低损耗有机无机混合溶胶凝胶波导的实验研究

利用有机无机混合的溶胶凝胶方法在硅基底上制备波导薄膜.采用正硅酸四乙酯和苯基三乙氧基硅烷作为反应先驱物,利用旋涂的方法成膜,对其折射率,传输损耗以及条形波导的光刻、刻蚀特性进行了研究.测量了波导薄膜折射率随成分变化的关系.实验表明,该方法工艺简单,可以获得具有较低损耗的波导薄膜.测试得到632.8 nm波段的损耗系数为0.23 dB/cm.采用ICP刻蚀工艺获得了较为平整的条形波导.     

单晶硅表面有机硅烷/Ag2O纳米微粒复合自组装膜的制备和表征

利用分子自组装成膜技术 ,在单晶硅表面制备了有机硅烷 /Ag2 O纳米微粒复合膜 .应用接触角测定仪、原子力显微镜和X射线光电子能谱仪分析表征了薄膜的组成和结构 .结果表明 ,通过硅烷偶联剂 3 氨丙基 三乙氧基硅烷在单晶硅基底表面的成功组装 ,获得了较为均匀的硅烷化表面 ,而Ag2 O纳米微粒可在硅烷化表面成功地进行组装 ,并呈亚单层排布     

集成光学 光波导材料与制备

TN252 2006043283低损耗有机无机混合溶胶凝胶波导的实验研究=Alowloss planar waveguide by using organic-inorganic sol-gel[刊,中]/庞拂飞(中科院上海光机所.上海(201800)) ,韩秀友…∥光子学报.—2006 ,35(4) .—509-512利用有机无机混合的溶胶凝胶方法在硅基底上制备波导薄膜。采用正硅酸四乙酯和苯基三乙氧基硅烷作为反应先驱物,利用旋涂的方法成膜,对其折射率,传输损耗以及条形波导的光刻、刻蚀特性进行了研究。测量了波导薄膜折射率随成分变化的关系。实验表明,该方法工艺简单,可以获得具有较低损耗的波导薄膜。测试得到632 .8nm…     

新型杂萘联苯型聚芳醚砜硐聚合物光子材料成膜和光学特性

对新型聚合物光子材料杂萘联苯型聚芳醚砜硐(PPESK)波导薄膜的成膜工艺进行了系统的研究。分析了溶剂吸水性对成膜质量的影响,并通过氮气保护的方法获得了具有良好均一性的波导薄膜,其厚度一致性可优于1%,折射率一致性优于0.03%。采用棱镜耦合技术测量分析了PPESK波导薄膜的折射率、双折射、热光系数等光学特性,测量得到该材料在1310 nm波长处的损耗小于0.24 dB/cm,在1550 nm波长处的损耗小于0.52 dB/cm,表明该材料是一类性能良好的聚合物光子材料。     

高压PECVD技术沉积硅基薄膜过程中硅烷状态的研究

采用高压射频等离子体增强化学气相沉积(RF-PECVD)方法在不同功率下制备了一系列硅薄膜材料，研究了材料晶化率和生长速度随功率变化的规律， 进而研究PECVD方法沉积硅薄膜过程中的硅烷反应状态，并提出可以根据硅烷耗尽程度的不同将硅烷反应状态分为未耗尽、耗尽和过耗尽三种.然后，对不同硅烷反应状态下的材料结构、光电性能以及相应的电池进行了研究，并指出适合于太阳电池本征层的高质量微晶硅材料应该沉积在硅烷耗尽状态. 关键词： 耗尽状态 微晶硅 光发射谱     

双色俘精酸酐薄膜的双波长图像光存储

采用两种光致变色俘精酸酐体系化合物[1,2,4-三甲基-5-苯基-3-吡咯甲叉(异丙叉)俘精酸酐和对-N,N-二甲基苯基-2-甲基-3-恶唑甲叉(异丙叉)俘精酸酐]制备了单层双色聚甲基丙烯酸甲酯(PMMA)复合薄膜感光记录材料。采用双波长(650nm和488nm)图像存储和读出光路,实现了用两种波长在双色复合薄膜的同一位置同时记录两幅图像。当分别用各自对应的波长读出时,两幅图像各自获得了高衬比度,且二者之间的串扰很小,证明了在双色光致变色俘精酸酐材料上进行双波长复用图像光存储的可行性。     

用于KDP晶体的桥式聚倍半硅氧烷防潮膜

 以间苯亚甲基二异氰酸酯与氨丙基三乙氧基硅烷反应制备了具有长桥链结构的聚倍半硅氧烷前驱体,利用制备的前驱体在碱性条件下水解缩聚制备了桥式聚倍半硅氧烷溶胶,并采用提拉浸涂法对磷酸二氢钾（KDP）晶体镀膜。通过1H NMR 对前驱体进行结构定性,利用²⁹Si MAS NMR和N₂吸附-脱附表征对凝胶结构进行了分析,用AFM对薄膜的表面形貌进行了研究,通过湿度为60%时KDP晶体光学性质的变化考察了薄膜的防潮性能。利用三倍频和基频激光测试了薄膜的抗激光损伤性能。结果表明:这种桥式聚倍半硅氧烷薄膜对KDP晶体具有很好的防潮保护作用,并显示了较好的抗激光损伤性能。     

溶胶-凝胶法制备光波导薄膜及性质的研究

采用有机改性硅酸盐制备了光敏性溶胶－凝胶,并在凝胶中加入四丙氧基锆作为调节折射率的材料;用该凝胶在硅片上提拉成膜.为了增加薄膜与硅片的粘附性,成膜前先用干氧热氧化法在硅片上生长了一层厚度约为1500的二氧化硅;样品的原子力相片表明薄膜的表面非常平整,在5×5 μm2的范围内最大表面起伏只有0.657 nm.利用波导阵列掩膜版, 对制备的薄膜在紫外光波段下曝光,得到了表面平坦、侧墙光滑、陡直的沟道波导阵列.研究发现:紫外曝光时间和坚膜时的后烘温度都会使薄膜的折射率增大.通过对样品红外吸收谱的分析,从微观机理上解释了折射率随工艺条件变化的原因.     

导致光聚物全息存储布喇格偏移因素的研究

研究了光聚物高密度全息存储材料在全息记录过程中曝光量、曝光时间、厚度收缩比例、折射率调制度及记录角度等因素对布喇格偏移的影响规律,结果表明:曝光量一定时,布喇格偏移与曝光时间的关系不大,当曝光量不一定时布喇格偏移随曝光时间增加缓慢增加最后达到饱和;而布喇格偏移随厚度收缩比例和折射率调制度的增加以接近正比例的关系增加;记录光栅的倾斜度越大则布喇格偏移也越大.这些结论对光聚物高密度全息存储研究具有重要的意义.     

硅掺杂辉光放电聚合物薄膜的热稳定性研究

采用等离子体辉光放电聚合技术,在不同四甲基硅烷(TMS)流量条件下制备了硅掺杂辉光放电聚合物(Si-GDP)薄膜,采用傅里叶变换红外光谱、X射线光电子能谱和热重(TG)分析技术分析了不同TMS流量对Si-GDP薄膜结构与热稳定性的影响.结果表明:随着TMS流量在0–0.06 cm³/min范围变化,Si-GDP薄膜中Si的原子含量C_Si为0–16.62%;含Si红外吸收峰的相对强度随TMS流量的增加而明显增大;Si-GDP薄膜的TG分析显示,温度在300 ℃时,随TMS流量的增加,Si-GDP薄膜的失重减少,热稳定性增强. 关键词： 硅掺杂辉光放电聚合物薄膜 X射线光电子能谱 热稳定性     

As2S8玻璃条形波导的光激励法制备技术研究

为了在As2S8薄膜中制备条形波导,实验研究了As2S8薄膜光致折射率变化和密度变化的现象,采用棱镜耦合、X线衍射和远红外反射光谱等测试技术,确认了As2S8薄膜经紫外光辐照后薄膜密度增高、折射率增大的现象。采用可见光吸收谱测试技术,确认了经紫外光辐照的As2S8薄膜不发生黑化现象。在归纳了实验规律的基础上,提出并采用紫外光激励的方法试制了As2S8条形波导,采用自动调芯端面耦合的方法激励As2S8条形波导的导模,结果显示该波导具有良好的导波特性。     

硅基光波导芯层材料及波导分束器的制备

本文采用溶胶－凝胶法制备了具有紫外感光性的SiO2/ZrO2/H有机无机复合薄膜,利用分光式椭偏仪测得该薄膜在光纤的常用通信窗口0.85 μm、1.31 μm和1.55 μm波长附近折射率分别为1.556 9、1.548 9和1.547 2,与下包层SiO2的折射率（1.46）相比,其折射率差比δ分别为6.64％,6.09％和5.97％,可作为芯层材料用于光波导的制备.通过控制提拉速率可以制作出厚度分别为1.29,2.20,4.00,5.44和6.82 μm的SiO2/ZrO2/H芯层薄膜,以满足0,1,2,3和4阶导模的传输要求.进而利用该薄膜自身的感光特性结合紫外掩模法,制备出相应厚度的1×8Y分支光功率分配器.通光实验表明,该光功分器能够将1.53～1.56 μm波长的光限制在波导内,实现光的传输和分束功能.     

光波导技术同步测量棱镜及波导薄膜参数

依据全反射理论和棱镜耦合原理,实现了对棱镜折射率及波导薄膜材料折射率和厚度的同步测量。使用高准直半导体激光器激光入射到棱镜内部与波导膜的分界面上,逐步旋转棱镜或改变棱镜的入射角,得到棱镜耦合M线,曲线前面几组的波谷为波导模激发,在M线左侧收尾处有一个不完整波峰,其反射光强随入射角迅速衰减,为全反射时的临界点,由此可实现棱镜及波导薄膜参数的同步测量;用此法测量了棱镜耦合一体化平面波导棱镜的折射率和聚甲基丙烯酸甲酯(PMMA)聚合物波导薄膜的折射率和厚度。测量棱镜折射率精度为±1.9×10-4,波导薄膜折射率和厚度的精度分别为±6.2×10-4 μm和±1.6×10-2 μm。     

UV-illuminated chemical bath deposition of CdS buffer layer for CIGSSe solar cells

In this paper, we compare the performance of Cu(In,Ga)(S,Se)₂ (CIGSSe) thin film solar cells with a CdS buffer layer grown by chemical bath deposition (CBD) with UV irradiation of 365 nm or 254 nm at an output power of 8 W. The effects of UV light irradiation on the CBD-CdS thin film deposition mechanism were investigated through chemical and electro-optical studies. UV light irradiation during the solution process promotes the hydrolysis of thiourea, thereby inhibiting the formation of the intermediate products being developed on the reaction pathways and decreasing the solution pH. Therefore, the efficiency of the CdS/CIGSSe solar cells was improved because of the increased elemental ratio of S/(S + O) in the CdS thin film. This very simple and effective approach can be used to control the S/O ratio of the CdS thin film fabricated by the CBD process without artificially controlling the process temperature, solution pH or concentration.     

Modulation of refractive index and thickness of poly(methyl methacrylate) thin films with UV irradiation and heat treatment

This paper reports changes in refractive index and thickness of spin-coated poly(methyl methacrylate) (PMMA) thin films upon irradiation by a conventional high-pressure mercury UV lamp. Significant increase in refractive index and reduction in thickness are detected. Index modulations of greater than 0.01 are achieved in the thin films after 4 min of irradiation. The thickness reduction of an irradiated PMMA film is consistent with its weight loss. This is caused by the escape of the volatile molecules generated during the irradiation process. A slight increase in the refractive index is also found in the film, heat-treated above its glass transition temperature (Tg). This thermal effect is detected in the UV irradiation process. We propose three possible aliphatic structures that are formed during the photochemical reaction and may exist in the main chain of irradiated PMMA after the irradiation. Their refractive indices in aggregate state are greater than that of PMMA based on an evaluation using the Lorentz-Lorenz equation. This is suggested to be an important reason for the refractive index increase in the UV-irradiated PMMA films. A UV-irradiated film, heat-treated above its Tg, has a rough surface with many tiny holes as illustrated by atomic force microscopy. These holes are attributed to the evaporation of the small molecules generated during the irradiation process.     

基于平面波导激励的修正长程表面波的传感器研究

为了解决传统的强度检测型波导激励的表面等离子体共振传感器灵敏度不高的缺点,研究平面波导激励的介质膜-金属-被测介质的可激发修正的长程表面等离子体波结构。采用离子交换的方法制备折射率可用费米函数拟合的平面波导,研究了离子交换时间对平面波导的模数及等效折射率等特性的影响,为激励波导的优化设计提供有效依据。采用制备的平面波导激励介质膜-金属-被测介质的非对称结构,研究金属材质、介质膜厚和金属膜厚等因素对修正的长程表面等离子体波特性的影响,对被测溶液的折射率进行检测。实验结果表明,其灵敏度为传统的强度检测型表面等离子体共振传感器的6倍,并且具有较好的线性关系。     

Characteristics analysis of hybrid plasmonic waveguide for low-loss lightwave guiding

It has been experimentally demonstrated that a low-loss guided hybrid mode is supported if a metal strip is embedded in a low index polymer layer surrounded by two high index slabs. In this paper, further numerical analyses on the guided hybrid modes are reported to fully elucidate the characteristics of the hybrid plasmonic waveguide. For a one-dimensional slab structure with a metal film of infinite width, simulation results exhibit that low-loss guided hybrid modes are associated with surface plasmon modes and dual dielectric slab modes. The optical properties of the guided modes are improved by increasing the field intensity which is confined into lossless dielectric layers by decreasing the metal film thickness and increasing the refractive index and thickness of the high-index slabs. The finite element method is used to investigate the lateral mode confinement of the optical guided modes by the corresponding metal strip. By reducing the metal film width, the guided modes are confined in the plane transverse to the direction of propagation and the characteristics are significantly improved. The hybrid plasmonic waveguide can be exploited for long-range propagation-based application such as optical interconnection.     

Hydrophilicity of amorphous TiO2 ultra-thin films

The UV-light-induced hydrophilicity of amorphous titanium dioxide thin films obtained by radio frequency magnetron sputtering deposition was studied in relation with film thickness. The effect of UV light irradiation on the film hydrophilicity was fast, strong and did not depend on substrate or thickness for films thicker than a threshold value of about 12 nm, while for thinner films it was weak and dependent on substrate or thickness. The weak effect of UV light irradiation observed for the ultra-thin films (with thickness less than 12 nm) is explained based on results of measurements of surface topography, UV-light absorption and photocurrent decay in vacuum. Comparing to thicker films, the ultra-thin films have a smoother surface, which diminish their real surface area and density of defects, absorb partially the incident UV light radiation, and exhibit a longer decay time of the photocurrent in vacuum, which proves a spatial charge separation. All these effects may contribute to a low UV light irradiation effect on the ultra-thin film hydrophilicity.     

极化聚合物薄膜波导的光学特性

叙述了键合型ＤＡＮＳ聚合物薄膜波导的制备和极化过程。应用集成光学中的棱镜耦合技术,对ＤＮＡＳ聚合物薄膜波导极化前后以及紫外光照射前后的光学特性分别进行了表征。实验结果表明,极化后波导非寻常光折射率明显增大而波导寻常光折射率减小;经过紫外光照射后,波导折射率降低约０．０２。     

TE0导模干涉刻写周期可调亚波长光栅理论研究

通过棱镜耦合激发非对称金属包覆介质波导结构中的TE₀导波模式, 利用两束TE₀模的干涉从理论上实现了周期可调的亚波长光栅刻写. 分析了TE₀模式的色散关系, 刻写亚波长光栅的周期与激发光源、棱镜折射率、光刻胶薄膜厚度及折射率之间的关系. 用有限元方法数值模拟了金属薄膜、光刻胶薄膜和空气多层结构中TE₀导模的干涉场分布. 研究发现, 激发光源波长越短, TE₀ 模干涉刻写的亚波长光栅周期越小; 光刻胶越厚, 刻写的亚波长光栅周期越小; 高折射率光刻胶有利于更小周期亚波长光栅的刻写. 相较于表面等离子体干涉光刻, 基于TE₀ 模的干涉可在厚光刻胶条件下通过改变激发光源、棱镜折射率、光刻胶材料折射率、特别是光刻胶薄膜的厚度等多种方式实现对亚波长光栅周期的有效调控.