Growth of nanowires from annealing SiBONC nanopowders

Silicon carbide (SiC) nanowires were prepared by the gas pressure annealing of SiBONC powders, which were synthesized by pyrolysis of a polymeric precursor. The yield, morphology and composition of the nanowires were influenced by the Si/B ratio in the original ceramic powders, annealing temperature and atmosphere. Annealing temperatures between 1500 and 1600 °C and Si/B molar ratios between 70:30 to 60:40 were suitable for growth of the nanowires. When annealing in an argon (Ar) atmosphere, the SiC nanowires contained little oxygen (O); and the diameters ranged from 20 to 200 nm. Then annealing in a nitrogen (N₂) atmosphere, the nanowires were thicker and rougher, and consisted of a relatively high level of nitrogen. Varied shapes and morphologies of the nanowires were observed for different synthesis conditions. The present novel method makes possible the large-scale fabrication of β-SiC nanowires.     

Hydrothermal synthesis of MoS2 nanowires

The MoS₂ nanowires with diameters of 4 nm and lengths of 50 nm were synthesized by a hydrothermal method using 0.36 g MoO₃ and 1.8 g Na₂S as precursors in 0.4 mol/l HCl solution at 260°C. The products are characterized by XRD, XPS, TEM, HTEM and BET. Results show that the as-prepared MoS₂ nanowires consist of 1–10 sulfide layers with BET surface areas of 107 m²/g. The possible reaction route and the formation mechanism of the MoS₂ nanowires are discussed. The effects of exterior conditions such as pH value, temperature, concentration of precursors and additives on the particle size and morphology of MoS₂ crystallites were investigated.     

具有碳化硅纳米线编织结构的氧化铝泡沫陶瓷的制备及性能研究

本文利用简单、高效的浆料直接发泡法制备气孔率高达96%的Al₂O₃/Si泡沫陶瓷,并选用简便、易行的焦炭埋烧工艺在Al₂O₃/Si泡沫陶瓷坯体中生长出大量SiC纳米线。通过控制烧结温度来观察分析SiC纳米线的生长形貌变化。采用扫描电子显微镜(SEM)、X射线衍射仪、BET比表面积测试仪、电子万能试验机等对泡沫陶瓷的微观结构、物相组成、比表面积、气孔率、抗压强度、热导率进行分析与表征。结果表明,1 450 ℃烧结时得到的SiC纳米线最多,纳米线在泡沫陶瓷孔壁交织缠绕。同时观察到SiC纳米线的存在改变了氧化铝泡沫陶瓷固有的脆性断裂模式,SiC纳米线可有效促进泡沫陶瓷在压缩过程中的裂纹偏转。本实验制备了一种新型的纳米线缠绕在孔壁上的三维网络结构的泡沫陶瓷,为在泡沫陶瓷内部原位生长SiC纳米线提供了新的方法,更好地拓展了泡沫陶瓷在环境过滤、催化剂载体等领域中的应用。     

Silicon nanowire growth by electron beam evaporation: Kinetic and energetic contributions to the growth morphology

The vertical and epitaxial growth of long (up to a few microns) silicon nanowires on Si(1 1 1) substrates by electron beam evaporation (EBE) (10⁻⁶–10⁻⁷ mbar) is demonstrated at temperatures between 600 and 700 °C following the vapour–liquid–solid (VLS) growth mechanism from gold nanoparticles. The silicon atoms are provided by evaporating silicon at varying evaporation currents (I_E) between 35 and 80 mA, which results in growth rates between 1 and 100 nm/min. The growth peculiarities in the interaction triangle, evaporation current (I_E), growth temperature (T_S) and gold layer thickness (d_Au) will be reported. Kinetic and energetic contributions to the morphology of silicon nanowires will be discussed.     

A simple method to synthesize single-crystalline β-wollastonite nanowires

The single-crystalline β-wollastonite (β-CaSiO₃) nanowires were prepared via a simple hydrothermal method, in the absence of any template or surfactant using cheap and simple inorganic salts as raw materials. Xonotlite [Ca₆(Si₆O₁₇)(OH)₂] nanowires were first obtained after hydrothermal treatment at a lower temperature of 200 °C for 24 h, and after being calcinated at 800 °C for 2 h, xonotlite nanowires completely transformed into β-wollastonite nanowires and the wire-like structure was preserved. The synthesized β-wollastonite nanowires had a diameter of 10–30 nm, and a length up to tens of micrometers, and the single-crystalline monoclinic parawollastonite structured β-wollastonite was identified by XRD with the space group of P2₁/a and cell constants of a=15.42 Å, b=7.325 Å, c=7.069 Å and β=95.38°. A possible growth mechanism of β-wollastonite nanowires was also proposed. The advantages of this method for the nanowire synthesis lie in the high yield, low temperature and mild reaction conditions, which will allow large-scale production at low cost.     

Growth of SrFe12O19 nanowires under an induced magnetic field

Nanowires of SrFe₁₂O₁₉ with diameters of 100 nm and lengths of 2.5 μm have been successfully synthesized in a hydrothermal cell at 180 °C with an 0.35 T magnetic field applied. The growth behavior of the nanoparticles was compared with that under zero magnetic field. The X-ray diffraction patterns indicate that both of the two processes result in formation of pure SrFe₁₂O₁₉, however transmission electron microscope observations show that the morphology of the particles changed from flake-like in zero magnetic field into nanowires in a magnetic field. Compared to the sample obtained under zero magnetic field, the as-prepared one exhibits a higher saturation magnetization. The possible underlying mechanism responsible for the morphology change and the magnetic properties improvement were discussed.     

Investigations on the effect of InSb and InAsSb step-graded buffer layers in InAs0.5Sb0.5 epilayers grown on GaAs (0 0 1)

We report the structural and electrical properties of InAsSb epilayers grown on GaAs (0 0 1) substrates with mid-alloy composition of 0.5. InSb buffer layer and InAs_xSb_1−x step-graded (SG) buffer layer have been used to relax lattice mismatch between the epilayer and substrate. A decrease in the full-width at half-maximum (FWHM) of the epilayer is observed with increasing the thickness of the InSb buffer layer. The surface morphology of the epilayer is found to change from 3D island growth to 2D growth and the electron mobility of the sample is increased from 5.2×10³ to 1.1×10⁴ cm²/V s by increasing the thickness of the SG layers. These results suggest that high crystalline quality and electron mobility of the InAs_0.5Sb_0.5 alloy can be achieved by the growth of thick SG InAsSb buffer layer accompanied with a thick InSb buffer layer. We have confirmed the improvement in the structural and electrical properties of the InAs_0.5Sb_0.5 epilayer by quantitative analysis of the epilayer having a 2.09 μm thick InSb buffer layer and 0.6 μm thickness of each SG layers.     

Vapour phase growth of epitaxial silicon carbide layers

After a brief overview of different epitaxial layer growth techniques, the homoepitaxial chemical vapour deposition (CVD) of SiC with a focus on hot-wall CVD is reviewed. Step-controlled epitaxy and site competition epitaxy have been utilized to grow polytype stable layers more than 50 μm in thickness and of high purity and crystalline perfection for power devices. The influence of growth parameters including gas flow, C/Si ratio, growth temperature and pressure on growth rate and layer uniformity in thickness and doping are discussed. Background doping levels as low as 10¹⁴ cm⁻³ have been achieved as well as layers doped over a wide n-type (nitrogen) and p-type (aluminium) range.

Furthermore the status of numerical process simulation is mentioned and SiC substrate preparation is described. In order to get flat and damage free epi-ready surfaces, they are prepared by different methods and characterised by atomic force microscopy and by scanning electron microscope using channelling patterns. For the investigation of defects in SiC high purity CVD layers are grown. The improvement of the quality of bulk crystal substrates by micropipe healing and so-called dislocation stop layers can further decrease the defect density and thus increase the yield and performance of devices. Due to its high growth rate functionality and scope for the use of multi-wafer equipment hot-wall CVD has become a well-established method in SiC-technology and has therefore great industrial potential.     

Residence-time dependent kinetics of CVD growth of SiC in the MTS/H2 system

In most chemical vapor deposition (CVD) experiments in flow reactors carried out until now, growth conditions were chosen which yield growth rates independent or linearly dependent on the total gas flow rate, so that the residence time (t) of the gases in the hot zone of the reactor should not play any role in the growth rate. We have performed CVD experiments in the system MTS/H₂, under conditions of low decomposition of MTS. We have found a region, where the growth rate and its derivatives depend strongly on the operating conditions, in particular, where the growth rate of SiC increases strongly with an increase of t. For lower or higher (but yet incomplete) decomposition of MTS, the growth rate becomes again independent of t, and its apparent energy of activation becomes 200 kJ/mol.     

Preparation of CdS nanowires by the decomposition of the complex in the presence of microwave irradiation

A novel synthetic route for the preparation of CdS nanowires has been developed. CdS nanowires with a diameter of ca. 4 nm have been successfully prepared by the microwave irradiation of a complex of cadmium-1-pyrrlidine dithio carboxylic acid ammonium (C₅H₁₂N₂S₂, APDTC) [Cd(APDTC)₂]₂ in an ethylenediamine solution. The CdS nanowires were characterized by powder X-ray diffraction pattern, transmission electron microscopy (TEM), UV-Vis spectroscopy, diffuse reflection spectroscopy and PL spectroscopy.     

Oscillation of Y2BaCuO5 particle concentration in the melt-grown YBaCuO bulk superconductors

The oscillation of Y₂BaCuO₅ (2 1 1) particle concentration in form of bands parallel to the growth front was observed in top-seeded melt-grown (TSMG) single-grain YBa₂Cu₃O₇/Y₂BaCuO₅ bulk superconductors. The formations of these bands have been associated with temperature fluctuations at the growth front, which induce the fluctuation of the growth rate of the YBa₂Cu₃O₇ (123) crystal and consequently also the fluctuation of the amount of trapped 211 particles. We have shown that the oscillation of 211-particle concentration does not occur when the growth front is horizontal and the crystal solidifies from below upwards. In the a-growth sector (a-GS) the oscillation was observed only in the nests with very small 211 particles.     

Microstructure and ferroelectric properties of BaTiO3 films on LaNiO3 buffer layers by rf sputtering

We have fabricated LaNiO₃ and BaTiO₃ films using the rf sputtering method. The LaNiO₃ were deposited on Si substrates, demonstrating a (1 0 0) highly oriented structure and nanocrystalline characteristic with a grain size of 30 nm. The BaTiO₃ thin films were deposited on the LaNiO₃ buffer layers, and have exhibited a (1 0 0) texture with a thickness of 400 nm. A smooth interface is obtained between the LaNiO₃ bottom electrode and the BaTiO₃ film from cross-section observations by scanning electron microscopy. The bi-layer films show a dense and column microstructure with a grain size of 60 nm. Ferroelectric characterizations have been obtained for the BaTiO₃ films. The remnant polarization and coercive field are 2.1 μC/cm² and 45 kV/cm, respectively. The leak current measurements have shown a good insulating property.     

Influence of oxygen, hydrogen, helium, argon and vacuum on the surface behavior of molten InSb, other semiconductors, and metals on silica

Sessile drop experiments were performed on molten indium antimonide on clean quartz (fused silica) surfaces. A cell was constructed through which argon, helium, oxygen, hydrogen or a mixture of these was flowed at 600 °C. Some of the InSb was doped with 0.1% Ga. The surface tension σ of oxide-free molten InSb was smaller in Ar than in He, may have increased with increasing O₂ in the gas, and was not influenced by Ga or H₂. The contact angle θ on silica was higher in the presence of Ar, was lowered by O₂, and was not influenced by H₂ or Ga. The work of adhesion W and the surface energy σ_sv of the silica were higher in He than in Ar. The surface remained free of solid oxide only in flowing gas containing 0.8 ppm O₂. This behavior is attributed to reaction of O₂ at the surface of the melt to form In₂O gas. When solid oxide formed on Ga-doped material, it was strongly enriched in Ga, with the Ga/In ratio increasing with the concentration of O₂ in the gas.

Examination of published sessile-drop results for liquid metals and semiconductors on silica revealed that W and σ_sv were highest for reactive melts, in which SiO₂ dissolves. For non-reactive melts, W and σ_sv were lower and θ higher in a gas than in a vacuum, regardless of whether the experiments had been carried out in sealed ampoules, a flowing gas, or dynamic vacuum. The implication is that the surface of silica was different in a vacuum than in a gas at 1 bar.     

Simple hydrothermal preparation of -MnOOH nanowires and their low-temperature thermal conversion to β-MnO2 nanowires

Without the use of any extra surfactant or template, γ-MnOOH single crystalline nanowires were synthesized directly through the hydrothermal reaction between KMnO₄ and toluene in distilled water at 180 °C for 24 h; and β-MnO₂ single crystalline nanowires could be obtained just by calcination of the γ-MnOOH nanowires in air at 280 °C for 5 h. The as-prepared γ-MnOOH and β-MnO₂ nanowires were characterized by X-ray powder diffraction, atomic absorption spectroscopy, Fourier transformed infrared spectroscopy, scanning electron microscope, transmission electron microscope, high-resolution transmission electron microscope and selected area electron diffraction.     

High-resolution XRD study of stress-modulated YBCO films with various thicknesses

High-quality epitaxial YBa₂Cu₃O_7−δ (YBCO) superconducting films with thicknesses between 0.2 and 2 μm were fabricated on (0 0 l) LaAlO₃ with direct-current sputtering method. The influence of film thickness on the structure and texture was investigated by X-ray diffraction conventional θ–2θ scan and high-resolution reciprocal space mapping (HR-RSM). The films grew with strictly c-axis epitaxial, and no a-axis-oriented growth was observed up to a thickness of 2 μm. Lattice parameters of the YBCO films with different thicknesses were extracted from symmetry and asymmetry HR-RSMs. The X-ray lattice parameter method was used to determine the residual stress in YBCO films by measuring the a-, b-, c-axis strains, respectively. The results showed that YBCO films within thinner than 1 μm were under compressive stress, which was relieved increasing of film thickness. However, beyond 1 μm in thickness, YBCO films exhibited a tensile stress. Based on the experimental analysis, the variety of residual stresses in the films is mainly attributed to oxygen vacancies with thickness of YBCO film increasing.     

Analysis of SiC crystal sublimation growth by fully coupled compressible multi-phase flow simulation

A fully coupled compressible multi-phase flow solver was developed to effectively design a large furnace for producing large-size SiC crystals. Compressible effect, convection and buoyancy effects, flow coupling between argon gas and species, and the Stefan effect are included. A small and experimental furnace is used to validate the solver. First, the essentiality of 2D flow calculation and the significance of incorporating buoyancy effect and gas convection, the Stefan effect, and flow interaction between argon gas and species were investigated by numerical results. Then the effects of argon gas on deposition rate, growth rate, graphitization on the powder source, and supersaturation and stoichiometry on the seed were analyzed. Finally, the advantages of an extra chamber design were explained, and improvement of growth rate was validated by the present solver.     

Electron microscopy studies of epitaxial MgB2 superconducting thin films grown by in situ reactive evaporation

The morphology and chemistry of epitaxial MgB₂ thin films grown using reactive Mg evaporation on different substrates have been characterized by transmission electron microscopy methods. For polycrystalline alumina and sapphire substrates with different surface planes, an MgO transition layer was found at the interface region. No such layer was present for films grown on MgO and 4-H SiC substrates, and none of the MgB₂ films had any detectable oxygen incorporation nor MgO inclusions. High-resolution electron microscopy revealed that the growth orientation of the MgB₂ thin films was closely related to the substrate orientation and the nature of the intermediary layer. Electrical measurements showed that very low resistivities (several μΩ cm at 300 K) and high superconducting transition temperatures (38 to 40 K) could be achieved. The correlation of electrical properties with film microstructure is briefly discussed.     

Catalytic growth of In2O3 nanobelts by vapor transport

Indium oxide (In₂O₃) nanobelts have been fabricated by thermal evaporation of metallic indium powders with the assistance of Au catalysts. The as-synthesized nanobelts are single-crystalline In₂O₃ with cubic structure, and usually tens of nanometers in thickness, tens to hundreds of nanometers in width, and several hundreds of micrometers in length. The room temperature photoluminescence spectrum of In₂O₃ nanobelts features a broad emission band at 620 nm, which could be attributed to oxygen deficiencies in the as-synthesized belts. The formation of In₂O₃ nanobelts follows a catalyst-assistant vapor—liquid–-solid growth mechanism, which enables the controlled growth of individual belts on predetermined sites.     

Self-catalytic branch growth of SnO2 nanowire junctions

Multiple branched SnO₂ nanowire junctions have been synthesized by thermal evaporation of SnO powder. Their nanostructures were studied by transmission electron microscopy and field emission scanning electron microcopy. It was observed that Sn nanoparticles generated from decomposition of the SnO powder acted as self-catalysts to control the SnO₂ nanojunction growth. Orthorhombic SnO₂ was found as a dominate phase in nanojunction growth instead of rutile structure. The branches and stems of nanojunctions were found to be an epitaxial growth by electron diffraction analysis and high-resolution electron microscopy observation. The growth directions of the branched SnO₂ nanojunctions were along the orthorhombic [1 1 0] and . A self-catalytic vapor–liquid–solid growth mechanism is proposed to describe the growth process of the branched SnO₂ nanowire junctions.     

Bi20TiO32 nanocones prepared from Bi–Ti–O mixture by metalorganic decomposition method

Bi₂₀TiO₃₂ in the form of nanocones are reported for the first time, which have been found during the formation of Bi₂Ti₂O₇ nanocrystals. Bi₂₀TiO₃₂ nanocones were prepared by metalorganic decomposition technique. From X-ray patterns, it was found that Bi₂₀TiO₃₂ is a metastable phase, and can transform gradually into Bi₂Ti₂O₇ phase with the annealing time increasing at a temperature of 550°C. The image of field emission scanning electron microscopy shows that the lengths of the nanocones are up to several micrometers and the diameters of cusps range from 20 to 200 nm. The studies of transmission electron microscopy show that the nanocones are crystalline Bi₂₀TiO₃₂. The growth mechanism of Bi₂₀TiO₃₂ nanocones has been proposed, which is similar to the vapor–liquid–solid growth mechanism.