Anisotropic thermal expansion behavior of thin films of polymethylsilsesquioxane, a spin-on-glass dielectric for high-performance integrated circuits

Thin films of poly(methylsilsesquioxane) (PMSSQ) are candidates for use as interdielectric layers in advanced semiconductor devices with multilayer structures. We prepared thin films of PMSSQ with thicknesses in the range 25.0-1151.0 nm by spin-casting its soluble precursor onto Si and GaAs substrates with native oxide layers and then drying and curing the films under a nitrogen atmosphere at temperatures in the range 250-400 degrees C. The out-of-plane thermal expansion coefficient alpha(perpendicular) of each film was measured over the temperature range 25-200 degrees C using spectroscopic ellipsometry and synchrotron X-ray reflectivity, while the in-plane thermal expansion coefficient alpha(parallel) of each film was determined over the temperature range 25-400 degrees C by residual stress analysis. PMSSQ films cured at higher temperatures exhibited reduced thermal expansion, which is attributed to the denser molecular packing and higher degree of cross-linking that arises at higher temperatures. Surprisingly however, all the PMSSQ films were found to exhibit very strong anisotropic thermal expansion; alpha(perpendicular) and alpha(parallel) of the films were in the ranges 140-329 ppm/ degrees C and 12-29 ppm/ degrees C respectively, depending on the curing temperature. This is the first time that cured PMSSQ thin films have been shown to exhibit anisotropic thermal expansion behavior. This anisotropic thermal expansion of the PMSSQ thin films might be due to the anisotropy of cross-link density in the films, which arises because of a combination of factors: the preferential orientation of methyl groups toward the upper film surface and the preferential network formation in the film plane that occurs during curing of the confined film. In addition, the film electron densities were determined using synchrotron X-ray reflectivity measurements and the film biaxial moduli were obtained using residual stress analysis.     

Thin wetting films from aqueous solutions of surfactants and phospholipid dispersions

The microscopic thin wetting film method was used to study the stability of wetting films from aqueous solution of surfactants and phospholipid dispersions on a solid surface. In the case of tetradecyltrimethylammonium bromide (C(14)TAB) films the experimental data for the receding contact angle, film lifetime, surface potential at the vapor/solution and solution/silica interface were used to analyze the stability of the studied films. It is shown that with increasing C(14)TAB concentration charge reversal occurs at both (vapor/solution and solution/silica) interfaces, which affects the thin-film stability. The spontaneous rupture of the thin aqueous film was interpreted in terms of the earlier proposed heterocoagulation mechanism. The presence of the mixed cationic/anionic surfactants was found to lower contact angles and suppresses the thin aqueous film rupture, thus inducing longer film lifetime, as compared to the pure amine system. In the case of mixed surfactants hetero-coagulation could arise through the formation of ionic surfactant complexes. The influence of the melting phase-transition temperature T(c) of the dimyristoylphosphatiddylcholine (DMPC) on the stability of thin films from dispersions of DMPC small unilamellar vesicles on a silica surface was studied by measuring the film lifetime and the TPC expansion rate. The stability of thin wetting films formed from dispersions of DMPC small unilamellar vesicles was investigated by the microinterferometric method. The formation of wetting films from diluted dispersions of DMPC multilamellar vesicles was studied in the temperature range 25-32 degrees C. The stability of thin film of lipid vesicles was explained on the basis of hydrophobic interactions. The results obtained show that the stability of wetting films from aqueous solutions of single cationic and mixed cationic-anionic surfactants has electrostatic origin, whereas the stability of the phospholipid film is due to hydrophobic interaction.     

GIUSAXS and AFM studies on surface reconstruction of latex thin films during thermal treatment

The structural evolution of a single-layer latex film during annealing was studied via grazing incidence ultrasmall-angle X-ray scattering (GIUSAXS) and atomic force microscopy (AFM). The latex particles were composed of a low-Tg (-54 degrees C) core (n-butylacrylate, 30 wt %) and a high-Tg (41 degrees C) shell (t-butylacrylate, 70 wt %) and had an overall diameter of about 500 nm. GIUSAXS data indicate that the q(y) scan at q(z) = 0.27 nm(-1) (out-of-plane scan) contains information about both the structure factor and the form factor. The GIUSAXS data on latex films annealed at various temperatures ranging from room temperature to 140 degrees C indicate that the structure of the latex thin film beneath the surface changed significantly. The evolution of the out-of-plane scan plot reveals the surface reconstruction of the film. Furthermore, we also followed the time-dependent behavior of structural evolution when the latex film was annealed at a relatively low temperature (60 degrees C) where restructuring within the film can be followed that cannot be detected by AFM, which detects only surface morphology. Moreover, compared to AFM studies GIUSAXS provides averaged information covering larger areas.     

Deposition of small organic molecules by the displacement of two immiscible supercritical phases

A new coating process is described (deposition from two immiscible supercritical phases, or DISP) in which a solution of supercritical carbon dioxide (scCO2) with a desired solute is displaced by supercritical helium (scHe). After depressurization, the solute is deposited on substrates initially submerged in the coating solvent. Micron-sized particles and thin films of sucrose octaacetate (SOA) were formed on silicon wafer substrate coupons from DISP at relatively low temperatures and pressures (< or = 6500 psi and < or = 60 degrees C). The particle size, film thickness, and morphology of SOA were characterized as a function of coating conditions-solution concentrations, withdrawal velocities, and pressures. Particles in the range of 1-14 microm in diameter were deposited at low solute concentrations (< or = 0.2 wt % at 4500 psi), whereas films in the range of 0.1-0.5 microm in thickness were deposited at higher solute concentrations (> or = 1.5 wt % at 4500 psi). Particle sizes decreased with increasing displacement velocity and increasing pressure. Estimates of characteristic times for diffusion and nucleation indicate that DISP is a diffusion-limited process. Optical microscopy and atomic force microscopy (AFM) were used to characterize film morphology, including defect formations and film roughness. Highly uniform films with low root-mean-square (RMS) roughness (approximately 10 angstroms) were obtained at a low displacement velocity of 0.0035 cm/s, while ring-like defect structures were observed in films deposited at a higher displacement velocity of 0.035 cm/s. The film thickness and morphology of the films deposited from DISP were compared with films from normal dip coating with typical organic solvents (acetone and toluene). Films deposited from scCO2 by DISP were much thicker, more uniform, and exhibited much fewer drying defects and lower RMS roughness compared with films from the organic solvents.     

Facile tailoring of film morphology and release properties using layer-by-layer assembly of thermoresponsive materials

Layer-by-layer self-assembly was used to prepare thermoresponsive thin films of poly(N-isopropylacrylamide) (PNIPAAm) and poly(acrylic acid) (PAA) based on hydrogen bonding. The temperature of PNIPAAm adsorption was shown to significantly affect both the mass proportion of PNIPAAm in the film and the film surface morphology. When the adsorption was conducted at temperatures close to the lower critical solubility temperature of PNIPAAm, the amount of PNIPAAm in the film increased significantly (from 51 to 59%), and the total film mass increased by 30-40%. The films prepared at 30 degrees C also exhibited a lower surface roughness (1-2 nm) compared with 5-8 nm when prepared at 10 or 21 degrees C. The resulting multilayer films ([PAA/PNIPAAm]10) were capable of being reversibly loaded and unloaded with dye (Rhodamine B) by exposure to solutions at elevated temperatures. The rate of loading and release was shown to depend on both the solution temperature and film preparation temperature, leading to tunable loading/release properties.     

Growth and structure of water on SiO2 films on Si Investigated by Kelvin probe microscopy and in Situ X-ray spectroscopies

The growth of water on thin SiO2 films on Si wafers at vapor pressures between 1.5 and 4 Torr and temperatures between -10 and 21 degrees C has been studied in situ using Kelvin probe microscopy and X-ray photoemission and absorption spectroscopies. From 0 to 75% relative humidity (RH), water adsorbs forming a uniform film 4-5 layers thick. The surface potential increases in that RH range by about 400 mV and remains constant upon further increase of the RH. Above 75% RH, the water film grows rapidly, reaching 6-7 monolayers at around 90% RH and forming a macroscopic drop near 100%. The O K-edge near-edge X-ray absorption spectrum around 75% RH is similar to that of liquid water (imperfect H-bonding coordination) at temperatures above 0 degrees C and is ice-like below 0 degrees C.     

Adhesive transitions in Newton black films: a computer simulation study

We report molecular dynamics simulations of Newton black films (NBFs), ultra thin films of aqueous solutions stabilized with two monolayers of ionic surfactants, sodium dodecyl sulfate. We show that at low water content conditions and areas per surfactant corresponding to experimental estimates in NBFs, homogeneous films undergo an adhesion "transition," which results in a very thin adhesive film coexisting with a thicker film. We identify the adhesive film with the equilibrium structure of the Newton black film. We provide here a direct microscopic view of the formation of these important structures, which have been observed in experimental studies of emulsions and foams. We also report a detailed investigation of the structural properties and interfacial fluctuation spectrum of the adhesive film. Our analysis relies on the definition of an "intrinsic surface," which is used to remove the averaging effect that the capillary waves have on the film properties.     

Dewetting of thin polystyrene films absorbed on epoxy coated substrates

Various characteristics of dewetting of thin polystyrene (PS) films absorbed on highly cross-linked epoxy-coated and silicon oxide covered substrates are studied as a function of PS film thickness (20h(c1) whereas the spinodal dewetting (SD) occurs through the growth of surface undulations for hh(c2) while the SD mechanism is observed for h相似文献   

Thin-Film Morphologies of Random Copolymers as Functions of Thermal History

Series polymers of butyl methacrylate with various contents of 3-(trimethoxysilyl)propyl methacrylate (MSMA) that introduces crosslinking networks among the macromolecules upon hydrolysis and self-condensation have been synthesized by free radical polymerization, and the influence of crosslinking density on the film properties has been examined. The polymer solutions were spin-cast over a layer of polystyrene brush to yield homogeneous polymer films. When the films of about 30 nm thick were exposed to moisture and then heated at 60 degrees C for hydrolysis and self-condensation of MSMA groups, the initially flat surfaces became slightly coarser but without apparent dewetting. Further annealing at 140 degrees C resulted in dewetting of the thin films, whose morphologies in thermodynamic equilibrium were related to the chemical compositions of the polymers. The polymers having higher contents of MSMA exhibited significantly reduced dewetting at the high temperature, due to the higher density of crosslinking networks that restricted the molecular mobility. In contrast to the thin films of about 30 nm thick, thicker films (about 100 nm) showed only a slight dewetting, even non-dewetting at the elevated temperature. Copyright 2001 Academic Press.     

Textured fluorine-doped tin dioxide films formed by chemical vapour deposition

The use of an aerosol delivery system enabled fluorine-doped tin dioxide films to be formed from monobutyltin trichloride methanolic solutions at 350-550 °C with enhanced functional properties compared with commercial standards. It was noted that small aerosol droplets (0.3 μm) gave films with better figures of merit than larger aerosol droplets (45 μm) or use of a similar precursor set using atmospheric pressure chemical vapour deposition (CVD) conditions. Control over the surface texturing and physical properties of the thin films were investigated by variation in the deposition temperature and dopant concentration. Optimum deposition conditions for low-emissivity coatings were found to be at a substrate temperature of about 450 °C with a dopant concentration of 1.6 atm% (30 mol% F:Sn in solution), which resulted in films with a low visible light haze value (1.74%), a high charge-carrier mobility (25 cm(2) V s(-1)) and a high charge-carrier density (5.7×10(20) cm(-3)) resulting in a high transmittance across the visible (≈80%), a high reflectance in the IR (80% at 2500 nm) and plasma-edge onset at 1400 nm. Optimum deposition conditions for coatings with applications as top electrodes in thin film photovoltaics were found to be a substrate temperature of about 500 °C with a dopant concentration of 2.2 atm% (30 mol% F:Sn in solution), which resulted in films with a low sheet resistance (3 Ω sq(-1)), high charge-carrier density (6.4×10(20) cm(-3)), a plasma edge onset of 1440 nm and the films also showed pyramidal surface texturing on the micrometer scale which corresponded to a high visible light haze value (8%) for light scattering and trapping within thin film photovoltaic devices.     

聚苯乙烯/聚二甲基硅氧烷嵌段共聚物的表面形态研究

采用原子力显微镜(AFM)和透射电镜(TEM)研究了聚苯乙烯/聚二甲基硅氧烷嵌段共聚物(PS-b-PDMS)薄膜的相形态.结果表明,当采用甲苯作为溶剂,旋转涂膜的薄膜样品呈现网络状的形态分布在表面,而样品所对应的透射电镜照片中,PDMS相作为球状分布在PS的连续相中.退火温度对共聚物表面形态有一定的影响,当退火温度高于PDMS的玻璃化温度,表面中PDMS相增多.PS-b-PDMS嵌段共聚物的表面形态随着所用溶剂的变化而有所不同,当采用甲苯作为溶剂时,样品的PS相形成凹坑分布在PDMS的相区之中,而采用环己烷作为溶剂时,PS相作为突起分布在PDMS相区之中.另外,基底对共聚物薄膜表面形态的有较大的影响,当采用硅晶片作为基底时,样品中的PDMS相和PS相呈现近似平行于表面的层状结构.     

Experimental study of hybrid nematic wetting films

Liquid crystal layers, with thickness less than 1 μm, are deposited on isotropic - solid or liquid - substrates and investigated in the bulk nematic range of temperatures. The boundary conditions at interfaces are antagonist ones, therefore the layers are distorted due to nematic elasticity. These films are referred to as "hybrid nematics". The consequences are complex. First, a forbidden range of film thickness is observed, depending only on temperature. Second, the anisotropy of the elastic response gives rise to striking stripe patterns in the thicker films. This behavior is common to several members of the series of n-cyanobiphenyls deposited on oxidized silicon wafers, water and glycerol. The aim of the study is to collect data, and determine which ones find a place within a common theoretical framework.     

Influence of substrate chemistry and the network homogeneity of ultra‐thin cross‐linked polymer films cured at their surface on the main relaxations temperatures probing by microthermal analysis

Thin 200‐nm epoxy–amine mixtures were cured on silicon wafers with different surface chemistry to quantify the effect of the chemistry on the glass transition temperature evolution in ultra‐thin thermosetting films. Two surface treatments were investigated: the first one only consisted in the activation of the silanols groups at the silicon surface, whereas the second one consisted in the grafting 3‐aminopropyltrimethoxysilane (APTMS) monolayer on the silicon wafers. The epoxy films were deposited on these chemistry modified wafers by spin coating a toluene solution of DGEBA–amine mixture at stoichiometric ratio. The same cure processing was used for both samples. Thin films were analysed not only using microthermal and thermomechanical analysis to determine the relaxation transitions temperatures of these films but also using FTIR in infrared reflection absorption spectroscopy mode to determine the curing rate of these networks. It was found that all these thin films showed two different glass transitions, the first one at 96 °C and was independent of the surface treatments, whereas the second one increasing from 142 °C for the oxidised wafers surface to 167 °C for the aminosilane grafted on the silicon wafer. The substrate chemistry extent on the film network structure, the interfacial bonds and interactions are discussed. This work also illustrates the interest in using microthermal analysis to obtain relevant temperature glass transition of thin film at sub‐micrometre scale, strongly dependant of local structure and chemistry composition. Copyright © 2009 John Wiley & Sons, Ltd.     

Preparation and tribological studies of C60 thin film chemisorbed on a functional polymer surface

A novel self-assembled C60 film was prepared by chemical adsorption of C60 molecules onto an amino-group-containing polyethyleneimine-coated silicon substrate surface. The contact angle of distilled water on the C60 film was measured, the thickness was determined by means of ellipsometric analysis, and the morphology was observed with an atomic force microscope. The tribological properties of the films were investigated as well. It was found that the C60 thin film had a contact angle of about 72 degrees and thickness of 1.8 nm and exhibited a surface domain microstructure composed of fullerene clusters. Due to the hydrophobicity and low surface energy, the C60 film possessed good adhesive resistance and had an adhesive force of about 7.1 nN, which was about an order of magnitude lower than that of the silicon substrate surface. Moreover, the C60 film showed good friction reduction, load-carrying capacity, and antiwear ability, which were attributed to the higher mechanical stiffness and elastic modulus of C60 molecules. Besides, the friction coefficient decreased with increasing sliding velocity and normal loads, due to the rolling effect of the physisorbed C60 molecules.     

Nanostructured films of amphiphilic fluorinated block copolymers for fouling release application

New amphiphilic block copolymers S nSz m consisting of blocks with varied degrees of polymerization, n and m, of polystyrene, S, and polystyrene carrying an amphiphilic polyoxyethylene-polytetrafluoroethylene chain side-group, Sz, were prepared by controlled atom transfer radical polymerization (ATRP). The block copolymers, either alone or in a blend with commercial SEBS (10 wt% SEBS), were spin-coated in thinner films (200-400 nm) on glass and spray-coated in thicker films ( approximately 500 nm) on a SEBS underlayer (150-200 microm). Angle-resolved X-ray photoelectron spectroscopy (XPS) measurements proved that at any photoemission angle, varphi, the atomic ratio F/C was larger than that expected from the known stoichiometry. Consistent with the enrichment of the outer film surface (3-10 nm) in F content, the measured contact angles, theta, with water (theta w > or = 107 degrees ) and n-hexadecane (theta h > or = 64 degrees ) pointed to the simultaneous hydrophobic and lipophobic character of the films. The film surface tension gamma S calculated from the theta values was in the range 13-15 mN/m. However, the XPS measurements on the "wet" films after immersion in water demonstrated that the film surface underwent reconstruction owing to its amphiphilic nature, thereby giving rise to a more chemically heterogeneous structure. The atomic force microscopy (AFM) images (tapping mode/AC mode) revealed well-defined morphological features of the nanostructured films. Depending on the chemical composition of the block copolymers, spherical (ca. 20 nm diameter) and lying cylindrical (24-29 nm periodicity) nanodomains of the S discrete phase were segregated from the Sz continuous matrix (root-mean-square, rms, roughness approximately 1 nm). After immersion in water, the underwater AFM patterns evidenced a transformation to a mixed surface structure, in which the nanoscale heterogeneity and topography (rms = 1-6 nm) were increased. The coatings were subjected to laboratory bioassays to explore their intrinsic ability to resist the settlement and reduce the adhesion strength of two marine algae, viz., the macroalga (seaweed) Ulva linza and the unicellular diatom Navicula perminuta. The amphiphilic nature of the copolymer coatings resulted in distinctly different performances against these two organisms. Ulva adhered less strongly to the coatings richer in the amphiphilic polystyrene component, percentage removal being maximal at intermediate weight contents. In contrast, Navicula cells adhered less strongly to coatings with a lower weight percentage of the amphiphilic side chains. The results are discussed in terms of the changes in surface structure caused by immersion and the effects such changes may have on the adhesion of the test organisms.     

Collapse transition in thin films of poly(methoxydiethylenglycol acrylate)

The thermal behavior of poly(methoxydiethylenglycol acrylate) (PMDEGA) is studied in thin hydrogel films on solid supports and is compared with the behavior in aqueous solution. The PMDEGA hydrogel film thickness is varied from 2 to 422?nm. Initially, these films are homogenous, as measured with optical microscopy, atomic force microscopy, X-ray reflectivity, and grazing-incidence small-angle X-ray scattering (GISAXS). However, they tend to de-wet when stored under ambient conditions. Along the surface normal, no long-ranged correlations between substrate and film surface are detected with GISAXS, due to the high mobility of the polymer at room temperature. The swelling of the hydrogel films as a function of the water vapor pressure and the temperature are probed for saturated water vapor pressures between 2,380 and 3,170?Pa. While the swelling capability is found to increase with water vapor pressure, swelling in dependence on the temperature revealed a collapse phase transition of a lower critical solution temperature type. The transition temperature decreases from 40.6?°C to 36.6?°C with increasing film thickness, but is independent of the thickness for very thin films below a thickness of 40?nm. The observed transition temperature range compares well with the cloud points observed in dilute (0.1?wt.%) and semi-dilute (5?wt.%) solution which decrease from 45?°C to 39?°C with increasing concentration.     

Theoretical analysis of gold-deposited optical fiber sensor and characterization of the gold film.

Gold-deposited optical fiber sensors with film thicknesses from 30 to 60 nm were prepared, and the responses to a wide range of a refractivity (1.33-1.54 refractive index (RI) units) were investigated both experimentally and theoretically. The response curve of the sensor has two minima in the refractivity range from 1.33 to 1.44 and at 1.462 RI units. The former minimum is due to surface plasmon resonance (SPR) in the thin gold film, and shifts to a lower refractivity as the film becomes thicker. The response curves of the sensors with film thicknesses of 45 and 60 nm agreed well with those calculated from SPR theoretical equations. Morphology observations of the surfaces of deposited gold films on glass by atomic force microscopy (AFM) and a variation in resistance of the films with various thicknesses show the structure of the gold films. We concluded that the thin deposited gold films have many defects, and that the core of the gold-deposited optical fiber leaks light through the defects to the sample solution with the same refractivity (1.462 RI units) as that of the core.     

New benchmark for water photooxidation by nanostructured alpha-Fe2O3 films

Thin films of silicon-doped Fe2O3 were deposited by APCVD (atmospheric pressure chemical vapor deposition) from Fe(CO)5 and TEOS (tetraethoxysilane) on SnO2-coated glass at 415 degrees C. HRSEM reveals a highly developed dendritic nanostructure of 500 nm thickness having a feature size of only 10-20 nm at the surface. Real surface area determination by dye adsorption yields a roughness factor of 21. XRD shows the films to be pure hematite with strong preferential orientation of the [110] axis vertical to the substrate, induced by silicon doping. Under illumination in 1 M NaOH, water is oxidized at the Fe2O3 electrode with higher efficiency (IPCE = 42% at 370 nm and 2.2 mA/cm2 in AM 1.5 G sunlight of 1000 W/m2 at 1.23 VRHE) than at the best reported single crystalline Fe2O3 electrodes. This unprecedented efficiency is in part attributed to the dendritic nanostructure which minimizes the distance photogenerated holes have to diffuse to reach the Fe2O3/electrolyte interface while still allowing efficient light absorption. Part of the gain in efficiency is obtained by depositing a thin insulating SiO2 interfacial layer between the SnO2 substrate and the Fe2O3 film and a catalytic cobalt monolayer on the Fe2O3 surface. A mechanistic model for water photooxidation is presented, involving stepwise accumulation of four holes by two vicinal iron or cobalt surface sites.     

Fabrication and properties of thermosensitive organic/inorganic hybrid hydrogel thin films

We report on a facile method for fabricating thermosensitive organic/inorganic hybrid hydrogel thin films from a cross-linkable organic/inorganic hydrid copolymer, poly[ N-isopropylacrylamide- co-3-(trimethoxysilyl)propylmethacrylate] [P(NIPAm- co-TMSPMA)]. Fourier transform infrared (FT-IR) spectra confirmed the formation of hybrid hydrogel thin films after hydrolysis of the methoxysilyl groups (Si-O-CH 3) and subsequent condensation of the silanol groups (Si-OH). Atomic force microscopy (AFM) images revealed that the surface morphology of the hydrogel thin films depended on the supporting substrates. Microdomains were observed for the hydrogel thin films on a gold surface, which can be attributed to inhomogeneous network structures. The thermoresponsive swelling-deswelling behavior and the viscoelastic properties of the hydrogel thin films were investigated as a function of temperature (25-45 degrees C) by using a quartz crystal microbalance (QCM) operated in water. The high frequency shear modulus of the P(NIPAm- co-TMPSMA) hydrogel thin films was several hundred kilopascals.     

A thin film analog of the corneal mucus layer of the tear film: an enigmatic long range non-classical DLVO interaction in the breakup of thin polymer films

We present experimental results on the instability and dewetting of thin liquid polydimethylsiloxane (PDMS) films intercalated between an aqueous medium and a silicon wafer grafted with PDMS ‘brushes’. This is a thin film analog of the precorneal thin mucus coating sandwiched between the aqueous tear film and the glycocalyx carrying corneal epithelial surface. Lowering of the PDMS–water interfacial tension by a surfactant results in dewetting even of micrometer thick films within a few minutes. The instability appears to be induced by a long range non-classical DLVO force which has the same decay behavior as the nonretarded van der Waals force, but a magnitude which is about 2–3 orders higher. Implications for the breakup of the precorneal mucus layer and the tear film are discussed.