Influence of progressive cross-linking on dewetting of polystyrene thin films

We present dewetting experiments on thin polymer films as a function of cross-linking density. Covalent cross-links were obtained in the glassy state on the basis of azide photochemistry of linear random copolymers of styrene and p-(azidomethyl)styrene, i.e., 106 and 2500 kg/mol with 7% and 1% azide functionality among the polymer backbone, respectively. Upon ultraviolet radiation, azides generate highly unstable nitrene radicals which react with the surrounding polymer backbone, yielding covalent cross-links. We determined the probability for film rupture, defined by the number of holes formed per unit area, and the relaxation time (tauw) of residual stresses which resulted from the film preparation process. For the lower molar mass polymer studied and for azide conversion rates lower than 60%, only partial cross-linking occurred. The effective molar mass of the polymer increased, and consequently, an increase in tauw was observed. The increase in tauw was accompanied by a decrease in hole density, indicating that the still present residual stresses in the films were not able anymore to rupture the films at the high probability of un-cross-linked polymers. For high conversion (>60%), cross-linking was significant enough to lead to the formation of a three-dimensional rubbery network which, in turn, generated an elastic force that counteracted the driving forces. This elastic force eventually inhibited dewetting and the relaxation of residual stresses. Thus, at high conversions, the relaxation time tauw grew exponentially and the number of holes tended toward zero. For the higher molar mass polymer, no changes in the relaxation time tauw were observed for low conversion (<30%). However, at a higher conversion rate, tauw increased drastically, suggesting an almost infinitely long relaxation time at 100% conversion. Consequently, to successfully stabilize thin polymer films by cross-linking, it is preferable to use long polymer chains.     

Structure and dewetting behavior of polyhedral oligomeric silsesquioxane-filled polystyrene thin films

Polyhedral oligomeric silsesquioxane (POSS) meets increasing interest as a building unit for inorganic-organic hybrid materials. The incorporation of cyclopentyl-substituted POSS (CpPOSS) into polystyrene (PS) thin films led to an inhibition of dewetting. In this paper, the dispersion state of CpPOSS in the CpPOSS/PS hybrid films and, furthermore, the relationships between the structure and dewetting inhibition effect are discussed. Structural analysis of the hybrid films revealed that CpPOSS segregated to the film surface and crystallized. The segregation of CpPOSS to the surface changes the surface free energy and spreading coefficient of the film. Interfacial structure was also roughened by the segregation of CpPOSS, which can contribute to the inhibition of dewetting by pinning the contact line of the PS film with the substrate. The inhibition of dewetting can be attributed to the modification of the film surface and interface by the segregation of CpPOSS.     

Early and intermediate stages of guided dewetting in polystyrene thin films

We investigated the early and intermediate stages of the guided dewetting of polystyrene (PS) thin films on chemically patterned silicon, achieved by micro-contact printing of non-wettable self-assembling monolayers of an alkylsilane. Two different types of ordered patterns could be achieved depending on the annealing temperature and time. Study of the dynamics of hole growth revealed a deviation of the growth profile from the trend on homogeneous substrates, attributed to the pinning of the PS rims on the borders of the hydrophobic regions. The ordered patterns produced could be useful in applications that require spatially localized features of controlled surface chemistry, such as studies in proteomics, single cell studies, and biosensors.     

Nonsolvent-induced dewetting of thin polymer films

The process of nonsolvent-induced dewetting of thin polystyrene (PS) films on hydrophilic surfaces at room temperature has been studied by using water as a nonsolvent. It is observed that the process of nonsolvent-induced dewetting is greatly different from other previous dewetting processes. The PS film is found in nonviscous state in our study. A mechanism of nonsolvent-induced dewetting is deduced in an order of penetration, replacement, and coalescent, and it is different from other previous dewetting mechanisms. The results of experiments are analyzed from thermodynamics and dynamics to support the hypothetical mechanism.     

Viscoelastic dewetting of constrained polymer thin films

Thin films of fluids are playing a leading role in countless natural and industrial processes. Here we study the stability and dewetting dynamics of viscoelastic polymer thin films. The dewetting of polystyrene close to the glass transition reveals unexpected features: asymmetric rims collecting the dewetted liquid and logarithmic growth laws that we explain by considering the nonlinear velocity dependence of friction at the fluid/solid interface and by evoking residual stresses within the film. Systematically varying the time so that films were stored below the glass-transition temperature, we studied simultaneously the probability for film rupture and the dewetting dynamics at early stages. Both approaches proved independently the significance of residual stresses arising from the fast solvent evaporation associated with the spin-coating process. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 44: 3022–3030, 2006     

Direct measurement of molecular motion in freestanding polystyrene thin films

An optical photobleaching technique has been used to measure the reorientation of dilute probes in freestanding polystyrene films as thin as 14 nm. Temperature-ramping and isothermal anisotropy measurements reveal the existence of two subsets of probe molecules with different dynamics. While the slow subset shows bulk-like dynamics, the more mobile subset reorients within a few hundred seconds even at T(g,DSC) - 25 K (T(g,DSC) is the glass transition temperature of bulk polystyrene). At T(g,DSC) - 5 K, the mobility of these two subsets differs by 4 orders of magnitude. These data are interpreted as indicating the presence of a high-mobility layer at the film surface whose thickness is independent of polymer molecular weight and total film thickness. The thickness of the mobile surface layer increases with temperature and equals 7 nm at T(g,DSC).     

Thickness-dependent autophobic dewetting of thin polymer films on coated substrates

We demonstrate that the wetting behavior of a thin liquid film, poly(4-bromostyrene) (PBrS), on top of a solid substrate may be effectively controlled with the insertion of a secondary liquid film, poly(4-vinyl pyridine) (P4VP), underneath the primary film. This secondary film remains stable under all conditions, and can be viewed as an extension of the substrate itself. On the basis of results from X-ray standing waves generated via total external reflection from an X-ray mirror, time-of-flight secondary ion mass spectroscopy, optical microscopy, and atomic force microscopy, we construct the full Helmholtz free energy versus PBrS thickness curve using existing theories that account for both long- and short-range interactions. The form of the free energy curve, which contains an inflection point and an absolute minimum at a nonzero PBrS thickness, accurately reflects our observation that thick PBrS films undergo autophobic dewetting on top of the stable P4VP, while sufficiently thin PBrS films remain stable. The thickness of the autophobic wetting layer is controlled by the range of the repulsive interaction between the film and the substrate, and is found to be ～4 nm for the PBrS/P4VP interface.     

Partial dewetting of polyethylene thin films on rough silicon dioxide surfaces

The effect of roughness on the dewetting behavior of polyethylene thin films on silicon dioxide substrates is presented. Smooth and rough silicon dioxide substrates of 0.3 and 3.2-3.9 nm root-mean-square roughness were prepared by thermal oxidation of silicon wafers and plasma-enhanced chemical vapor deposition on silicon wafers, respectively. Polymer thin films of approximately 80 nm thickness were deposited by spin-coating on these substrates. Subsequent dewetting and crystallization of the polyethylene were observed by hot-stage optical microscopy in reflection mode. During heating, the polymer films melt and dewet on both substrates. Further observations after cooling indicate that, whereas complete dewetting occurs on the smooth substrate surface, partial dewetting occurs for the polymer film on the rough surface. The average thickness of the residual film on the rough surface was determined by ellipsometry to be a few nanometers, and the spatial distribution of the polymer in the cavities of the rough surface could be obtained by X-ray reflectometry. The residual film originates from the impregnation of the porous surface by the polymer fluid, leading to the observed partial dewetting behavior. This new type of partial dewetting should have important practical consequences, as most real surfaces exhibit significant roughness.     

Impact of chain architecture (branching) on the thermal and mechanical behavior of polystyrene thin films

The modulus and glass transition temperature (T_g) of ultrathin films of polystyrene (PS) with different branching architectures are examined via surface wrinkling and the discontinuity in the thermal expansion as determined from spectroscopic ellipsometry, respectively. Branching of the PS is systematically varied using multifunctional monomers to create comb, centipede, and star architectures with similar molecular masses. The bulk‐like (thick film) T_g for these polymers is 103 ± 2 °C and independent of branching and all films thinner than 40 nm exhibit reductions in T_g. There are subtle differences between the architectures with reductions in T_g for linear (25 °C), centipede (40 °C), comb (9 °C), and 4 armed star (9 °C) PS for ≈ 5 nm films. Interestingly, the room temperature modulus of the thick films is dependent upon the chain architecture with the star and comb polymers being the most compliant (≈2 GPa) whereas the centipede PS is most rigid (≈4 GPa). The comb PS exhibits no thickness dependence in moduli, whereas all other PS architectures examined show a decrease in modulus as the film thickness is decreased below ～40 nm. We hypothesize that the chain conformation leads to the apparent susceptibility of the polymer to reductions in moduli in thin films. These results provide insight into potential origins for thickness dependent properties of polymer thin films. © 2011 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2012     

Atomic force microscopy studies on the dewetting of perfluorinated ionomer thin films

The surface structure and dewetting process of thin films of complex perfluorinated ion‐containing polymers have been studied with atomic force microscopy. These polymers, or ionomers, consist of hydrophilic, hydrophobic, and ionic groups, which are noncompatible with one another, and this results in the association of the polymers into supramolecular structures. These types of polymers have a broad range of technological uses, ranging from thin selective coatings to fuel cells in the form of polymer electrolyte membranes. As the technology calls for thinner films, the interfacial structure and dynamics (wetting/dewetting) of the films become critical in controlling the overall behavior of the polymers. The ionomer under consideration forms structured films consisting of bundles of micelles. These ultrathin films do not dewet above the glass‐transition temperatures of the polymers, contrary to what has been observed in thin diblock copolymers. Perturbing the system with a high‐ionic‐strength solution, however, results in a breakup of the primary aggregate and enhances the adhesion of the films and their stability. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 41: 149–158, 2003     

Slippage of Newtonian liquids: influence on the dynamics of dewetting thin films

Slippage of Newtonian liquids in the presence of a solid substrate is a newly found phenomenon, the origin of which is still under debate. In this article, we present a new analysis method to extract the slip length. Enhancing the slip of liquids is an important issue for microfluidic devices that demand for high throughput at low pumping power. We study the velocity of short-chained liquid polystyrene (PS) films dewetting from nonwettable solid substrates. We show how the dynamics of dewetting is influenced by slippage, and we compare the results of two types of substrates that give rise to different slip lengths. As substrates, Si wafers that have been coated with octadecyltrichlorosilane (OTS) or dodecyltrichlorosilane (DTS) were used. Our results demonstrate that the dewetting velocity for PS films on DTS is significantly larger than on OTS and that this difference originates from the different slip lengths of the liquid on top of the two surfaces. For PS films of thickness between 130 and 230 nm, we find slip lengths between 400 nm and 6 microm, depending on substrate and temperature.     

Surface modification of thin polystyrene films

 The sulfonation of polystyrene (PS) films with 50 and 96% sulfuric acid as a function of time is presented. In contrast to previous literature reports, we showed that the treatment of PS films even with dilute sulfuric acid yields sulfonated surfaces after reaction times of 30 s–1 h. The hydrophilicity of the modified PS increased considerably in comparison to the unreacted PS films. X-ray photoelectron spectroscopy yielded evidence for the sulfonation of PS at the surface. Unreacted spin-coated PS films were very smooth, while modified PS showed some clumps dispersed on a flat surface, as analyzed by atomic force microscopy. The surface morphology was identified as a phase-separated system composed of domains of unreacted PS and a matrix of sulfonated PS by fluorescence microscopy using the positively charged dye rhodamine B. The adsorption of the polycation diallyldimethylammonium chloride on the sulfonated PS surface could be detected. The thickness of the adsorbed polycation was 2.2 nm. Received: 3 November 1998 Accepted in revised form: 23 February 1999     

Focused laser-induced marangoni dewetting for patterning polymer thin films

Highly-localized focused laser spike (FLaSk) heating of polymer thin films is a resist- and developer-free alternative to two-dimensional (2D) laser direct write for creating patterns on the single micron or, by exploiting overlap effects, submicron scale. The massive temporal and spatial thermal gradients and resulting thermal Marangoni stresses generated by FLaSk are an effective means for the directed dewetting and patterning of such films. Here, the general applicability of this technique to glassy amorphous polymer thin film systems is investigated through systematic investigation of film thickness, glass transition temperature, and polymer mobility. The results reveal that the important parameters are the film thickness (coupled to the optical heating effects through anti-reflection coating effects) and the high-temperature polymer melt mobility, allowing for generation of single features with linewidths of down to ∼1 μm. Further, the introduction of spatial mobility variations by using polymer brushes, bilayers, and microphase separated block copolymers leads to additional profile manipulation effects (i.e. spontaneous 2D pattern generation and flattened top profiles). © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 225–236     

Direct visualization of dewetting of molecularly thin liquid films on solid surfaces

The effect of the surface energy gamma, disjoining pressure, Pi, and roughness on the dewetting of molecularly thin liquid lubricant films on magnetic disks, which have sub-nanometer surface topography, has been investigated by visualizing the dewetting process directly using ellipsometric microscopy. The dewetting process of thin liquids on the rough surface is determined not only by the well-known instability of films, which is determined by the sign of dPi/dh, but also by the sign of Pi and the surface topography of the substrate even if its roughness is of the sub-nanometer order. The dewetting film formed small droplets, which were not along the surface topography of the substrate, when Pi < 0. On the other hand, it formed grooves along the surface topography with a sub-nanometer roughness when Pi > 0. Moreover, the sub-nanometer roughness initiated the dewetting of the metastable liquid thin films.     

Ordering phenomena in thin polystyrene films

Ordering of polystyrene (PS) molecules in thin films collapsed from toluene solutions onto a glass substrate by dip coating is studied in relation to the polymer molecular weight and its distribution. The degree of ordering of chain elements is deduced from measurements of film birefringence, between the normal and parallel directions to the film surface, as a function of film thickness. A technique has been developed for measuring this birefringence by monitoring the intensity of laser light passing through the film, as a function of the angle of incidence. Films of monodisperse low-molecular-weight PS exhibit high ordering very close to the substrate, but this ordering decays within 1 μm from the glass surface. Films of monodisperse high-molecular-weight PS, on the other hand, exhibit a much smaller, but very long-range degree of order. In a blend of PS of these two molecular weights, as well as in a polydisperse sample, these effects appear in tandem. The long-range ordering effect, evident in the 100,000 molecular weight polystyrene films, is much smaller in magnitude in lower-molecular-weight films, reflecting probably the importance of chain entanglements.     

Morphological evolution in dewetting polystyrene/polyhedral oligomeric silsesquioxane thin film bilayers

Morphological evolution in dewetting thin film bilayers of polystyrene (PS) and a polyhedral oligomeric silsesquioxane (POSS), trisilanolphenyl-POSS (TPP), was studied as a function of annealing temperature and annealing time. The results demonstrate unique dewetting morphologies in PS/TPP bilayers at elevated temperatures that are significantly different from those typically observed in dewetting polymer/polymer bilayers. During temperature ramp studies by optical microscopy (OM) in the reflection mode, PS/TPP bilayers form cracks with a weak optical contrast at approximately 130 degrees C. The crack formation is attributed to tensile stresses within the upper TPP layer. The weak optical contrast of the cracks observed in the bilayers for annealing temperatures below approximately 160 degrees C is consistent with the cracking and dewetting of only the upper TPP layer from the underlying PS layer. The optical contrast of the morphological features is significantly enhanced at annealing temperatures of >160 degrees C. This observation suggests dewetting of both the upper TPP and the lower PS layers that results in the exposure of the silicon substrate. Upon annealing the PS/TPP bilayers at 200 degrees C in a temperature jump experiment, the upper TPP layer undergoes instantaneous cracking as observed by OM. These cracks in the upper TPP layer serve as nucleation sites for rapid dewetting and aggregation of the TPP layer, as revealed by OM and atomic force microscopy (AFM). X-ray photoelectron spectroscopy (XPS) results indicated that dewetting of the lower PS layer ensued for annealing times >5 min and progressed up to 90 min. For annealing times >90 min, OM, AFM, and XPS results revealed complete dewetting of both the layers with the formation of TPP encapsulated PS droplets.     

Rubbing‐induced molecular alignment and its relaxation in polystyrene thin films

Rubbing‐induced molecular alignment and its relaxation in polystyrene (PS) thin films are studied with optical birefringence. A novel relaxation of the alignment is observed that is distinctly different from the known relaxation processes of PS. First, it is not the Kohlrausch–Williams–Watts type but instead is characterized by two single exponentials plus a temperature‐dependent constant. At temperatures several degrees or more below the glass‐transition temperature (T_g), the relaxation time falls between that of the α and β relaxations. Second, the decay time constants are the same within 40% for PS with weight‐average molecular weights (M_w's) of 13,700–550,000 Da at temperatures well below the sample T_g's, indicating that the molecular relaxations involved are mostly local within the entanglement distance. Nonetheless, the temperature at which the rubbing‐induced molecular alignment disappears (T₀) exhibits a strong M_w dependence and closely approximates the T_g of the sample. Furthermore, T₀ depends notably on the thickness of the polymer in much the same way as previously found for the T_g of supported PS films. This suggests that the α process becomes dominant near T_g. Preliminary spectroscopic studies in the mid‐infrared range show a significant degree of bending of the phenyl ring toward the sample surface, with the C? C bond connecting the phenyl ring and the main chain tends to lie along the rubbing direction, which indicates that the relaxation is connected with the reorientation of this C? C bond. We exclude the observed relaxation, as predominantly a near‐surface one, because detailed studies on the effects of rubbing conditions on the degree of molecular alignment indicate that the alignment is not local to the polymer–air surface. © 2001 John Wiley & Sons, Inc. J Polym Sci Part B: Polym Phys 39: 2906–2914, 2001     

Nonlinear evolution of thin liquid films dewetting near soft elastomeric layers

The nonlinear evolution of thin liquid films dewetting near soft elastomeric layers is examined in this work. Evolution equations are derived by applying the lubrication approximation and assuming that van der Waals forces in the liquid cause the dewetting and that the solid can be described as a linear viscoelastic material. Two cases are examined: (i) a liquid layer resting on an elastomer bounded from below by a rigid substrate, and (ii) an elastomer overlying a thin liquid film bounded from below by a rigid substrate. Linear stability analysis is carried out to obtain asymptotic relations which are then compared against solutions of the full characteristic equations. In the liquid-on-solid case, numerical solutions of the evolution equations show that van der Waals forces cause thinning of the liquid film and thickening of the elastomeric solid beneath film depressions. Inclusion of a short-range repulsive force suggests that regular patterns may form in which ridges of fluid rest on depressions in the solid. In the solid-on-liquid case, the van der Waals forces cause the solid layer to break up before the liquid film can dewet. The results presented here support the idea that the dewetting of thin liquid films might be exploited to create topographically patterned surfaces on soft polymeric solids.     

Dewetting of thin polystyrene films under confinement

The dewetting behavior of thin polystyrene (PS) film has been investigated by placing an upper plate with a ca. 140 nm gap from the underlying substrate with the spin-coated thin polymer films. Three different kinds of dewetting behaviors of thin PS film have been observed after annealing according to the relative position of the PS film to the upper plate. Since the upper plate is smaller than the underlying substrate, a part of the polymer film is not covered by the plate. In this region (I), thin PS film dewetting occurs in a conventional manner, as previously reported. While in the region covered by the upper plate (III), the PS film exhibits unusual dewetted patterns. Meanwhile, in the area right under the edge of the plate (II) (i.e., the area between region I and region III), highly ordered arrays of PS droplets are formed. Formation mechanisms of different dewetted patterns are discussed in detail. This study may offer an effective way to improve the understanding of various dewetting behaviors and facilitate the ongoing exploration of utilizing dewetting as a patterning technique.     

Photoactive additives for cross-linking polymer films: Inhibition of dewetting in thin polymer films

In this report, we describe a versatile photochemical method for cross-linking polymer films and demonstrate that this method can be used to inhibit thin polymer films from dewetting. A bifunctional photoactive molecule featuring two benzophenone chromophores capable of abstracting hydrogen atoms from various donors, including C-H groups, is mixed into PS films. Upon exposure to UV light, the bis-benzophenone molecule cross-links the chains presumably by hydrogen abstraction followed by radical recombination. Photoinduced cross-linking is characterized by infrared spectroscopy and gel permeation chromatography. Optical and atomic force microscopy images show that photocrosslinked polystyrene (PS) thin films resist dewetting when heated above the glass transition temperature or exposed to solvent vapor. PS films are inhibited from dewetting on both solid and liquid substrates. The effectiveness of the method to inhibit dewetting is studied as a function of the ratio of cross-linker to macromolecule, duration of exposure to UV light, film thickness, the driving force for dewetting, and the thermodynamic nature of the substrate.