Design of patterned sapphire substrates for GaN-based light-emitting diodes

A new method for patterned sapphire substrate(PSS) design is developed and proven to be reliable and cost-effective.As progress is made with LEDs' luminous efficiency,the pattern units of PSS become more complicated,and the effect of complicated geometrical features is almost impossible to study systematically by experiments only.By employing our new method,the influence of pattern parameters can be systematically studied,and various novel patterns are designed and optimized within a reasonable time span,with great improvement in LEDs' light extraction efficiency(LEE).Clearly,PSS pattern design with such a method deserves particular attention.We foresee that GaN-based LEDs on these newly designed PSSs will achieve more progress in the coming years.     

全息技术制作二维光子晶体蓝宝石衬底提高发光二极管外量子效率

为了提高GaN基发光二极管(LED)的外量子效率,在蓝宝石衬底制作了二维光子晶体.衬底上的二维光子晶体结构采用激光全息技术和感应耦合等离子体(ICP)干法刻蚀技术制作,然后采用金属氧化物化学气相沉积(MOCVD)技术在图形蓝宝石衬底(PSS)上生长2μm厚的n型GaN层,4层量子阱和200nm厚的p型GaN层,形成LED结构.衬底上制作的二维光子晶体为六角晶格结构,晶格常数为3.8μm,刻蚀深度为800nm.LED器件光强输出测试结果显示,在PSS上制作的LED(PSS-LED)的发光强度普遍高于蓝宝石平 关键词： 全息 发光二极管 图形蓝宝石衬底 外量子效率     

GaN-based violet laser diodes grown on free-standing GaN substrate

A violet laser diode (LD) structure is grown on a free-standing c-plane GaN substrate and 4~μ m× 800~μ m ridge waveguide LDs are fabricated. The electrical and the optical characteristics of LDs under different facet-coating and chip-mounting conditions are investigated under pulse mode operation. The active region temperatures of p-side up and p-side down mounted LDs are calculated with different injection currents. The calculated thermal resistances of p-side up and p-side down mounted LDs are 4.6~K/W and 3~K/W, respectively. The threshold current of the p-side down mounted LD is much lower than that of the p-side up mounted LD. The blue shift of the emission wavelength with increasing injection current is observed only for the LD with p-side down mounting configuration, due to the more efficient heat dissipation.     

Simulation of InGaN/GaN light-emitting diodes with patterned sapphire substrate

Blue InGaN/GaN multiple quantum well (MQW) light-emitting diodes (LEDs) with patterned sapphire substrate (PSS) are simulated by the APSYS software. Approach of combining finite-difference time-domain (FDTD) method and raytracing technique is applied to perform light extraction. The simulation results show that PSS dramatically increases extraction efficiency of light power, in agreement with experiment. It is found that extraction efficiency can be maximized by changing the shape of PSS. This work presents a new approach to combine electrical simulation with FDTD and raytracing in 3D TCAD simulation of GaN-LED.     

Electron leakage effects on GaN-based light-emitting diodes

Nitride-based light-emitting diodes suffer from a reduction (droop) of the internal quantum efficiency (IQE) with increasing injection current. Using advanced device simulation, we investigate the impact of electron leakage on the IQE droop for different properties of the electron blocker layer (EBL). The simulations show a strong influence of the EBL acceptor density on the droop. We also find that the electron leakage decreases with increasing temperature, which contradicts common assumptions.     

High brightness InGaN-based yellow light-emitting diodes with strain modulation layers grown on Si substrate

InGaN-based multiple quantum wells (MQWs) yellow light-emitting diodes (LEDs) were grown on Si substrate by metal organic vapor deposition. Blue MQWs were introduced as strain modulation layers for yellow MQWs. The LED chips emitted 72-mW yellow light with 566-nm dominant wavelength and 9.4 % external quantum efficiency (EQE) at 350 mA under room temperature, and it reached a peak EQE of 22.2 % at 0.7 mA. A comparison sample without strain modulation layers exhibited much weaker performance. The results reveal that long-wavelength emission of InGaN system is reliable if the strain of MQWs has been properly modulated.     

Light-extraction efficiency and forward voltage in GaN-based light-emitting diodes with different patterns of V-shaped pits

We present a new method of making a textured V-pit surface for improving the light extraction efficiency in GaN- based light-emitting diodes and compare it with the usual low-temperature method for p-GaN V-pits. Three types of GaNbased light-emitting diodes （LEDs） with surface V-pits in different densities and regions were grown by metal-organic chemical vapor deposition. We achieved the highest output power and lowest forward voltage values with the p-InGaN V-pit LED. The V-pits enhanced the light output power values by 1.45 times the values of the conventional LED owing to an enhancement of the light scattering probability and an effective reduction of Mg-acceptor activation energy. Moreover, this new technique effectively solved the higher forward voltage problem of the usual V-pit LED.     

GaN基多量子阱蓝光LED的γ辐照效应

本文用4×104Ci(1Ci=3.7×1010Bq)的60Co源(剂量率2×105rad(Si)/h)对GaN基InGaN/GaN多量子阱蓝光LED进行5种剂量的γ射线的辐照实验.通过辐照前后蓝光LED的波长、色纯度、最大半峰宽(FWHM)和电流-电压(I-V)、电流-光通量(I-F)等电光学特性分析,得到γ射线对GaN基LED器件的辐照效应.结果发现,辐照后LED器件的发光一致性和均匀性变差,在20mA工作电流下,最大剂量下器件发光强度衰减近90%,光通量衰减约40%,并得到器件的抗辐照能力的参数τ0Kγ为4.039×10-7rad.s-1,发现较低的正向偏压下(小于2.6V)器件的饱和电流随辐照总剂量增大而增大.     

Analysis on electrical characteristics of high-voltage GaN-based light-emitting diodes

<正>In order to investigate their electrical characteristics,high-voltage light-emitting-diodes(HV-LEDs) each containing four cells in series are fabricated.The electrical parameters including varying voltage and parasitic effect are studied. It is shown that the ideality factors(IFs) of the HV-LEDs with different numbers of cells are 1.6,3.4,4.7,and 6.4.IF increases linearly with the number of cells increasing.Moreover,the performance of the HV-LED with failure cells is examined.The analysis indicates that the failure cell has a parallel resistance which induces the leakage of the failure cell.The series resistance of the failure cell is 76.8Ω,while that of the normal cell is 21.3Ω.The scanning electron microscope(SEM) image indicates that different metal layers do not contact well.It is hard to deposit the metal layers in the deep isolation trenches.The fabrication process of HV-LEDs needs to be optimized.     

Internal quantum efficiency of GaN-based light-emitting diodes grown on silicon substrates determined from rate equation analyses

We present a convenient and reliable method for determining the internal quantum efficiency (IQE) in GaN-based blue light-emitting diodes (LEDs) grown on Si(111) substrates based on the carrier rate equation model. By using the peak point of the efficiency curve in photoluminescence (PL) measurements as the parameter of the rate equation analysis, the IQE can be unambiguously determined without any pre-assumed parameters. The theoretical IQE model is used to fit the measured PL efficiency curves and the IQE of LED samples are determined. The maximum IQE of the LED sample grown on the Si substrate was obtained to be 0.74, which is found to agree well with the results obtained by conventional temperature-dependent PL measurements.     

Improved light extraction of GaN-based light-emitting diodes with surface-patterned ITO

The surface patterning of the indium tin oxide (ITO) transparent current layer has been investigated to improve the light extraction efficiency of GaN-based light-emitting diodes (LEDs). LEDs with periodic micro-hexagon patterned ITO have been fabricated utilizing standard lithography techniques and inductively coupled plasma (ICP) technology. The luminance intensity of the LED chips with patterned ITO following 160 s ICP etching was enhanced by about 50% compared to the LED chips with unpatterned ITO. Detailed processing parameters are provided. scanning electron microscopy (SEM) and atomic force microscopy (AFM) are used to examine the micro-structures. The results indicate that the surface-patterned ITO technique could have potential applications in high-power GaN-based LEDs.     

无序光子晶体提高GaN基蓝光发光二极管光提取效率的研究

亚波长尺度光子晶体结构可有效提升发光二极管(LED)的光提取效率(LEE),然而在制造过程中会存在缺陷或无序.利用时域有限差分法对理想方形光子晶体结构进行了优化,在此基础上对三种无序光子晶体结构进行了仿真,研究了光子晶体结构参数的无序变化对GaN基蓝光LED LEE的影响.结果表明,光子晶体空气孔位置和半径的无序变化使优化的80 nm光子晶体LED的LEE下降,而可使非优化的60nm光子晶体LED的LEE增加;当光子晶体空气孔位置和半径的无序变化量从0到士20 nm之间变化时,LEE最大会产生53.8％的浮动;光子晶体刻蚀深度的无序变化对LEE影响较小,一般可以忽略,研究结果为高性能蓝光光子晶体LED的设计制作提供了重要的理论参考.     

The enhancement of light-emitting efficiency using GaN-based multiple quantum well light-emitting diodes with nanopillar arrays

The quest for higher modulation speed and lower energy consumption has inevitably promoted the rapid development of semiconductor-based solid lighting devices in recent years. GaN-based light-emitting diodes （LEDs） have emerged as promising candidates for achieving high efficiency and high intensity, and have received increasing attention among many researchers in this field. In this paper, we use a self-assembled array-patterned mask to fabricate InGaN/GaN multi- quantum well （MQW） LEDs with the intention of enhancing the light-emitting efficiency. By utilizing inductively coupled plasma etching with a self-assembled Ni cluster as the mask, nanopillar arrays are formed on the surface of the InGaN/GaN MQWs. We then observe the structure of the nanopillars and find that the V-defects on the surface of the conventional structure and the negative effects of threading dislocation are effectively reduced. Simultaneously, we make a comparison of the photoluminescence （PL） spectrum between the conventional structure and the nanopillar arrays, achieved under an experimental set-up with an excitation wavelength of 325 mm. The analysis demonstrates that MQW-LEDs with nanopillar arrays achieve a PL intensity 2.7 times that of conventional LEDs. In response to the PL spectrum, some reasons are proposed for the enhancement in the light-emitting efficiency as follows： 1） the improvement in crystal quality, namely the reduction in V-defects; 2） the roughened surface effect on the expansion of the critical angle and the attenuated total reflection; and 3） the enhancement of the light-extraction efficiency due to forward scattering by surface plasmon polariton modes in Ni particles deposited above the p-type GaN layer at the top of the nanopillars.     

GaN-based LEDs surrounded with a two-dimensional nanohole photonic crystal structure for effective laterally guided mode coupling

Traditional implementation of photonic crystals (PhCs) on LED light emission surfaces results in weak coupling of light with the PhCs. Here we introduce a GaN-based LED surrounded with a nanohole PhC structure along the mesa edges. The laterally guided modes in the epi-structure can be effectively coupled with the two-dimensional periodic structure. The proposed structure results in the improvement of LED light extraction and provides flexibility of radiation directionality control.     

Enhanced ESD properties of GaN-based light-emitting diodes with various MOS capacitor designs

High electrostatic discharge (ESD) protection of GaN-based light-emitting diodes (LEDs) has been developed using a metal–oxide semiconductor (MOS) capacitor. This structure is realized by adopting various metal electrode patterns. The MOS capacitor can be implemented by extending the metal line directly from the p-type electrode to the top surface of an SiO₂-capped n-GaN layer near the vicinity of the n-type electrode. By connecting a MOS capacitor in parallel with the GaN-based LED, the negative ESD strike could be significantly increased from 385 to 1075 V of human body mode (HBM).     

Improvement of GaN light-emitting diodes with surface-treated Al-doped ZnO transparent Ohmic contacts by holographic photonic crystal

This letter presents a holographic photonic crystal (H-PhC) Al-doped ZnO (AZO) transparent Ohmic contact layer on p-GaN to increase the light output of GaN-based LEDs without destroying the p-GaN. The operating voltage of the PhC LEDs at 20 mA was almost the same as that of the typical planar AZO LEDs. While the resultant PhC LED devices exhibited significant improvements in light extraction, up to 1.22 times that of planar AZO LEDs without PhC integration. Temperature dependence of the integrated photoluminescence intensity indicates that this improvement can be attributed to the increased extraction efficiency due to the surface modification. These results demonstrate that the surface-treated AZO layer by H-PhCs is suitable for fabricating high-brightness GaN-based LEDs.     

Enhanced performance of GaN-based light-emitting diodes with InGaN/GaN superlattice barriers

GaN-based multiple quantum well light-emitting diodes （LEDs） with conventional and superlattice barriers have been investigated numerically. Simulation results demonstrate using InGaN/GaN superlattices as barriers can effectively enhance performances of the GaN-Based LEDs, mainly owing to the improvement of hole injection and transport among the MQW active region. Meanwhile, the improved electron capture decreases the electron leakage and alleviates the efficiency droop. The weak polarization field induced by the superlattice structure strengthens the intensity of the emission spectrum and leads to a blue-shift relative to the conventional one.     

Fabrication of high quality two-dimensional photonic crystal mask layer patterns

This work discusses the fabrication of two-dimensional photonic crystal mask layer patterns. Photonic crystal patterns having holes with smooth and straight sidewalls are achieved by optimizing electron beam exposure doses during electron beam lithography process. Thereafter, to precisely transfer the patterns from the beam resist to the SiO₂ mask layer, we developed a pulse-time etching method and optimize various reaction ion etching conditions. Results show that we can obtain high quality two-dimensional photonic crystal mask layer patterns.