Sn-substituted LiMn2O4 thin films prepared by RF magnetron sputtering

The spinel thin films of LiMn₂O₄ and LiSn_0.0125Mn_1.975O₄ prepared by RF magnetron sputtering were studied with focusing on structural and electrochemical properties. The LiSn_0.0125Mn_1.975O₄ thin films showed the superior properties, i.e., a high capacity retention of 94% at the current rate of 5 C after 90 cycles, due to the increase in Mn valence and the decrease in oxygen deficiency. The larger oxygen deficiency in undoped LiMn₂O₄ thin films was confirmed by the increased lattice volume and structural degeneration.     

Hybrid ZnO/polymer thin films prepared by RF magnetron sputtering

Zinc oxide/poly(acrylic acid) (ZnO/PAA) multilayered hybrid films with different layer thicknesses were prepared by radio frequency magnetron sputtering. Zinc peroxide was used as precursor materials for the preparation of ZnO layers, since the zinc peroxide decomposes to ZnO during the film deposition. The films have a high transmittance in the visible region and exhibit visible photoluminescence emission. The band gap energy of the films—determined by the Tauc relationship—decreases with increasing layer thickness (3.40–3.36 eV) due to the increasing crystalline size of the ZnO particles. The morphological investigations showed that a real layered hybrid film structure formed.     

Preparation of the visible light responsive TiO2 thin film photocatalysts by the RF magnetron sputtering deposition method

TiO₂ thin film photocatalysts which could induce photoreactions under visible light irradiation were successfully developed in a single process by applying an ion engineering technique, i.e., the radio frequency (RF) magnetron sputtering deposition method. The TiO₂ thin films prepared at temperatures greater than 773 K showed the efficient absorption of visible light; on the other hand, the TiO₂ thin films prepared at around 573 K were highly transparent. This clearly means that the optical properties of TiO₂ thin films, which absorb not only UV but also visible light, can be controlled by the preparation temperatures of the RF magnetron sputtering deposition method. These visible light responsive TiO₂ thin films were found to exhibit effective photocatalytic reactivity under visible light irradiation (λ > 450 nm) at 275 K for the reductive decomposition of NO into N₂ and N₂O. From various characterizations, the orderly aligned columnar TiO₂ crystals could be observed only for the visible light responsive TiO₂ thin films. This unique structural factor is expected to modify the electronic properties of a TiO₂ semiconductor, enabling the efficient absorption of visible light.     

Physical properties of metal-doped ZnO thin films prepared by RF magnetron sputtering at room temperature

Journal of Solid State Electrochemistry - Transparent thin films of pure ZnO, Ca-doped ZnO (CZO), and Ga-doped ZnO (GZO) were deposited on glass by RF magnetron sputtering. The influence of calcium...     

The photocatalytic properties of amorphous TiO2 composite films deposited by magnetron sputtering

The preparation of amorphous TiO₂ film coupled with various metal-oxide semiconductors and their photocatalytic activities evaluated by photo-degradation of methylene blue and rhodamine B aqueous solution are briefly reviewed. The proposed photoreaction mechanism of the amorphous composite semiconductor and the differences between amorphous TiO₂-based films and crystalline TiO₂ photocatalytic materials in terms of preparation and usage are addressed. The inactive intrinsic amorphous TiO₂ film coupled with various metal oxides were found to gain high photocatalytic activity. These dopants induce forming new energy levels in the band gap of TiO₂ to enhance the charge separation of the photoinduced electrons and holes and extend the light absorption of TiO₂-based photocatalytic films into the visible region. In addition, two different effects of coupling metal oxides have been proved: the introduction of oxides of W, Cr, V, Ag, and Mo can significantly increase the photo-reactivity of amorphous TiO₂ film, while the combination of oxides of Zr, Sn, Sb, Cu, Ta, Fe, and Ni cannot affect the inactivity of pure amorphous TiO₂ film.     

Preparation of nitrogen-substituted TiO2 thin film photocatalysts by the radio frequency magnetron sputtering deposition method and their photocatalytic reactivity under visible light irradiation

Nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts have been prepared by a radio frequency magnetron sputtering (RF-MS) deposition method using a N2/Ar mixture sputtering gas. The effect of the concentration of substituted nitrogen on the characteristics of the N-TiO2 thin films was investigated by UV-vis absorption spectroscopy, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and scanning electron microscopy (SEM) analyses. The absorption band of the N-TiO2 thin film was found to shift smoothly to visible light regions up to 550 nm, its extent depending on the concentration of nitrogen substituted within the TiO2 lattice in a range of 2.0-16.5%. The N-TiO2 thin film photocatalyst with a nitrogen concentration of 6.0% exhibited the highest reactivity for the photocatalytic oxidation of 2-propanol diluted in water even under visible (lambda > or = 450 nm) or solar light irradiation. Moreover, N-TiO2 thin film photocatalysts prepared on conducting glass electrodes showed anodic photocurrents attributed to the photooxidation of water under visible light, its extent depending on wavelengths up to 550 nm. The absorbed photon to current conversion efficiencies reached 25.2% and 22.4% under UV (lambda = 360 nm) and visible light (lambda = 420 nm), respectively. UV-vis and photoelectrochemical investigations also confirmed that these thin films remain thermodynamically and mechanically stable even under heat treatment at 673 K. In addition, XPS and XRD studies revealed that a significantly high substitution of the lattice O atoms of the TiO2 with the N atoms plays a crucial role in the band gap narrowing of the TiO2 thin films, enabling them to absorb and operate under visible light irradiation as a highly reactive, effective photocatalyst.     

Extending the photoresponse of TiO2 to the visible light region: photoelectrochemical behavior of TiO2 thin films prepared by the radio frequency magnetron sputtering deposition method

TiO(2) thin films prepared by a radio frequency magnetron sputtering (RF-MS) deposition method were found to show an enhanced photoelectrochemical response in the visible light region. By controlling the temperature and the gaseous medium during the deposition step, it was possible to control the properties of these films. The photoelectrochemical behavior of the sputtered TiO(2) thin films was compared with that of a commercial TiO(2) sample, and the sputtered films showed higher incident photon to the charge carrier generation efficiency (IPCE of 12.6% at 350 nm) as well as power conversion efficiency (0.33% at 1.84 mW/cm(2)) than the commercial TiO(2) sample. Femtosecond transient absorption spectroscopy experiments have revealed that a major fraction of photogenerated electrons and holes recombine within a few picoseconds, thus limiting photocurrent generation efficiency. The mechanistic insights obtained in the present study should aid in designing semiconductor nanostructures that will maximize the charge separation efficiency and extend the response of the large band gap semiconductor TiO(2) into visible light regions.     

Photocatalytic oxidation of 2-propanol under visible light irradiation on TiO<Subscript>2</Subscript> thin films prepared by an RF magnetron sputtering deposition method

Visible light-responsive TiO₂ (Vis-TiO₂) thin films able to absorb UV and visible light in wavelength regions of 250–600 nm were successfully developed by applying a radio-frequency magnetron sputtering deposition method. These Vis-TiO₂ thin films exhibited high activity for the photocatalytic oxidation of 2-propanol diluted in water even under visible light irradiation (λ ≥ 450 nm). The photocatalytic activity of Vis-TiO₂ thin films was dramatically enhanced by the deposition of Pt particles on the surface. Secondary ion mass spectrometry measurements revealed that Pt particles are distributed from the top surface to the deep bulk of Vis-TiO₂ thin films with a columnar structure. The unique columnar structure of Vis-TiO₂ thin films plays an important role in the high photocatalytic performance.     

Separate evolution of H2 and O2 from H2O on visible light-responsive TiO2 thin film photocatalysts prepared by an RF magnetron sputtering method

Visible light-responsive TiO₂ thin film photocatalysts (Vis-TiO₂) have been prepared on Ti metal foil (Vis-TiO₂/Ti) or ITO glass (Vis-TiO₂/ITO) substrates by a radio-frequency magnetron sputtering (RF-MS) method. The UV–Vis spectra as well as photoelectrochemical performance of Vis-TiO₂ were affected by various calcination treatments such as calcination in air or NH₃. Calcination treatment in NH₃ (1.0 × 10⁴ Pa, 673 K) was particularly effective in increasing the visible light absorption of Vis-TiO₂ as well as in enhancing its photoelectrochemical performance and photocatalytic activity. A novel Vis-TiO₂ thin film photocatalyst (Vis-TiO₂/Ti/Pt) was prepared by an RF-MS method where Vis-TiO₂ was deposited on one side of a Ti metal foil substrate and nanoparticles of Pt were deposited on the other side. The separate evolution of H₂ and O₂ from H₂O could be successfully achieved by using an H-type glass cell consisting of two aqueous phases separated by Vis-TiO₂/Ti/Pt and a proton-exchange membrane. It was found that the rate of the separate evolution of H₂ and O₂ was also dramatically enhanced by calcination treatment of Vis-TiO₂ in NH₃.     

Efficient electrochromic performance of anatase TiO2 thin films prepared by nebulized spray deposition method

Anatase TiO₂ thin films with high optical modulation, better reversibility, fast switching time, and enhanced coloration efficiency were prepared by nebulized spray pyrolysis technique. X-ray diffraction study confirmed the formation of anatase phase TiO₂ in the present work. This inference was substantiated from the Raman active modes of A_1g, 2 B_1g, and 3 E_g corresponding to O–Ti–O bond in TiO₂. The PL emission peak observed at 400 nm is corresponds to the indirect transition (X_1b?→?Γ₃) from the conduction band to the valence band. The average reflectance of TiO₂ thin films was varied from 31 to 20%. The electrochemical study revealed the excellent performance of TiO₂ films with high optical modulation (ΔT?=?61%), fast switching kinetics (t _b ?=?1.6 s, t _c ?=?2.4 s), good coloration efficiency (100 cm² C^?1), and better reversibility (86%). The efficient electrochromic behavior of films may be due to the smooth microstructure nature, which provides an easy pathway for the diffusion and charge transfer process of Li⁺ ions in TiO₂ film matrix. The fast transfer of Li⁺ ion was realized from the electrochemical impedance spectroscopic measurement.     

Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering

Tetragonal tungsten bronze (TTB) films have been synthesised on Pt(111)/TiO₂/SiO₂/Si substrates from Ba₂LnFeNb₄O₁₅ ceramics (Ln = La, Nd, Eu) by RF magnetron sputtering. X-ray diffraction measurements evidenced the multi-oriented nature of films with some degrees of preferential orientation along (111). The dependence of the dielectric properties on temperature and frequency has been investigated. The dielectric properties of the films are similar to those of the bulk, i.e., ε ∼150 and σ ∼10⁻⁶ Ω⁻¹ cm⁻¹ at 1 MHz and room temperature. The films exhibit two dielectric anomalies which are attributed to Maxwell Wagner polarization mechanism and relaxor behaviour. Both anomalies are sensitive to post-annealing under oxygen atmosphere and their activation energies are similar E_a ∼0.30 eV. They are explained in terms of electrically heterogeneous contributions in the films.     

Effect of physical chemistry parameters in photocatalytic properties of TiO2 nanocrystals

We used a new synthesis of TiO₂ anatase 6 nm nanocrystals prepared at room temperature (Hegazy and Prouzet, 2012 [10]) to explore the influence of different physical-chemical parameters on photocatalysis, and bench-tested the material against two commercial powders made of either pure anatase (Sigma?), or composite anatase–rutile particles (P25 Degussa?). The initial as-synthesised material demonstrates a low photocatalytic activity, which is greatly improved after thermal activation as a result of improved crystallinity without any drastic change in crystal size. The influence of several other parameters was studied, the resulting tests being compared with commercial products. The cumulative improvement provided by these different parameters led finally to a material that exhibits a higher photocatalysis compared to commercial anatase, and similar to the commercial material usually used for reference (P25). This study, which can apply to other titania materials, illustrates how the post-treatment and process adaptation can help to optimise an initial material.     

Electrochemical kinetics of nanosized Ag and Ag2O thin films prepared by radio frequency magnetron sputtering

Ag and Ag₂O thin films have been prepared by radio frequency magnetron sputtering on Cu substrates and have been characterized by X-ray diffraction, scanning electron microscope and atomic force microscope. The electrochemical performance of the thin films has been studied by galvanostatic cycling and cyclic voltammetry. The potential dependence of Li-ion chemical diffusion coefficients, [(D)\tilde]_\textLi {\widetilde{D}_{\text{Li}}} , of the films has been determined by galvanostatic intermittent titration technique and electrochemical impedance spectroscopy. It is found that Li-ion chemical diffusion coefficients of the Ag film range from 10⁻¹⁶ to 3 × 10⁻¹⁴ cm² s⁻¹. The Ag/Li₂O composite that is formed from Ag₂O after the first cycle exhibits higher [(D)\tilde]_\textLi {\widetilde{D}_{\text{Li}}} values than the Ag film, especially at a low Li-intercalation content. The phase transitions in the two-phase region cause a significant decrease of chemical diffusion coefficients.     

Characterization of TiO2 nanotube arrays prepared via anodization of titanium films deposited by DC magnetron sputtering

Highly ordered TiO₂ nanotube arrays were fabricated on a conducting glass substrate in NH₄HF₂/glycol electrolyte via anodization of titanium film which was deposited by direct current magnetron sputtering (DCMS) at different temperatures. The results showed that Ti films with good homogeneity and high denseness could be formed under the conditions Ar pressure 0.35 Pa, direct current 3.5 A, and 2 h at 300 °C. Characterization of the TiO₂ nanotube arrays was investigated comparatively, by altering anodization time. The surface morphology of the samples changed as the anodization time was prolonged from 10 to 150 min at 30 V. The TiO₂ thin film was amorphous and could be transformed into anatase by annealing at 450 °C. On the basis of UV?Cvisible transmission spectra the bandgap of the thin film was calculated to be 3.12 eV, and its tail extended to 2.6 eV.     

Properties of ITO films prepared by reactive magnetron sputtering

Indium tin oxide (ITO) thin films were deposited by mid frequency pulsed dual magnetron sputtering using a metallic alloy target with 10 wt.% tin in an atmosphere of argon and oxygen. The aim of the work was to study the interdependence of structural, electrical and optical properties of ITO films deposited in the reactive and transition target mode, respectively. The deposition rate in the transition mode exceeds the deposition rate in the reactive mode by a factor of six, a maximum value of 100 nm·m min⁻¹ could be achieved. This corresponds to a static deposition rate of 200 nm min⁻¹. The lowest electrical resistivity of 1.1·10⁻³ Ω cm was measured at samples deposited in the high oxygen flow range in the transition mode. The samples show a good transparency in the visible range corresponding to extinction coefficients being below 10⁻². X-ray diffraction was used to characterise crystalline structure as well as film stress. ITO films prepared in the transition mode show a slightly preferred orientation in (211) direction, whereas films deposited in the reactive mode are strongly (222) oriented. Compared to undoped In₂O₃ all samples have an enlarged lattice. The lattice strain perpendicular to the surface is about 0.8% and 2.0% for films grown in the transition and the reactive mode, respectively. Deposition in the transition mode introduces a biaxial film stress in the range of −300 MPa, while stress in reactive mode samples is −1500 MPa.     

自组装成膜法制TiO2薄膜

采用有机分子自组装(Self-Assembly)成膜技术将硅烷偶联剂[(CH3O)3Si(CH2)3SH]组装在普通的玻片表面, 得到二维有的单层有机膜, 并将膜端基(SH)原位氧化为磺酸基(SO3H)。利用该功能基(SO3H)的吸附性, 从四氯化钛的水溶液中淀积制得了TiO2薄膜。X射线光电子能谱(XPS)和原子力显微镜(AFM)等研究显示, TiO2薄膜是均匀和连续的, 具有良好的透明性。     

Internal structure of nanoporous TiO2/polyion thin films prepared by layer-by-layer deposition

The internal structure of porous TiO2 films prepared by electrostatic layer-by-layer deposition was investigated. The films were prepared by alternate dipping of solid substrates into dispersions of TiO2 nanoparticles and polycations, polyanions, or pure buffer solution, respectively. The surface charge of the amphoteric TiO2 particles was controlled by the pH of the aqueous dispersions. The morphology of the film surface was investigated by means of scanning electron microscopy. It was found that the surface roughness strongly depends on the polymeric material used for the deposition process but is independent of the ionic strength of the solution or the molecular weight of the polyions. The samples with rough surfaces feature strong light scattering. The porosity and internal structure of the TiO2/polyelectrolyte films were investigated by adsorption/desorption of dye molecules. A crude estimate yields an internal surface that is up to 160 times the plane surface of the substrate for a film thickness of 1 microm. The composition of the films was investigated by X-ray photoelectron spectroscopy (XPS). Detection of the XPS signal after each deposition step of the first three dipping cycles shows a significant increase of the relative surface coverage of Ti after the TiO2 deposition step and of PSS after the PSS deposition step. For later dipping cycles, such an increase was also detectable but less prominent.     

Structural and optical properties of TiO2 thin films prepared by spin coating

Transparent semiconducting thin films of titanium oxide (TiO₂) were deposited on glass substrates by the sol–gel method and spin-coating technique. The physical properties of the prepared films were studied as a function of the number of spun-cast layers. The microstructure and surface morphology of the TiO₂ films were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM), with respect to the film thickness. The XRD analysis reveals that the films are polycrystalline with an anatase crystal structure and a preferred grain orientation in the (101) direction. The morphological properties were investigated by AFM, which shows a porous morphology structure for the films. The optical properties of the films were characterized by UV–Visible spectrophotometry, which shows that the films are highly transparent in the visible region and their transparency is slightly influenced by the film thickness, with an average value above 80 %. The dependence of the refractive index (n), extinction coefficient (k), and absorption coefficient (α) of the films on the wavelength was investigated. A shift in the optical band gap energy of the films from 3.75 to 3.54 eV, as a function of the film thickness, has been observed.     

Effect of Pt loading on the photocatalytic reactivity of titanium oxide thin films prepared by ion engineering techniques

Platinum-loaded titanium oxide thin-film photocatalysts were prepared by using an ionized cluster beam (ICB) deposition method and a RF magnetron sputtering (RF-MS) deposition method as dry processes. From the results of the photocatalytic oxidation of acetaldehyde with O₂ under UV light irradiation, small amounts of Pt loading (less than 10 nm film thickness) were found to dramatically enhance the photocatalytic reactivity. However, when TiO₂ thin films were loaded with relatively larger amounts of Pt (more than 30 nm as the film thickness), the photocatalytic reactivity became lower than for the pure TiO₂ thin films. Moreover, investigations of the ratio of Pt loaded onto the surface of the thin film catalysts by XPS measurements revealed that the small amounts of Pt loaded exist as very small clusters working to efficiently enhance the charge separation, whereas, large amounts of Pt covers the entire surface of the TiO₂ thin films, resulting in a decrease of the photocatalytic reactivity.