光栅光谱仪波长校准算法研究

使用正弦曲线拟合进行波长校准时,根据不同的待定系数选择方法,提出三种校准算法.最优算法选定四个待定系数,其中两个线性系数使用最小二乘法计算,而两个非线性系数使用最优化原理求得.线性算法只选定两个线性系数为待定量,而非线性系数为确定值.简化算法仅选定一个线性系数为待定量,其余三个系数为确定值.实测数据表明,线性算法拟合准确度接近最优解,计算复杂度低,是一种最适合于光栅光谱仪波长校准的算法.     

砷化镓光电阴极光谱响应与吸收率关系分析

为了研究砷化镓(GaAs)光电阴极光谱响应与吸收率曲线间的关系,采用分子束外延法(MBE)和金属有机化合物化学气相沉积法(MOCVD)制备了两类GaAs光电阴极,并测试得到了样品吸收率和光谱响应实验曲线.对每个样品的这两条曲线在同一坐标系中做最大值归一化处理,将归一的光谱响应曲线与归一的吸收率曲线做除法,得到了类似光电阴极表面势垒的形状.结果表明,两种方法制备的光电阴极光谱响应曲线相比吸收率曲线都发生了红移,MBE样品偏移量稍大于MOCVD样品.短波吸收率不截止,光谱响应截止于500 nm左右;可见光波段上,光谱响应曲线的峰值位置相比吸收率曲线红移了几百meV;近红外区域,光谱响应曲线的截止位置相比吸收率曲线红移了几个meV.MOCVD样品中杂质对带隙的影响更小,光谱响应相比吸收率发生的能量偏移更小.这些结论对提高GaAs光电阴极光电发射性能有指导意义.     

4.48 nm正入射软X射线激光用Cr/C多层膜高反射镜的研制

针对4.48nm类镍钽软X射线激光及其应用实验,设计制备了工作于这一波长的近正入射多层膜高反射镜。选择Cr/C为制备4.48nm高反射多层膜的材料对,通过优化设计,确定了多层膜的周期、周期数以及两种材料的厚度比。模拟了多层膜非理想界面对高反射多层膜性能的影响。采用直流磁控溅射方法在超光滑硅基片上实现了200周期Cr/C多层膜高反射镜的制备。利用X射线衍射仪测量了多层膜结构,在德国BessyⅡ同步辐射上测量了在工作波长处多层膜反射率,测量的峰值反射率达7.5%。对衍射仪测量的掠入射反射曲线和同步辐射测量的反射率曲线分别进行拟合,得到的粗糙度和厚度比的结果相近。测试结果表明,所制备的Cr/C多层膜样品结构良好,在指定工作波长处有较高的反射峰,达到了设计要求。     

Layer magnetization canting in 57Fe/FeSi multilayer observed by synchrotron Mössbauer reflectometry

Synchrotron Mössbauer reflectometry and CEMS results on a [⁵⁷Fe(2.55 nm)/FeSi\break(1.57 nm)]₁₀ multilayer (ML) on a Zerodur substrate are reported. CEMS spectra are satisfactorily fitted by α‐Fe and an interface layer of random α‐(Fe, Si) alloy of 20% of the ⁵⁷Fe layer thickness on both sides of the individual Fe layers. Kerr loops show a fully compensated AF magnetic layer structure. Prompt X‐ray reflectivity curves show the structural ML Bragg peak and Kiessig oscillations corresponding to a bilayer period and total film thickness of 4.12 and 41.2 nm, respectively. Grazing incidence nuclear resonant Θ–2Θ scans and time spectra (E = 14.413 keV, λ = 0.0860 nm) were recorded in different external magnetic fields (0 < B^ext < 0.95 T) perpendicular to the scattering plane. The time integral delayed nuclear Θ–2Θ scans reveal the magnetic ML period doubling. With increasing transversal external magnetic field, the antiferromagnetic ML Bragg peak disappears due to Fe layer magnetization canting, the extent of which is calculated from the fit of the time spectra and the Θ–2Θ scans using an optical approach. In a weak external field the Fe layer magnetization directions are neither parallel with nor perpendicular to the external field. We suggest that the interlayer coupling in [Fe/FeSi]₁₀ varies with the distance from the substrate and the ML consists of two magnetically distinct regions, being of ferromagnetic character near substrate and antiferromagnetic closer to the surface.     

基于微面斜率法的粗糙表面半透明介质层光谱散射特性分析

对具有一维高斯分布粗糙表面的半透明介质层光谱散射,基于微面斜率法建立了考虑遮蔽效应的粗糙表面光谱辐射传递概率模型,采用蒙特卡罗法模拟光谱辐射能束在粗糙表面、半透明介质层介质与镜反射基底之间的多次反射、折射和吸收等传递过程。通过数值模拟,分析了介质层表面粗糙度、光谱光学厚度、折射率和基底反射率对介质层双向反射分布函数(BRDF)的影响。结果表明,表面粗糙程度不同时,反射峰值随入射角度呈现不同的变化趋势;表面粗糙度增加或折射率增大都将导致漫反射份额增大;介质层光谱光学厚度和基底反射率主要影响BRDF的数值大小,而对BRDF的分布形态影响很小。     

低温退火的X射线W/Si多层膜应力和结构性能

W/Si多层膜反射镜在硬X射线天文望远镜中有重要应用. 为减小其应力对反射镜面形和望远镜分辨率的影响, 同时保证较高的反射率, 采用150, 175和200 ℃ 的低温退火工艺对采用磁控溅射镀制的W/Si周期多层膜进行后处理. 利用掠入射X射线反射测试和样品表面面形测试对退火前后W/Si多层膜的应力和结构进行表征. 结果表明, 在150 ℃ 退火3 h 后, 多层膜1级峰反射率和膜层结构几乎没有发生变化, 应力减少约27%; 在175 ℃ 退火3 h后, 多层膜膜层结构开始发生变化, 应力减少约50%; 在200 ℃退火3 h 后, 多层膜应力减小超过60%, 但1级布拉格峰反射率相对下降17%, 且膜层结构发生了较大变化. W, Si界面层的增大和相互扩散加剧是应力和反射率下降的主要原因.     

Capping layers for extreme-ultraviolet multilayer interference coatings

The reflectivity of extreme-ultraviolet thin-film multilayer (ML) interference coatings, terminated by a native oxide or other capping layer (CL), is critically dependent on the thickness of the final deposited layer of the top period. We show in this numerical study that, for a molybdenum-silicon ML, a high reflectivity loss may be incurred if the final Si layer is not of optimum thickness. For maximum reflectivity the thickness of the final Si layer must be controlled such that the node of the standing wave lies within the absorptive CL.The final Si layer may be replaced, at the expense of reflectivity, by SiC and capped with another inert material for improved protection of the ML.     

HgCdTe组分不均性对X射线反射率的影响

本征反射率是X射线衍射摇摆曲线计算机模拟的基础。用X射线动力学理论研究了组分不均匀对HgCdTe材料X射线反射率的影响。研究结果表明,横向组分不均匀性直接影响摇摆曲线的峰形,峰值反射率和半峰全宽随组分不均匀的增大而分别减小和增大,且与组分不均匀性的均方差近似成指数关系,但其积分反射率却基本保持不变;采用多层模型对具有线性组分梯度的HgCdTe半导体材料反射率的计算结果则表明,纵向组分梯度除导致反射率峰值强度下降外,还会引起摇摆曲线产生单边干涉效应,摇摆曲线的半峰全宽和干涉峰间距随组分梯度的增加而增大,而干涉峰间距与干涉周期之间的关系则随组分梯度的增加其偏离线性的程度增大。     

ZnO thin film characterization by X-ray reflectivity optimization using genetic algorithm and Fourier transformation

Zinc oxide (ZnO) thin film was fabricated by sol-gel spin coating method on glass substrate. X-ray reflectivity (XRR) and its optimization have been used for characterization and extracting physical parameters of the film. Genetic algorithm (GA) has been applied for this optimization process. The model independent information was needed to establish data analyzing process for X-ray reflectivity before optimization process. Independent information was exploited from Fourier transform of Fresnel reflectivity normalized X-ray reflectivity. This Fourier transformation (Auto Correlation Function) yields thickness of each coated layer on substrate. This information is a keynote for constructing optimization process. Specular X-ray reflectivity optimization yields structural parameters such as thickness, roughness of surface and interface and electron density profile of the film. Acceptable agreement exists between results obtained from Fourier transformation and X-ray reflectivity fitting.     

SH wave propagation in a piezoelectric/piezomagnetic plate with an imperfect magnetoelectroelastic interface

In this paper, we investigate the SH wave propagation in a layered piezoelectric (PE) and piezomagnetic (PM) plate with an imperfect magnetoelectroelastic interface. A linear magnetoelectroelastic spring model is used to describe the weakness of the imperfect interface. On the basis of this model, dispersion curves and mode shapes of the SH waves are computed. In particular, a PZT-5A/CoFe₂O₄ composite plate is considered in the numerical examples to calculate the dispersion curves and the mode shapes for different combinations of the magnetic, electrical and elastic spring constants. The effects of the layer thickness ratio and the electric-magnetic boundary conditions on the dispersion curves are discussed in details. Our results show that for a general weak bonding case, the high modes of the dispersion curves are not monotonous in the range of small wave numbers. With the layer thickness ratio increasing, the wave velocities of the SH waves increase. The electric boundary conditions mainly determine the dispersion curves of the SH waves in the case of a small layer thickness ratio, i.e. a large thickness of the PE layer. The present results have relevant applications in the nondestructive testing and evaluation of the layered PE/PM plate-like wave devices.     

窄带高反射光纤布拉格反射滤波器

利用改进的非对称六层波导模型，分析了光纤布拉格反射滤波器的特性。讨论了波导结构参数－主要是高折射率层的厚度对器件特性的影响，指出了在制作过程中控制器件反射率的途径。     

硅基片上微米厚度SiO2膜的斜入射红外反射透过谱分析

介绍了硅基片上具有微米厚度的SiO2膜在斜入射情况下的红外反射透过谱测量结果,发现在900~1250cm-1波段内的结果有别于一般的透射谱,出现了峰位基本不变的1100cm-1反射峰。随厚度增大,1100cm-1峰和1200cm-1凹谷的降低逐渐变为迟缓。当厚度达到2μm以上后,1075~1250cm-1谱线的变化已不再明显。通过分析表明,结果中包含了SiO2膜的表面反射谱和SiO2膜层的吸收谱。当膜厚达到微米量级而引起较大吸收时,表面反射谱的贡献相当明显。此时,对该段谱线的分析不能仅考虑膜层的吸收。     

19.5nm极紫外反射镜的研制

介绍了一种用于太阳观测19.5nm极紫外多层膜的研究工作。利用软件对规整的Mo/Si膜系结构进行了优化,拓宽了反射带宽,提高了积分反射率。采用双离子束溅射技术,时间控厚,成功制备了该反射镜。通过同步辐射反射率计测试表明,峰值反射率27.5%,均匀性在1%以内,已初步达到预设要求。     

Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm. PACS 78.67.Pt; 78.66.-W; 81.15.Cd     

Theoretical analysis of the spectra of X-ray resonant magnetic reflectivity

We have developed the general computer code for the calculations of reflectivity with polarization analysis from an arbitrary anisotropic multilayer, which allows us to test different approaches for the Bragg reflectivity spectrum treatment. We have proved the validity of the usage of the Bragg peak position for the determination of the energy dependence of the diagonal component of resonant susceptibility tensor, but revealed the essential discrepancy of this procedure for the off-diagonal term determination. The explanation lies in the polarization mixture by multiple reflections at large glancing angles. By the model calculations we have shown that in L-MOKE geometry the observed difference of the integrated Bragg peak reflectivity for the (+) and (−) field direction is predominantly caused by the magnetization of the central part of resonant layer at the first-order Bragg peak, but it is very sensitive to the interface magnetization at the second-order Bragg peak.     

Effects of Interface Roughness on Interlayer Coupling in Fe/Cr/Fe Structure

Effect of interface roughness on antiferromagnetic coupling between Fe layers in a Fe/Cr/Fe trilayer, with Cr layer having a wedge form has been studied. All the samples have been deposited simultaneously on substrates having different roughness, thus it is being considered that there is no variation in the morphological features like grain size and grain texture of the films. Measurements have been done as a function of Cr spacer layer thickness and the peak value of antiferromagnetic coupling strength is compared among different trilayers, thus any influence of spacer layer thickness fluctuation from sample to sample has also been avoided. The samples are characterized by X-ray reflectivity (XRR) and magneto-optic Kerr effect (MOKE). XRR results show that the roughness of the substrate is not replicated at the successive interfaces. Antiferromagnetic coupling between Fe layers decreases with the increase of roughness of Fe/Cr/Fe interfaces.     

Layer spacings in coherently strained epitaxial metal films

Laterally resolved measurements of the quantum size effect (QSE) in electron reflectivity are made with low energy electron microscopy on coherently strained Ag films on a W(110) surface. The evolution of the total film thickness with increasing number of atomic layers is determined accurately by dynamical theory analysis of the QSE features. Combined with a model of layer spacings obtained from first-principles calculations, this provides for a novel approach to determine the buried interface layer spacing, which is inaccessible to other methods.     

An improved model for computing the reflectivity of a AlAs/GaAs based distributed bragg reflector and vertical cavity surface emitting laser

In this paper, reflectivity of a Distributed Bragg Reflector (DBR) has been computed by considering the effects of changes of wavelength on the changes of the refractive index of the materials of DBR layers. The intrinsic losses of the materials have been included in the computation of the reflectivity of the DBR. It has been found that the effect of change of the wavelength on the refractive index of the DBR materials reduces the Full Width Half Maxima (FWHM) of the stop band significantly which is expected to improve the laser characteristics. If the FWHM is reduced, the thickness of the active layer of a VCSEL can also be reduced which will further reduce the threshold current of the device. It has been found that the intrinsic losses of the materials have a significant effect on the reflectivity of a DBR. It has also been found that peak reflectivity of a 20 pair AlAs/GaAs DBR reduces by 0.2% after including the intrinsic losses (with a value of the intrinsic losses α = 10 cm^?1).     

Design of the chirped Mo/Si multilayer mirror with SiC capping layer in extreme ultraviolet region

The design procedures were discussed in detail for a normal incident chirped Mo/Si multilayer mirror with Group Delay Dispersion (GDD) of ?3600 as² in the wavelength region of 13–17 nm. The GDD was calculated using an analytical approach by fitting the optical constants of the coating materials in the wavelength range of 12.8–17.2 nm, respectively. The final structure of the chirped mirror was obtained by using the simplex algorithm from the initial structure obtained by the genetic algorithm based on structure generated by a random generator. After considering the interfacial roughness and layers thickness deviation, the effects on the reflectivity and the GDD were discussed. It was found that the average reflectivity decreases from 5.98% to 4.22% and the average GDD decreases from ?3561.86 as² to ?3462.03 as², the vibration of GDD were larger than that of the reflectivity. The reflectivity was affected greatly by the 9th layer and the GDD was affected greatly by the 25th layer when each layer thickness changes ±0.2 nm. Compared with the GDD, the reflectivity was affected greatly by the layer thickness error.