基于聚丙烯酰胺凝胶软印章的电化学纳米加工(英文)

电化学刻蚀使用腐蚀性小的电解质溶液,且溶液可使用周期长,是一种环境友好的加工工艺.本文采用聚丙烯酰胺水凝胶(PAG)作为软印章,辅以优化工艺,将电化学湿印章技术(E-WETS)的加工精度从几十微米提高到了200纳米.将新配制的聚丙烯酰胺水凝胶浇注在具有纳米结构的软模板表面,固化后脱模并保存于0.2mol·L-1KCl溶液中,在合适电位和压力下,对硅片表面金膜进行电化学湿法刻蚀,分别研究了聚丙烯酰胺水凝胶的聚合条件、电化学加工电位以及水凝胶表面压力对加工结果的影响.实验表明,在最优条件下可加工出直径为200纳米的特征点阵结构,且该方法具有较好的可靠性和稳定性。     

有机硅橡胶/蒙脱土纳米复合弹性印章的制备

聚二甲基硅氧烷硅橡胶(PDMS)是用于制作软刻蚀技术[1,2]中弹性印章的最常用材料, 但使用单一的硅橡胶制作的印章存在易变形、易溶胀等缺点. 本文用有机蒙脱土(MMT)和硅橡胶进行插层纳米复合改性, 用树脂固化仪对复合体系进行固化行为分析和固化配方优化, 并对复合材料的耐溶胀性能及其弹性印章的表面形貌进行观察比较.     

二维平面细胞微图案化技术及其生物学应用

可以控制细胞粘附形状、大小的方法统称为细胞图案化技术.这些方法结合微纳米制备、表面化学、电化学和光化学等手段可以动态控制细胞的粘附、迁移、分化及其相互作用,为细胞生物学研究提供了一个新平台.本文介绍了二维平面细胞图案化的各种方法,并对其优缺点进行了总结,评述了细胞图案化技术在细胞生物学基础研究、组织工程以及基于细胞的生物传感器领域的应用.     

扫描探针纳米加工技术的现状与发展趋势

介绍了扫描探针纳米加工技术的基本原理、应用前景和最新进展 ,并讨论了该技术的发展趋势     

嵌段共聚物自组装及其在纳米材料制备中的应用(下)

嵌段共聚物可以自组装形成丰富的有序微结构。这些微结构可以拥有各种不同的几何形态和晶体／准晶结构及宽泛的尺寸选择性，而且具有良好的可调控性及相对容量的加工方法。利用嵌段共聚物这种自组装特性来制备一些利用传统技术难以获得的纳米材料（如功能纳米材料，纳米结构材料，模板材料，介孔固体等）及微米／亚微米微结构材料（如光子晶体等），具有优越性。这些材料将在信息技术，生物医学，催化等领域取得应用。     

有序介孔碳负载Fe、Co、Ni纳米晶的软模板合成及其表征

报道了在有序介孔碳基体中一步合成负载Fe、Co、Ni纳米晶的方法. 以间二苯酚和甲醛为碳源, F127为模板剂, Fe、Co、Ni的硝酸盐为前驱体, 通过软模板组装路线在酸性条件下合成了负载型有序介孔碳复合材料. 采用X射线衍射(XRD)、透射电镜(TEM)和氮气吸附等手段对所合成材料进行了表征. 结果表明: 合成的材料具有类似于SBA-15的有序介孔结构, 有序介孔碳负载Fe、Co、Ni纳米晶复合材料的比表面积分别为586、626和698 m²·g^-1. XRD和TEM表征结果证实了金属物种以高分散纳米晶的形式分布在介孔碳基体中.     

New Developments in Soft Lithography

Abstract

The burgeoning area of soft lithography is reviewed with special emphasis on developments within the past three years. Applications in electronics have driven such developments, but more recently, other kinds of device structures and 3D prototyping have also found application, in part, through soft lithography. Microcontact printing (μCP), “lift off” μCP nano transfer printing (nTP), micromolding in capillaries (MIMIC), solvent assisted micromolding (SAMIM), replica molding (REM), and microtransfer molding are the main soft lithography schemes discussed.     

Soft Lithography

Elastomeric stamps and molds provide a great opportunity to eliminate some of the disadvantages of photolithograpy, which is currently the leading technology for fabricating small structures. In the case of “soft lithography” there is no need for complex laboratory facilities and high-energy radiation. Therefore, this process is simple, inexpensive, and accessible even to molecular chemists. The current state of development in this promising area of research is presented here.     

用软刻蚀方法制备PbS纳米晶复合聚丙烯酸微图形

PbS microstructures have several applications such as Pb2+ion-selective sensors and IR detector.The method to prepare PbS nanocrystal embed in poly(acrylicacid) (PAA) microstructures produced by means of soft lithography and solid state polymerizatio n by γ-ray irradiation was described. PbS micro patterns were prepared by Micro molding in Capillaries (MIMIC) with aqueous solution of acrylic acid lead monomer, and then solid state polymerized by γ-ray irradiation. Finally, the sample was treated with aqueous solution of Na2 Stoconvert the Pb2+ to PbS in the matrix. High-resolution micro structures of PAA, which have PbS nanocrystals embedded in them, could be produced successfully in this way. The final products were characterized by TEM, XRD, and XPS. TEM image indicated that the PbS particles embedded in PAA had a diameter of smaller than 20nm. X-ray powder diffraction method was also used to characterize the PbS/PAA nanocomposite film. The XPS analysis showed the element Pb has been converted to PbS nanoparticles in the composite films.     

软光刻法制备具有表面微结构的角蛋白膜

近年来,使用微纳米制造工艺将蛋白质或多肽进行高精度空间图案化,推动了细胞生物学、组织工程学、药物科学等领域的发展.同时,羊毛角蛋白作为一种储量大的天然生物蛋白质,具有优异的水溶性、良好的生物相容性和可控的降解性,但羊毛角蛋白通常不能自组装形成凝胶网络或其他不溶形式,因此,使用羊毛角蛋白制备如纤维、薄膜、凝胶等的成型结构存在很大困难.本工作通过使用化学修饰的方法,在角蛋白上接枝功能基团,使角蛋白获得光敏感性,探究了共价交联法制备具有表面微结构角蛋白膜的可行性.并用3D激光扫描显微镜、紫外可见近红外光谱仪和傅里叶变换显微红外光谱仪对薄膜结构进行了表征.结果表明,使用软光刻法可以得到表面微结构完整度很高的角蛋白膜.本工作对羊毛角蛋白共价交联法进行了实验探索,实验结果不仅为人们提供了一种软光刻技术制备具有表面微结构的角蛋白膜的方法,而且为羊毛角蛋白制备成型结构提供了新的途径.     

Fabrication of Micro‐ and Nanoscale Polymer Structures by Soft Lithography and Spin Dewetting

In this work, the process of spin dewetting of a polymer solution on a topographically patterned PDMS mold was used for fabrication of micro‐ and nanaoscale polymer structures. Spin coating was used to provide a fast and reproducible coating. This simple technique was capable of producing a wide range of polymer feature geometries from a single microfabricated mold. This experimental study looks at the effects of the original mold feature geometry as well as the polymer solution concentration on the resultant microstructures. Polystyrene and poly(propyl methacrylate) were used as model polymers. Features with film thickness ranging from <100 nm to >5 µm were obtained using this technique. The process was also extended to fabrication of nanoscale features.

     

Polymers in conventional and alternative lithography for the fabrication of nanostructures

This review provides a survey of lithography techniques and the resist materials employed with these techniques. The first part focuses on the conventional lithography methods used to fabricate complex micro- and nano-structured surfaces. In the second part, emphasis is placed on patterning with unconventional lithography techniques such as printing, molding, and embossing, and on their development into viable, high-resolution patterning technologies.     

Reactive μCP on ultrathin block copolymer films: Localized chemistry for micro- and nano-scale biomolecular patterning

Three different, complementary soft lithographic approaches for the fabrication of chemical patterns on ultrathin polystyrene-block-poly(tert-butyl acrylate) (PS₆₉₀-b-PtBA₁₂₁₀) films are discussed. Central to the methodology is the previously introduced reactive PS₆₉₀-b-PtBA₁₂₁₀ platform that allows one to covalently graft (bio)molecules via robust amide linkages in high densities on flat, as well as on structured, surfaces. As shown in this paper, the combination of the polymer-based platform and reactive microcontact printing (μCP) patterning approaches allows one to obtain patterns of (bio)molecules with (sub)micrometer feature sizes. The μCP approaches comprise: (A) the direct transfer of functional (bio)molecules from an oxidized elastomeric stamp to hydrolyzed and N-hydroxysuccinimide (NHS) activated PS₆₉₀-b-PtBA₁₂₁₀; (B) the transfer of a passivating poly(ethylene glycol) layer to hydrolyzed and NHS-activated PS₆₉₀-b-PtBA₁₂₁₀ followed by wet chemical grafting of functional moieties; (C) the local hydrolysis of the PtBA skin layer with trifluoroacetic acid (TFA), followed by NHS activation and wet chemical derivatization. The applicability and the versatility of the combination of the polymer thin film-based platform and soft lithographic methodologies for patterning biologically relevant molecules is demonstrated for polyamidoamine (PAMAM) dendrimers, different proteins, as well as probe DNA. The successful hybridization of target DNA and the immobilization of fibronectin in micropatterns show that ultrahigh density patterns for micro- and nano-arrays, as well as for studies of cell-surface interactions, can be conveniently fabricated based on these approaches and platforms.     

微反应器和微聚合反应器

微反应器是指容量仅为零点几μm^3或宽度为1μm左右的反应“容器”，反应在这个微小区域内有控地进行。以表面科学与微制造技术为核心，新型微反应器近年来发展很快。本文介绍五种微反应器，即反相胶束微反应器，聚合物微反应器，固体模板微反应器，微条纹反应器和微聚合反应器，以及它们在各高科技领域中的可能应用。     

光刻技术:发展路径及未来趋势

光刻技术在半导体器件大规模生产中发挥重要作用.今天,多数先进半导体生产都已经应用ArF准分子激光浸润光刻技术.双重图像曝光和侧壁图像转移技术使ArF准分子激光浸润光刻技术延伸到32纳米半节距(HP)器件的制造成为可能.为了制造更小尺寸的器件,必须开发新的制造工艺.极端紫外线光刻是制造22纳米半节距甚至更小尺寸半导体器件的先进下一代光刻技术解决方案.另外,其他技术解决方案,如纳米压印光刻技术和无掩模直描光刻技术等也被考虑用于制造更小节点尺寸的器件,但是目前这些方案仅仅处在研发阶段,而且在现阶段就已经呈现出在大规模生产中的诸多困难.本文从材料的角度对光刻技术进行一个整体描述,并对光刻技术未来趋势进行讨论.