Electron microscopy study of the structural defect formation in ZnS under irradiation by electrons with energy of 400 keV

ZnS crystals grown form the vapor phase and ZnS/(001)GaAs epitaxial structures grown by metalorganic vapor phase epitaxy are studied by transmission electron microscopy after in situ irradiation in an electron microscope at an electron energy of 400 keV and intensity of (1–4) × 10¹⁹ electrons/cm² s. It is shown that irradiation leads to the formation of small (2.5–45 nm) dislocation loops with a density of 1.4 × 10¹¹ cm^–2, as well as voids and new phase inclusions ≤10 nm in size. Using the moire fringe contrast analysis, these inclusions were identified as ZnO and ZnO₂.     

注硅半绝缘GaAs的深能级

用深能级瞬态谱(DLTS)详细研究了硅离子注入Liquid-encapsulated Czochralski(缩写为LEC)半绝缘GaAs的深中心。结果表明,在注硅并经高温退火的有源区中观测到4个多子(电子)陷阱,E₀₁,E₀₂,E₀₃和E₀₄。它们的电子表观激活能分别为0.298,0.341,0.555和0.821eV。其中E₀₄与EL2有关,但不是EL2缺陷。E₀₄的电子 关键词：     

Characterization of GaAs/AlxGa1-xAs heterointerface defects by means of capacitive measurememts

x Ga_1-xAs heterojunctions grown by liquid-phase epitaxy. Interface states with hiqh concentration, N_t=3×10¹¹ cm^-2 and energy level E_c-E_t=0.14 eV distributed in a box 150 Å wide at the heterointerface and acting as electron traps are observed. The possible origin could be the isolated arsenic vacancy V_As in n-GaAs. Received: 25 April 1996/Accepted: 22 January 1997     

Deep level structure and compensation mechanism in In-doped CdTe crystals

Deep Level Transient Spectroscopy (DLTS) and Optical Deep Level Transient Spectroscopy (ODLTS) experiments have been conducted on a series of In-doped CdTe crystals grown by the Bridgman or the travelling heater (THM) methods using Te as the solvent. The THM samples are n-type but strongly compensated. Annealing at 700°C under high Cd vapour pressure leads to a decompensation of the crystals. The electron concentration is then a measure of the donor (In) concentration, which was in the range 3 × 10¹⁶−1.5 × 10¹⁸cm⁻³. Six and eight electron traps are, respectively detected in the non-annealed and annealed samples at a concentration level 10²–10³ times below the net electron concentration. They cover the energy range 0.2–0.8 eV. Similar traps are found in both types of crystals, the concentration of which increases with In content and after annealing. The presence of In interstitial-type defects is suggested. A main hole trap at 0.12eV is detected by ODLTS in compensated samples with a concentration close to the donor concentration. Low temperature electrical measurements show that this trap is ionized under equilibrium conditions. It appears to be the main compensating acceptor centre. A plausible microscopic structure is In_cdV_cd. This study shows that In-doped CdTe grown by THM is electrically compensated and that In-containing neutral associates or precipitates play a minor role in the compensation mechanism.     

电子辐照硅层中缺陷能级的研究

用12MeV电子辐照硅p⁺n结,在硅中除引入氧空位E₁(E_c-0.19eV),双空位E₂(E_c-0.24eV)和E₄(E_c-0.44eV)外,还引入缺陷E₃(E_c-0.37eV)。用DLTS方法和反向恢复时间测量研究了这些能级的退火行为,可以看到,E₃的退火温度最高(≈520℃)。由退火特 关键词：     

Characteristics of traps in TlInS2 single crystals

Characteristics of charge traps in TlInS₂ single crystals are investigated by the use of thermally stimulated current (TSC) technique. The TSC spectra of the sample from 80 K to 300 K are recorded at a constant heating rate. The spectra reveal that there are several trapping levels associated with the complex structure of overlapping peaks. The experimental results indicate that the traps in TlInS₂ associated with the spectra in the measuring range of temperature obey the monomolecular (first order) kinetics. Thus, the spectra are resolved into first order shaped peaks by the use of computerized best fit procedure. The trapping parameters; such as the energy depth, temperature dependent frequency factor and capture cross section, together with concentrations of the corresponding six discrete levels are computed. These centers all having low capture cross sections with strong temperature dependence are found to be at the energies of 0.11 eV, 0.22 eV, 0.25 eV, 0.26 eV, 0.29 eV and 0.30 eV with high concentrations of 6.6 × 10¹⁶, 2.0 × 10¹⁷, 3.3 × 10¹⁷, 9.6 × 10¹⁶, 2.3 × 10¹⁷ and 4.0 × 10¹⁷ cm^?3, respectively.     

The density and pressure of helium in bubbles in metals

Abstract

The energy shift of the He 1¹S₀?2¹P₁ transition, ΔE(n), can be used to determine the density, n, of He in bubbles in metals. A self-consistent band structure calculation for solid fcc He yields a linear relationship ΔE=C.n with C _th=22 × 10^?3 eV nm³. Systematic electron energy loss spectroscopy and transmission electron microscopy studies of He bubbles in Al for various He doses and temperatures result in C_exp=(24±8).10^?3 eV nm³ in agreement with theory. The analysis is consistent with the assumption that dislocation loop punching is the dominant bubble growth mechanism during high-dose room temperature implantation. The application to He bubbles in Ni indicates a maximum He density of n=0.2 × 10³ nm^?3 for which He should be solid at room temperature.     

Relation entre proprietes electriques et defauts de reseau dans ZnSiAs2 Partie I—analyse de l'energie d'ionisation

The electrical properties of crystals of the ternary semiconducting compound ZnSiAs₂ grown either by horizontal vapor phase transport or by the Bridgman method are reported.The resistivity and the Hall coefficient in the temperature range 77–300 K or 4.2–300 K have been measured and explained taking into account the asymmetry of the effective mass. All crystals arep-type with only one acceptor energy level between 7 × 10⁻³ eV and 0.32 eV, and are generally highly compensated. Annealing in zinc or arsenic vapor at 873 K induces a shift of the energy level vs annealing time.The position of the energy level vs annealing time has been explained in terms of intrinsic defects such as Schottky defects (As or Zn vacancies). The latter are accompanied by anti-structural disorder on the zinc sites. The different values of the energy levels created by the Schottky defects are attributed to a concentration effect; this may lead to the formation of an impurity band in some samples.     

A study of deformation-produced deep levels inn-GaAs using deep level transient capacitance spectroscopy

Deformation-produced deep levels, both of electron and hole traps, have been studied using deep level transient capacitance spectroscopy (DLTS) for an undopedn-type GaAs (HB grown) compressed at 440°C. Concentrations of two grown-in electron trap levels (E _c −0.65eV andE _c −0.74eV) and one grown-in hole trap level (E _v +∼0.4eV) increase with plastic deformation, while that of a grown-in electron trap level (E _c −∼0.3eV) decreases in an early stage of deformation. While no new peak appeared in the electron trap DLTS spectrum after plastic deformation, in the hole trap DLTS spectrum a broad spectrum, seemingly composed of many peaks, newly appeared in a middle temperature range, which may be attributed to electronic energy levels of dislocations with various characters.     

SiC film growth on Si(111) by supersonic beams of C 60

The development of electronic devices based on Silicon Carbide (SiC) has been strongly limited by the difficulties in growing high quality crystalline bulk materials and films. We have recently elaborated a new technique for the synthesis of SiC on clean Si substrates by means of supersonic beams of C₆₀: the electronic and structural properties of the film can be controlled by monitoring the beam parameters, i.e. flux and particles energy and aggregation state. SiC films were grown in Ultra High Vacuum on Si(111)-7×7, at substrates temperatures of 800 ^° C, using two different supersonic beams of C₆₀: He and H₂ have been used as seeding gases, leading to particles energy of 5 eV and 20 eV, respectively. Surface characterisation was done in situ by Auger and X-Ray photoelectron spectroscopy, as well as by low energy electron diffraction and ex situ by atomic force microscopy technique. SiC films exhibited good structural and electronic properties, with presence of defects different from the typical triangular voids. Received 20 November 2001     

Theoretical investigation on photovoltaic properties of PC61BM‐PDPP5T system as a promising polymer‐based solar cell

In the current work, dependent density functional theory and time‐dependent density functional theory calculations coupled with the inherent charge hopping model and some visualization techniques have been used to systematically investigate the photovoltaic properties of PC₆₁BM‐PDPP5T system. Calculations show that PC₆₁BM‐PDPP5T system possesses the relatively large open‐circuit voltage 0.82 V the middle‐sized exciton binding energy (0.690 eV), the small internal reorganization energy (0.159 eV) in the exciton‐dissociation process, but the relatively large one (0.396 eV) in the case of charge‐recombination. With a simplified molecular model, the exciton‐dissociation rate constant, k_dis, is estimated to be as large as 1.156 × 10¹⁰ s^?1 in PC₆₁BM‐PDPP5T phase interface, while the charge‐recombination one, k_rec, is only 1.018 × 10⁷ s^?1 under the same condition, which indicates a rapid and efficient photoinduced exciton‐dissociation process. Copyright © 2016 John Wiley & Sons, Ltd.     

乙醇分子的高分辨电子动量谱学研究:单个构象异构体的轨道电子动量分布

利用高分辨电子动量谱仪测量了乙醇分子外价轨道的电离能谱,通过对一系列角度关联的电离能谱进行解谱,获得了各个电离能峰对应的分子轨道电子动量分布.利用密度泛函理论方法计算了乙醇分子两种构象异构体的轨道电子动量分布,通过与实验结果进行比较,发现实验测量的电离能为14.5和15.2 eV能峰对应的电子动量分布分别与理论计算的单个构象异构体trans 8a''和gauche 9a轨道电子动量分布符合较好.     

用MOS方法研究四元混晶In0.75Ga0.25As0.58P0.42中的深能级中心

采用MOS方法,在液相外延生长的n型In_0.75Ga_0.25As_0.58P_0.42混晶中,我们测出了两个位于导带下面0.20eV和0.48eV处的电子陷阱,对电子的俘获截面分别为1.4×10^-16cm²和3.8×10^-12cm²。关于采用MOS方式研究具有多层结构的化合物半导体材料的DLITS问题,本文也进行了讨论。 关键词：     

Electron-impact ionization and dissociation of C<Subscript>2</Subscript>D<Superscript>+</Superscript>

Absolute cross sections for electron-impact single ionization, dissociative excitation and dissociative ionization of the ethynyl radical ion (C₂D⁺)^+) have been measured for electron energies ranging from the corresponding reaction thresholds to 2.5 keV. The animated crossed electron-ion beam experiment is used and results have been obtained for the production of C₂D²⁺, C²⁺, C₂⁺_2^+ , CD⁺, C⁺ and D⁺. The maximum of the cross section for single ionization is found to be (2.01 ± 0.02) × 10^-17 cm², at the incident electron energy of 105 eV. Absolute total cross sections for the various singly charged fragments production are observed to decrease by a factor of almost three, from the largest cross-section measured for C⁺, over C₂⁺_2^+ and CD⁺ down to that of D⁺. The maxima of the cross sections are obtained to be (14.5 ± 0.5) × 10^-17 cm² for C₂⁺_2^+, (12.1 ± 0.1) × 10^-17 cm² for CD⁺, (27.7 ± 0.2) × 10^-17 cm² for C⁺ and (11.1 ± 0.8) × 10^-17 cm² for D⁺. The smallest cross section is measured to be (1.50 ± 0.04) × 10^-18 cm² for the production of the doubly charged ion C²⁺. Individual contributions for dissociative excitation and dissociative ionization are determined for each singly-charged product. The cross sections are presented in closed analytic forms convenient for implementation in plasma simulation codes. Kinetic energy release distributions of dissociation fragments are seen to extend from 0 to 6 eV for the heaviest fragment C₂⁺_2^+, up to 11.0 eV for CD⁺, 14.2 eV for C⁺ and 11.2 eV for D⁺ products.     

Deep levels in low‐energy electron‐irradiated 4H‐SiC

Deep levels introduced by low‐energy (200 keV) electron irradiation in n‐type 4H‐SiC epitaxial layers grown by chemical vapour deposition were studied by deep level transient spectroscopy (DLTS) and photoexcitation electron paramagnetic resonance (photo‐EPR). After irradiation, several DLTS levels, EH1, EH3, Z_1/2, EH5 and EH6/7, often reported in irradiated 4H‐SiC, were observed. In irradiated freestanding films from the same wafer, the EPR signals of the carbon vacancy in the positive and negative charge states, V_C⁺ and V_C^‐, respectively, can be observed simultaneously under illumination with light of certain photon energies. Comparing the ionization energies obtained from DLTS and photo‐EPR, we suggest that the EH6/7 (at ～E_C – 1.6 eV) and EH5 (at ～E_C – 1.0 eV) electron traps may be related to the single donor (+ | 0) and the double acceptor (1– | 2–) level of V_C, respectively. Judging from the relative intensity of the DLTS signals, the EH6/7 level may also be contributed to by other unidentified defects. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth of InSe:Mn semiconductor crystals by Bridgman–Stockbarger technique and analysis of electron irradiation effects on Sn/InSe:Mn Schottky diodes

Mn-doped p-InSe semiconductor crystals were grown by Bridgman –Stockbarger technique. The crystals were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and fabricated Sn/InSe:Mn Schottky diodes. The current–voltage (I–V) and capacitance–voltage (C–V) measurements of diodes were investigated to determine the response of devices to electron irradiation with 9?MeV energy and 1.2?×?10¹⁰?e^??cm^?2 dose. After irradiation, the ideality factor and barrier height of the Sn/InSe:Mn Schottky diode were determined as 1.66 and 0.85?eV, respectively. Before irradiation, they were determined as 1.37 and 0.90?eV, respectively. It has been concluded that the radiation with high energy may contribute to form defects at the interface of the Sn/InSe:Mn device.     

Studies of deep levels in He+-irradiated silicon

9 to 10¹³ particles/cm² have been investigated by the deep level transient spectroscopy technique and capacitance-voltage profiling. Under low fluence irradiation at least four main electron traps have been observed. With further increase in irradiation fluence, two new levels located at E_c-0.56 eV and E_c-0.64 eV appear on the high-temperature side of the DLTS signal. The slope change observed in the amplitude variations of the singly negative charge state of the divacancy versus the dose takes place when these two new levels appear. This suggests that both are multivacancy-related defects. After annealing at 350 °C for 15 min, all electron traps have disappeared. Moreover, no shallow levels are created during the annealing. Received: 12 December 1996/Accepted: 6 May 1997     

梯度掺杂与均匀掺杂GaN光电阴极的对比研究

为了提高负电子亲和势(NEA)GaN光电阴极的量子效率,利用金属有机化合物化学气相淀积(MOCVD)外延生长了梯度掺杂反射式GaN光电阴极,其掺杂浓度由体内到表面依次为1×10¹⁸ cm^-3,4×10¹⁷ cm^-3,2×10¹⁷ cm^-3和6×10¹⁶ cm^-3,每个掺杂浓度区域的厚度约为45 nm,总的厚度为180 nm.在超高真 关键词： NEA GaN光电阴极 梯度掺杂 量子效率 能带结构     

Experimental and computational study of the passage of an electron beam through the curvilinear element of the Drakon stellarator system in a tenuous plasma

Results are presented from the first stage of studies on the passage of an electron beam with energy 100–500 eV in a magnetic field of 300–700 Oe through the curvilinear solenoid of the KRéL unit, the latter being a prototype of the closing segment of the Drakon stellarator system, in the plasma-beam discharge regime. The ion density at the end of the curvilinear part of the chamber, n _i ≈8×10⁸–10¹⁰ cm⁻³, the electron temperature T _e ≈4–15 eV, and the positions at which the beam hits the target for different distances from it to the electron source are determined experimentally. The motion of the electron beam is computationally modeled with allowance for the space charge created by the beam and the secondary plasma. From a comparison of the experimentally measured trajectories and trajectories calculated for different values of the space charge, we have obtained an estimate for the unneutralized ion density of the order of 5×10⁷ cm⁻³. Zh. Tekh. Fiz. 69, 22–26 (February 1999)     

约化场强对氮-氧混合气放电等离子体演化特性的影响

采用零维等离子体动力学模型,计算了不同约化场强条件下N₂/O₂放电等离子体的演化特性.结果表明,平均电子能量与约化场强有着近似的线性关系,在约化场强为100 Td时,平均电子能量约为2.6 eV、最大电子能量达35 eV;约化场强是影响电子能量函数分布的主要因素.气体放电过程结束后,振动激发态氮分子的粒子数浓度不再变化,电子激发态的氮分子、原子和氧原子的粒子数浓度达到一峰值后开始降低;放电结束后的氧原子通过复合反应生成臭氧.约化场强升高,由于低能电子减少的影响,振动激发态氮分子的粒子数浓度降低,当约化场强由50 Td增加75 Td,100 Td时,粒子数浓度由3.83×10¹¹ cm^-3降至1.98×10¹¹ cm^-3和1.77×10¹¹ cm^-3,其他粒子浓度则相应增大. 关键词： 等离子体 约化场强 粒子演化 数值模拟