Effect of Cathode and Anode Voltage on an Ion Sheath Thickness in a Magnetically Confined Diffusion Plasma

This article reports about the ion sheath thickness variation occurring in front of a negatively biased plate immersed in the target plasma region of a double plasma device. The target plasma is produced due to the local ionization of neutral gas by the high energetic electrons coming from the source region (main discharge region). It is observed that for an increase in cathode voltage (filament bias voltage) in the source region, the ion flux into the plate increases. As a result, the sheath at the plate contracts. Again, for an increase in source anode voltage (magnetic cage bias), the ion flux to the plate decreases. As a result, the sheath expands at the plate. The ion sheath formed at the separation grid of the device is found to expand for an increase in cathode voltage and it contracts for an increase in the anode voltage of the main discharge region. One important observation is that the applied anode bias can control the Bohm speed of the ions towards the separation grid. Furthermore, it is observed that the ion current collected by the separation grid is independent of changes in plasma density in the diffusion region but is highly dependent on the source plasma parameters. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

用发射光谱法测量氮气直流辉光放电的转动温度

本文报道了氮气气压分别为10和20Pa时，对直流辉光放电的发射光谱进行测量和分析的结果。选择的研究对象为N2放电中形成的N2^ B^2∑u^ →X^2∑g^ 跃迁的Δv=v′-v″=0谱带系中v′=0→v″=0谱带的R支。在阴极背面辉光区、阴极鞘层区、正柱区以及阳极辉光区中分别选择一点进行了转动分辨的发射光谱的测量。利用自己编写的光谱拟合程序，获得了相应的实验条件下N2^ 的转动温度，给出了转动温度随放电电压的变化趋势，其结果可以用直流放电的帕邢定律得到很好的解释。在10和20Pa气压下，放电的阴极鞘层区、正柱区、阳极辉光区中的转动温度都随放电电压呈现出了不同的变化趋势，甚至是完全相反的变化趋势。我们认为这是由于气压不同时，放电状态不同所致：气压为10Pa时的放电是正常辉光放电，而气压为时20Pa的放电为反常辉光放电。     

Hot Ion Production in a Modified Penning Discharge

Ions with Maxwellian energy distributions and kinetic temperatures up to seven keV have been observed in a modified Penning discharge. Investigation of the plasma revealed two distinct spoke-like concentrations of charge, consisting respectively of ions and electrons, rotating with different velocities in the sheath between the plasma and the anode ring. Theoretical expressions are derived for the frequency of the ion and electron spoke rotation, for the ion kinetic temperature resulting from the ion spoke velocity, and for the ion heating efficiency. An extensive series of experimental measurements were made to check these theoretical expressions, and approximate agreement was obtained. It is shown that the ion kinetic temperature in the modified Penning discharge scales according to the relation Vi ~ Vani1/4/B1/2 where Va is the applied anode voltage, ni is the ion density in the sheath, and B is the magnetic field strength. The observed data demonstrate that the ion heating efficiency can be as high as several tens of percent.     

Sheath and plasma parameters in a magnetized plasma system

The variation of electron temperature and plasma density in a magnetized N₂ plasma is studied experimentally in presence of a grid placed at the middle of the system. Plasma leaks through the negatively biased grid from the source region into the diffused region. It is observed that the electron temperature increases with the magnetic field in the diffused region whereas it decreases in the source region of the system for a constant grid biasing voltage. Also, investigation is done to see the change of electron temperature with grid biasing voltage for a constant magnetic field. This is accompanied by the study of the variation of sheath structure across the grid for different magnetic field and grid biasing voltage as well. It reveals that with increasing magnetic field and negative grid biasing voltage, the sheath thickness expands.     

混合离子束阴极真空弧等离子体鞘层特性

基于无碰撞模型,建立了混合离子束阴极真空弧等离子体鞘层动力学模型,给出了解析表达式。针对材料改性中应用的H-Ti混合离子束,模拟计算了鞘层厚度和靶表面电场强度分别随离子密度和偏置靶压的演变规律。针对实际应用中出现的鞘层击穿和离子束散焦现象进行了理论分析,发现离子束稳定工作区域强烈依赖于离子密度和偏置靶压等参数,降低离子密度和提高靶压会增加稳定工作区域范围。     

混合离子束阴极真空弧等离子体鞘层特性

基于无碰撞模型,建立了混合离子束阴极真空弧等离子体鞘层动力学模型,给出了解析表达式。针对材料改性中应用的H-Ti混合离子束,模拟计算了鞘层厚度和靶表面电场强度分别随离子密度和偏置靶压的演变规律。针对实际应用中出现的鞘层击穿和离子束散焦现象进行了理论分析,发现离子束稳定工作区域强烈依赖于离子密度和偏置靶压等参数,降低离子密度和提高靶压会增加稳定工作区域范围。     

ICP等离子体鞘层附近区域发光光谱特性分析

为了独立控制鞘层附近区域离子密度和离子能最分布,采用光发射谱(OES)测量技术,对不同射频功率、放电气压和基底偏压下感应耦合等离子体鞘层附近区域辉光特性进行了研究.原子谱线和离子谱线特性分析表明,在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度.改变放电气压和射频功率,对得到的光谱特性分析表明,鞘层附近区域离子密度随射频功率的增大而线性增大,在低压下随气压的升高而增大.低激发电位原子谱线强度增加迅速,高激发电位原子谱线强度增加缓慢,而离子谱线强度增加很不明显.改变基底直流偏压,对得到的发射光谱强度变化分析表明,谱线强度随基底正偏压的增加而增大.随着基底负偏压的加入,谱线强度先减小而后增大;直流偏压为-30 V时,光谱强度最弱.快速离子和电子是引起Ar激发和电离过程的主要能量来源.     

Low-Frequency Relaxation Oscillations in Capacitive Discharge Processes

Low-frequency （2.72-3.70 Hz） relaxation oscillations at 100 mTorr at higher absorbed power were observed from time-varying optical emission of the main discharge chamber and the periphery. We interpret the low frequency oscillations using an electromagnetic model of the slot impedance with parallel connection variational peripheral capacitance, coupled to a circuit analysis of the system including the matching network. The model results are in general agreement with the experimental observations, and indicate a variety of behaviours dependent on the matching conditions.     

Nonlinear dynamics of radio frequency plasma processing reactorspowered by multifrequency sources

The source frequency has a strong influence on plasma characteristics in RF discharges. Multiple sources at widely different frequencies are often simultaneously used to separately optimize the magnitude and energy of ion fluxes to the substrate. In doing so, the sources are relatively independent of each other. These sources can, however, nonlinearly interact if the frequencies are sufficiently close. The resulting plasma and electrical characteristics can then be significantly different from those due to the sum of the individual sources. In this paper, a plasma equipment model is used to investigate the interaction of multiple frequency sources in capacitively and inductively coupled RF excited plasmas. In capacitively coupled systems, we confirmed that the plasma density increases with increasing frequency but also found that the magnitude of the DC bias and DC sheath voltage decreases. To produce a capacitively coupled discharge having a high plasma density with a large DC bias, we combined low and high frequency sources. The plasma density did increase using the dual frequency system as compared to the single low frequency source. The sources, however, nonlinearly interacted at the grounded wall sheath, thereby shifting both the plasma potential and DC bias. In inductively coupled plasmas (ICP), the frequency of the capacitive substrate bias does not have a significant effect on electron temperature and density. The DC bias and DC sheath voltage at the substrate were, however, found to strongly depend on source frequency. By using additional RF sources at alternate locations in ICP reactors, it was found that the DC bias at the substrate was varied without significantly changing other plasma parameters, such as the substrate sheath potential     

Investigations on ionic processes and dynamics in the sheath region of helium and hydrogen discharges by laser spectroscopic electric field measurements

Temporally and spatially resolved measurements of the electric field distribution in the sheath region of RF and dc discharges provide a detailed insight into the sheath and ion dynamics. The electric field is directly related to the sheath ion and electron densities, the sheath voltage, and the displacement current density. Under certain assumptions also the electron and ion conduction current densities at the electrode, the ion current density into the sheath from the plasma bulk, the ion energy distribution function, and the power dissipated in the discharge can be inferred. Furthermore, the electric field distribution can give an indication of the collision-induced conversion between different ion species in the sheath. Laser spectroscopic techniques allow the noninvasive in situ measurement of the electric field with high spatial and temporal resolution. These techniques are based on the spectroscopic measurement of the Stark splitting of Rydberg states of helium and hydrogen atoms. Two alternative techniques are applied to RF discharges at 13.56 MHz in helium and hydrogen and a pulsed dc discharge in hydrogen. The measured electric field profiles are analyzed, and the results discussed with respect to the ion densities, currents, energies, temporal dynamics and species composition. Received: 26 July 2000 / Accepted: 12 December 2000 / Published online: 3 April 2001     

Macroparticle reflection from a biased substrate in a vacuum arcdeposition system

The reflection of macroparticles, generated by a vacuum arc, from a substrate biased negatively with respect to the surrounding plasma is considered. Charging of macroparticle in the near-substrate sheath and its influence on the macroparticle motion were taken into account. It was found that macroparticles can be either reflected or attracted to the substrate depending strongly on the ion current density. The possibility of macroparticle reflection increases with negative bias voltage and saturates at about a few hundred volts     

Precisely balanced ionizer using atmospheric pressure glow discharge in air

Ion balance of an ionizer previously developed has been improved, using an atmospheric pressure glow discharge in air as a bipolar ion source. Although the glow ionizer itself has had good performance in ion balance, further we have investigated the possibility of precise control of the ion balance by controlling the discharge itself or the ion flow from the discharge to the object to be neutralized. To control the discharge, we have adjusted the voltage waveform to produce the glow discharge: a dc bias voltage superimposed on a sinusoidal waveform or widths of positive and negative rectangular pulses. Also an adjustable potential of a grid electrode additionally arranged has been employed to control the ion flow. By controlling any of them, we have succeeded in precisely controlling the ion balance of the glow ionizer.     

Determination of sheath parameters by test particles upon local electrode bias and plasma switching

Equilibrating gravitation by electric forces, microparticles can be confined in the plasma sheath above suitably biased local electrodes. Their position depends on the detailed structure of the plasma sheath and on the charge that the particles acquire in the surrounding plasma, that is by the electron and ion currents towards it. Bias switching experiments reveal how the charge and equilibrium position of the microparticle change upon altered sheath conditions. Above a critical bias, the particle is subject to an additional downward acceleration that cannot be explained solely by gravity and ion drag. This acceleration can be attributed to a positive charging of the particle induced by extreme out-of-equilibrium conditions of the plasma sheath in its surroundings: locally the plasma sheath can be completely deprived of electrons by means of the bias. We observe similar particle behaviors also in the afterglow of the discharge for a persisting bias voltage on the electrode: damped oscillation into a new equilibrium or (accelerated) fall according to the bias. The observed particle dynamics in locally tailored plasma sheath environments directly monitors changes in electric field structures and plasma density profiles.     

Diagnosis of Multiple Gases Separated from Transformer Oil Using Cavity-Enhanced Raman Spectroscopy

The Raman signal of gas molecules is very weak due to its small scattering cross section. Here, a near-confocal cavity-enhanced Raman detection system is demonstrated. In the cavity, a high power light of 9W is achieved by using a cw 200mW 532nm laser, which greatly enhances the detection sensitivity of gas species. A photomultiplier tube connected to a spectrometer is used as the detection system. The Raman spectra of the mixed gases separated from transformer oil has been observed. The relationship of absolute Raman intensity and gas pressure is also obtained. To our knowledge, this is the first Raman system to detect the gases separated from transformer oil.     

Sheath characteristics in multi-component plasma with negative ions

Properties of steady state ion sheath formed in front of a negatively biased metal plate under the influence of negative ions have been investigated in collisionless argon/SF₆ plasma. This experiment is carried out at a fixed discharge voltage and fixed filament heating power. In this experiment, the decrement in plasma pre-sheath potential drop as well as positive ion drift velocity toward the plate is experimentally recorded in the presence of negative ions. It is also found that the plasma positive ion density and plasma electron temperature decrease in the presence of negative ions. These factors attribute to the decrease of ion current toward the plate. Hence the usual ion sheath expands. Article presented at the International Conference on the Frontiers of Plasma Physics and Technology, 9–14 December 2002, Bangalore, India.     

Discharge initiation in a hollow-cathode plasma source of electrons

Experimental results on discharge initiation in a hollow-cathode plasma source of electrons are reported. The discharge is initiated by ions flowing out from the accelerating gap into the discharge region. The ions are generated by a high-voltage glowing discharge occurring in the accelerating gap at a pressure of more than 2 Pa and a voltage of no less than 2 kV. It is shown that an increase in the ion-electron emission coefficient, which can be raised by properly choosing the gas-metal pair, decreases the threshold ion current initiating the discharge at a fixed discharge voltage.     

A simple kinetic model of a Ne-H2 Penning-plasma laser

A simple kinetic model of the Ne-H₂ Penning-Plasma Laser (PPL) (NeI 585.3 nm) is proposed. The negative glow of a hollow cathode discharge at intermediate pressures is considered as the active medium. The balance equations for the upper and lower laser levels, electrons, ions and electron energy are solved. The dependences of the laser gain on the discharge conditions (Ne and H₂ partial pressures, discharge current) are calculated and measured. The calculated values are in a good agreement with the experimental data.     

A comparison of RF electrode sheath models

Analytic expressions have been found from different time-averaged and dynamic models for the electrode sheath width in a capacitively driven RF discharge. The sheath widths predicted from all the models under consideration are shown to practically coincide if they are expressed in terms of DC sheath voltage and ion current to the RF electrode. However, these models have fundamental differences in their RF discharge scaling laws that result in different theoretical predictions for RF discharge electrical characteristics. Analytic expressions for the sheath width with arbitrary collisionality at moderate RF voltages are found to be in good agreement with experimental measurements made over a wide range of discharge voltage and gas pressure     

Experimental investigation of discharge characteristics in enhanced glow discharge plasma immersion ion implantation

In enhanced glow discharge plasma immersion ion implantation (EGD-PIII) that involves a small pointed anode and large area tabular cathode, the high negative substrate bias not only acts as the plasma producer but also supplies the implantation voltage. Consequently, an electric field is created to focus the electrons and the electron focusing field in turn enhances the glow discharge process. In this work, the discharge characteristics of EGD-PIII are investigated experimentally. The discharge initiation and extinction characteristics during pulsed biasing are discussed. The duration of the post pulse-off plasma is explained from the viewpoint of particle motion and experimentally verified by employing an auxiliary disk. Our experiments show that a dual-pulse method may be utilized to determine the remnant plasma.     

甚高频激发的容性耦合Ar+O_2等离子体电负特性研究

利用探针辅助的脉冲激光诱导负离子剥离诊断技术对掺入5%O_2的容性耦合Ar等离子体电负特性进行了诊断研究.首先详细解析了脉冲激光剥离后探针的电信号,分析了探针偏压在低于或高于空间电位下的探针收集信号特征;根据探针偏压与探针收集信号之间的依赖关系,用来描述Ar+O_2等离子体电负特性的等离子体电负度被定义为脉冲激光剥离出的电子电流与偏压高于空间电位的探针收集到的背景电子电流的饱和比值,并对等离子体电负度随放电气压、射频功率以及轴向位置的变化进行了诊断测量.实验结果表明等离子体的电负度随着射频功率的增加而减小、随着放电气压的上升而变大;由于非对称电极的分布特性,在轴向方向上靠近功率电极时等离子体电负度有升高的趋势,这种趋势可能与鞘层边界附近二次电子的动力学行为以及负离子的产生与消失过程有关.