Electrical characteristics of helicon wave plasmas

The external electrical characteristics of helicon wave plasmas have been studied over a wide range of magnetic fields, radio frequency (RF) power, frequencies, and Ar gas pressures. External parameters, such as antenna voltage, current, and phase shifts, and internal parameters, such as electron density, are measured. The equivalent discharge resistance, reactance, and power transfer efficiency are calculated through these measurements. The characteristics of helicon mode is compared with inductively coupled plasma (ICP) and low mode. The power efficiency of the helicon mode is better than that of other modes. Consequently, electron density of helicon mode is much higher than that of other modes. This means the existence of a mechanism where electrons are very efficiently accelerated by the electric field of the antenna in the helicon mode. The power efficiency of helicon mode is higher at lower RF frequency and at optimum gas pressure than that of other modes     

Radial inhomogenity of plasma parameters in a low-pressure inductive RF discharge

This work is devoted to systematic investigation into the radial dependence of the plasma parameters of a low-pressure inductive radio-frequency (RF) discharge on pressure within a wide range of 0.8–1 Torr. Experimental results that were obtained under the considered pressures make it possible to analyze the patterns of the changes in plasma parameters upon both a nonlocal mode of discharge and a transition from a nonlocal to local mode of the RF power input. Discharges in helium, neon, argon, and krypton were considered. Experimental data were compared to the results of the numerical simulation of the inductive RF discharge using the particle-in-cell (PIC) method.     

射频功率对氢气与反式二丁烯的低压电感耦合等离子体的影响（英）

利用等离子体聚合技术制备的GDP壳层是目前ICF靶丸的主要烧蚀层材料。为了了解GDP薄膜沉积过程中的CH等离子体的状态,采用朗缪尔探针和质谱仪对C4H8/H2等离子体的组分和状态参数进行了诊断,并对等离子体的电子能量分布函数、电子密度、电子温度等进行了深入分析。同时讨论了等离子体状态与放电参数之间的关系。研究发现,射频功率对等离子体参数有明显的影响。从10 W到35 W,电子密度正比于射频功率。随着射频功率的增加,在两步电离机制作用下,电子温度和等离子体电势呈现先减小后增大的变化趋势。另外,在高气压下,质谱诊断中发现了大量的稳定的小质量碎片离子,这表明在高气压下等离子体气相中的离子碎片聚合反应被抑制。     

A comparison of RF electrode sheath models

Analytic expressions have been found from different time-averaged and dynamic models for the electrode sheath width in a capacitively driven RF discharge. The sheath widths predicted from all the models under consideration are shown to practically coincide if they are expressed in terms of DC sheath voltage and ion current to the RF electrode. However, these models have fundamental differences in their RF discharge scaling laws that result in different theoretical predictions for RF discharge electrical characteristics. Analytic expressions for the sheath width with arbitrary collisionality at moderate RF voltages are found to be in good agreement with experimental measurements made over a wide range of discharge voltage and gas pressure     

Effects of nonlocal electron kinetics and transition from αto γ regime in an RF capacitive discharge in nitrogen

The electron kinetics and regime of operation of asymmetrically coupled RF (27-MHz) nitrogen discharges in two vessels with different interelectrode gaps over the range of 0.20-0.35 torr gas pressure are studied in terms of the electron energy distribution function (EEDF). The latter is measured by means of a computer-controlled data acquisition system, a Langmuir probe with cross-modulation second derivative technique applied. The experiments are performed with an axial resolution along the RF electric field and accompanied with a measurement of electrical discharge characteristics. The effects of local and nonlocal plasma response are considered. The transition between α and γ discharge regimes is registered by measuring the EEDF and its moments' changes with the increase of the RF discharge current density     

大面积NBI 射频离子源电气参数设计分析

为探究射频离子源驱动器线圈电气参数对射频放电的影响,主要进行了射频离子源等离子体激发的物理分析,并计算了射频电源的频率选择与线圈放电电流、线圈匝间电压以及放电气压之间的关系,设计了射频离子源驱动器的主要参数。研制的射频离子源驱动器装置,成功获得氢等离子体射频放电。实验结果和理论计算结果符合很好。     

�����NBI ��Ƶ����Դ����������Ʒ���

为探究射频离子源驱动器线圈电气参数对射频放电的影响,主要进行了射频离子源等离子体激发的物理分析,并计算了射频电源的频率选择与线圈放电电流、线圈匝间电压以及放电气压之间的关系,设计了射频离子源驱动器的主要参数。研制的射频离子源驱动器装置,成功获得氢等离子体射频放电。实验结果和理论计算结果符合很好。     

An experimental study of the plasma parameters of a hybrid low-pressure RF discharge

This paper presents an experimental study of the plasma parameters of a hybrid radio-frequency (RF) discharge, which is a new modification of an RF discharge. The discharge is maintained by both vortex and potential RF electrical fields. To generate a hybrid RF discharge, an RF power input unit is used in the form of a parallel-connected inductor and capacitor coatings. A blocking capacitor is included in the capacitive channel of the discharge. The paper presents data from the study of the influence of power coupled to the plasma, argon pressure, and blocking capacitance on the plasma parameters, i.e., the electron energy distribution, temperature, and density and plasma potential. The role of the capacitive channel in the variations in properties and the characteristics of the discharge are considered.     

A 400–500 GHz Balanced SIS Mixer with a Waveguide Quadrature Hybrid Coupler

We have developed a 400–500 GHz low-noise balanced SIS (Superconductor Insulator Superconductor) mixer, which is based on a waveguide RF quadrature hybrid coupler. The RF quadrature hybrid was designed and fabricated as a broadband hybrid with good performance at 4 K. The fabricated RF quadrature hybrid was measured at room temperature with a submillimeter vector network analyzer to check amplitude and phase imbalance between two output ports. Then the balanced mixer was assembled with the RF hybrid, two DSB mixers, and a 180° IF hybrid. Several important parameters such as noise temperature, LO power reduction, and IF spectra were measured. The LO power reduction is defined as how much LO power the balanced mixer saves compared with a typical single-ended mixer. The measured noise temperature of the balanced mixer was ~ 55 K at the band center which corresponds to ~ 3 times the quantum noise limit (hf/k) in DSB, and ~ 120 K at the band edges. The noise performance over LO frequency was almost the same as that of the worse DSB mixer used in the balanced mixer. In addition the LO power required for the balanced mixer is ~ 11 dB less than that of the single-ended mixers.     

高频感应等离子体流动模型与微型电推进器流场特性分析

微型射频离子推力器具有结构简单、 工作寿命长、 推力动态范围大、 性能调节响应灵敏等特点,是国际微电推进领域的研究热点之一.射频离子推力器电离室内的感性耦合放电等离子体特性和推力器的性能密切相关.为此,文章建立了低气压、小尺寸微型射频离子推力器电离室内感性耦合等离子体流体模型,开展了电磁场、流场、化学反应浓度场的多物理...     

射频容性耦合等离子体放电特性的光谱诊断

利用流体模型模拟和发射光谱实验诊断相结合的方法,研究了中等气压、中等功率下射频容性耦合等离子体的放电特性。理论上,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar气为工作气体,研究了不同气压以及不同射频输入功率下等离子体电子温度和电子密度的分布规律。实验上,依据仿真模型设计制作了相同尺寸的密闭玻璃腔体和平板电极,采用13.56 MHz射频放电技术电离腔体内的工作气体Ar气,测量了不同气压、不同射频输入功率时放电等离子体的发射光谱。通过分析和选择适当的Ar Ⅰ和Ar Ⅱ的特征谱线,分别利用玻尔兹曼斜率法以及沙哈-玻尔兹曼方程计算了等离子体的电子温度与电子密度,并结合模拟仿真结果对光谱诊断结果进行了修正。结果表明：当气体压强为300~400 Pa、输入功率为600~800 W时,等离子体近似服从玻尔兹曼分布,此时利用光谱法得到的等离子体参数与仿真结果相符合。仿真模拟与光谱实验诊断相结合的方法可初步诊断出中等气压下等离子体的放电参数,增加了玻尔兹曼斜率法和沙哈-玻尔兹曼方程在等离子体放电中的使用范围,扩大了光谱法在低电子密度容性耦合等离子体参数诊断的应用场合,为中等气压容性耦合等离子体在工业与军事上的应用研究提供了重要物理状态的分析手段。     

Ion Bombardment Secondaty Electron Maintenance of Steady RF Discharge

The results of both theoretical and experimental study of a steady E-type RF discharge, in which ionization is controlled by fast electrons generated in RF sheaths near the electrodes (y regime), are presented. It is shown that the transition of an RF discharge into the ? regime is of a threshold nature and is accompanied by a sharp increase in plasma density and a decrease in electron temperature. The suggested theoretical model of an RF discharge in the ? regime satisfactorily describes experiments carried out in a wide range of frequencies, RF voltages, and gas pressures.     

Impedance model of helical resonator discharge

Modeling and measurement results of the RF input impedance of a helical resonator discharge are given. A simple microstrip transmission line model is used to extract an equivalent circuit of a helical resonator discharge. The transmission line model consists of a grounded cylinder for RF shielding, a helical copper coil for RF heating, and a high density plasma. Transmission line parameters for an experimental helical resonator discharge chamber are extracted, and the results are compared with the measured results. The measured transmission line parameters for the experimental reactor are the characteristic impedance of 200 Ω, the attenuation constant of 6×10^-3 Np/m, and the wave number of 0.36 rad/m, which have good agreement with the calculated values     

柱面天线射频感性耦合等离子体放电模式特性的实验研究

利用Z-scan、电流、电压探头,通过测量等离子体吸收功率、天线电流、电压、等离子体直流悬浮电位等多种参数,研究了匹配网络、天线耦合强度、导电地面积、气压等多种因素对E,H放电模式特性及模式转化行为的影响.基于Γ型阻抗匹配网络中串联电容对射频电源输出功率的影响,提出了E—H放电模式转化的正负反馈区概念.研究发现：在相同的其他放电条件下,处于正反馈区时等离子体放电易于产生跳变型模式转化,而且模式跳变的临界天线电流、回滞宽度、跳变临界功率、跳变功率差等参数均随阻抗匹配网络参数产生明显变化;在负反馈区内,模式转化过程趋于连续.由于阻抗匹配网络的影响,E—H模式的跳变电流并不是总大于H—E模式的跳变电流.在不同导电地面积、阻抗匹配网络、气压下,模式转化过程中等离子体直流悬浮电位的变化呈现多样性. 关键词： 射频等离子体 感性耦合 容性耦合 模式转化     

EAST���ӻ���������1.5MW��Ƶ�Ŵ������о�

介绍了EAST上ICRF辅助加热系统1.5MW射频信号源中工作频率为25～70MHz的末级功率放大器的研制工作,从最优工作参数、输入回路和输出回路三个主要方面详细分析了该级大功率宽频带射频放大器。经比较,分析结果和测试数据显示了很好的一致性,这为实现ICRF加热系统的可靠运行奠定了基础。     

Power absorption corresponding to ion losses in parallel-plate RFdischarges

A simple model of a symmetric parallel-plate RF discharge is studied to illustrate how such discharges may absorb power from an RF power supply in order to sustain DC power losses corresponding to the steady acceleration of ions through the sheaths. The motions of the sheath boundaries over one period are derived assuming that the current density varies sinusoidally. One finds that the sheath thickness increases discontinuously at one sheath whenever the plasma contacts the opposing electrode. This implies that the external power supply delivers an electron pulse from the electrode at higher potential to the electrode at lower potential, so that some power is being absorbed in a pulsed fashion. The power absorbed by the discharge is also calculated for the portions of the RF cycle where the current varies sinusoidally. It is found that power is supplied by the discharge in this phase of the RF cycle, with the energy coming from the deflating sheaths. It is further shown that the sum of the pulsed power absorption and smooth power generation, averaged over one RF period, is equal to the DC ion power losses arising from ions falling through the time-averaged sheath potentials     

Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films

A RF-superimposed dc-magnetron sputter process for coating color filter materials with transparent and conducting ITO films was investigated. In this process, the sputtering cathode is excited simultaneously by dc- and RF-power (at 13.56 MHz). This work summarises the measured properties of the gas discharge. Some basic data of the deposited ITO films are given, also. The dependence of the RF portion of the total sputtering power on the discharge voltage has been monitored for different values of total power and process pressure. The ion energy distribution function of the positively charged ions approaching the substrate surface has been measured using a retarding field plasma analyser probe. It was shown that the mean energy of the ions increases with increasing RF portion of the total power. The electron temperature in the body region of the gas discharge has been derived from measurements of the optical emission of the excited species. Received: 3 November 1998 / Accepted: 8 March 1999 / Published online: 14 July 1999     

Automatic impedance matching and opto-Hertzian effect in RF excited CO2 waveguide lasers

We report the successful operation of a novel automatic impedance matching technique (AIMing) and observations of the opto-Hertzian effect. The AIMing system is capable of maintaining efficient RF power delivery to a CO₂ waveguide laser over a wide range of operating conditions. The opto-Hertzian signal, produced by circulating laser power fluctuations and detected in the RF reflected power, has some interesting properties and may be used for laser frequency stabilisation.     

射频电感性耦合等离子体调谐基片自偏压特性

采用调节射频电感性耦合等离子体中基片电极与地之间的外部电路阻抗的方法,控制基片电极的射频自偏压。研究了调谐基片自偏压随外部调谐电容值的变化特征,得到了调谐基片射频自偏压随射频放电功率、气压的变化曲线。在一定放电参数区域内,调谐基片射频自偏压随调谐电容的变化曲线呈现跳变、双稳、迟滞现象。     

Electrical and structural properties of In-doped ZnO films deposited by RF superimposed DC magnetron sputtering system

Zinc-indium-oxide (ZIO) films were deposited on non-alkali glass substrates by RF superimposed DC magnetron sputtering with a ZIO (9.54 wt% In₂O₃ content) high-density, sintered target at room temperature. The electrical, structural and optical properties of the ZIO films deposited with different sputtering parameters were examined. The total power for RF superimposed DC magnetron sputtering was 80 W. The RF power ratio in the total sputtering power was changed from 0 to 100% in steps of 25%. The ZIO films deposited with a 100% RF discharge showed the lowest resistivity, 1.28×10⁻³ Ω cm, due to the higher carrier concentration. The ZIO film deposited at 50% RF power showed a relatively larger grain size and smaller FWHM. XPS suggested an increase in the level of In³⁺ substitution for Zn²⁺ in the ZnO lattice with increasing RF/(DC+RF) due to the low damage process. The average transmittance of all ZIO films in the visible light region was >80%. The increasing RF power portion of the total sputtering power led to a broadening of the optical band gap, which was attributed to the increase in carrier density according to Burstein-Moss shift theory.