Xanthene-Dye-Doped Films

The contribution of absorptive and refractive gratings to a mixed hologram is investigated by means of two-wave coupling technique by moving a hologram. Polyvinyl alcohol films doped with xanthene-dyes such as erythrosin B,eosin Y, uranin and fluorescein which absorb an argon-ion laser light of 488 nm and 515 nm are used as hologram recording materials in our experiment. A simple model of the two-level one-step photo-bleaching well explains the growth of an absorptive grating and the refractive index and also the working wavelength dependence of growth of the refractive grating in the xanthene-dye-doped films.     

波长尺寸表面浮雕光栅的严格理论计算和分析

本文采用麦克斯韦(Maxwell)方程微分积分方程对波长尺寸的梯形反射光栅在TE模式(横向电场)偏振状态入射下,进行严格理论的计算和分析.表面电场计算表明,光栅刻槽斜边边界对于金属材料金和铝光栅表面电场分布具有明显效应,对于入射波长为λ=1.0μm附近的红外区域,金材料具有强烈的金属特性,此时表面电场的斜边边界效应更加明显.表面电场及其远场衍射效率伴随刻槽深度变化,而振荡特性进一步阐明了此效应对近,远场的作用.该方程适用于任意形状光栅或单一散射体对任意入射方向,任意偏振态的衍射和散射问题.     

Fabrication of Small Fluorescence Scale Patterns by Electron Beam Drawing Using Polymer Film Containing Fluorescence Dye

We report the fabrication of a resolution–evaluation chart and a scale for a fluorescence microscope. Small fluorescence patterns were fabricated by irradiating an electron beam (EB) in a thin film prepared by dispersing fluorescence dye (rhodamine 590) in poly(methyl methacrylate) (PMMA) and by development to remove EB-irradiated parts. As a result, the fluorescence emission pattern of nanometer order (a line width of 110 nm and a line interval of 370 nm) with sufficient fluorescence intensity was obtained, and a 1 μm bright fluorescence scale for the laser scanning fluorescence microscope was fabricated. These fluorescence patterns are handled easily and are effective for measurement using a fluorescence microscope.     

用扫描近场光学显微镜技术研究金膜表面等离体子共振

表面等离体子波(SPW)可与入射光横磁波极化能量耦合并被共振激发,这种现象被称为表面等离体子共振现象(SPR)。主要利用扫描近场光学显微镜(SNOM)技术和表面等离体子共振现象技术相结合,来研究金膜表面等离体子共振。设计并建立了结构独特的新型Kretschmann型表面等离体子共振现象耦合装置,同时又设计了具有厚度梯度的表面等离体子的制备方法。在此基础上,测量了改变入射角条件下的表面等离体子共振曲线,测得该装置的等离体子共振角灵敏度为1°。并且对金膜表面进行表面等离体子共振条件下的扫描近场光学显微成像。实验结果表明,在共振时金膜表面的扫描成像比不共振时清晰,而且增加了很多细节。应用表面等离体子共振现象技术将可以明显提高扫描近场光学显微镜的信噪比、分辨力等性能。     

应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度

采用具有良好比刚度和热稳定性的碳化硅材料作为基底,使用全息-离子束刻蚀技术制作了光栅。碳化硅材料表面固有缺陷导致制作的光栅刻槽表面粗糙度高,槽底和槽顶粗糙度分别达到了29.6 nm和65.3 nm (R_q)。通过等离子辅助沉积技术在碳化硅表面镀制一层均匀的硅改性层,经过抛光可以获得无缺陷的超光滑表面。XRD测试表明制备的硅改性层为无定形结构。原子力显微镜的测试结果表明:经过抛光后,表面粗糙度为0.64 nm(R_q)。在此表面上制作的光栅刻槽表面粗糙度明显降低,槽底和槽顶粗糙度分别为2.96 nm和7.21 nm,相当于改性前的1/10和1/9。     

A Novel Fabrication Technique of Long Period Fiber Gratings Using a Holographic Optical Element

We develop a new flexible and precise ultraviolet exposure technique to fabricate a long period fiber grating using a computer-generated holographic optical element (HOE). The HOE can generate a striped beam pattern with about a 300 #x03BC;m period from a KrF excimer laser. This method offers (1) ease in varying the grating period and (2) grating period precision. We achieve a grating period within an accuracy of #x00B1;0.04 #x03BC;m. This means that the peak wavelength can be controlled within an accuracy of #x00B1;0.2nm with an operating wavelength of 1.55 #x03BC;m.This paper was originally presented at the 2nd International Conference on Optical Design and Fabrication, ODF2000 which was held on November 15-17, 2000 at the International Conference Center, Tokyo, Waseda University, Japan.     

表面热透镜技术测试光学薄膜特性研究

在薄膜特性的研究工作中，激光引起的表面形变是一种广泛应用的技术。在这种技术中，薄膜的形变(热包高度小于0．1nm)一般是采用光热偏转技术来探测的。介绍了一种通过光学衍射效应来研究薄膜表面形变的新技术即表面热透镜技术，它是研究薄膜特性的一种灵敏且易于控制的方法。探讨了其理论模型及在薄膜的吸收测量和缺陷特性测试方面，该方法相对于传统方法的优点和潜力。