Emission Theory of Amorphous Material Sputtering: the Dependence of the Sputtering Coefficient on the Angle of Primary Ion Beam Incidence

The dependences of the sputtering coefficient on the types of accelerated ions, their energy, and the angle of incidence on a target are calculated. For Ar–Si, Хе–С, and H–W systems, acceptable coincidence between the calculated and experimental data is obtained. Two mechanisms for secondary-particle ejection from solids are established; they determine the dependences of the base sputtering coefficient for the base on the energy and the angle of primary ion incidence on the target.     

磁控溅射法沉积SiN_x非晶薄膜的生长机制及结构分析

利用磁控溅射技术在单晶Si衬底上沉积了Six非晶薄膜.样品的傅里叶变换红外吸收光谱(FTIR)显示,SNx非晶薄膜在812～892 cm-1范围内存在一个较强的吸收谱带.该吸收谱带对应于Si-N-Si键的伸缩振动吸收(stretching vibration mode),其吸收峰峰位随着溅射功率的增大明显红移;但退火后,该吸收峰又逐渐蓝移.结合中心力模型和自由结合模型,分析了磁控溅射过程中Six非晶薄膜的生长机制和内部结构.研究认为,随着溅射功率的提高,薄膜中先后形成Si-N4四面体,Si-N-Si3,Si-N2-S2及Si-N3-Si等结构,这几种结构分别对应着Si-N-Si键的不同模式的振动吸收.随着退火温度的升高,分子热运动逐渐加剧,非晶SiNx薄膜发生相分离,生成Si3N4和Si纳米晶颗粒,因此,S-N-Si键的吸收峰逐渐向Si3N4的特征振动吸收峰位870 cm-1靠近.     

二维非晶光子材料的缺陷态

应用多重散射方法计算了二维介质柱构成的非晶光子材料的缺陷态。在非晶光子材料中抽掉不同位置的圆柱会产生频率不同的缺陷模，但缺陷模的能量都是非常局域的，能量基本上集中在以缺陷波长1／3为半径的圆内。这表明非晶光子材料中形成的缺陷模不仅具有周期性光子晶体的缺陷模的强局域化特征，同时缺陷模更富于变化。     

Amorphous Coatings and Surfaces on Structural Materials

Metallic glasses show a unique combination of high strength, excellent corrosion, and wear resistances because of their amorphous structure having a short-range order. In spite of excellent properties, the application of metallic glasses is restricted because of their inherent limitations in the bulk form, including limited tensile ductility. Using metallic glasses as the coatings for structural applications is an attractive way of taking advantage of their superior properties. Additionally, metallic glass-based composites having crystalline phases embedded in a amorphous matrix have also shown improved properties. Thus, metallic glasses can be synthesized as the coatings or subjected to surface modification to provide functionally superior surfaces. This article is a review of metallic glass-based coatings and surface modification of metallic glasses to achieve functionally superior surfaces for structural applications. Essential theoretical concepts were discussed which influence the processing. Common ways of processing along with the influence of various processing parameters were explored. Some non-conventional techniques which emerged as a result of continued efforts were also taken into account. Corrosion and wear properties of these materials along with the underlying mechanisms were discussed in detail. Focus was given to the recent product level applications explored in the open literature. Current challenges in the field were reviewed and guidelines for the future developments were provided.     

红外吸收光谱法研究磁控溅射沉积SiOx非晶薄膜的过程

利用磁控溅射技术,在单晶Si衬底上生长了SiOx非晶薄膜.傅里叶变换红外吸收光谱(FTIR)显示,SiOx非晶薄膜存在3个吸收谱带.研究发现,随着溅射功率的提高,薄膜中先后形成Si-Oy-Si4-y(0＜y≤4),Si6环以及无桥氧空位中心(NBOHC)缺陷等结构,这几种结构对应的Si-O-Si键的伸缩振动吸收、非对称伸缩振动吸收以及O-Si-O键的振动吸收是导致薄膜的FTIR光谱出现3个吸收谱带的根本原因.     

非晶SiC_xO_y薄膜的可调强光发射机制

采用甚高频等离子体增强化学气相沉积技术,以SiH_4、CH_4和O_2作为反应气源,通过调控O2流量在250℃下制备强光发射的非晶SiC_xO_y薄膜。利用光致发光光谱、荧光瞬态谱、Raman光谱、X射线光电子能谱及红外吸收谱对薄膜的光学性质和微结构进行表征与分析,进而讨论其可调可见光发射机制。实验结果表明,SiC_xO_y薄膜发光性质与薄膜中的氧组分密切相关。随着薄膜中氧组分的增加,其发光峰位由橙红光逐渐向蓝光移动,肉眼可见强的可见光发射。荧光瞬态谱分析表明,薄膜的荧光寿命在纳秒范围。结合X射线光电子能谱和红外吸收谱对薄膜的相结构和化学键合结构进行分析,结果表明薄膜的主要相结构和发光中心随O_2流量的变化是其可调光发射的主要原因。     

On the Theory of Neutral and Charged Cluster Ion Sputtering of Metal

A calculation method for large neutral and/or charged cluster (with number of atoms N > 5) elastic sputtering of a metal during ion bombardment is proposed. The result is presented as a simple assymptotic formula for the probability of cluster ejection and cluster charge state. A conclusion is made on the exponential nature of the dependence of the total cluster yield on the number of atoms the cluster consists of.     

快重离子引起的塑性形变现象

非晶材料在快重离子轰击下显示了奇异的各向异性的塑性形变 ,这是电子能损所引起的宏观可见的剧烈的原子重排 .这个效应不能发生在具有晶态结构的材料中 ,但发生于所有的非晶材料中 .这一宏观现象隐含了寻找原子尺度上电子激发转换成原子位移的潜在线索 ,因而受到广泛的关注 .在回顾了现象发现的历史之后 ,综述了离子束引起的塑性形变的基本规律、最新结果、实验方法和技术新的进展 ,最后讨论了相关的物理机制和唯象模型. A very peculiar effect occurring when an amorphous material is irradiated with swift heavy ion is the giant plastic deformation phenomenon discovered in the eighties by Klaumunzer[DD(-8/9]¨ It is macroscopically visible atomic rearrangements induced by electronic energy loss. This effect occurs only in truly amorphous solids and can not occur in a crystalline material. This phenomenon gives rise to a wide ranging and lasting research in the field of the interaction of swift heavy...     

Enhancement of Field Emission Properties in La-Doped ZnO Films Prepared by Magnetron Sputtering

Field emissions (FE) from La-doped zinc oxide (ZnO) films are both experimentally and theoretically investigated. Owing to the La-doped effect, the FE characteristic of ZnO films is remarkably enhanced compared with an undoped sample, and a startling low turn-on electric field of about 0.4V/μm (about 2.5V/μm for the undoped ZnO films) is obtained at an emission current density of 1μA/cm² and the stable current density reaches 1mA/cm² at an applied field of about 2.1V/μm. A self-consistent theoretical analysis shows that the novel FE enhancement of the La-doped sample may be originated from its smaller work function. Due to the effect of doping with La, the Fermi energy level lifts, electrons which tunnelling from surface barrier are consumedly enhancing, and then leads to a huge change of field emission current. Interestingly, it suggests a new effective method to improve the FE properties of film materials.     

Sputtering: the material erosion tool

The erosion of materials with energetic ions is an indispensable tool in the laboratory and the industry. The ion–solid collision process leading to the ejection of atoms contains fascinating physics and materials science of surfaces. In this article, different aspects of sputtering relevant to applications are discussed. Current research is emphasized and future directions are outlined.     

射频磁控溅射低温制备非晶铟镓锌氧薄膜晶体管

利用射频磁控溅射技术室温制备了铟镓锌氧(IGZO)薄膜,采用X射线衍射(XRD)表征薄膜的晶体结构,原子力显微镜(AFM)观察其表面形貌,分光光度计测量其透光率。结果表明:室温制备的IGZO薄膜为非晶态且薄膜表面均匀平整,可见光透射率大于80%。将室温制备的IGZO薄膜作为有源层,在低温(<200℃)条件下成功地制备了铟镓锌氧薄膜晶体管(a-IGZO TFT),获得的a-IGZO-TFT器件的场效应迁移率大于6.0 cm2.V-1.s-1,开关比约为107,阈值电压为1.2 V,亚阈值摆幅(S)约为0.9 V/dec,偏压应力测试a-IGZO TFT阈值电压随时间向右漂移。     

Theory of Thermionic Emission of Scandate Cathodes

Technical Physics - The effect of microimpurities in barium oxide on the parameters of its electronic structure and, accordingly, on the work function is demonstrated experimentally and...     

A Linear Model for the Interpretation of Optical Emission Spectroscopy Measurements in Low Pressure DC Magnetron Sputtering

For a balanced dc magnetron discharge a linear model for the formation of excited and ionized species is presented. The consideration is based on collisional kinetic theory and a correlation of discharge current with ionization rates, and leads to normalized rate coefficients. The electron energy distribution changes according to the determining external parameters, but needs neither to be known in detail nor to be of Maxwellian type. The model calculations are consistent with measurements done by optical emission spectroscopy (OES) on the magnetron sputtering of aluminium in argon discharges. The dependences of optical emission intensities on discharge current and on argon pressure show that both, excited argon atoms as well as excited argon ions, are generated from neutral argon by direct, fast electron impact. It is additionally shown that at least for low argon pressure the excitation of aluminium atoms is also caused by direct electron impact.     

磁控溅射制备ZnO薄膜的受激发射特性的研究

用射频磁控反应溅射法在二氧化硅衬底上制备ZnO薄膜。得到了在不同温度下ZnO薄膜的吸收与光致发光。观测到了纵光学波 (LO)声子吸收峰与自由激子吸收峰 ;室温 (30 0K)下 ,PL谱中仅有自由激子发光峰。这些结果证实了ZnO薄膜具有较高的质量。探讨了变温ZnO薄膜的发光特性。研究了ZnO薄膜的受激发射特性。     

The Effect of Thermionic Electron Emission on the Formation of Amorphous Metallic Nanoparticles in a Laser-Jet Plasma

Technical Physics - In recent years, the interest in using the structures consisting of amorphous nanoparticles has increased significantly due to their peculiar electric, magnetic, and catalytic...     

溅射气压对非晶Hg1-xCdx Te薄膜微观结构和化学组分的影响（英文）

采用射频磁控溅射制备了非晶态结构的Hg1-xCdxTe薄膜,并利用台阶仪、XRD、原子力显微镜、EDS等分析手段对薄膜生长速率、物相、表面形貌、组分比例进行了研究。实验结果表明,溅射气压对薄膜生长速率、微观结构、表面形貌和化学组分有直接影响。随着溅射气压增大,其生长速率逐渐降低。当溅射气压高于1.1 Pa时,薄膜XRD图谱上没有出现任何特征衍射峰,只是在2θ=23°附近出现衍射波包,具有明显的非晶态特征;当溅射气压小于1.1 Pa时,XRD谱表现为多晶结构。另外,随着溅射气压的增加,薄膜表面粗糙度逐渐减小,而且溅射气压对薄膜组成的化学计量比有明显影响,当溅射气压为1.1 Pa时,薄膜中Hg的组分比最低,而Cd组分比最高。     

辉光放电光谱分析技术在金属材料分析中的应用

本文主要介绍了辉光放电光谱仪的基本原理，分析特点以及在金属材料分析中的应用，并从理论上推导出辉光放电光谱分析技术用于金属材料分析的理论依据。着重介绍了基板分析、深度逐层分析。对磷青铜镀银层逐层分析；渗碳、氮钢板分析；彩涂钢板分析进行了探讨。