The strain relaxation in a lattice-mismatched heterostructure

Strain relaxation phenomena of the heteroepitaxial lattice-mismatched semiconductors have been investigated. The relationship between the residual in-plane strain and the width of the misfit cell was obtained geometrically. The residual in-plane strain was calculated for various film thicknesses by using the energy minimization theory on the misfit cell in the In_xGa_1−xAs/GaAs(1 0 0) heterostructure system. A generalized strain relaxation model is presented on the basis of the energy minimization theory.     

Fabrication and characterization of GaAs quantum well buried in AlGaAs/GaAs heterostructure nanowires

We developed a growth method for forming a GaAs quantum well contained in an AlGaAs/GaAs heterostructure nanowire using selective-area metal organic vapor phase epitaxy. To find the optimum growth condition of AlGaAs nanowires, we changed the growth temperature between 800 and 850 °C and found that best uniformity of the shape and the size was obtained near 800 °C but lateral growth of AlGaAs became larger, which resulted in a wide GaAs quantum well grown on the top (1 1 1)B facet of the AlGaAs nanowire. To form the GaAs quantum well with a reduced lateral size atop the AlGaAs nanowire, a GaAs core nanowire about 100 nm in diameter was grown before the AlGaAs growth, which reduced the lateral size of AlGaAs to roughly half compared with that without the GaAs core. Photoluminescence measurement at 4.2 K indicated spectral peaks of the GaAs quantum wells about 60 meV higher than the acceptor-related recombination emission peak of GaAs near 1.5 eV. The photoluminescence peak energy showed a blue shift of about 15 meV, from 1.546 to 1.560 eV, as the growth time of the GaAs quantum well was decreased from 8 to 3 s. Transmission electron microscopy and energy dispersive X-ray analysis of an AlGaAs/GaAs heterostructure nanowire indicated a GaAs quantum well with a thickness of 5−20 nm buried along the 〈1 1 1〉 direction between the AlGaAs shells, showing a successful fabrication of the GaAs quantum well.     

On the early deposition of GaP onto GaAs

It has been examined whether the presence of liquid Ga produced by the thermal decomposition of the GaAs substrate could influence the deposition of GaP. It was found that the surface tension of liquid Ga changed quickly and sensitively with small initial changes of the atmosphere in the reactor. Model experiments explained why and when the presence of free HCl is disadvantageous for the process.     

Liquid phase epitaxy of AlxGa1−xP on GaP and its application to double heterostructure light modulators

Single- and double-heterojunction structures of Al_xGa_1?xP/GaP were grown by liquid phase epitaxy and their opto-electronic properties were characterized. Using a starting growth temperature of 900°C, a background impurity level in undoped Al_0.5Ga_0.5P of 1 × 10¹⁶ cm^-3 (p-type) is obtained. The growth rate of Al_xGa_1?xP was very low. An almost intrinsic layer exists at the p-n Al_xGa_1?xP/GaP heterojunction interface due to the interdiffusion of the dopants. By using a rotating slide liquid phase epitaxial growth technique, we have made a high efficiency light modulator from a Al_xGa_1?xP/GaP double heterostructure. The employment of a dummy crystal resulted in very good reproducibility of the GaP waveguide layer thickness. Light is well confined in the GaP layer and a voltage difference, V_π, of 6 V is enough to obtain the phase difference, π, between TE and TM modes.     

Raman scattering study of dopant homogeneity in GaP and GaAs single crystals

Application of Raman scattering as a non-destructive method with high spatial resolution suitable for the determination of charge carrier profiles connected with dopant segregations in polar semiconductors is reported. Single crystals of GaP and GaAs are investigated. The results are in good agreement with electrical measurements.     

Aspects of low heterostructure symmetry in (311)A (In,Ga)As/GaAs

We investigate the structural and optical properties of (In,Ga)As/GaAs heterostructures induced by the low symmetry of the [311]A orientation. High-resolution X-ray diffraction (HRDXD) measurements reveal the existence of a shear-strained unit cell. The onset of relaxation in heavily strained structures leads to pronounced anisotropies and to satellite splittings in the X-ray diffraction patterns. Optical investigations indicate that the impact of the piezoelectric fields on the ground state energy is compensated for by In segregation. Nevertheless these fields cause a pronounced reduction of the excitonic binding energy in the (311)A structures.     

InGaAlP/InGaP多量子阱中的红外向可见光的上转换

利用808nm激光二极管泵浦的Nd:YAG晶体发出的1064nm皮秒激光器实现了InGaAlP多量子阱材料的红外1064nm向可见光波长660nm、625nm、580nm的上转换,并且通过条纹相机收集的时间分辨表征了此材料的上转换激发态的寿命.波长1064nm向625nm的上转换激发态寿命约为5ns,而1064nm向660nm的上转换激发态寿命约为7ns.通过双光子原理解释了此现象.     

ZnSe/ZnCdSe heterostructure nanowires

The authors report the growth of high density ZnSe/ZnCdSe heterostructure nanowires on oxidized Si substrate. It was found that the as-grown nanowires were tapered with mixture of cubic zinc-blende and hexagonal wurtzite structures. It was also found that photoluminescence intensities observed from these ZnSe/ZnCdSe heterostructure nanowires were much larger than observed from the homogeneous ZnSe nanowires. Furthermore, it was found that activation energies for the nanowires with well widths of 6, 12, 18 and 24 nm were 22, 41, 67 and 129 meV, respectively.     

纳米GaP粉体在水溶液中的分散性能及其PVP复合薄膜的制备

采用三种不同类型的分散剂对纳米磷化镓(GaP)粉体进行分散,并用测量滤液吸光度的方法来比较分散效果;测定了纳米GaP粉体的等电点,以及采用十二烷基苯磺酸钠分散时的Zeta电位,并初步制备了纳米GaP /聚乙烯吡咯烷酮(PVP)复合薄膜.结果表明,分散剂的选择、分散剂的浓度、pH值都对分散效果有着重要的影响;制备的纳米GaP / PVP复合薄膜具有良好的可见光透光性和一定的紫外线吸收性能.     

CdZnTe(110)面表面原子弛豫和表面态的研究

通过真空Ar+离子刻蚀获得理想清洁的(110)表面,采用低能电子衍射(LEED)观察了(110)面表面原子结构,观察到(110)面表面未发生重构.采用光电子能谱技术验证了(110)面表面原子结构发生了弛豫.采用角分辨光电子谱(angle-resolved photoemission spectropy)实验测量出在费米能级以下0.9eV处存在峰宽约为0.8eV的表面态.并估算出其表面电荷密度约为6.9×1014cm-2,亦即表面Te和Cd(Zn)原子各有一个悬键.     

四方相区NBT-KBT无铅铁电介电弛豫与铁电相变研究

本文研究了具有四方结构的(Na1-xKx)0.5Bi0.5TiO3体系中x＝0.22,0.26和0.30陶瓷材料不同温度下的电滞回线,结合变温XRD和介电温谱分析,发现该体系四方结构的组成为反铁电体,但紧靠准同型相界的四方结构由于场诱导下引起的反铁电-铁电相变,表现出铁电体特性,材料在升温过程中由于反铁电宏畴向微畴的转变导致了介电峰的产生,且在介电温谱上表现出强烈的介电常数-频率依赖性,为弛豫铁电体特征.     

CBE growth of GaAs/GaAs, GaAs/Si and AlGaAs/GaAs using TEG, AsH3 and amine-alane precursors

The growth of high quality AlGaAs by CBE has been limited by the high levels of carbon and oxygen contamination. The use of alane based precursors offers a significant reduction in such contamination. We report for the first time the CBE growth of Al_xGa_1−xAs from triethylgallium, dimethylethylamine-alane and arsine, and compare with. growth from triethylgallium, trimethylamine-alane and arsine. Some preliminary results of work on the CBE growth of GaAs on silicon will also be reported.     

Phase diagram of growth mode for the SiGe/Si heterostructure system with misfit dislocations

The strain, surface and interface energies of the SiGe/Si (SiGe grown on Si) heterostructure system with and without misfit dislocations were calculated for the Frank–van der Merwe (FM), Stranski–Krastanov (SK) and Volmer–Weber (VW) growth modes essentially based on the three kinds of fundamental and simple structures. The free energies for each growth mode were derived from these energies, and it was determined as a function of the composition and layer thickness of SiGe on Si. By comparison of the free energies, the phase diagrams of the FM, SK and VW growth modes for the SiGe/Si system were determined. The (1 1 1) and (1 0 0) reconstructed surfaces were selected for this calculation. From the phase diagrams, it was found for the growth of SiGe on Si that the layer-by-layer growth such as the FM mode was easy to be obtained when the Ge composition is small, and the island growth on a wetting layer such as the SK mode was easy to be obtained when the Ge composition is large. The VW mode is energetically stable in the Ge-rich compositional range, but it is difficult for the VW mode to appear in the actual growth of SiGe on Si because the VW region is right above the SK region. The regions of the SK and VW modes for the (1 1 1) heterostructure are larger than those for the (1 0 0) one because the strain energy of the (1 1 1) face is larger than that of the (1 0 0) face. The regions of the SK and VW modes for the heterostructure with misfit dislocations are narrower than those for the one without misfit dislocations because the strain energy is much released by misfit dislocations. The phase diagrams roughly explain the behavior of the FM and SK growth modes of SiGe on Si.     

On the mechanism of chemical polishing of GaAs crystals

In order to establish reproducible conditions for chemical lap polishing of GaAs with NaOCl solutions, containing also OH⁻- and CO -ions, the mechanism of dissolution was investigated using the rotating disk arrangement. In solutions with excess OCl⁻ concentrations likewise diffusion and a reaction of the first order with respect to OH⁻ and CO, complexing agents for Ga-ions, control the dissolution rate, and the surfaces of the wafers are polished. OH⁻ and CO₃^2– concentrations in excess with respect to OCl⁻ lead to rate determining OCl⁻ diffusion and to irregularly polished or film covered surfaces. Diffusion constants for OH⁻, CO and OCl⁻ are given.     

Study on the possibility of native oxide removal from GaP and GaAs surface by etching,using model experiments

Crystallites of α-Ga₂O₃, β-Ga₂O₃, GaOOH, GaPO₄ and an amorphous phase have been detected previously on chemically etched GaP- and GaAs surfaces. The same compounds were prepared separately and submitted to solubility study, applying several etchants used in etching practice. It could be observed that the solubility of gallium oxides decreases as the chemically bound water is diminished, the anhydrous β-Ga₂O₃ being almost insoluble. As the same poorly soluble oxide forms were found on etched GaP and GaAs surfaces, the difficulties occurring in etching practice can be connected with their presence.     

Transmission electron microscopy study of hexagonal GaN film grown on GaAs (0 0 1) substrate by using AlAs nucleation layer

Hexagonal gallium nitride (h-GaN) films have been grown on AlAs nucleation layer by using radio frequency (RF) plasma source-assisted molecular beam epitaxy on GaAs (0 0 1) substrate. Transmission electron microscopy (TEM) techniques are used to characterize such h-GaN epilayers. TEM results show that (0 0 0 1) atom planes of h-GaN are parallel to (0 0 1) atom planes of the GaAs substrate. Defects, such as stacking faults and dislocations, have also been observed.     

Formation mechanism of InxGa1−xAs bridge layers on patterned GaAs substrates

The formation mechanism of In_xGa_1−xAs (x=0.06) bridge layers on patterned GaAs (1 1 1)B substrates using liquid-phase epitaxy has been investigated. For this (i) the effect of density gradient in the solution on the formation of bridge layer and (ii) growth of bridge layer on 1 1 0 line-seed-substrates were studied. The convection induced by destabilizing density gradient in the solution led to an increase of lateral growth rate of the InGaAs bridge layers on a substrate mounted on the upper portion of the solution. However, it did not have any significant effect on the formation of the bridge layers. The formation of bridge layer on 1 1 0 line-seed-substrate took place only for the {1 1 1}B growth fronts, which indicated that “Berg effect” is responsible for the formation of bridge layers.     

Impedance analysis and high temperature conduction mechanism of flux grown Pb(Zn1/3Nb2/3)0.91Ti0.09O3 single crystal

The electrical properties of Pb(Zn_1/3 Nb_2/3)_0.91Ti_0.09O₃ single crystals over a wide range of frequencies (20 Hz to 2 MHz) and temperature (30 to 490 °C) were studied using impedance spectroscopic technique. A strongly frequency dependant Debye type relaxation process in crystals was observed. The activation energy for relaxation was found to be 1.72 eV. The nature of Cole‐Cole plot reveals the contribution of only grain (bulk) effect in the sample. The temperature dependant conductivity was found to different in different temperature regions, which shows the presence of different carrier for conduction. The activation energy for conduction in the order of 1.69 eV suggested that the conduction process in higher temperature region is governed by the presence of lead vacancy defect in the sample. Further, the negative temperature thermistor behaviour of the system was explored and various associated parameters were calculated. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of Al addition on the crystallization of a-AlxSi1−x (0.025 x 0.100) by electron-beam irradiation

Si crystals and nano-rods were formed in Al-added amorphous Si films (a-Al_xSi_1−x; 0.025 x 0.100) by the irradiation of a focused electron-beam; the films were in situ heated to be kept at 400 °C and the current density of the electron-beam was 15.7 pA/cm². The size, shape, and concentration of the Si crystallites were varied sensitively with the Al content as well as the irradiation time. Under the electron-beam irradiation, crystallization occurred to produce polycrystalline phases in the a-Al_0.025Si_0.975 film, while rod-shaped Si nanostructures were formed in the a-Al_0.050Si_0.950 and a-Al_0.100Si_0.900 film. It is evident that the removal of Al and as a result the atomic rearrangements and/or local restructuring in the Al/a-Si film are critically affected by the electron-beam irradiation, which lead to the local crystallization and growth of Si nanocrystallites.     

Growth and characterization of GaP and GaAs1−xPx

The minority carrier lifetime at low and high excitation densities was determined in VPE layers of GaP and GaAs_?0.2 P_?0.8. The lifetime at high excitation densities, having a value up to ∽350 ns, is one to two orders of magnitude larger than the lifetime at low excitation densities. It is shown that impurities are involved in some saturable killer centres dominating at low excitation densities. In the case of the largest values of the minority carrier lifetime and at a dislocation density of > 10⁵ cm^?2, the non-radiative recombination at high excitation densities is shown to occur at dislocations; at lower values of the minority carrier lifetime the killer action may be due to microprecipitates. These findings also hold for LPE layers of GaP. It is shown that by measuring the minority carrier lifetime as a function of temperature a discrimination is possible between killer action due to diffusion of minorities towards sinks like dislocations or microprecipitates and due to capture by a normal point-defect type recombination centre.