Contactless measurement of the conductivity of II–VI epitaxial layers by means of the partially filled waveguide method

We report the contactless determination of the conductivity, the mobility and the carrier concentration of II–VI semiconductors by means of the technique of the partially filled waveguide at a microwave frequency of 9 GHz. The samples are CdHgTe epitaxial layers, grown on CdZnTe substrates by molecular beam epitaxy. The conductivity is determined from the transmission coefficient of the sample in the partially filled waveguide. For the analysis of the experimental data, the complex transmission coefficient is calculated by a rigorous multi-mode matching procedure. By varying the conductivity of the sample, we obtain an optimum fit of the calculated data to the experimental results. Comparison with conductivity data determined by the van der Pauw method shows that our method allows to measure the conductivity with good accuracy. The behaviour of the transmission coefficient of the sample is discussed in dependence on the layer conductivity, the layer thickness and the dielectric constant of the substrate. The calculations require to consider in detail the distribution of the electromagnetic fields in the sample region. The usual assumption of a hardly disturbed TE₁₀ mode cannot be used in our case. By applying a magnetic field in extraordinary Voigt configuration, galvanomagnetic measurements have been carried out which yield the mobility and thus the carrier concentration. These results are also in good agreement with van der Pauw transport measurements.     

Defect study on electron irradiated GaAs by means of positron annihilation

Measurements of the positron lifetime and Doppler-broadened annihilation-radiation have been performed in electron-irradiated GaAs. The positron lifetime at the irradiation induced defects was 0.250 ns at 300 K. The defect clustering stage was found to occur at around 520–620 K, and the coarsening and annealing stage is believed to be above 620 K. Similar annealing stages were also observed in GaAs lightly doped with Si (0.2×10¹⁸ cm^–3). Both the lifetime and the S-parameter in the irradiated GaAs were found to decrease with temperature from 300 K to 100 K, suggesting the coexistence of shallow traps in electron irradiated GaAs.     

Temperature-Dependent Electron Transport in In0.5Ga0.5 P/GaAs Grown by MOVPE

Hall effect measurements in undoped In0.5Ga0.5 P/GaAs allo grown by metal organic vapour-phase epitaxy （MOVPE） have been carried out in the temperat.ure range 15-350K. The experimenta.1 results are analysed using a two-band model including conduction band transport calculated using an iterative solution of the Boltz- mann equation. A good agreement was obtained between theory and experiment. The impurity contents of In0.5Ga0.5 P/GaAs alloy, such as donor density ND, acceptor density NA and donor activation energy εD, were also determined.     

Investigation of transient transport and recombination phenomena in semiinsulating GaAs

Photoconductivity and Hall voltage kinetics were measured simultaneously in SI GaAs monocrystals, using the pulsed neodimium laser excitation. The scattering and recombination centres were found to have a different influence at different time intervals of the transients (from 10 ns to some seconds). It is shown that in GaAs the photoconductivity relaxation in some time intervals can be interpreted correctly only by taking into account the mobility changes. The obtained resuls are explained in terms of recharging of the scattering centres and variations of the capture cross-section of charge carries on the local centres.     

Defect study of proton-irradiated liquid-encapsulated Czochralski GaAs using the positron-annihilation technique

The positron lifetime of undoped Liquid-Encapsulated Czochralski (LEC)-GaAs and Si-doped (1.3×10¹⁸ cm^–3) LEC-GaAs was measured before and after irradiation with protons (dose 1×10¹⁵/cm², 15 MeV). In Si-doped GaAs, the decrease of positron lifetime at temperatures between 10 and 300 K are due to the decrease of the positron-diffusion length and the increase of the effective shallow traps such as antisite Ga_As. The annealing stage of the proton-irradiation-induced defects which show the different behavior from that of electron-irradiation-induced defects suggests that proton irradiation creates more complicated defect complexes, containing vacancies rather than isolated vacancy-type defects or simple complexes which have been observed during electron-irradiation processes. Above 700 K, proton-irradiation-induced defects such as vacancy-type defects and simple vacancy complexes are almost annealed out, while Si-induced defects such as Si_Ga-V_Ga complexes cannot be annealed out above 973 K.     

Photo-magneto-electric effect in semi-insulating GaAs: carrier lifetimes and influence of the defect structure

We report the investigation of the Photo-Magneto-Electric effect (PME) in semi-insulating Liquid-Encapsulated (LEC-) grown GaAs crystals, using both intrinsic and impurity excitation. The role of the majority and minority carriers on the conductivity phenomena was evaluated and the lifetimes of electrons and holes were determined depending on excitation conditions. Anomalously high PME voltages, reaching in some cases some volts, were measured, which demonstrate a sharp drop in the temperature region 320–360K. The observed changes are discussed supposing that the influence of the non-homogeneous defect structure of the samples is essential.     

Incorporation of Sn into epitaxial GaAs grown from the liquid phase

The incorporation of Sn into LPE GaAs was studied as a function of the atomic fractionx _Sn ^l of Sn in the liquid (1.6×10⁻⁴≤x _Sn ^l ≤0.54), the growth temperatureT _K and the cooling rate α. The diffusion coefficient of As in Ga for moderate Sn-doping was deduced from the growth velocities to beD _As (760° C)=(3.3±1.0)×10⁻⁵ cm²/s. The epitaxial layers were analyzed after van der Pauw with special emphasis on the sources of experimental error. With the aid of current mobility theories the concentrations of the ionized donors and acceptors were derived. From their dependence onx _Sn ^l , on α and onT _K combined with the Schottky-barrier model of Sn incorporation it can be concluded that the melt and the growing crystal surface were in thermal equilibrium. The diffusion coefficient of Sn in GaAs is about 8×10⁻¹⁴ cm²/s at 760° C. The distribution coefficient for Sn increases from 4.4×10⁻⁵ to 12.3×10⁻⁵ in the temperature range from 690 to 800° C. The total Sn incorporationx _Sn ^s was measured using the atomic absorption spectroscopy for the first time down tox _Sn ^s =10¹⁷/cm³. From these data it can be concluded that up tox _Sn ^l =0.54 the dopant Sn is incorporated as donor and as acceptor only and that within the experimental scatter there is no indication of incorporation as a neutral species.     

Electron Transport in Ga-Rich InxGa1-xN Alloys

Resistivity and Hall effect measurements on n-type undoped Ga-rich InxGa1-xN （0.06 ≤ x ≤ 0.135） alloys grown by metal-organic vapour phase epitaxy （MOVPE） technique are carried out as a function of temperature （15-350 K）. Within the experimental error, the electron concentration in Inx Ga1-x N alloys is independent of temperature while the resistivity decreases as the temperature increases. Therefore, Inx Ga1-xN （0.06 ≤ x ≤0.135） alloys are considered in the metallic phase near the Mort transition. It has been shown that the temperaturedependent metallic conductivity can be well explained by the Mort model that takes into account electron-electron interactions and weak localization effects.     

Light-intensity dependence of slow-relaxation phenomena in semi-insulating GaAs

Quenching-only and quenching-enhancement phenomena in low-temperature photoconductivity (PC) of SI GaAs have been studied as a function of light intensity for photons in 1.0–1.2 eV energy range. Quenching-only of PC occurs only at high light intensities (above 10¹⁴ photons/cm² s) and reflects well-known bleaching of EL2 defects. On the contrary, the quenching-enhancement effect can be observed only for several orders of magnitude lower light intensities and neither the quenching nor the enhancement part of low-temperature evolution of PC is directly connected with EL2 defects, but reflects the time evolution of the occupancy of deep traps other than EL2. It was also found that bleaching of EL2 is quite an unefficient process.     

Determination of photoexcited carrier concentration and mobility in GaAs doping superlattices by hall effect measurements

The photo-Hall effect in a new type of periodicp-n doping multilayer structures (superlattices) of GaAs grown by molecular beam epitaxy has been investigated. In these space charge systems electrons and holes are separated in real space. As a consequence, large deviations from thermal equilibrium become quasi-stable. Carrier generation by optical absorption occurs in these doping superlattices even at photon energies far below the gap of the homogeneous semiconductor material. The photoexcitation results in a strong enhancement of the conductivityparallel to the layers and in a substantial photovoltaic response. An increase in carrierconcentration as well as an increase in carriermobility both contribute to the observed enhancement of the conductivity under excitation. The absolute values of changes in free-carrier concentration are very large due to the manyfold active layers of the structure. The measured free-carrier mobilities depend on the population of the multilayer system. A reduction in mobility as compared to bulk material is found to be more pronounced in weakly populated systems. This finding is caused by the larger weight of the boundary regions of the total active layers where the free-carrier density is lower than the density of ionized impurities resulting in an enhanced impurity scattering.     

Comment on `Electronic Properties of Red P-Type Tl2S5 Single Crystals'

Recently, Gamal et al. [Chin. Phys. Lett. 22 (2005) 1530] reported the results of electrical conductivity, Hall effect and thermoelectric measurements on p-type Tl₂S₅ single crystals. From the experimental data for the temperature dependence of differential thermoelectric power, Gamal et al. determined thevalues of 2.66×10^-41kg and 2.50×10^-41kg, respectively, for the effective masses of electrons and holes in p-type Tl₂S₅, which are about ten orders of magnitude smaller than the free electron mass (9.11×10^-31kg). We argue that the anomalously small values obtained for the effective mass of chargecarriers in Tl₂S₅ have no physical significance.     

Effect of Zn substitution for Co on the transport properties of Y BaCo4O7

Electrical resistivity and Seebeck coefficients of Y BaCo_4−xZn_xO₇ (x=0.0,0.5,1.0,2.0) were investigated in the temperature range 350-1000 K. It was found that the electrical resistivity and activation energy increase with increasing Zn concentration, while Seebeck coefficients do not increase but decrease when electrical resistivity increases. We explained the increase of electrical resistivity and the drop of Seebeck coefficients for Zn-substituted samples by the decrease of carrier mobility, rather than of carrier concentration. The effect of oxygen absorption and desorption on the electrical resistivity and Seebeck coefficients was also investigated. An abrupt change of transport properties happens at about 650 K for x=0.0 and 0.5 samples measured in oxygen. For x=1.0 and 2.0 samples, however, such change disappears and the transport behavior in oxygen is almost same as that in nitrogen due to the significant suppression of oxygen diffusion caused by the higher Zn concentration in these samples.     

Carrier injection level dependence of post-breakdown metastability in semi-insulating GaAs

Recently, a room temperature electrically induced metastability in semi-insulating (SI)-GaAs has been reported in which the normally high resistance state of SI-GaAs converts into a low resistance state when breakdown electric fields are applied to the metal/SI-GaAs/metal system. The low resistance state continues to persist when the electric field is lowered below the breakdown bias and as such may be treated as metastable state of the material. This phenomenon is believed to be closely related to the ‘lock-on’ effect utilized in high power photoconductive semiconductor switches made from SI-GaAs. The present study seeks to understand the mechanism for this electrically induced metastability by studying the influence of the injection current on the metastable phase. The data favor an interpretation of the high current state of the SI-GaAs in terms of double carrier injection and the sustaining of an internal electron-hole plasma in the material.     

Enhancement of minority carrier lifetime in GaAs1? x P x ( x =0.4; 0.65) by nitrogen implantation

Minority carrier lifetimes in nitrogen implanted GaAs_1-x P _x (x=0.4; 0.65) were measured at 77K by an optical phase shift method as a function of nitrogen dose and annealing temperature in order to investigate the dependence of the lifetime on the concentration of nitrogen isoelectronic traps. A large increase in the lifetime was observed after nitrogen implantation followed by annealing at and above 800°C. The maximum lifetimes were 22ns for GaAs_0.35P_0.65 and 6.7 ns for GaAs_0.6P_0.4. They were obtained by implantation to a dose of 5×10¹³ cm⁻² in GaAs_0.35P_0.65 and 10¹³ cm⁻² in GaAs_0.6P_0.4. The lifetime after nitrogen implantation followed by annealing was longer by a factor of 6–7 than that of the unimplanted sample.     

Thermally stimulated currents in semi-insulating GaAs Schottky diodes and their simulation

We report the investigation of the non-irradiated and irradiated-with-pions Schottky diodes made on semi-insulating GaAs. Thermally stimulated currents have been measured experimentally and modeled numerically. To reveal the influence of the single levels, we used the thermal emptying of the traps by fractional heating. Attention is paid to the comparative analysis of the distribution of the parameters of different samples produced and processed by the same technique, contrary to the usual approach of the analysis of a few different samples. The following main conclusions are drawn. First of all, many different levels (from 8 to 12) have been found in the temperature range from 90 K to 300 K in all samples. Their activation energies range from 0.07 up to 0.55 eV, their capture cross-sections are 10^-22–10^-14 cm², and initial occupation is 2×10¹¹–5×10¹⁴ cm^-3. The irradiation with pions does not influence the density of most levels significantly. On the other hand, levels with activation energies of about 0.07–0.11 eV, 0.33–0.36 eV, 0.4–0.42 eV, and 0.48–0.55 eV have been found only in the irradiated samples. Irradiation also increases the inhomogeneity of the crystals, which causes the scattering of the activation energies obtained by fractional heating technique. Received: 13 November 1998 / Accepted: 16 April 1999 / Published online: 4 August 1999     

Van der Pauw resistivity measurements on evaporated thin films of cadmium arsenide, Cd3As2

Cadmium arsenide is a II-V semiconductor, exhibiting n-type intrinsic conductivity with high mobility and narrow bandgap. It is deposited by thermal evaporation, and has shown the Schottky and Poole-Frenkel effects at high electric fields, but requires further electrical characterisation. This has now been extended to low-field van der Pauw lateral resistivity measurements on films of thickness up to 1.5 μm. Resistivity was observed to decrease with increasing film thickness up to 0.5 μm from about 3 × 10⁻³ Ω m to 10⁻⁵ Ω m, where the crystalline granular size increases with film thickness. This decrease in resistivity was attributed to a decrease in grain boundary scattering and increased mobility. Substrate temperature during deposition also influenced the resistivity, which decreased from around 10⁻⁴ Ω m to (10⁻⁵ to 10⁻⁶) Ω m for an increase in substrate deposition temperature from 300 K to 423 K. This behaviour appears to result from varying grain sizes and ratios of crystalline to amorphous material. Resistivity decreased with deposition rate, reaching a minimum value at about 1.5 nm s⁻¹, before slowly increasing again at higher rates. It was concluded that this resulted from a dependence of the film stoichiometry on deposition rate. The dependence of resistivity on temperature indicates that intercrystalline barriers dominate the conductivity at higher temperatures, with a hopping conduction process at low temperatures.     

Hall mobility of amorphous Ge2Sb2Te5

The electrical conductivity, Seebeck coefficient, and Hall coefficient of three-micron-thick films of amorphous Ge₂Sb₂Te₅ have been measured as functions of temperature from room temperature down to as low as 200 K. The electrical conductivity manifests an Arrhenius behavior. The Seebeck coefficient is p-type with behavior indicative of multi-band transport. The Hall mobility is n-type and low (near 0.07 cm²/V s at room temperature).     

Dark electrical conductivity and photoconductivity of Ga4Se3S layered single crystals

Ga₄Se₃S layered crystals were studied through the dark electrical conductivity, and illumination- and temperature-dependent photoconductivity in the temperature region of 100-350 K. The dark electrical conductivity reflected the existence of two energy states located at 310 and 60 meV being dominant above and below 170 K, respectively. The photoconductivity measurements revealed the existence of another two energy levels located at 209 and 91 meV above and below 230 K. The photoconductivity was observed to increase with increasing temperature. The illumination dependence of photoconductivity was found to exhibit linear and supralinear recombination above and below 280 K, respectively. The change in recombination mechanism was attributed to the exchange in the behavior of sensitizing and recombination centers.     

Raman and point contact current-voltage characterization of laser-induced diffusion in GaAs

Raman scattering and point contact current-voltage (PCIV) measurements were used as characterization tools of tin-diffused GaAs layers. Diffusion was induced by irradiating GaAs substrates covered with thin tin layers single pulses of a ruby laser. Samples processed with the lowest energies show strong damage and incomplete electrical activation as deduced from Raman and PCIV measurements, respectively. Raman microprobe in depth analysis and PCIV profiles also suggest the presence of a damaged region with incomplete electrical activation at the boundary between the molten layer and the solid substrate.     

Influence of growth conditions on the structural,optical, and electrical properties of ZnSe films

ZnSe films were grown by chemical vapour deposition on GaAs substrates. The influence of the source temperature (between 820 and 900° C) and the substrate temperature (between 620 and 790° C) on the film properties were investigated by Hall measurements, X-ray diffraction, and photoluminescence. With respect to blue luminescent devices the ratio of excitonic to deep level transitions was found to be optimum at low growth rates when the source temperatures were kept below 840° C. P-type conduction up to a net carrier concentration of 8×10¹⁸ cm^–3 could be obtained by substrate temperatures above 700° C. Lattice contraction versus substrate temperature pointed to a reduced incorporation of donors at higher growth temperatures.