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1.
We report on the first principle density functional calculation of the charge transition levels of native defects (vacancies and interstitials) in CaF2 structure. The transition level was defined as the Fermi level where two charge states of given defect have the same formation energy. The common error in the band gap inherited to semiclocal density functional has been accounted for by incorporating the hybrid density functional method, leading to correct placement of the transition levels within the band gap. The band gap size from hybrid calculation has been validated using the full potential, Linearized Augmented Planewave method with the Modified-Becke-Johnson exchange potential. Prior to level calculations, we ensured that an agreement between the formation energies from small (95–97 atoms) and large (323–325 atoms) supercells was achieved after applying the Makov-Payne correction method. Our calculated transition level for the anion vacancy was 2.97 eV below the conduction band, agreeing with the experimental optical absorption band at 3.3 eV associated with the electron transition from the ground state F-center to the conduction band in CaF2.  相似文献   

2.
Complementary angle-resolved photoemission and bulk-sensitive k-resolved resonant inelastic x-ray scattering of divalent hexaborides reveal a >1 eV X-point gap between the valence and conduction bands, in contradiction to the band overlap assumed in several models of their novel ferromagnetism. This semiconducting gap implies that carriers detected in transport measurements arise from defects, and the measured location of the bulk Fermi level at the bottom of the conduction band implicates boron vacancies as the origin of the excess electrons. The measured band structure and X-point gap in CaB6 additionally provide a stringent test case for many-body quasiparticle band calculations.  相似文献   

3.
Electroabsorption measurements at 300 K made within the band gap on high resistivity GaAs:O are reported. For a crystal with the Fermi level at 0.54 eV, major structure has been detected at 0.52, 0.57, 0.67, 0.75, 0.87, 0.93, 1.03, 1.12, 1.25, 1.36, and 1.39 eV. The 0.67 eV peak appears only in the second harmonic spectrum, indicating no change in permanent dipole for this transition. Polarized light, lock-in amplifier phase angle, and applied field variation data are presented.  相似文献   

4.
We have observed the modulated reflectance spectra of n and p type GaSb at 300, 80, and 5 K from 0.56 to 2 eV. The modulated reflectance of intrinsic n type InSb was measured at 80 K from 0.2 to 2 eV. The “dry sandwich” vapor deposition technique was used to make the electroreflectance (ER) samples. The low-temperature spectrum of the undoped p type GaSb sample shows three peaks at the band edge that could be associated with transitions from the top of the valence band, the light (0.903 eV) and heavy (1.014eV) hole state Fermi levels to the conduction band. The energies of the observed peaks are in agreement with the Fermi level determination from Hall effect and Faraday rotation measurements. This modulation mechanism is based on band population effects. The ER signal of InSb under flatband condition at 80 K has five half oscillations at the direct band gap. The contribution of piezoelectric strain to ER is present since the dc bias required to achieve flatband condition is different at the band gap than at E1. The ER signal corresponding to the direct gap energy E0 and to the spin-orbit energy E0 + Δ0 was determined in the n and p type samples of GaSb at different temperatures. We have measured the intrinsic energy gap in GaSb at room temperature. Eg = 0.74 eV. The corresponding spin-orbit splitting was found to be Δ0 = 0.733 ± 0.002 eV.  相似文献   

5.
近年来,Fe和N掺杂锐钛矿相TiO2半导体在实验中发现许多优异性能,本文采用基于密度泛函理论的平面波超软赝势方法研究了纯锐钛矿相TiO2、Fe和N单掺杂及Fe和N共掺杂TiO2的能带结构、电荷布居、态密度和光学性质.分析发现:Fe掺杂引起杂质能带位于禁带中央,杂质能带最高点与导带相距大约0.6 eV而最低点与价带相距大约0.2 eV;N掺杂引起的杂质能带位于价带顶部附近. Fe和N共掺杂后杂质能带由两部分组成,位于价带顶上方0.62 eV和导带底下方0.22 eV处,其中一层杂质能带主要由N原子的2p轨道和Fe原子的3d轨道杂化形成,而另一条杂质能带主要由Fe原子的3d轨道形成,由于杂质能级的出现,使锐钛矿TiO2的禁带宽度变小.对光学性质分析发现:Fe和N共掺杂会使锐钛矿TiO2光学吸收带边红移,可见光区的光吸收系数明显增大,在低能区出现了新的吸收峰,对应能量为1.82 eV,与实验结果相符.  相似文献   

6.
CdTe is one of the leading materials for low cost, high efficiency thin-film solar cells with a nearly ideal band gap of 1.48 eV. However, its solar to electricity power conversion efficiency(PCE) is hindered by the relatively low open circuit voltage(VOC) due to intrinsic defect related issues. Here, we propose that alloying CdTe with CdSe could possibly improve the solar cell performance by reducing the "ideal" band gap of CdTe to gain more short-circuit current from long-wavelength absorption without sacrificing much VOC. Using the hybrid functional calculation, we find that the minimum band gap of the CdTe_(1-x)Se_x alloy can be reduced from 1.48 eV at x = 0 to 1.39 eV at x = 0.32, and most of the change come from the lowering of the conduction band minimum. We also show that the formation of the alloy can improve the p-type doping of CuCdimpurity based on the reduced effective formation energy and nearly constant effective transition energy level, thus possibly enhance VOC, thus PCE.  相似文献   

7.
采用基于第一性原理的贋势平面波方法,对不同类型点缺陷单层MoS2电子结构、能带结构、态密度和光学性质进行计算。计算结果表明:单层MoS2属于直接带隙半导体,禁带宽度为1.749ev,V-Mo缺陷的存在使得MoS2转化为间接带隙Eg=0.671eV的p型半导体,V-S缺陷MoS2的带隙变窄为Eg=0.974eV,S-Mo缺陷的存在使得MoS2转化为间接带隙Eg=0.482eV; Mo-S缺陷形成Eg=0.969eV直接带隙半导体,费米能级上移靠近价带。 费米能级附近的电子态密度主要由Mo的4d态和s的3p态电子贡献。光学性质计算表明:空位缺陷对MoS2的光学性质影响最为显著,可以增大MoS2的静态介电常数、折射率n0和反射率,降低吸收系数和能量损失。  相似文献   

8.
ZnS能够用于光解水制氢,但是由于ZnS带隙较宽在一定程度上制约了可见光的吸收。为了减小闪锌矿ZnS的带隙宽度,增加对可见光的吸收,采用密度泛函理论研究了Cu-X(X=B, Al, Ga, In)共掺杂对ZnS电子结构和可见光吸收的影响。计算结果表明Cu-X(X=B, Al, Ga, In)共掺杂ZnS的结合能都是负值,都属于稳定结构;掺杂使得闪锌矿ZnS的带隙宽度由2.9eV分别减小到2.68eV、2.41 eV、2.18 eV、1.82 eV,导致了吸收谱和光导产生红移,有利于可见光的吸收;掺杂后导带底向低能级方向移动,同时在禁带中产生p-d杂化能级,导致了带隙宽度减小,有利于可见光的吸收和阻止光生载流子的复合;最后掺杂ZnS的带边位置满足水解制氢的条件,可用于制造光催化剂。综上所述Cu-X(X=B, Al, Ga, In)共掺杂ZnS有利于可见光的吸收。  相似文献   

9.
在密度泛函理论方法的基础上,系统研究了本征氧化锌和氧空位氧化锌的(110)二维膜材料的形成和电子结构性质.计算分析结果表明,ZnO的本征(110)二维膜比氧空位的(110)二维膜稳定性高,ZnO的(110)二维膜有失去氧的倾向.本征ZnO的(110)膜为直接带隙型材料,带隙宽度为2.3 eV,氧空位(110)膜为间接带隙型材料,带隙宽度为1.877 eV.氧空位的(110)膜导带向下移动,并且导带中的能级简并化.氧空位(110)膜材料的导带底能级有2个能谷,分别位于1.877 eV和1.88 eV,这些位置的能级有效质量比本征膜大幅度增大,这些位置的电子速度普遍较低. ZnO的(110)膜产生氧空位之后,Zn的s电子参与形成其价带顶能级.氧空位(110)膜材料中Zn-O键的混合型结合倾向增大.  相似文献   

10.
冯庆  王寅  王渭华  岳远霞 《计算物理》2012,29(4):593-600
采用基于第一性原理的平面波超软赝势方法研究N和S单掺杂以及N和S共掺杂金红石相TiO2的能带结构,态密度和光学性质.结果表明:N掺杂导致禁带宽度减小为1.43 eV,并且在价带上方形成了一条杂质能带;S掺杂导致费米能级上移靠近导带,直接带隙减小为0.32 eV;N和S共掺杂导致能带结构中出现了两条杂质能带,靠近导带的一条杂质能级距离导带底约0.35 eV,靠近价带的一条杂质能级距离价带顶约0.85 eV,杂质能级主要由N原子的2p轨道和S原子的3p轨道组成.N和S掺杂后不但使TiO2的吸收带产生红移,而且在可见光区具有较大的吸收系数,光催化活性增强.  相似文献   

11.
Studies of recombination in ~0.2 Ω-cm As- and Sb-doped Co60 γ-irradiated Ge which yield energy levels and the temperature dependence of the electron and hole capture probabilities are reported. For Sb-doped material at 323°K, the recombination center energy level position (neglecting statistical weight) was found to be 0.361±0.005 eV above the valence band with a possible slight temperature dependence corresponding roughly to one-half the variation of band gap with temperature. The capture probability ratio at this same temperature was 740. For the Asdoped case, two different levels appear to dominate the recombination process in annealed and unannealed low resistivity material. The energy level positions relative to the valence band (neglecting statistical weight) are 0.327±0.005 eV and 0.37±0.01 eV at room temperature for the annealed and unannealed samples, respectively. The corresponding capture probability ratios are 650 and 810. As in the case of Sb-doping, the energy level appears to shift with temperature at about one-half the rate of the shift in band gap energy.  相似文献   

12.
An ab-initio pseudopotential calculation has been performed by using density functional methods within the local density approximation (LDA) to investigate the band structure and optical properties of the ferroelectric-semiconductor SbSI in the para- and ferroelectric phases. It has been shown that SbSI has an indirect gap in both phases (1.45 eV and 1.49 eV in the para- and ferroelectric phases respectively) and that the smallest direct gap is at the S point of the Brillouin zone (1.56 eV and 1.58 eV in the para- and ferroelectric phases respectively). Furthermore, it is shown that first-order phase transition, from the paraelectric phase to the ferroelectric phase (the transiton temperature is about 22 °C), does not change the nature of the band gap. Moreover, the linear frequency dependent dielectric function, including self-energy effects, has been calculated along the c-polar axis in the para- and ferroelectric phases.   相似文献   

13.
《中国物理 B》2021,30(7):76104-076104
Using the structure search of particle swarm optimization(PSO) algorithm combined with density functional theory(DFT), we conduct a systematic two-dimensional(2D) material research on the SiO and discover a P2 monolayer structure.The phonon spectrum shows that the 2D P2 is dynamic-stable under ambient pressure. Molecular dynamics simulations show that 2D P2 can still exist stably at a high temperature of 1000 K, indicating that 2D P2 has application potential in high-temperature environments. The intrinsic 2D P2 structure has a quasi-direct band gap of 3.2 e V. The 2D P2 structure can be transformed into a direct band gap semiconductor by appropriate strain, and the band gap can be adjusted to the ideal band gap of 1.2 e V–1.6 e V for photovoltaic materials. These unique properties of the 2D P2 structure make it expected to have potential applications in nanomechanics and nanoelectronics.  相似文献   

14.
The band gap of CuInTe2 has been determined with the aid of electroreflectance measurements. The single crystal samples were produced by a zone growth technique and exhibited p-type electrical characteristics. Both electrolyte and dry sandwich techniques have been used and we find that the direct energy gap has values of 1.06 eV at 290 K and 1.12 eV at 77 K.  相似文献   

15.
The electronic structure of the Li doped large gap semiconductor (insulator) NiO is investigated by photoemission and inverse photoemission spectroscopy. Spectral weight is produced by the Li doping within the gap at 1.4 eV above the top of the valence band. It is interpreted as due to an acceptor level associated with a LiO complex.  相似文献   

16.
Bulk and surface sensitive x-ray spectroscopic techniques are applied in tandem to show that the valence band edge for In2O3 is found significantly closer to the bottom of the conduction band than expected on the basis of the widely quoted bulk band gap of 3.75 eV. First-principles theory shows that the upper valence bands of In2O3 exhibit a small dispersion and the conduction band minimum is positioned at Gamma. However, direct optical transitions give a minimal dipole intensity until 0.8 eV below the valence band maximum. The results set an upper limit on the fundamental band gap of 2.9 eV.  相似文献   

17.
Ti, V and Cr in n-type 6H-SiC were investigated by radiotracer deep level transient spectroscopy (DLTS). Doping with the radioactive isotopes 48V and 51Cr was done by recoil implantation followed by annealing (1600 K). Repeated DLTS measurements during the elemental transmutation of these isotopes to 48Ti and 51V respectively revealed the corresponding concentration changes of band gap states. Thus, three levels were identified in the band gap: a Cr level at 0.54 eV and two V levels at 0.71 and 0.75 eV below the conduction band edge. There are no deep levels of Ti in the upper part of the band gap. Received: 28 April 1997/Accepted: 16 May 1997  相似文献   

18.
The electronic structure and diffusion energy barriers of Li ions in pure and Mn-doped LiFePO4 have been studied using density functional theory(DFT).The results demonstrate clearly that Fe-O covalent bond is weaker than P-O covalent bond.Pure LiFePO4 has band gap of 0.56 eV and diffusion energy barrier of 2.57 eV for Li ions,while the dopant has small band gap of 0.25 eV and low diffusion energy barrier of 2.31 eV,which indicates that the electronic and ionic conductivity of LiFePO4 have been improved owing to doping.  相似文献   

19.
荷电孤子的电子束缚态   总被引:1,自引:0,他引:1       下载免费PDF全文
卢定伟  孙鑫  傅柔励  刘杰 《物理学报》1990,39(2):289-295
现有理论认为聚乙炔中的孤子只具有一个电子束缚态——midgap态。本工作发现,由于电子之间存在相互作用,且高分子链具有分立的原子结构,荷电孤子在能隙中应具有两个电子束缚态:一个是深能级,它离能隙中央0.2eV;一个是浅能级,离带边0.06eV。反式聚乙炔的光致吸收光谱证实了此理论。 关键词:  相似文献   

20.
俞松  饶勇超  段香梅 《中国物理 B》2017,26(8):87301-087301
Photocatalytic water splitting has gained increasing attention, since it utilizes renewable resources, such as water and solar energy, to produce hydrogen. Using the first-principles density functional theory, we investigate the properties of the single layer C_2N which was successfully synthesized. We reveal that monolayer C_2N has a substantial direct band gap of 2.45 eV. To regulate its band gap, four different nonmetal elements(B, O, P, and S) on the cation and anion sites are considered. Among them, B-doped N site is the most effective one, with the lowest formation energy and a band gap of 2.01 eV. P-doped N site is the next, with a band gap of 2.08 eV, though its formation energy is higher. The band alignments with respect to the water redox levels show that, for these two dopings, the thermodynamic criterion for the overall water splitting is satisfied. We therefore predict that B-or P-doped C_2N, with an appropriate band gap and an optimal band-edge position, would be a promising photocatalyst for visible-light water splitting.  相似文献   

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