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1.
稀释磁性半导体Cd0.9Mn0.1Te晶体的退火改性   总被引:2,自引:2,他引:0  
运用缺陷化学原理近似计算了Cd0.9Mn0.1Te晶体的点缺陷浓度,得到了晶体成分与理想化学计量比偏离最小时的退火条件.利用该退火条件,指导了Cd0.9Mn0.1Te晶体的两温区退火实验,并分析了退火对晶片性能的影响.结果表明:在973 K,Cd气氛下对Cd0.9Mn0.1Te晶片退火140 h后,晶片(111)面的X射线回摆曲线的FWHM值由退火前的168.8' 降至108',红外透过率由退火前48;提升到64;,接近晶体的理论透过率,电阻率也由退火前的2.643×105 Ω·cm提高到4.49×106 Ω·cm.由此可见,对生长态的Cd0.9Mn0.1Te晶体进行退火实验能提高晶体的结晶质量,补偿晶体的Cd空位点缺陷,使晶体成分接近理想的化学计量比.  相似文献   

2.
以Cd_(1-y)Zn_y合金作退火源,对采用改进的垂直布里奇曼法(MVB)生长的In掺杂的Cd_(0.9)Zn_(0.1)Te晶片进行退火改性.结果表明:与退火前相比,退火后晶片的成分均匀性提高,Cd、Zn和Te三种元素的含量更接近理想的化学计量比,平均红外透过率由12;提高到59;,电阻率从3.5×10~6 Ω·cm提高到5.7×10~9 Ω·cm,且在PL谱中出现了代表晶体质量的(D~0,X)发光峰.在合适的条件下对低阻值In掺杂的CdZnTe晶体进行退火改性可较好的提高晶体的性能.  相似文献   

3.
本文运用热力学关系估算了CdZnTe熔体平衡分压.尝试以Cd1-xZnx合金源替代Cd源控制Cd分压和Zn分压进行了Cd 0.8Zn 0.2Te晶体熔体生长,探讨了熔体分压与晶体电阻率的关系.获得的Cd 0.8Zn 0.2Te晶体的电阻率接近1010Ω·cm,高于同类方法文献报道1~2个数量级.晶体的结构完整性较好,平均腐蚀坑密度(EPD)为2×105cm-2,纵向组成分布偏离度在4;左右,红外透过率大于60;,晶体中第二相和沉淀物明显减少,优于仅采用Cd分压控制的Cd0.8Zn0.2Te晶体.  相似文献   

4.
用溶剂熔区移动法制备了掺In的Cd0.9Zn01Te晶体,晶体生长温度800℃,温度梯度为20℃/cm,生长速度0.4 mm/h.测试了晶体的Te夹杂情况、红外透过率图谱、Ⅰ~Ⅴ特性曲线和PICTS特性,并以1115℃下用VB法生长的掺In的Cd0.9Zn0.1Te晶体做为参照,对比了两者性能.结果表明,溶剂熔区移动法制备的晶体Te夹杂的密度和体积百分比比VB法晶片低,但是Te夹杂的尺寸要比VB法晶体大;溶剂熔区移动法晶体的红外透过率比VB法晶体高;溶剂熔区移动法晶体电阻率比VB法晶体高了一个数量级;PICTS测试发现,溶剂熔区移动法晶体内主要的缺陷密度低于VB法晶体.  相似文献   

5.
采用溶剂熔区移动法生长出掺In的Cd0.9Zn0.1Te晶体.测试了晶体轴向Zn含量分布,并对晶体的头部和中部进行了Te夹杂相、红外透过率、I-V特性曲线和PL谱图的对比测试.结果表明:头部晶体的Zn含量、红外透过率和电阻率均大于中部;而头部晶体的Te夹杂尺寸、杂质和缺陷含量均小于中部.  相似文献   

6.
采用移动加热器法生长铟惨杂浓度为5×1017 atoms/cm3的Cd0.9Mn0.1Te (CMT)和Cd0.9Zn0.1Te (CZT)单晶.生长得到的CMT晶体和CZT晶体电阻率范围为4.5×109 ~ 6.2×1010 Ω·cm.CMT晶体的成分均匀性要优于CZT晶体,拟合得到CMT和CZT晶体中Mn和Zn的分凝系数分别为0.95和1.23.富Te区在两种晶体生长过程中都具有显著的提纯作用,In惨杂的浓度范围均在6.4 ~ 14.4 ppm范围内.红外透射显微镜观察到三角形和六边形为主的Te夹杂的尺寸5 ~24 μm,浓度为105 cm-3.除最后结晶区之外,沿晶体生长方向Te夹杂的尺寸逐渐减小而浓度逐渐增大.制备的CMT和CZT探测器对59.5 keV241Am放射源均有能谱响应,能量分辨率分别为23.2;和24.6;.  相似文献   

7.
采用改进垂直布里奇曼法生长出的磷锗锌(ZnGeP2,ZGP)晶体中存在各种缺陷,导致其红外透过率较低,刚生长的晶体不能直接用于制备红外非线性光学器件.分别采用真空、同成分粉末包裹和真空-同成分粉末包裹的复合退火工艺对生长的ZGP晶体进行了退火热处理研究.应用傅立叶红外光谱仪(FTIR)、高阻仪(HRM)、X射线能谱仪(EDS)等对退火前后的晶体性能和成分进行了测试分析.结果表明,三种方法退火后晶体的红外透过率和电阻率都得到改善,其中复合退火工艺的改善效果最为显著,晶体红外透过率由41;提高到60;,电阻率由2.5×108 Ω·cm提高到7.2 ×108 Ω·cm,晶体成分接近ZGP理想化学配比,退火后晶体的光学和电学性能得到显著改善,可用于ZGP-OPO器件制作.  相似文献   

8.
基于缺陷化学理论,考虑到富Te的CdTe晶体中可能存在的点缺陷,建立了在Te气氛下退火时,热力学平衡态晶体中的点缺陷模型,其中包括Cd间隙(Cdi)、Cd空位(VCd)、Te间隙(Tei)和Te反位(TeCd).利用质量作用定律和伪化学平衡方程计算了富Te情况下本征CdTe晶体中的点缺陷浓度和费米能级.计算结果系统的揭示了点缺陷浓度、费米能级、Te压以及退火温度之间的关系,发现只有TeCd浓度足够大时才能对费米能级产生钉扎作用.  相似文献   

9.
垂直Bridgman法生长Cd1-XMnxTe晶体的缺陷研究   总被引:1,自引:0,他引:1  
本文采用垂直布里奇曼(Bridgman)法生长了尺寸为Φ30 mm×130mm的Cd1-xMnxTe晶体,利用Nakagawa腐蚀液显示了晶体的位错、Te夹杂相和孪晶缺陷,并采用傅立叶变换红外光谱仪研究了晶体的红外透过率与晶体缺陷之间的关系.结果表明:生长态Cd1-xMnxTe晶体的位错密度为104~105 cm-2,Te夹杂相密度为103~104cm-2,晶体中的孪晶主要为共格孪晶,孪晶面为[111]面,且平行于晶体生长方向.在入射光波数4000~500 cm-1范围,晶体的红外透过率为36.7;~55.3;,红外透过率越大,表明晶体的位错和Te夹杂相密度越低,晶体对该波长范围的红外光表现为晶格吸收和自由载流子吸收.  相似文献   

10.
采用Te溶剂结合改进的垂直布里奇曼法(MVB)制备了In:ZnTe与ZnTe晶体,并对晶体的光学与电学特性进行了表征.通过红外透过显微成像技术观察了In:ZnTe与ZnTe中的Te夹杂并进行了统计分析,发现In掺杂未对ZnTe中的Te夹杂的分布和尺寸产生显著影响.红外透过光谱分析表明,In:ZnTe与ZnTe晶体的红外透过率曲线均表现出平直的趋势,且其平均透过率基本相等,约为60;,进一步表明In的掺入并未导致严重的晶格和杂质吸收.然而,Ⅰ-Ⅴ测试分析发现,In掺杂使得ZnTe晶体的电阻率提高了5个数量级.同时Hall测试分析表明,In:ZnTe与ZnTe晶体均为p型导电,In掺杂很大程度上补偿了晶体中的Vzn,使得晶体中的载流子浓度降低了4个数量级.对比了两种晶体的紫外-可见-近红外透过光谱,可以观察到,In掺杂使ZnTe的吸收边从550 nm红移到560nm,这可能是由于In掺杂引入的浅能级导致的吸收边带尾现象造成的.  相似文献   

11.
The article presents an analysis into agglomeration during KCl vacuum crystallization. The theoretical and experimental investigations into the mechanism of agglomeration during mass crystallization result in an extension of the growth phenomena within the known model equations. The basis for this is essentially constituted by the collision model concepts of the theory of floculation in disperse systems. The parameters derived from the microprocess analysis (energy dissipation, content of solids, growth rate of individual grains) lead to model equations which are confirmed by laboratory and test trials.  相似文献   

12.
Rakin  V. I. 《Crystallography Reports》2020,65(6):1033-1041
Crystallography Reports - The relationship of morphological spectra (sets of data on the morphological types of real polyhedral crystals and their probabilities under current physicochemical...  相似文献   

13.
The evolution of the geometric characteristics introduced by Pauling and their dependence on the specific features of the structure and chemical bonds have been considered. The values of the covalent and van der Waals radii are given as well as their relationships and mutual transitions.  相似文献   

14.
15.
A review of measurement of thermophysical properties of silicon melt   总被引:2,自引:0,他引:2  
Measurements of thermophysical properties of Si melt and supplementary study of X-ray scattering/diffraction by the authors' group were reviewed. The values obtained differed variously from those of literature. Density was 2–3% larger, surface tension 20–30% smaller, viscosity up to 40% larger, electrical conductivity 8% smaller, spectral emissivity more or less in good agreement with literature values, and thermal diffusivity a few percent larger. An anomalous density jump was found near the melting point. Surface tension and viscosity also showed anomaly. A strange time-dependent change of density was observed over 3 h after melting. X-ray analyses suggested a slight change in local atom ordering, but showed no sign of cluster formation. An addition of 0.1 at% gallium caused the density jump to disappear, while that of boron caused no change. An EXAFS study of the former melt indicated a strong interaction between Ga and Si atoms as if molecules of GaSi3 existed. The implications of the measured properties are a possibility of soft-turbulence in an Si melt in a relatively large crucible, a more complicated manner of intake of oxygen depleted molten Si from the free surface region to underneath the growing crystal, and a relaxation of the melt after melting arising from trapped gas species.  相似文献   

16.
Within the method of discrete modeling of packings, an algorithm of generation of possible crystal structures of heteromolecular compounds containing two or three molecules in the primitive unit cell, one of which has an arbitrary shape and the other (two others) has a shape close to spherical, is proposed. On the basis of this algorithm, a software package for personal computers is developed. This package has been approved for a number of compounds, investigated previously by X-ray diffraction analysis. The results of generation of structures of five compounds—four organic salts (with one or two spherical anions) and one solvate—are represented.  相似文献   

17.
The formulae for absolute Rdisap and relative R velocities of disappearance and lifetime τ of faces of growing crystals have been derived for stationary growth. It was shown that the quantities are determined by the relative growth velocity RA/RcritA of the vanishing face A with respect to the critical growth velocity RcritA and by the geometry of a crystal expressed by the trigonometric functions of interfacial angles β and γ formed between face A and the adjacent faces. R increases and τ decreases with the increase in RA/RcritA to certain limiting values. The calculations have been verified and illustrated by the experimental results for triclinic potassium bichromate (KBC) crystals. Results enable ones to predict values of velocities of disappearance and lifetimes of undesirable, supplementary faces of any real crystal.  相似文献   

18.
SAXS in situ experiments on the evolution of TMOS solutions during hydrolysis and polycondensation lead to power laws with scaling exponents ≈ 2. It is suggested that this could be the result of the polydispersity of the samples and that only an apparent fractal dimension can be obtained in this way. Kinetic studies tend to indicate that agglomeration in the sol is the result of a diffusion-controlled process.  相似文献   

19.
Growth conditions affect the velocities of disappearance and lifetime of faces of growing crystals. Supersaturation is a factor which causes either an increase or a decrease in velocities of disappearance of faces and their lifetime depending on the mechanism and kinetics of growth of disappearing and adjacent faces. The possible relationships between velocities of disappearance of faces, their lifetime and supersaturation have been derived and discussed.  相似文献   

20.
The diffraction function expressing the dependence of the intensity of the diffracted X-rays on the angle of diffraction ϱ is derived. On the basis of this equation two methods of measuring the microcrystal size in the direction of the normal line onto the beam of coherently diffracting atom planes are elaborated. Further, the methods for measuring the diffraction line enlargement owing to the experimental conditions are given here.  相似文献   

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