共查询到16条相似文献,搜索用时 140 毫秒
1.
用能量为1千电子伏,束流为6微安的氮离子轰击含有痕量碳和氧的钼(001)和钼(110)表面10至15分钟,在俄歇能谱中出现了很强的氮的俄歇峰。从室温直到350℃退火,低能电子衍射观察表明,表面是无序层。样品加热到530℃和650℃之间,在钼(001)表面上得到c(2×2)-氮,p(2×2)-氮和(4(21/2)×21/2)R45°-氮、氧三种结构的低能电子衍射图;在密堆的钼(110)面得到单一结构的c(7×3)-氮的低能电子衍射图。低能电子衍射图与热脱附密切相关
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用一定能量的氩离子束轰击含碳、氧的钼(100)和(111)表面,不能除去表面上的碳。而用能量为1千电子伏,束流为6微安的氮离子轰击10—15分钟,氮在表面的吸附达到饱和值。加热到400—600℃之间碳、氧从表面上基本消失,600—650℃之间吸附在表面上的氮大量脱附,即氮峰陡降到较低值,碳又偏析到表面上。加热到730℃和775℃氮从表面消失,分别得到碳在钼(100)表面上的p(2×2)和c(6×2)结构。而若将大量脱附氮的钼(111)表面,冷却到室温,氧又偏析到表面上。重新加热到650℃以上碳先从表面消失
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用AES和LEFD在700—800℃温度范围内研究了硫在钼(111)表面上的偏析动力学和表面结构。样品加热到800℃硫迅速地偏析到表面上并逐步地取代了表面上的碳。加热到700℃硫没有明显的表面偏析。硫的偏析主要受它的体扩散速率的控制,表面碳的存在也抑制了硫的表面偏析。不同温度下的偏析动力学实验后,分别进行了低能电子衍射实验,观察到钼(111)(31/2×31/2)R30°-硫和1/3(44-99)-硫两种表面结构的低能
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使用LEED和AES研究了钼(110)表面上的碳和氧,用能最为1千电子伏束流为6微安的氩离子轰击含碳和氧的钼(110)表面,发现碳的峰形和强度发生了变化,深度剖面分析指出,碳层是来源于体内,加热样品到700℃和750℃以上分别观察到碳的c(4×4)-碳和-碳两种有序结构.
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采用电沉积法在镍合金表面制备钼镍镀层。研究钼镍镀层的硬度、磨损质量和摩擦系数、热膨胀等性能。分别用发射光谱法、能谱法、扫描电镜法和X衍射法等对钼镍镀层进行表征。在镍合金表面镀上一层钼镍镀层,可使其的硬度和耐磨性大幅度提高并减小磨擦系数,钼镍镀层的硬度为518 HV,比镍合金的硬度(300 HV)提高了72.67%;钼镍镀层的磨损质量是镍合金的磨损质量的1/1.94;镍合金和钼镍镀层的磨擦系数分别为0.640和0.559。镍合金的物理热膨胀曲线在100~120℃温度范围和570~640℃范围形成了2个峰,镍合金+钼镍镀层的物理热膨胀曲线在570~640℃范围形成了1个峰。在570~640℃范围可明显改善其热膨胀,镍合金+钼镍镀层的物理热膨胀曲线在570~640℃范围形成的峰远比镍合金的物理热膨胀曲线在570~640℃范围形成的峰小,可能是因为钼进入到镍的晶格中,抑制了镍在570~640℃范围发生晶格转变(bcc→fcc)所致。镍合金+钼镍镀层的物理热膨胀曲线在595~625℃范围形成的小峰,可能是由于MoNi_4和MoNi由半晶型结构转变为晶型结构所致。 相似文献
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描述了用低能电子衍射(LEED)研究不同温度下在Si(100)-c(8×8)表面吸氢引起的一系列相变过程。实验发现:在液氮温度下,在Si(100)-c(8×8)表面连续吸氢将引起表面经Si(100)-(4×1)-H向(2×1)-H最终向(1×1)-H转变;而在从700℃到室温间的不同温度下饱和吸氢,实验中观察到:Si(100)-c(8×8)表面将先转变至Si(100)-c(4×4)-H,然后至(2×1)-最终至(1×1)-H。 相似文献
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利用低能电子衍射(LEED)研究了离子轰击加退火处理的和淀积外延的两种Si(113)表面的原子结构。发现对于经750—800℃退火后的两种Si(113)表面,当其温度高于600℃时存在1×1非再构表面相。随着样品温度缓慢地冷却至室温,Si(113)-1×1表面经过3×1(约600—400℃)最后转变为3×2再构。当退火温度为600℃时,则只出现3×1再构,室温下的3×2和3×1表面都是很稳定的。讨论了表面杂质对Si(113)表面原子结构的影响。在衬底温度为580℃的Si(113)表面上进行淀积生长,当外延
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The surface modifications of Mo massive samples (0.5 mm foils) made by nitrogen ion implantation are studied by SEM, XRD, AFM, and SIMS. Nitrogen ions in the energy range of 16-30 keV with a fluence of 1 × 1018 N+ cm−2 were implanted in molybdenum samples for 1600 s at different temperatures. XRD patterns clearly showed MoN (0 3 1) (hcp) very close to Mo (2 0 0) line. Crystallite sizes (coherently diffracting domains) obtained from MoN (0 3 1) line, showed an increase with substrate temperature. AFM images showed the formation of grains on Mo samples, which grew in size with temperature. Similar morphological changes to that has been observed for thin films by increasing substrate temperature (i.e., structure zone model (SZM)), is obtained. The density of implanted nitrogen ions and the depth of nitrogen ion implantation in Mo studied by SIMS showed a minimum for N+ density as well as a minimum for penetration depth of N+ ions in Mo at certain temperatures, which are both consistent with XRD results (i.e., IMo (2 0 0)/IMo (2 1 1)) for Mo (bcc). Hence, showing a correlation between XRD and SIMS results. This phenomenon is explained on the basis of residual gas, substrate temperature, dissociation of water in the chamber and the ion energy. 相似文献
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薄膜体声波谐振器(FBAR)的谐振频率会受到外界环境温度的影响而产生漂移,对于FBAR滤波器而言,这种温度-频率漂移特性会导致其中心频率、插入损耗、带内纹波等性能发生变化,降低其在电学应用中的可靠性。应用ANSYS有限元分析软件,对一个典型Mo-AlN-Mo三层结构的FBAR进行了温度-频率漂移特性的仿真,得到其在[-50 ℃, 150 ℃]温度范围内的频率温度系数(TCF)约为-3510-6/℃。在FBAR叠层薄膜结构中添加了一层具有正温度系数的二氧化硅温度补偿层,分析了该补偿层厚度对FBAR的温度-频率漂移特性、谐振频率和机电耦合特性的影响。设计了具有一层二氧化硅温度补偿层的FBAR叠层,由Mo/AlN/SiO2/Mo多层薄膜构成,仿真得到其频率温度系数为0.87210-6/℃;与没有温度补偿层的FBAR相比,温度稳定性得以显著改善。关键词: Abstract: Key words: 相似文献
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The interaction of cobalt with clean and sulfur covered Mo(100) surfaces was investigated with Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and temperature programmed desorption (TPD). On the clean surface, the deposition and subsequent annealing of one monolayer of cobalt resulted in the formation of an ordered overlayer with (1 × 1) surface structure. When cobalt was deposited on sulfur covered Mo(100) surfaces, after annealing the sulfur overlayer migrated on top of the cobalt layer. This topmost sulfur overlayer did not significantly affect the thermal desorption of cobalt from the Mo(100) surface. Various ordered structures of sulfur, cobalt and coadsorbed sulfur and cobalt were observed by LEED. A new surface structure showing (3 × 1) symmetry was observed when at least one monolayer of cobalt was deposited and annealed at 870 K on an ordered monolayer of sulfur on the Mo(100) surface. This surface structure was stable in ultrahigh vacuum up to 940 K. 相似文献
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T. McAvoy J. Zhang C. Waldfried D.N. McIlroy P.A. Dowben O. Zeybek T. Bertrams S.D. Barrett 《The European Physical Journal B - Condensed Matter and Complex Systems》2000,14(4):747-755
The experimental band structure of Mo(112) and the effects by temperature and adsorbate are presented. A surface resonance,
identified as crossing the Fermi level at about 1/3 from to of surface Brillouin zone, was observed to be very sensitive to both contamination and temperature. We find evidence of adsorbate
and temperature induced reconstruction of the Mo(112) surface. Examination of low-energy electron diffraction (LEED) and scanning
tunneling microscopy (STM) data provides evidence for an adsorbate induced reconstruction of the Mo(112) surface with periodicities
consistent with the Fermi level crossing of the surface resonance. The reconstruction is found to occur at coverages as low
as 0.03 Langmuirs of oxygen or carbon. The reconstruction and/or adsorbate affects the density of states and bands near the
Fermi level of a
1 symmetry.
Received 3 March 1999 and Received in final form 1 October 1999 相似文献
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提出了一种利用离子注入和后续退火制备氮掺杂TiO2薄膜的方法。首先在室温下向石英玻璃中注入Ti离子,随后在氮气中退火到900 ℃,从而制备了氮掺杂的玻璃基TiO2薄膜。SRIM2006程序模拟和卢瑟福背散射谱(RBS)研究表明注入离子从样品表面开始呈高斯分布,实验结果和模拟结果吻合很好。X射线光电子能谱(XPS)研究结果表明注入态样品中形成了金属Ti和TiO2,900 ℃退火后金属Ti转变成TiO2,同时N原子替代少量的晶格O原子形成了O-Ti-N化合物。紫外-可见吸收光谱(UV-Vis)结果显示,当退火温度至500 ℃时,在吸收光谱中开始出现TiO2的吸收边,随退火温度升高到900 ℃,由于O-Ti-N化合物形成,TiO2的吸收边从3.98 eV红移到3.30 eV,TiO2吸收边末端延伸到可见光区,在可见光区的吸收强度明显增加。 相似文献