全反射X射线荧光光谱法同时测定地气样品中锰,镍,铜,锌,铅,铷和锶

论述了利用自行研制的有３个反射体的全反射分析装置，用钼靶Ｘ光管激光发，以Ｓｅ为内标，同时测定了地气样品中Ｍｎ，Ｎｉ，Ｃｕ，Ｚｎ，Ｐｂ，Ｒｂ和Ｓｒ等元素。对纳克级元素含量，方法的精密度为７．２％，绝对检出限为１０＾１０－１０＾－１１ｇ。其分析结果的准确度与无火焰原子吸收相符。     

可溶性共轭聚席夫碱的合成、表征及电性能

本文以对苯二胺分别与乙二醛、丁二酮、３，４－己二酮和４，５－辛二酮缩聚合成了四种主链结构相同而侧基各异的新颖共轭性聚席夫碱．采用红外光谱和元素分析等方法对聚合物进行了表征．发现带有侧烷基的共轭性聚席夫碱能溶于一般有机溶剂；不同侧基的聚席夫碱溶解性是：两基聚席夫碱＞乙基聚席夫碱＞甲基聚度夫碱．测定了四种共轭聚席夫碱的本征导电率及其与温度的关系，结果表明，聚合物具有半导体性质．当聚合物以碘掺杂后，导电率可从１０－１１－１０－１２Ｓ／ｃｍ增加到１０－３－１０－４Ｓ／ｃｍ．探讨了共轭聚合物的侧基取代对掺杂后导电性的影响．     

铸铁中硅、磷、钼等九种元素的ICP-AES测定

采用ＩＣＰ－ＡＥＳ对铸铁中硅、磷、钛、钼、镍、锰、铬、铝和铜杂质的测定进行了研究。考察了铁对待测元素的干扰情况，发现铁对铜有光谱尾翼干扰，干扰系统为１．０×１０－５。采用不同的酸溶解样品时，硅的测定结果有显著的差别。     

氢化物发生原子荧光光谱法测定临床样品微量砷和硒

研究了氢化物原子荧光法测定临床床样品全血，血清，胎盘，头发，指甲和尿液中微量Ａｓ和Ｓｅ的方法。线性范围为Ａｓ１．３＊１０＾－９－２．５＊１０＾－７ｇ／ｍＬ，Ｓｅ２．８＊１０＾１０－７．５＊１０＾－８ｇ／ｍＬ；相对标准偏差（ｎ＝１３）Ａｓ２．６－３．６％，Ｓｅ２．８－４．２％；Ａｓ、Ｓｅ的标准加入回收率为９６．７－１０４．２％，用于６种临床样品中Ａｓ、Ｓｅ测定，获得满意的结果。     

高纯金中杂质元素的电感耦合高频等离子体原子发射光谱法测定

研究了萃取金后用ＩＣＰ－ＡＥＳ法测定微量Ｐｔ、Ｐｄ、Ｒｈ、Ｉｒ、Ａｇ等２８个杂质元素的方法。元素间的干扰用等效浓度法校正。杂质元素标准加入回收率为７５％～１１８％；相对标准偏差为４．３％～２０％；取样量为２．５ｇ时，测定下限为５×１０＾５％～２×１０＾－４％。     

ICP-AES 法测定 RZnAl5RE 合金中的镧、铈、铁、铝、铅、镉

采用ＩＣＰ－ＡＥＳ测定了ＲＺｎＡｌ５ＲＥ合金中的Ｌａ、Ｃｅ、Ｆ３、Ａｌ、Ｐｂ、ＣＤ元素含量。考察了基体及无机酸浓度对６种元素线强度的影响。选择了仪器工作条件,检出限在０．０３～１．００μｇ／Ｌ之间,加标回收率为９３％～１０８％,相对标准偏差小于１２．６８％（ｎ＝１０）。     

在线流动注射-巯基棉分离富集-ICP-AES 测定粮食中铜、镉、铅的研究

研究了巯基棉对待测元素Ｃｕ、Ｃｄ、Ｐｂ的预富集性能,并与改进的流动注射法（双流路）相结合,建立了一套新型、高效的在线流动注射－巯基棉分离富集－ＩＣＰ－ＡＥＳ分析体系,提高了分析方法的频率和灵敏度。Ｃｕ、Ｃｄ、Ｐｂ各元素的检出限分别为０．７μｇ／Ｌ、０．５μｇ／Ｌ和２．９μｇ／Ｌ。１０次的相对标准偏差分别为１．７１％、２．９４％和４．４９％。回收率为８７．８％～１０２．４％。     

水杨醛缩-5-碘-8-氨基喹啉的合成及荧光光度法测定煤渣中痕量镓的研究

报道了新息夫碱试剂水杨醛缩－５－碘－８－氨基喹啉（ＳＡＩＡＱ）的合成。用元素分析、红外光谱法确定了其结构。测定了ＳＡＩＡＱ的酸度常数Ｋａ１＝２．４０×１０－４，Ｋａ２＝２．９８×１０－９。在ｐＨ３．５０～５．００范围内ＳＡＩＡＱ与Ｇａ３＋形成稳定的荧光螯合物，且在λｅｘ／λｅｍ＝４２８ｎｍ／５４０ｎｍ产生强烈荧光。其荧光强度与Ｇａ３＋的浓度在１．５μｇ／Ｌ～２６０μｇ／Ｌ范围内呈线性关系，检出限１．５μｇ／Ｌ，考察了共存离子的影响，选择性高。已应用于煤渣中痕量镓的分析。     

水杨醛缩—5—碘—5—氨基喹啉的合成及荧光光度法测定煤渣中痕量镓的研究

报道了新息夫碱试剂水杨醛缩－５－碘－５－氨基喹啉（ＳＡＩＡＱ）的合成。用元素分析、红外光谱法确定了其结构。测定了ＳＡＩＡＱ的酸度常数Ｋａ１＝２．４０×１０＾－４，Ｋａ２＝２．９８×１０＾－９。在ｐＨ３．５０￣５．００范围内ＳＡＩＡＱ与Ｇａ＾３＋形成稳定的荧光螯合物，且在λｅｘ／λｅｍ＝４２８ｎｍ／５４０ｎｍ产生强烈荧光。其荧光强度与Ｇａ＾３＋的浓度在１．５μｇ／Ｌ￣２６０μｇ／Ｌ范围内呈线性关系，     

激光探针电感耦合等离子体质谱分析全岩碱融玻璃的微量元素

建立了一种利用激光探针电感耦合等离子体质谱直接分析岩石碱融玻璃的微量元素分析方法；选用＾５５Ｍｎ作内标，分别以ＧＳＲ－１和ＧＳＲ－３为外标测定ＪＧ－１ａ和ＪＢ－３中的３３个微量元素；该分析方法的检出限为１ｎｇ／ｇ－１２０μｇ／ｇ。单点分析结果显示，除Ｓｃ，Ｎｉ，Ｇａ，Ｎｂ，Ｈｆ，Ｔａ及Ｇｄ，Ｔｍ，Ｌｕ等重稀土元素２人余元素的分析精度均好于１０％，准确度在±１０％以内；９次测量的平均值中，绝大多数的     

Recent results of synchrotron radiation induced total reflection X-ray fluorescence analysis at HASYLAB,beamline L

At the Hamburger Synchrotronstrahlungslabor (HASYLAB), Beamline L, a vacuum chamber for synchrotron radiation-induced total reflection X-ray fluorescence analysis, is now available which can easily be installed using the adjustment components for microanalysis present at this beamline. The detector is now in the final version of a Vortex silicon drift detector with 50-mm² active area from Radiant Detector Technologies. With the Ni/C multilayer monochromator set to 17 keV extrapolated detection limits of 8 fg were obtained using the 50-mm² silicon drift detector with 1000 s live time on a sample containing 100 pg of Ni.Various applications are presented, especially of samples which are available in very small amounts: As synchrotron radiation-induced total reflection X-ray fluorescence analysis is much more sensitive than tube-excited total reflection X-ray fluorescence analysis, the sampling time of aerosol samples can be diminished, resulting in a more precise time resolution of atmospheric events. Aerosols, directly sampled on Si reflectors in an impactor were investigated. A further application was the determination of contamination elements in a slurry of high-purity Al₂O₃. No digestion is required; the sample is pipetted and dried before analysis. A comparison with laboratory total reflection X-ray fluorescence analysis showed the higher sensitivity of synchrotron radiation-induced total reflection X-ray fluorescence analysis, more contamination elements could be detected. Using the Si-111 crystal monochromator also available at beamline L, XANES measurements to determine the chemical state were performed. This is only possible with lower sensitivity as the flux transmitted by the crystal monochromator is about a factor of 100 lower than that transmitted by the multilayer monochromator. Preliminary results of X-ray absorption near-edge structure measurements for As in xylem sap from cucumber plants fed with As(III) and As(V) are reported. Detection limits of 170 ng/l of As in xylem sap were achieved.     

Detection of Casting Material on Historical Violins by Infrared Spectroscopy and Total Reflection X-Ray Fluorescence Spectrometry

Abstract

Infrared spectroscopy and total reflection X-ray fluorescence spectrometry are used for the analysis of historical varnishes. Total reflection X-ray fluorescence spectrometry is used in the analysis of the elemental composition; infrared spectroscopy is used to determine the inorganic and organic molecules of the binding media, pigments and additives. On historical violins made by A. Guarneri and L. Widhalm silicon and tin were found by total reflection X-ray fluorescence spectrometry. Silicon was proved to be present in the form of silicon rubber by infrared spectroscopy. A further experiment confirmed that the treatment of a violin with silicon rubber casting material is detectable.     

Determination of trace elements in macrozoobenthos samples by total reflection X-ray fluorescence analysis

The paper describes the analysis of a set of metals in macrozoobenthos samples from a river in Western Austria by using total reflection X-ray fluorescence analysis (TXRF). Metal concentrations in aquatic insect larvae from an industrially contaminated site are significantly higher than in larvae from a reference site. Furthermore, species-specific differences in metal accumulation were found. TXRF allows multi-element analysis of very low metal concentrations in very small sample masses (e.g. single aquatic insect larvae with a dry weight of only a few milligrams). Due to its multi-element capability and high sensitivity total reflection X-ray fluorescence analysis is a valuable tool for biomonitoring studies of metal contamination in aquatic ecosystems.     

Photovoltaic substrates and hafnium based gate dielectrics characterized with total reflection X-ray fluorescence

In this study, the capabilities of total reflection X-ray fluorescence spectroscopy characterization for both the photovoltaic industry and advanced semiconductor processing were investigated. Analysis of single crystal silicon coupon samples from various cleans during photovoltaic processing showed that certain clean steps were more effective in removing trace metal contamination. The multicrystalline photovoltaic silicon sample also had detected, but difficult to quantify, metallic contamination. Changes in the silicon dioxide content of hafnium silicate films used in semiconductor processing were also characterized by total reflection X-ray fluorescence spectroscopy analysis.     

Development of off-line layer chromatographic and total reflection X-ray fluorescence spectrometric methods for arsenic speciation

Rapid and low cost off-line thin layer chromatography–total reflection X-ray fluorescence spectrometry and overpressured thin layer chromatography–total reflection X-ray fluorescence spectrometry methods have been developed for separation of 25 ng of each As(III), As(V), monomethyl arsonic acid and dimethylarsinic acid applying a PEI cellulose stationary phase on plastic sheets and a mixture of acetone/acetic acid/water = 2:1:1 (v/v/v) as eluent system. The type of eluent systems, the amounts (25–1000 ng) of As species applied to PEI cellulose plates, injection volume, development distance, and flow rate (in case of overpressured thin layer chromatography) were taken into consideration for the development of the chromatographic separation. Moreover, a microdigestion method employing nitric acid for the As spots containing PEI cellulose scratched from the developed plates divided into segments was developed for the subsequent total reflection X-ray fluorescence spectrometry analysis. The method was applied for analysis of root extracts of cucumber plants grown in As(III) containing modified Hoagland nutrient solution. Both As(III) and As(V) were detected by applying the proposed thin layer chromatography/overpressured thin layer chromatography–total reflection X-ray fluorescence spectrometry methods.     

同步辐射白光全反射XRF在痕量元素检测的初步应用研究

叙述了同步辐射白光全反射Ｘ射线荧光分析的实验装置，给出了几种标准物质ＴＸＲＦ实验的检出限，并对实验结果进行了讨论。     

Determination of low atomic number elements at trace levels in uranium matrix using vacuum chamber total reflection X-ray fluorescence

Determinations of low atomic number elements Na, Mg and Al present at trace concentrations in uranium matrix were made by vacuum chamber total reflection X-ray fluorescence spectrometer for the first time. For this purpose, synthetic samples of uranium with known amounts of these low atomic number elements were prepared by mixing different volumes of their solutions with U solution of high purity. The concentrations of these elements in the samples were in the range of 100–300 μg/g with respect to uranium and 10–20 μg/mL in the solutions. Major matrix uranium was separated by solvent extraction with 30% solution of tri-n-butyl phosphate in dodecane. After the solvent extraction, aqueous phase containing trace elements was mixed with Sc internal standard and the samples were analyzed by vacuum chamber total reflection X-ray fluorescence spectrometer having a Cr Kα excitation source. The total reflection X-ray fluorescence results obtained, after blank corrections, indicated an average deviation of 14% from the calculated concentrations of these low atomic number elements on the basis of their preparation. However, the total reflection X-ray fluorescence determined concentration of Mg was exceptionally lower than the calculated concentration in two samples. These studies have shown that vacuum chamber total reflection X-ray fluorescence is a promising technique for the determination of low atomic number elements in uranium matrix after its separation.     

Comparison of conventional and total reflection excitation geometry for fluorescence X-ray absorption spectroscopy on droplet samples

X-ray absorption fine structure (XAFS) experiments in fluorescence mode have been performed in total reflection excitation geometry and conventional 45°/45° excitation/detection geometry for comparison. The experimental results have shown that XAFS measurements are feasible under normal total reflection X-ray fluorescence (TXRF) conditions, i.e. on droplet samples, with excitation in grazing incidence and using a TXRF experimental chamber. The application of the total reflection excitation geometry for XAFS measurements increases the sensitivity compared to the conventional geometry leading to lower accessible concentration ranges. However, XAFS under total reflection excitation condition fails for highly concentrated samples because of the self-absorption effect.     

Review on grazing incidence X-ray spectrometry and reflectometry

Grazing incidence X-ray techniques are now widely used for surface and thin film analysis. The present article overviews the recent advancement since 1993 of the grazing incidence X-ray spectrometry and reflectometry in both theoretical and experimental aspects. Every current topic related to the total reflection X-ray fluorescence spectrometry (TXRF) is described in detail through the introduction of numerous published works on the application in the various fields of the science and industrial technologies. Recent rapid growth in diffuse scattering at grazing incidence as well as in specular reflection is another important scope. The combined measurements of different grazing incidence X-ray techniques might be a future trend for realizing further advanced analysis of the surface and interfaces of materials.     

Detection limit calculations for the total reflection techniques of X-ray fluorescence analysis

In this work, theoretical calculations of detection limits for different total reflection techniques of X-ray fluorescence analysis are presented. Calculations include grazing incidence (TXRF) and gracing emission (GEXRF) conditions. These calculations are compared with detection limits calculated for conventional X-ray fluorescence (XRF). In order to compute detection limits, Shiraiwa and Fujino's model was used to calculate X-ray fluorescence intensities. This model makes certain assumptions and approximations to achieve the calculations, especially in the case of the geometrical conditions of the sample, and the incident and takeoff beams. Nevertheless, the calculated data of detection limits for conventional XRF and total-reflection XRF show a good agreement with previous results. The model proposed here allows us to analyze the different sources of background and the influence of the excitation geometry, which contribute to a better understanding of the physical processes involved in the XRF analysis by total reflection. Finally, a comparison between detection limits in total-reflection analysis at grazing incidence and at grazing emission is carried out. Here, a good agreement with the theoretical predictions of the Reciprocity Theorem is found, showing that, in theory, detection limits are similar for both techniques.