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1.
《Polyhedron》1986,5(10):1579-1580
Reactions of tetrahalosilanes [SiX4 (X= F, Cl or Br)] and silane (SiH4) with sulphur trioxide (SO3) have been studied under different experimental conditions. Each of the silanes behaves differently in accordance with the bond energy of the Si—X bond. While SiF4 remains unreactive even at 600°C, SiCl4 reacts with SO3 at 500°C giving rise to hexachlorodisiloxane [(SiCl3)2O] as the major product. In contrast SiBr4 and SiH4 react with SO3 at room temperature and below room temperature, respectively, yielding silica as one of the products of reaction. In all cases the SO3 is reduced to sulphur dioxide.  相似文献   

2.
The enthalpies of formation of the addition compounds F4Si(py)2, Cl4Si(py)2, Br4Si(py)2 and I4Si(py)4 have been measured calorimetrically by two different ways (see table 1). It was not possible to confirm enthalpy data published in7, 8. The sequence SiF44~SiBr4>SiI4(?) is proposed for the acceptor power of the silicon tetrahalides towards pyridine.  相似文献   

3.
Contributions to the Chemistry of Halosilane Adducts. XVII. Preparation, Crystal and Molecular Structure of (2, 2′ -Bipyridine) - trichloro - (trichlorosiloxy) -silicon, Cl3SiOSiCl3. bipy 1 is obtained by the reaction of Cl3SiOSiCl3 and bipy. It crystallizes orthorhombic in the space group Pca21 (Z = 4). 1 contains a tetracoordinated and a hexacoordinated Si atom. The plain defined by coordinated bipy also contains the SiOSi group. The SiOSi bonding angle (152.8°) is larger than that of Cl3SiOSiCl3 (146°). The SiCl bonds are about 8% longer than the tetrahedral SiCl bonds. The two SiO bond lengths are different (1.684; 1.554 Å). The SiN distances (average 1.967 Å) as well as the other bond distances correspond to values found for related compounds. Configuration, SiOSi bond angle and other structural features are due to steric requirements. 1 represents the structure of least steric hindrance. The same structure is found in solution (1H-NMR). The results confirm that sterically more demanding ligands preferentially occupy the positions vertical to the plain of bipy (phen) in octahedral bip(phen) complexes of Si, hereby minimizing steric repulsions among each other(trans positions) and by CH groups of bipy(phen) exerted on ligands in he plain of bipy(phen).  相似文献   

4.
Formation of Organosilicon Compounds. LXII. Partial Brominated Carbosilanes The photobromination of 1 leads to compound 2 as well as to C-chlorinated derivatives if the time of reaction is prolonged. Compound 2 is also formed from (Br2Si–CH2)3; Gl. (1) see ?Inhaltsübersicht”?. In a corresponding reaction (Cl3Si–CH2)2SiCl2 gives successively Cl3Si–CHBr–SiCl2–CH2–SiCl3, Cl3Si–CBr2–SiCl2–CH2–SiCl3 and Cl3Si–CCl2–SiCl2–CH2–SiCl3. (Cl3Si)2CBr2 is accessible through the photobromination of (Cl3Si)2CH2. The reactivity of the CBr2-group is quite obvious in the reaction of Cl2Si–CBr2–SiCl2–CH2–SiCl3 with LiAlH4 yielding (H3Si–CH2)2SiCl2 as well as in the reaction of compound 2 with CH3MgCl yielding [(CH3)2Si–CH2]3. By treatment of the SiH groups with bromine the preparation of compounds with the general formulas CH3SiHnBr3?n; (H3?nSiBrn)2CH2; (H3?nSiBrn? CH2)2SiH2?nBrn; (H2?nBrnSi? CH2)3 and (H3?nSiBrn)2CCl2 is possible. Analysis of the nmr spectra shows that 1,3-Dibromo-1,3,5-trisilacyclohexane is formed to 67% in the trans and to 33% in the cis configuration; 1,3,5-Tribromo-1,3,5-trisilacyclohexane is formed to 80–90% in teh cis-trans configuration. The results of 1H and 29Si NMR investigations are reported.  相似文献   

5.
Reaction of the thermally stable silylene Si[(NCH2But)2C6H4-1,2] (1) [abbrev. as Si(NN)] with SiX4 (X = Cl or Br) afforded the disilanes (NN)SiX(SiX3) and [(NN)SiX]2 (X = Br only), the trisilane (NN)SiX-[(SiX3)Si(NN)] and the monosilane (NN)SiX2 (X = Br only), whereas treatment of 1 with MCl4 (M = Ge or Sn) yielded (NN)SiCl2 and MCl2. [(NN)SiBr]2 and (NN)SiBr2 were also obtained by reaction of 1 with Br2. Reaction of 1 with PhSiCl3 yielded the disilane (NN)SiCl(SiCl2Ph) and trisilane [(NN)SiCl]2SiClPh, whereas the disilane (NN)SiCl(SiCl2Me) was obtained with MeSiCl3. The trisilane (NN)SiCl-[(SiCl3)Si(NN)] was thermally labile and converted to [(NN)SiCl]2SiCl2.  相似文献   

6.
Contributions to the Chemistry of Halogenosilane Adducts. VIII. Preparation and Properties of the Cationic Bis-2,2′-Bipyridinesilicon Complexes, [SiCl2bipy2]2+ and [SiF2bipy2]2+ The reactions of SiCl2bipy2 (green isomer) and SiF2bipy2 with chlorine yield the new ionic complexes of Si, [SiX2bipy2]Cl2 (X = Cl, F). Bromine and iodine react similarly. With these reagents, however, formation of insoluble polyhalides of the complex cations inevitably occurs rendering further investigations difficult. The compounds contain the cis-octahedral cation [SiX2bipy2]2+. They are soluble in methanol and water and are unusually stable in these solvents. [SiCl2bipy2]Cl2 starts to react observably with methanol (substitution of SiCl) only after weeks. Thus reactions may be performed in this solvent. It follows from the investigation that the green isomer of SiCl2bipy2 is a cis-octahedral molecular complex of silicon. Two other green isomers of SiCl2bipy2 are shown to exist. The reactions of chlorine with these isomers yield products different from the cis-octahedral complex reported above. Ion-exchange and metathetical reactions of [SiCl2bipy2]Cl2 yield the new compounds [SiCl2bipy2]X2 (X = Br?, J?, NO3?, ClO4?, [Cr(NH3)2(NCS)4]?, PtCl62?/2). All compounds contain the [SiCl2bipy2]2+-cation which is investigated in detail (1H-, 29Si-NMR, IR, UV, ESCA, conductivity, molecular weight). The use of AgF for the synthesis of ionic SiF-complexes (X = F) gives rise to more complicated reactions.  相似文献   

7.
A series of mono-bipy and -phen complexes (bipy = bipyridine, phen = phenanthroline) of the perhalodisilanes, Si2F6, Si2Cl6 and Si2Br6, mixed methylhalodisilanes (Si2MenX6?n, X = Cl, I; n = 2,3) and Si3Cl8 · bipy have been prepared by reaction of the components, and have been characterized. 11 complexes are obtained exclusively.The structures of all complexes involve coordination of the base to the more acidic silicon and perpendicular alignment of the SiSi axis on the plane of the ligand. This may be rationalised in terms of steric requirements of the different groups, the more demanding groups occupying the sterically more favorable positions vertical to the plane of the ligand. For Si3Cl8 · bipy, spectroscopic and chemical evidence suggests bipy-coordination to the center silicon. PMR investigations of the dissociation equilibria of the complexes in solution led to determination of the heats of formation of four of the complexes and to a qualitative estimation of the relative acceptor strengths of several disilanes. Contrary to expectation, silyl groups increase the acceptor strength of silicon considerably and in the order SiMe3 < SiMe2Cl < SiMeCl2 < SiCl3. The effect of a SiMe3, substituent group may be compared to that of Cl. Methylchlorosilyl groups may exceed the effect of Cl as indicated by the increase in acceptor strength in the sequence (R =) Me < Ci < SiMe2Cl < SiMeCl2 for the acceptor RSiCl2Me. Si3Cl8 is the strongest acceptor in the series. Assuming the structural suggestion for Si3Cl8 · bipy (center coordination) to be correct an increase in acceptor strength is indicated in the sequence SiCl3(Si2Cl5) < SiCl2(SiCl3)2 (Si = coordinating center). This may be interpreted mainly in terms of charge accepting capacity of the polarisable silyl groups. Another interesting sequence of acceptor strengths measured in this work is 1,1,2-Si2Me3F3, 1,2-Si2Me2F4 < Si2Me3Cl3 < 1,2-Si2Me2Cl4, showing fluorodisilanes to be weaker acceptors than chlorodisilanes. This result is compared to the heats of formation of SiX4 · 2py complexes.  相似文献   

8.
SiBr4 in absolute ether reacts with KNH2 in liquid ammonia at ?60°C to give K2Si3(NH)7 and K2Si2(NH)5; attempts to prepare K4Si(NH)4 by using excess KNH2 were without success. The reaction of SiI4 in absolute ether with KNH2 in liquid ammonia is incomplete at ?60°C even after 48 hours, about 80% SiI4 remains unreacted. This reaction when carried out at room temperature gave K2Si(NH)3. All the three imidosilicates are amorphous and decompose in presence of traces of moisture to give corresponding oxosilicates.  相似文献   

9.
Alternative Ligands. XXII. Rhodium(I) complexes with Donor/Acceptor Ligands of the Typs Me2PCH2CH2SiXnMe3?n(X = F, Cl, OMe) Donor/acceptor ligand of the type Me2PCH2SiXnMe3?n react with [Rh(CO)2Cl]2 ( 1 ) to give the mononuclear complexes RhCl(CO)(PMe2CH2CH2SiXnMe3?n)2 ( 2-6 , Table 1) with planar geometry of the donor atoms, one exception being Me2PCH2CH2CH2SiCl3, yielding the crystalline RhIII-complex RhCl2(CO)(PMe2CH2CH2SiCl2)(PMe2CH2CH2SiCl3) ( 7 ) by oxidative addition of one of the SiCl bonds to the Rh1 precursor. Structures with Rh → Si interaction between the basic central atoms and the acceptor group SiXnMe3?n could be detected in the isolated products neither spectroscopically nor by X-ray diffraction of the two representatives RhCl(CO)(PMe2CH2CH2SiF3)2 ( 2 ) and RhCl(CO)[PMe2CH2CH2siF3]2 ( 2 ) and RhCl(CO) [PMe2CH2CH2Si(OMe3]2 ( 6 ). The presence of such acid/base adducts in the reaction mixture is indicated for the more acidic acceptor groups SiXnMe3?n byvco values near 1990cm?1, (see Table 3). The complex RhCl(CO)PMe3)(PMe2CH2CH2SiF3 ( 8 ) is obtained by the reaction of RhCl(CO)(PMe3)2 ( 9 ) with Me2PCH2SiF3 and has been identified spectroscopically in a mixture with 2 and 9 .  相似文献   

10.
Formation of Organosilicon Compounds. 70. Reactions of Si-fluorinated 1,3,5-Trisilapentanes with CH3MgCl and LiCH3 F3Si? CCl2? SiF2? CH2? SiF3 3 reacts with meMgCl. (me = Ch3 starting with a Si-methylation and not with a C-metallation as in the corresponding Si- and C-chlorinated compounds, e. g. (Cl3Si? CCl2)2SiCl2 [2]. A CCl-hydrogenation is observed too, which in the case of F3Si? CCl2? SiF2? CHCl? SiF3 4 gives meS3Si? CCl2? Sime2? CH2? Sime3. (F3Si? CCl2)2 5 reacts with meMgCl to form preferentially 1,2-Disilapropanes by cleaving a Si? Cbond. The isolation of F3Si? CCl2H and meF2Si? CCl2? SiF2me allows to locate the bond where 5 is cleaved at the beginning of the reaction. With meLi 5 reacts to form mainly me3Si? C?C? Sime3, showing that in the reaction of meLi, being a stronger reagent than meMgCl, and 5 a C-metallation occurs, following the same mechanism as in the reaction with (Cl3Si? CCl2)2)SiCl2 [2]. The reaction conditions for the synthesis of Si-fluroinated and C-chlorinated 1,3,5-Trisilapentanes in a 0.1 mol scale are reported. N.m.r. data of all investigated compounds are tabulated.  相似文献   

11.
Salts of Halogenophosphoric Acids. VII. Preparation and Properties of Silicon Dichlorophosphates By reaction of SiCl4 or SiHCl3 with dichlorophosphoric acid the compounds H[Si(PO2Cl2)5] · C2H5OC2H5, H[Si(PO2Cl2)5] or Si(PO2Cl2)4 have been prepared, the composition of which depends on the solvents used. Some properties of these compounds are described and possible Constitutions are discussed.  相似文献   

12.
Ionic Structures of 4- and 5-coordinated Silicon. Novel Ionic Crystal Structures of 4- and 5-coordinated Silicon: [Me3Si(NMI)]+ Cl?, [Me2HSi(NMI)2]+ Cl?, [Me2Si(NMI)3]2+ 2 Cl?. NMI Me3SiCl forms with N-Methylimidazole (NMI) a crystalline 1:1-compound which is stable at room temperature. The X-ray single crystal investigation proves the ionic structure [Me3Si(NMI)]+Cl? 1 which is the result of the cleavage of the Si? Cl bond and the addition of an NMI-ring. The reaction of Me2HSiCl with NMI (in the molar ratio of 1:2), under cleavage of the Si? Cl bond and co-ordination of two NMI rings, yields the compound [Me2HSi(NMI)2]+Cl? 2 . The analogous reaction of Me2SiCl2 with NMI (molar ratio 2:1) leads to a compound which consists of Me2SiCl2 and NMI in the molar ratio of 1:2. During the sublimation single crystals of the compound [Me2Si(NMI)3]2+ 2 Cl?. NMI 3 are formed.  相似文献   

13.
The complexes CpFe(CO)2SiBr3, CpFe(CO)2SiI3, CpFe(CO)2SiBr2(OMe), and CpFe(CO)2SiI(NH-cyclo-C6H11)2 are prepared by the reaction of CpFe(CO)2SiR3 (R = OMe, NH-cyclo-C6H11) with HBr, HI and CH3I. Treating CpFe(CO)2SiCl3 with a large excess of NaN3, KOCN or KSCN yields the first tri-pseudohalogensilyl—transition-metal-complexes. The compounds are characterized by IR and mass spectra. A new method of preparation of the already known complex CpFe(CO)2SiH3 is described starting from CpFe(CO)2SiCl3 and LiAlH4.  相似文献   

14.
The reduction of 1,2-bis(trimethylsilylimino)acenaphthene (tms-BIAN, 1) with metallic lithium in toluene affords the dilithium salt (tms-BIAN)Li 1,3,2-Diazasiloles (tms-BIAN)SiCl2 (2) and (tms-BIAN)SiMe2 (3) were prepared by the reactions of (tms-BIAN)Li2 with SiCl4 and Me2SiCl2, respectively. The reaction of (tms-BIAN)Li2 with an excess of Me2SiCl2 produces (Cldms-BIAN)SiMe2 (4), where Cldms-BIAN is 1,2-bis(chlorodimethylsilylimino)-acenaphthene. The compound (tms-BIAN)(SiCl3)2 (5) containing two different silyl substituents (Me3Si and Cl3Si) at each nitrogen atom was synthesized by the reaction of compound 1 with Cl3SiSiCl3. The elimination of SiCl4 from compound 5 is accompanied by cyclization to give derivative 2. Compounds 2-5 were characterized by 1H, 13C, and 29Si NMR spectroscopy. The crystal structures of 2-5 were established by X-ray diffraction.  相似文献   

15.
The crystal and molecular structure of the title compound, C20H16Cl2N4Si2+·2I?, has been determined at 173 K. To our knowledge, this is the first crystal structure of a silicon tetrahalide complex with a bidentate base as a ligand. The two chloro ligands are cis relative to each other. The Si—N bonds trans to a chloro ligand are longer than the Si—N bonds trans to an Si—N bond. This feature is observed for the majority of M(bipy)2Cl2 (M = metal and bipy = 2,2′‐bipyridyl) complexes, but it does not hold for all structures retrieved from the Cambridge Structural Database. The two pyridyl rings of each bipyridyl unit are nearly coplanar, whereas the bipyridyl units are almost perpendicular to each other. The two I? ions are more than 5 Å from the silicon centre. As a result, the compound can definitely be described as ionic. The crystal packing is stabilized by short C—H?I contacts.  相似文献   

16.
Synthesis of the Silatetraphospholanes (tBuP)4SiMe2, (tBuP)4SiCl2, and (tBuP)4Si(Cl)SiCl3 Molecular and Crystal Structure of (tBuP)4SiCl2 The reaction of the diphosphide K2[(tBuP)4] 7 with the halogenosilanes Me2SiCl2, SiCl4 or Si2Cl6 in a molar ratio of 1:1 leads via a [4 + 1]-cyclocondensation reaction to the silatetraphospholanes (tBuP)4SiMe2 1,1-dimethyl-1-sila-2,3,4,5-tetra-t-butyl-2,3,4,5-tetraphospholane, 1 , (tBuP)4SiCl2, 1,1-dichloro-1-sila-2,3,4,5-tetra-t-butyl-2,3,4,5-tetraphospholane, 2 , and (tBuP)4Si(Cl)SiCl3, 1-chloro-1-trichlorsilyl-1-sila-2,3,4,5-tetra-t-butyl-2,3,4,5-tetraphospholane, 3 , respectively, with the 5-membered P4Si ring system. The reaction leading to 1 is accompanied with the formation of the by-product Me2(Cl)-Si–(tBuP)4–Si(Cl)Me2 1a (5:1), which has a chain structure. On warming to 100°C 1a decomposes to 1 and Me2SiCl2. The compounds 2 and 3 do not react further with an excess of 7 due to strong steric shielding of the ring Si atoms by the t-butyl groups. 1, 2 and 3 could be obtained in a pure form and characterized NMR spectroscopically; 2 was also characterized by a single crystal structure analysis. 1a was identified by NMR spectroscopy only.  相似文献   

17.
IR multiphoton dissociation of trichlorosilane molecules in scavenger gas (O2, CO2, OCS, halomethanes, BCl3, TiCl4, etc.) media was studied. Stable, volatile dissociation products were determined. It was shown that the product formation mechanism depends on the partial pressure of SiHCl3. At a high pressure (400–800 Pa) of SiHCl3, its photolysis in a mixture with fluorine-, chlorine-, or bromine-containing scavengers led to the formation of products of the SiF4 – n Cl n and SiBr4 – n Cl n type, where n = 1–4. An SiHCl3 conversion into SiCl4 higher than 70% could be achieved. The formation mechanism was proposed for the photolysis products. At a low SiHCl3 pressure (<70 Pa), the formation of a stable volatile product was observed only in a mixture with BCl3, which resulted from the reaction of insertion of SiCl2 in the B–Cl bond.  相似文献   

18.
Formation of Organosilicon Compounds. 110. Reactions of (Cl3Si)2CCl2 and its Si-methylated Derivatives as well as of (Cl3Si)2CHCl, (Cl3Si)2C(Cl)Me and Me2CCl2 with Silicon (Cu cat.) The reactions of (Cl3Si)2CCl2 1 , its Si-methylated derivatives (Me3Si)2CCl2 8 , Me3Si? CCl2? SiMe2Cl 9 , (ClMe2Si)2CCl2 10 , Me3Si? CCl2? SiMeCl2 11 , Cl2MeSi? CCl2? SiCl3 12 as well as of (Cl3Si)2CHCl 38 , (Cl3Si)2CClMe 39 and of Me2CCl2 with Si (Cu cat.) in a fluid bed reactor ( 38 and 39 also in a stirred solid bedreactor) arc presented. While (Cl3Si)2CCl2 1 yields C(SiCl3)4 2 the 1,1,3,3-tetrachloro-2,2,4,4-tetrakis(trichlorsilyl)-1,3-disilacyclobutane Si6C2Cl16 3 and the related C-spiro linked disilacyclobutanes Si8C3Cl20 4 , Si10C4Cl24 5 , Si12C5Cl28 6 , Si14C6Cl32 7 this type of compounds is not obtained starting from the Si-methylated derivatives 8, 9, 10, 11 They Produce a number of variously Si-chlorinated and -methylated tetrasila- and trisilamethanes. However, Cl2MeSi? CCl2? SiCl3 12 forms besides of Si-chlorinated trisilamethanes also the disilacyclobutanes Si6C2Cl15Me 34 and cis- and trans Si6C2Cl14Me2 35 as well as the spiro-linked disilacyclobutanes Si8C3Cl19Me 36 , Si8C3Cl18Me2 37 . (Cl3Si)2CHCl 38 mainly yields HC(SiCl3)3 31 and also the disilacyclobutanes cis- and trans-(Cl3Si)HC(SiCl2)2CH(SiCl3) 41 and (Cl3Si)2C(SiCl2)2CH(SiCl3) 45 the 1,3,5-trisilacyclohexane [Cl3Si(H)C? SiCl2]3 44 as well as [(Cl3Si)2CH]2SiCl2, and (Cl3Si)2CClMe 39 mainly yields (Cl3Si)2C?CH2and (Cl3Si)2besides of HC(SiCl3)3, MeC(SiCl3)3and (Cl3Si)3C? SiCl2Me.,. Me2CCl2 59 mainly yields Me(Cl)C?CH2, Me2CHCl and HCl2Si? CMe2? SiCl3, besides of Me2C(SiCl3)2 and Me2C(SiCl2H)2 Compound 3 crystallizes triclinically in the space group P1 (Nr. 2) mit a = 900,3, b = 914,0, c = 855,3 pm, α = 116,45°, β = 101,44°, γ = 95,86° and one molecule per unit cell. Compound 4 crystallizes monoclinically in thc space group C2/c (no. 15) with a = 3158.3,b = I 103.7, c = 2037.4 pm, β = 1 16.62° and 8 molecules pcr unit cell. The disilacyclobutane ring of compound 3 is plane, showing a mean distance of d (Si-C) =19 1.8 pm and the usual deformations of endocyclic angles: αSi = 94,2°> 85,8° = αC.The spiro-linked disilacyclobutane rings of compound 4 are slightly folded by a mean angle of (19.0°). Their mean distances were found to be d (Si? C) = 190.4 pm relating to the central carbon atom and 192.0 pm to the outer ones, respectively. The deformations of endocyclic angles: αSi = 93,9°> 84,4° = αC are comparable to those of compound 3.  相似文献   

19.
Zusammenfassung Die Reaktion gemischter Siliciumhalogenide mit Pyridin (=py) oder 1,10-Phenanthrolin (=phen) führte zu den Additionsverbindungen SiClBr3(py)2, SiClBr3(phen), SiCl3Br(py)2, SiCl3Br(phen), SiCl2J2(py)4, SiCl2J2(phen), SiCl3J(py)3 und SiCl3J(phen). Eine Dismutation der gemischten Siliciumhalogenide wurde dabei nicht beobachtet. Ihre Darstellung erfolgte durch Umsetzung von ClSi(Net 2)3, Cl2Si(Net 2)2 und Cl3Si(Net 2) (et=C2H5) mit HBr oder HJ. Si2Cl6 reagierte mit 3py zu SiCl4(py)2 und 1/n [SiCl2(py)] n , Si2Br6 analog zu SiBr4(py)2 und 1/n [SiBr2(py)] n , Si3Cl8 mit 4py zu SiCl4(py)2 und 2/n [SiCl2(py)] n .
The reactions of mixed silicon halogenides with pyridine (=py), or 1.10-phenanthroline (=phen) resulted in the addition compounds SiClBr3(py)2, SiClBr3(phen), SiCl3Br(py)2, SiCl3Br(phen), SiCl2I2(py)4, SiCl2I2(phen), SiCl3I(py)3 and SiCl3I(phen). Dismutation of the mixed silicon halogenides in these reactions was not observed. Their preparation was achieved by cleaving of Si–N-bonds in ClSi(Net 2)3, Cl2Si(Net 2)2 and Cl3Si(Net 2) (et=C2H5) with HBr or HI. Si2Cl6 reacted with 3py forming SiCl4(py)2 and 1/n [SiCl2(py)] n . The analogous reaction of Si2Br6 resulted in SiBr4(py)2 and 1/n [SiBr2(py)] n . Si3Cl8 and 4py formed SiCl4(py)2 and 2/n [SiCl2(py)] n .


Mit 1 Abbildung

66. Mitt.:U. Wannagat, K. Hensen, P. Petesch undF. Vielberg, Mh. Chem.98, 1415 (1967).

Zugleich 7. Mitt. über Verbindungen von Nichtmetallhalogeniden mit Pyridin und seinen Homologen; 6. Mitt.:U. Wannagat, K. Hensen undP. Petesch, Mh. Chem.98, 1423 (1967).

Mit Auszügen aus den DissertationenF. Vielberg, Techn. Hochsch. Aachen 1956, undK. Hensen, T. H. Aachen 1962.  相似文献   

20.
An experimental and theoretical study of the base‐stabilized disilene 1 is reported, which forms at low temperatures in the disproportionation reaction of Si2Cl6 or neo‐Si5Cl12 with equimolar amounts of NMe2Et. Single‐crystal X‐ray diffraction and quantum‐chemical bonding analysis disclose an unprecedented structure in silicon chemistry featuring a dative Si→Si single bond between two silylene moieties, Me2EtN→SiCl2→Si(SiCl3)2. The central ambiphilic SiCl2 group is linked by dative bonds to the amine donor and the bis(trichlorosilyl)silylene acceptor, which leads to push–pull stabilization. Based on experimental and theoretical examinations a formation mechanism is presented that involves an autocatalytic reaction of the intermediately formed anion Si(SiCl3)3? with neo‐Si5Cl12 to yield 1 .  相似文献   

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