Observation of all-optical wavelength conversion based on cascaded effect in periodically poled lithium niobate waveguide

We experimentally demonstrate multi-channel wavelength conversion through the cascaded second-order nonlinear processes in periodically poled lithium niobate waveguide in the optical communication wavelength band of 1.5 μm. The normalized conversion efficiency as high as 90% W⁻¹ cm⁻² is obtained. Wavelength conversion over a broad wavelength range of 66 nm has been confirmed.     

In-plane gate transistors in AlxGa1−xN/GaN heterostructures written by focused ion beams

Focused ion beam implantation of gallium and dysprosium was used to locally insulate the near-surface two-dimensional electron gas of Al_xGa_1−xN/GaN heterostructures. The threshold dose for insulation was determined to be 2×10¹⁰ cm⁻¹ for 90 keV Ga⁺ and 1×10⁹ cm⁻¹ for 200 keV Dy²⁺ at 4.2 K. This offers a tool not only for inter-device insulation but also for direct device fabrication. Making use of “open-T” like insulating line patterns, in-plane gate transistors have been fabricated by focused ion beam implantation. An exemplar with a geometrical channel width of 1.5 μm shows a conductance of 32 μS at 0 V gate voltage and a transconductance of around 4 μS, which is only slightly dependent on the gate voltage.     

Enhanced field emission from PbTiO3 nanodots prepared by phase separation approach

Uniformly distributed PbTiO₃ nanodots were successfully prepared by phase separation approach. A precursor sol film was first spin-coated on Si wafer and then spontaneously separated into two distinct phases owing to the Marangoni instability. PT nanodots with tailorable size and density were obtained after further heat treatment. X-ray diffraction analysis indicated that these nanodots showed a perovskite structure. An excellent room temperature field emission property of PbTiO₃ nanodots was observed: the minimum turn-on voltage was about 5.3 V/μm; while the emission current density reached about 270 μA cm⁻² at an applied field of about 9.25 V/μm.     

Novel mid-IR laser based on hybrid AlGaAsSb/InAs/CdMgSe heterostructure

We report on the development of a novel design of a mid-IR laser combining III–V and II–VI compounds in a “hybrid” double heterostructure. It possesses large (1.5 eV) potential barriers both for injected electrons and holes, suppressing their leakage from the active region, and provides strong optical confinement. An AlGaAsSb/InAs/CdMgSe laser diode with a III–V/II–VI heterovalent interface at the 0.6 μm-InAs active region has been grown by molecular beam epitaxy on an InAs substrate. Despite a far from optimal defect density at the CdMgSe/InAs interface and high losses inherent for bulk active region of the laser, the structure demonstrates lasing at 2.8 μm (up to 100 K) in the pulsed regime with a threshold current density of 3–4 kA/cm². Type II InSb monolayer insertions into an InAs layer show bright photoluminescence at 3.8 μm (77 K), confirming the great potential of the InAs-based nanostructure active region for longer wavelength applications.     

Parameter optimization and characteristic analysis of a polymer microring resonant wavelength multiplexer

Novel formulas of transmission functions are presented, some parameters are optimized, and transmission characteristics are analyzed for a polymer microring resonant wavelength multiplexer around the central wavelength of 1.55 μm with the wavelength spacing of 5.6 nm and with eight vertical output channels. The computed results show that the designed device possesses some excellent features including the 3 dB bandwidth of 0.25 μm, weaker background light of 3.8×10⁻⁴, smaller inserted loss of less than 0.6 dB, and lower crosstalk below −20 dB for every vertical output channel.     

Mobility of electrons and holes in an n-type organic semiconductor perylene diimide thin film

N,N′-diphenylbutyl-3,4,9,10-perylenebiscarboximide (PTCDI-C4Ph) were characterized by optical and electrochemical methods. A device with an ITO/PTCDI-C4Ph (≈2 μm)/Al structure was fabricated to measure mobility by time-of-flight techniques. This vacuum deposited organic layer was an amorphous state. Electrons were observed faster than holes. The electron and hole mobilities were 1.8 × 10⁻⁴ cm²/V s and 1.1 × 10⁻⁴ cm²/V s under the electric field of 500 (V/cm)^1/2, respectively. This result shows that this organic compound is a good candidate for an n-type conduction.     

Atomic layer deposited HfO2 based metal insulator semiconductor GaN ultraviolet photodetectors

A report on GaN based metal insulator semiconductor (MIS) ultraviolet (UV) photodetectors (PDs) with atomic layer deposited (ALD) 5-nm-thick HfO₂ insulating layer is presented. Very low dark current of 2.24 × 10⁻¹¹ A and increased photo to dark current contrast ratio was achieved at 10 V. It was found that the dark current was drastically reduced by seven orders of magnitude at 10 V compared to samples without HfO₂ insulating layer. The observed decrease in dark current is attributed to the large barrier height which is due to introduction of HfO₂ insulating layer and the calculated barrier height was obtained as 0.95 eV. The peak responsivity of HfO₂ inserted device was 0.44 mA/W at bias voltage of 15 V.     

Improvement of R0A product of type-II InAs/GaSb superlattice MWIR/LWIR photodiodes

The effects of atomic hydrogen and polyimide passivation on R₀A product of type-II InAs/GaSb superlattice photo detectors for cut-off wavelength of both 6.5 μm and 12 μm were investigated. Low temperature current–voltage measurement shows that the use of atomic hydrogen during molecular beam epitaxy growth can improve R₀A product by 260% for 6.5 μm cut-off superlattice diodes and by 50% for 12 μm cut-off ones. The R₀A product of polyimide-passivated diodes with 12 μm cut-off is about 80% higher than those un-passivated ones. Wannier–Stark oscillations at higher reverse bias were observed for polyimide-passivated superlattice diodes with 12 μm cut-off. No Wannier–Stark oscillations were observed for un-passivated superlattice diodes, indicating that surface leakage current dominates in un-passivated diodes, while intrinsic dark current mechanisms such as tunneling and diffusion current dominate in polyimide-passivated diodes.     

Enhancement of field emission of SnO2 nanowires film by exposure of hydrogen gas

The effect of hydrogen (H₂) gas exposure on the field emission properties of tin oxide (SnO₂) nanowires films synthesized by the carbon thermal reduction vapor transport method was investigated. The exposure of H₂ gas results in the reduction of the turn-on voltage for driving a current of 10 nA from 7.6 V/μm to 5.5 V/μm and the increase of the field current based on 10 V/μm from 0.47 μA to 2.1 μA. The Fowler–Nordheim plot obtained from the current–voltage data supports that the field emission enhancement of SNW film is attributed to the reduction of the work function by the H₂ exposure.     

Oxide aperture scaling effect on high-speed (>16 GHz) vertical-cavity surface-emitting lasers performance

High-speed, oxide-confined, polyimide-planarized 850 nm vertical-cavity surface-emitting lasers (VCSELs) with oxide aperture diameters of 9, 10, 12, 15, 20, and 30 μm have been fabricated and characterized. For a 9 μm oxide aperture diameter, the lasers exhibit a resonance frequency, a 3-dB modulation frequency, and a modulation current efficiency factor (MCEF) up to 12.4, 16.5 GHz, and 10.9 GHz/mA^1/2, respectively, at only 7.9 kA/cm². Threshold voltage and current were 1.45 V and 0.7 mA, respectively. It is demonstrated that increasing the resonance frequency with bias does not guarantee a higher modulation bandwidth. The influence of oxide aperture scaling effect on VCSEL performance is presented.     

Low energy cluster beam deposited BN films as the cascade for field emission

The atomic deposited BN films with the thickness of nanometers (ABN) were prepared by radio frequency magnetron sputtering method and the nanostructured BN films (CBN) were prepared by Low Energy Cluster Beam Deposition. UV-Vis Absorption measurement proves the band gap of 4.27 eV and field emission of the BN films were carried out. F-N plots of all the samples give a good fitting and demonstrate the F-N tunneling of the emission process. The emission of ABN begins at the electric field of 14.6 V/μm while that of CBN starts at 5.10 V/μm. Emission current density of 1 mA/cm² for ABN needs the field of 20 V/μm while that of CBN needs only 12.1 V/μm. The cluster-deposited BN on n-type Silicon substrate proves a good performance in terms of the lower gauge voltage, more emission sites and higher electron intensity and seems a promising substitute for the cascade of field emission.     

Eye-protection glasses against YAG laser injury based on the band gap reflection of one-dimensional photonic crystal

Eye-protection glasses against YAG laser injury based on band gap reflection of one-dimensional photonic crystal (PC) is designed and manufactured in this paper. The laser beam (wavelength 1.06 μm) is reflected by the one-dimensional PC (with the transmission 10⁻⁷) and absorbed by the phosphatic glass substrate (with the transmission 1% for 1.06 μm), so the transmission of the device for wavelengths of1.06 μm can reach 10⁻⁹. The glasses have enough capabilities to protect the eyes from injury of ns-YAG lasers whose energy density is 1 J/cm² for all incident angles, and also to avoid a second injury to others from the reflected laser beams. The transmission of the glasses is beyond 70% for the visible lights. The testing data of the eye-protection glasses agree well with the theoretical predictions.     

GaN/AlN quantum dot photodetectors at 1.3–1.5 μm

We have demonstrated GaN/AlN quantum dots (QD) photodetectors, relying on intraband absorption and in-plane carrier transport in the wetting layer. The devices operate at room temperature in the wavelength range 1.3–1.5 μm. Samples with 20 periods of Si-doped GaN QD layers, separated by 3 nm-thick AlN barriers, have been grown by plasma-assisted molecular-beam epitaxy on an AlN buffer on a c-sapphire substrate. Self-organized dots are formed by the deposition of 5 monolayers of GaN under nitrogen-rich conditions. The dot height is 1.2±0.6 to 1.3±0.6 nm and the dot density is in the range 10¹¹–10¹² cm⁻². Two ohmic contacts were deposited on the sample surface and annealed in order to contact the buried QD layers. The dots exhibit TM polarized absorption linked to the s–p_z transition. The photocurrent at 300 K is slightly blue-shifted with respect to the s–p_z intraband absorption. The responsivity increases exponentially with temperature and reaches a record value of 10 mA/W at 300 K for detectors with interdigitated contacts.     

Isophorone derivative as red dopant for organic electroluminescent devices

The donor–acceptor functionalized molecule, bis(4-(2-(3,3-dicyanomethylene-5,5-dimethyl-1-cyclohexylidene)vinyl)phenyl)(1-naphthyl)amine (DPN-4CN), with symmetrical structure, was investigated for its application in optoelectronic devices. Red organic light-emitting diodes (OLEDs) were fabricated by doping DPN-4CN in tris(8-hydroxyquinolino) aluminum (Alq₃) as red emitters, with a structure of ITO/NPB/Alq₃:DPN-4CN/BCP/Alq₃/LiF/Al. The device with a doping concentration of 2.5 wt% showed pure red emission with λ_max at 654 nm and CIE coordinates of (0.62, 0.36), a high brightness of 5080 cd m⁻² at a driving voltage of 12 V, a current efficiency of 2.14 cd A⁻¹ and an external quantum efficiency of 1.07% at a current density of 20 mA cm⁻². The current efficiencies and CIE coordinates of the device were almost constant over a current density from 1 to 200 mA cm⁻².     

A germanium photodetector array for the near infrared monolithically integrated with silicon CMOS readout electronics

Near infrared (NIR) detectors, operating in the 1.3–1.6 μm region, are key elements in a number of applications ranging from optical communications to remote sensing. InGaAs and Ge are currently the materials of choice for the fabrication of NIR detectors due to their good absorption and transport properties. However, as the required performances increase (bit-rate in optical communications, number of pixels in imaging, etc.), it becomes more and more important to reduce the separation from detectors and driving/biasing and amplifying electronics, by integrating the two components on the same chip.We demonstrate an array of NIR detectors monolithically integrated with standard silicon CMOS readout electronics. The employed low temperature process allowed the integration of the detectors as the last step of chip fabrication. The integrated micro-system consists of a linear array of 120×120 μm² pixels, an analog CMOS multiplexer and a transimpedance amplifier. The chip exhibits a good photoresponse in the NIR, with responsivities as high as 43 V/W at 1.3 μm, dark currents of 1 mA/cm² and inter-pixel cross-talk better than −20 dB.     

Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/PVC-LiClO4/graphite

This paper reports the effect of surface topography of titanium dioxide films on short-circuit current density of photoelectrochemical solar cell of ITO/TiO₂/PVC-LiCLO₄/graphite. The films were deposited onto ITO-covered glass substrate by screen-printing technique. The films were tempered at 300 °C, 350 °C, 400 °C, 450 °C and 500 °C for 30 min to burn out the organic parts and to achieve the films with porous structure. The surface roughness of the films were studied using scanning electron microscope (SEM). Current–voltage relationship of the devices were characterized in dark at room temperature and under illumination of 100 mW cm⁻² light from tungsten halogen lamp at 50 °C. The device utilising the TiO₂ film annealed at 400 °C produces the highest short-circuit current density and open-circuit voltage as it posses the smoothest surface topography with the electrolyte. The short-circuit current density and open-circuit voltage of the devices increase with the decreasing grain size of the TiO₂ films. The short-circuit current density and open-circuit voltage are 0.6 μA/cm² and 109 mV respectively.     

Synthesis and efficient field emission of ZnO nanoinjectors

ZnO nanoinjectors were synthesized on Au-coated Si substrate by direct thermal evaporation of zinc powder at a low temperature of 600 °C and atmospheric pressure. Field-emission scanning electron microscopy and X-ray diffraction were applied to study the structural characteristics of the sample. The result indicated that the nanoinjector sample consisted of single-crystalline wurtzite structures which were preferentially oriented in the 0 0 1 direction. The field emission of the sample started at a turn-on field of 1.5 V/μm at a current density of 1 μA/cm², while the emission current density reached about 1 mA/cm² at an applied field of 5.0 V/μm.     

Fast electro-optical switching and high contrast ratio in epoxy-based polymer dispersed liquid crystals

We report the observation of an electro-optical switching effect from an opaque to a transparent state occurring at a threshold value of the applied field in a polymer dispersed liquid crystal (PDLC). Optical responses of the composite film under the conditions of an externally applied ac electric field (2–5 V_p−p/μ) and a film thickness (50 μm), were determined using an Argon laser (wavelength 514 nm). The experimental results showed promising switching times with a rise time of 190 μs and a decay time of 2 ms and an exceptionally high contrast ratio up to 410. These results demonstrate the validity of employing this new PDLC in electro-optical devices.     

Ge/Si photodiodes and phototransistors with embedded arrays of germanium quantum dots for fiber-optic communication lines

Photodetectors based on Ge/Si multilayer heterostructures with germanium quantum dots are fabricated for use in fiber-optic communication lines operating in the wavelength range 1.30–1.55 μm. These photodetectors can be embedded in an array of photonic circuit elements on a single silicon chip. The sheet density of germanium quantum dots falls in the range from 0.3 × 10¹² to 1.0 × 10¹² cm^?2, and their lateral size is approximately equal to 10 nm. The heterostructures are grown by molecular-beam epitaxy. For a reverse bias of 1 V, the dark current density reaches 2 × 10^?5 A/cm². This value is the lowest in the data on dark current densities available in the literature for Ge/Si photodetectors at room temperature. The quantum efficiency of photodiodes and phototransistors subjected to illumination from the side of the plane of the p-n junctions is found to be 3% at a wavelength of 1.3 μm. It is demonstrated that the maximum quantum efficiency is achieved for edge-illuminated waveguide structures and can be as high as 21 and 16% at wavelengths of 1.3 and 1.5 μm, respectively.     

Negative luminescence from mid-wave infrared HgCdTe diode arrays

A self-referencing, optical modulation technique was used to measure the negative luminescence efficiencies of an array of mid-wave infrared HgCdTe photodiodes with cutoff wavelength 4.6 μm as a function of sample temperature. The internal efficiency at a wavelength of 4 μm was 93% at 295 K, and nearly independent of temperature in the 240–300 K range. This corresponds to an apparent temperature reduction >50 K at room temperature and >30 K at 240 K. Moreover, the reverse-bias saturation current density was only 0.13 A/cm². The measured transmission and emission spectra were simulated using empirical HgCdTe absorption formulas from the literature.