GaAlAs/GaAs非均匀阱宽多量子阱超辐射发光管材料制备及表征

超辐射发光二极管(SLD)具有不同于半导体激光器和普通发光二极管的优异性能。为了制备高功率半导体超辐射发光管,并且得到比较大的光谱宽度、大的单程增益和抑制电流饱和,我们研究设计了具有850nm辐射波长的GaAlAs/GaAs非均匀阱宽多量子阱超辐射发光二极管结构,采用分子束外延(MBE)方法进行了材料制备。同时利用X射线双晶衍射,变温(10～300K)光致发光(PL)等方法检测分析了外延薄膜的结构和光电特性。在光致发光谱线中我们得到了发射波长850nm的谱峰,谱峰范围跨跃800～880nm,双晶回摆曲线结果显示了设计的结构得到实现。在注入电流140mA时,器件输出光谱的半峰全宽可以达到26nm,室温下连续输出功率达到6mW。     

GaAIAs／GaAs非均匀阱宽多量子阱超辐射发光管材料制备及表征

超辐射发光二极管（SLD）具有不同于半导体激光器和普通发光二极管的优异性能。为了制备高功率半导体超辐射发光管，并且得到比较大的光谱宽度、大的单程增益和抑制电流饱和，我们研究设计了具有850nm辐射波长的GaAlAs／GaAs非均匀阱宽多量子阱超辐射发光二极管结构，采用分子束外延（MBE）方法进行了材料制备。同时利用X射线双晶衍射，变温（10～300K）光致发光（PL）等方法检测分析了外延薄膜的结构和光电特性。在光致发光谱线中我们得到了发射波长850nm的谱峰，谱峰范围跨跃800～880nm，双晶回摆曲线结果显示了设计的结构得到实现。在注入电流140mA时，器件输出光谱的半峰全宽可以达到26nm，室温下连续输出功率达到6mw。     

1310 nm高功率超辐射发光二极管的制备及性能研究

为优化1310 nm超辐射发光二极管输出性能,提高器件输出功率,针对J型波导结构的1310 nm超辐射发光二极管的波导结构参数及器件散热能力进行研究.结果表明波导刻蚀深度、弯曲角度和绝缘层厚度是影响器件实现高功率输出的重要因素.基于研究结果对超辐射发光二极管器件结构及工艺进行优化,制备出脊宽5μm、弯曲角度8°、刻蚀深...     

1.3μmInGaAsP/InP涂层结构超辐射发光二极管输出特性的理论和实验

本文用考虑了增益饱和和热效应的耦合速率方程,对减反射涂层结构1.3μmInGaAsP/InP超辐射发光二极管的输出特性进行了计算,给出了腔长、有源层厚度和后腔面反射率对其输出光功率的影响以及光谱半宽随腔长和注入电流的变化。计算结果与我们制备的该结构超辐射发光二极管测试结果有较好的符合。     

带介质分布式Bragg反射镜结构高性能共振腔发光二极管的研究

采用等离子体增强化学气相沉积高低频交替生长法生长了SiO₂/Si₃N₄透明介质分布式Bragg反射镜(DDBR), 提出了对DDBR采用干、湿法并用的腐蚀方法. 采用传输矩阵法理论分析了DDBR, 得出了为满足出光增益要求的反射率和DDBR结构. 使用光致发光(PL)谱仪测量分析了DDBR反射谱和光致发光谱, 获得了使光致发光谱辐射增强的DDBR结构, 在整个光致发光谱380–780 nm波段, 整体辐射增强1.058倍, 在谐振波长处辐射增强1.5倍, 半峰全宽值由23 nm变窄为10.5 nm, 获得了很好的光谱纯度. 利用最优DDBR结构制成了高性能共振腔发光二极管器件, 与普通结构相比, 实现了低开启电压1.78 V; 在20 mA注入电流下, 轴向光强提高了20%, 光功率和光效分别提高了27.7%和26.8%, 光功率衰减缓慢; 在0–100 mA注入电流下, 没有明显的下降趋势, 表现出了良好的温度稳定性. 关键词： 发光二极管 共振腔 介质分布式布拉格反射镜 辐射增强     

重复稳定的掺氮磷化镓液相外延

本文简要地评述磷化镓外延生长技术,指出采用气相掺杂过补偿液相外延技术,适合于制备较高外量子效率的磷化镓绿色发光器件所需的外延生长层.从既能获得较高发光效率又能满足工业批量生产要求出发,设计制造了采用滑板技术及气相掺氮和掺锌的过补偿液相外延生长装置.装置具有结构简单,操作方便,便于控制等特点.应用该装置进行试验,总结了外延生长主要工艺和典型的生长条件.连续十余次外延生长的实验结果表明,所采用的液相外延生长技术,能稳定重复地生长出符合于制备较高外量子效率的绿色发光器件所需的掺氮磷化镓外延生长层.用该材料制成绿色发光二极管,当发光面积为500×500微米2,电流密度为12A/cm2时,总光通量一般大于10毫流明.最高的达到了19.85毫流明.由此说明,本文所报导的液相外延技术适合于工业上批量生产磷化镓绿色发光二极管.     

MOCVD原位红外测温方法的比较研究

MOCVD原位红外测温方法主要有单色辐射测温法与双波长比色测温法。利用薄膜等厚干涉模型与Kirchhoff定律计算了Si (111)衬底生长10 m GaN外延片的940 nm、1 550 nm光谱发射率,以Thomas Swan CSS MOCVD为例,比较了500 ℃至1 300 ℃范围内,940 nm单色辐射测温法、1 550 nm单色辐射测温法、940 nm与1 550 nm双波长比色测温法的相对误差和相对灵敏度,以及单色辐射测温法与双波长比色测温法的校准修正,并利用940 nm与1 550 nm双波长比色测温法在线监测了Si (111)衬底生长InGaN/GaN MQW 结构LED外延片过程中的温度。研究表明:940 nm与1 550 nm双波长比色测温法在相对误差及有效探测孔径修正校准上优于940 nm单色辐射测温法和1 550 nm单色辐射测温法,该结论可为MOCVD原位红外测温设备开发提供参考。     

高效率缓变带隙Ga_(1-x)Al_xA_s发光二极管

外量子效率高达27％、几何形状简单(划成矩形方块)的新型发光二极管已研制成功。二极管所用材料是采用一次多片液相外延技术制得的,此材料中的Al组份有一很大的梯度。除去GaAs衬底,就可以利用这个梯度,使光子沿着吸收非常低的路经,从外延层开始生长这边射出。这种发光二极管的光谱分布可以在很大的范围内变化。加速老化研究表明,这种二极管具有很高的可靠性。     

辐射与发光 发光与发光器件

IN312．8 2005031617 850 nm超辐射发光二极管=Superluminescent diodes at 850 nm[刊,中]／廖柯(重庆光电所．重庆(400060)),刘刚 明…∥半导体光电．-2004,25(4)．-257-261 设计并制作了一种用于中低精度光纤陀螺系统的850 nm超辐射发光二极管,对器件的波导模式进行了分析,给 出了主要技术参数的设计和测试结果。实验结果表明,器     

窗口吸收区结构超辐射发光二极管的优化设计与特性研究

本文从理论上对1.3μm InGaAsP/InP窗口吸收区结构超辐射发光二极管进行了优化设计.并在考虑增益饱和和热效应的条件下,用耦合速率方程模拟计算了该结构超辐射发光二极管的功率输出特性.分析研究了窗口区长、泵浦区长、有源层厚度和输出腔面反射率对其输出特性的影响.研究结果表明,由于窗口吸收区的有效散射和吸收,很好地抑制了F-P受激振荡,可用于实现高性能超辐射发光二极管.     

Channeled substrate window twin stripe GaAs/GaAlAs visible laser: Fabrication and steady state analysis

GaAs/GaAlAs high power window stripe lasers are developed with straight ac-tive layer in region adjacent to facet and curved active layer in central part.Only one-step liq-uid-phase epitaxy(LPE)growth is used in the fabvrication to from two internal current patheslaterally,allowing of a very simple fabrication process.Optical coupling from two stimulatingregions makes less beam divergence.The steady state analysis of such laser structure agreewell with experimental results.     

MOVPE Growth and Fabrication of 1.3μm High Power InGaAsP-InP Polarization-Insensitive Superluminescent Diodes with Complex Strained Quantum Wells

High power polarization-insensitive InGaAsP-InP multiple quantum well (MQW) superluminescent diodes (SLD's) emitting at 1.3μm were investigated. A combination of tensile strained and compressively strained quantum wells called complex strained MQW were used in a single active layer in order to obtain polarization insensitivity. Low-pressure metalorganic chemical vapor phase epitaxy was used for crystal growth. High resolution X-ray diffraction and photoluminescence spectra showed excellent crystal quality. The SLD's were fabricated to ridge waveguide structure with 7° tilted cavity, the two facets were coated with two layers anti-reflection TiO₂/SiO₂ films, residual facet reflectivity was found to be less than 0.04%. The SLD's exhibited a up to 18.8 mW optical output power and less than 1 dB polarization dependence of output power with a less than 0.5 dB optical spectra modulation at 250 mA.     

Epitaxial Nd:YLF linear waveguide laser

We report laser operation in planar and linear Nd:YLF waveguide structures grown by liquid-phase epitaxy (LPE). We could reduce the relatively high threshold of 115-mW incident pump power observed for the planar waveguide to 8 mW in a ridge-type structure that we obtained by mechanical polishing and subsequent growth of a cladding layer. Substantial improvements seem possible with reduction of the losses caused by imperfect end-face reflection and scattering, as well as by use of techniques capable of producing smaller structures than the 40-mum-wide triangular ridge cross section that was obtained with polishing. Since the LPE technique is applicable to other activator ions as well, it might offer a route to development of low-threshold upconversion lasers.     

Graded tensile-strained bulk InGaAs/InP superluminescent diode with very wide emission spectrum

A kind of novel broad-band superluminescent diodes (SLDs) using graded tensile-strained bulk InGaAs is developed. The graded tensile-strained bulk InGaAs is obtained by changing only group-Ⅲ trimethylgallium source flow during low-pressure metal organic vapor-phase epitaxy. At the injection current of 200mA, the fabricated SLDs with such structure demonstrate full-width at half-maximum spectral width of 106 nm and the output light power of 13.6 mW, respectively.     

InGaAsP/GaAs SCH SQW laser arrays grown by LPE

InGaAsP/InGaP/GaAs separate confinement heterostructure (SCH) single quantum well (SQW) laser structures have been obtained by an improved liquid-phase epitaxy (LPE) process. Wide-contact stripe lasers have been fabricated with threshold current density below 300 A/cm² and cavity length of 800 μm. Finally, with the same grown wafers, 1-cm bar laser diode (LD) arrays are made with 150 μm wide stripes and a maximum fill factor of 30%. Continuous Wave (CW) power output of 20 W has been reached.     

Liquid phase epitaxy

This paper presents a comprehensive review of the method of liquid phase epitaxy (LPE) of semiconductors. In Sect. 1 the physical principles including diffusion-limited growth and solid-liquid phase diagrams are treated in detail. In Sect. 2 technological aspects and various kind of growth systems including industrial versions are described. Section 3 summarizes the relevant properties of LPE grown layers. Section 4 contains the application of LPE to the material system InP/InGaAs/InGaAsP as a model system. In Sect. 5 the advantages and weaknesses of LPE with respect to device applications in comparison with competing methods are discussed, and finally we attempt to predict the future direction of LPE.     

宽带可调谐掺Yb3+双包层光纤激光器的研究

利用闪耀光栅构成可调谐Littrow外腔,对掺Yb³⁺双包层光纤激光器的波长调谐输出进行了实验研究.激光调谐输出波长范围70nm.针对光纤内的双折射效应对激光的输出功率的影响,实验中使用了在线光纤偏振控制器,从而有效地减小了调谐曲线的起伏及其与荧光谱的差别,并得到了窄线宽、线偏振、宽带调谐的激光输出.     

1.55μm单模激光管的研究

本文叙述了用液相外延法制得的1.55μm脊波导激光二极管。室温阈值电流100mA,单模线性输出5mW,光谱线宽小于2?,脉冲响应上升时间约为100ps。分析了影响阈值电流的诸因素,如有源层厚度d和掺杂水平等。也讨论了LD的输出模式与器件结构的关系。     

液相外延制备InGaAsP/InP掩埋异质结若干工艺问题的讨论

本文对InGaAsP/InP(DC-PBH)激光器掩埋异质结液相外延生长中的几个关键工艺问题进行了研究,提出了获得有利于沟道掩埋生长的理想沟道几何图形的新的腐蚀配方(Br_2/HBr),对二次外延再生长光刻腐蚀面损伤层和有害杂质的去除采用了阳极氧化工艺,同时探索了利用二次外延过程中Zn扩散来控制限制层(3)掺杂的新方法,在研究基础上制造了重现性好且性能良好的1.3μm激光二极管,室温时,阈值电流最低小于25mA,典型值为30mA,在60mA直流电流的驱动下,光输出功率高达12.5mW.