一种Offner型小型短波红外成像光谱仪

通过对Offner分光光学系统分析,给出了快速计算初始结构参数公式,根据算得的初始结构参数优化出一套适用于短波红外(1 000～2 500 nm)的分光光学系统,设计的光学系统相对孔径大(F/#2.2)、光谱分辨率高(优于10 nm)和入射狭缝长(12 mm),在整个波长和视场范围内调制传递函数MTF均大于0.5。完成的成像光谱仪整机体积小,重量轻(小于5 kg),仪器测试结果表明,全光谱范围内光谱线性好,光谱标定后波长精度优于4 nm, 通过对不同波段分辨率测试,全波长范围内光谱分辨率与设计相符,动态成像实验表明, 光谱图像清晰并且光谱数据质量佳。     

Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light

We have acquired images with a spatial resolution better than 38 nm by using a tabletop microscope that combines 13 nm wavelength light from a high-brightness tabletop laser and Fresnel zone plate optics. These results open a gateway to the development of compact and widely available extreme-ultraviolet imaging tools capable of inspecting samples in a variety of environments with a 15-20 nm spatial resolution and a picosecond time resolution.     

宽谱段高分辨扫描光谱定标技术

为了满足原子发射光谱仪在紫外至近红外宽谱段范围内的高光谱分辨率快速检测需求,采用精密角位移平台直接驱动光栅,配合面阵探测器,实现高精度光谱分段快速扫描探测。但在扫描过程中,探测器像元波长增量与光栅转角呈非线性关系,且不同像元的波长增量不同,这对该光谱仪波长定标造成障碍。为校正光栅色散的非线性,基于光栅方程精确计算光栅转角与探测器首尾两端像元波长的映射关系,针对同一光栅转角,探测器其余像元波长利用首尾像元波长按照局部线性色散规律计算得到,从而完成全谱段光谱定标。依据定标所得转角与探测波段对应关系依次驱动光栅转动,实现宽谱段范围内的分段高精度光谱快速扫描探测。利用汞灯光源对该定标方法的波长检测精度进行检验,在200~800 nm的宽谱段范围内,波长准确度优于0.018 nm,波长重复性优于0.001 nm。     

电离层遥感远紫外成像光谱仪光学系统设计

基于Czerny-Turner分光结构的成像光谱仪光学系统,介绍了一种用于电离层观测的远紫外成像光谱仪光学系统设计方法。分析了该结构的像差来源,提出了使用发散光照明光路的消像差方法,计算了像差校正条件。设计了工作在120～180nm波长范围内的远紫外成像光谱仪光学系统,视场角为6.0°×0.1°,焦距为121.8mm,F数为6.2。利用调制传递函数(MTF)和成像仿真分析的方法对该系统的主要性能参数进行了评价,验证了设计的成像光谱仪的光谱分辨力优于1.0nm,空间分辨力优于0.1°,完全满足电离层观测的应用要求。与同类设计相比,该系统不含非球面光学元件,加工装调简单且易于工程实现。     

Far-field optical microscopy with a nanometer-scale resolution based on the in-plane image magnification by surface plasmon polaritons

A new far-field optical microscopy capable of reaching nanometer-scale resolution is developed using the in-plane image magnification by surface plasmon polaritons. This approach is based on the optical properties of a metal-dielectric interface that may provide extremely large values of the effective refractive index neff up to 10(3) as seen by surface polaritons, and thus the diffraction limited resolution can reach nanometer-scale values of lambda/2neff. The experimental realization of the microscope has demonstrated the optical resolution better than 60 nm at 515 nm illumination wavelength.     

微分干涉差共焦显微膜层微结构缺陷探测系统

多层膜极紫外光刻掩模"白板"缺陷是制约下一代光刻技术发展的瓶颈之一,为提高对掩模"白板"上的膜层微结构缺陷的分辨能力,提出了一种微分干涉差共焦显微探测系统方案。基于标量衍射理论,计算了系统横向和轴向分辨率。利用MATLAB建模仿真,在数值孔径为0.65、工作波长为405 nm时,分析比较了微分干涉差共焦显微系统、传统显微系统和共焦显微系统的分辨率。结果表明微分干涉差共焦显微系统具有230 nm的横向分辨率和25 nm轴向台阶高度差的分辨能力(对应划痕等缺陷形式)。此外,仿真和分析了实际应用中探测器尺寸、样品轴向偏移等的影响,模拟分析了膜层微结构缺陷的探测,结果表明本系统可以探测200 nm宽、10 nm高的微结构缺陷,较另外两种系统有更好的探测能力。     

Lateral resolution of 28 nm (<Emphasis Type="BoldItalic">λ</Emphasis> /25) in far-field fluorescence microscopy

We demonstrate sub-diffraction lateral resolution of 28±2 nm in far-field fluorescence microscopy through stimulated emission depletion effected by an amplified laser diode. Measurement of the optical transfer function in the focal plane reveals a 6-fold enlargement of the spatial bandwith over the diffraction limit. The resolution is established by imaging individual fluorescent molecules on a surface. Corresponding to 1/25 of the responsible wavelength, the attained resolution represents a new benchmark in far-field microscopy and underscores the viability of fluorescence nanoscopy with visible light, conventional optics and compact laser systems . PACS 32.50.+d; 42.30.-d; 78.45.+h; 87.57.Ce     

小型高光谱分辨率光栅单色仪的研制

单色仪是成像光谱仪进行光谱连续定标的必备设备,为了对高光谱成像光谱仪进行连续光谱定标,设计了一种轻小型高光谱分辨率的光栅单色仪。采用水平式Czerny-Turner光路结构,以高光谱分辨率为出发点,通过推导计算,从光栅选型、焦距计算、狭缝尺寸的确定等方面详细论述了光栅单色仪的设计思路,给出仪器的重要必要结构参数,并论述了这些结构参数对仪器光谱分辨率和体积的影响。根据光栅单色仪的光路特点,对入射狭缝组件、准直物镜组件和成像物镜组件、扫描结构、机身等进行轻小型机械结构设计,并给出正弦杆扫描机构的结构参数与仪器输出波长和波长扫描精度的数学关系,完成了仪器的整体结构设计和装调。应用汞灯可见光光谱进行波长定标,采用最小二乘法得到定标曲线,并提出步进数极限误差与定标曲线相结合的方法,求得仪器的波长重复性和波长准确度;仪器在400~800 nm波长范围内,光谱分辨率优于0.1 nm,波长重复性达±0.096 6 nm,波长准确度达±0.096 9 nm。     

One-dimensional Wolter optics with a sub-50 nm spatial resolution

We studied an imaging system consisting of an elliptical mirror and a hyperbolic mirror [i.e., one-dimensional (1D) Wolter optics] to realize an achromatic full-field hard x-ray microscopy with a resolution better than 50 nm. We report the performance of this 1D Wolter optical system when the mirrors were ultraprecisely figured by elastic emission machining. Experiments to form a demagnified image (demagnification factor of 385) of a 10 μm slit were conducted at an x-ray energy of 11.5 keV at BL29XUL of SPring-8. The system could form a demagnified image with a resolution better than 50 nm over a 12.1 μm field.     

基于大数值孔径环形光锥照明的超分辨光学 显微成像方法研究

提出和发展了一种基于大数值孔径环形光锥照明的远场超分辨光学显微成像新方法, 采用将发光二极管(LED)面光源、窄带滤光和环形光锥照明相结合的特种照明方式, 实现超分辨显微成像. 建立了大数值孔径环形光锥照明成像的物理模型, 根据标量衍射理论, 在不同环形光锥照明时, 推导出光学显微系统像面衍射斑光强分布的理论计算公式; 通过Matlab求解和绘图, 得到衍射斑光强的分布图样, 从理论上证明这一成像方法可以有效提高光学显微镜的分辨率; 建立了相应的显微成像系统, 通过实验验证了该方法可有效改善显微镜的成像质量, 显著提高分辨率; 在中心波长450 nm、环形光锥数值孔径1.125—1.25时, 实验获得的分辨率至少优于150 nm, 与理论研究结果相符合, 从而证明了这一方法的可行性.     

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.     

周期性和孤立的纳米结构的超透镜亚波长成像

超透镜光刻技术是一种很有前景的纳米结构成像技术,由于其具有可以克服衍射极限的能力,直到2005年,张翔和他的同事在365 nm紫外线波长下成功的对一排纳米线和刻在高分子膜上的四个字母NANO实现了超分辨成像,分辨率高达1/6入射波长。通过传递矩阵方法优化出超透镜结构,并通过选择适当的材料和设计在超透镜结构中的每个层的厚度以及合理的优化实验等方法制备一个新的超透镜结构,利用这种超透镜结构实现了周期性纳米结构及孤立纳米结构的亚波长成像。实验结果表明,对于周期性的纳米结构,其图像分辨率达到100 nm,而孤立结构的分辨率低于50 nm,小于入射波长的1/7。     

紫外宽光谱大相对孔径光学系统设计

现有大部分紫外光学镜头的工作带宽较窄,紫外镜头的材料相对较少,镜头的紫外色差校正困难,导致其应用适应性降低.采用负正透镜交叠分布与类双高斯对称式结构形式,并利用熔石英材料和氟化钙材料本身的宽光谱透过性,设计了一种兼具大相对孔径、宽视场和高分辨率的紫外宽光谱光学系统.该系统的工作波长范围为240 nm～360 nm,紫外...     

Breaking the diffraction barrier in fluorescence microscopy by optical shelving

We report the breaking of the diffraction resolution barrier in far-field fluorescence microscopy by transiently shelving the fluorophore in a metastable dark state. Using a relatively modest light intensity of several kW/cm(2) in a focal distribution featuring a local zero, we confine the fluorescence emission to a spot whose diameter is a fraction of the wavelength of light. Nanoscale far-field optical resolution down to 50 nm is demonstrated by imaging microtubules in a mammalian cell and proteins on the plasma membrane of a neuron. The presence of dark states in virtually any fluorescent molecule opens up a new venue for far-field microscopy with resolution that is no longer limited by diffraction.     

Miniature lamellar grating interferometer based on silicon technology

We present a lamellar grating interferometer realized with microelectromechanical system technology. It is used as a time-scanning Fourier-transform spectrometer. The motion is carried out by an electrostatic comb drive actuator fabricated by silicon micromachining, particularly by silicon-on-insulator technology. For the first time to our knowledge, we measure the spectrum of an extended white-light source with a resolution of 1.6 nm at a wavelength of 400 nm and of 5.5 nm at 800 nm. The wavelength accuracy is better than 0.5 nm, and the inspected wavelength range extends from 380 to 1100 nm. The optical path difference maximum is 145 microm. The dimensions of the device are 5 mm x 5 mm.     

基于光时分复用技术的高速成像系统北大核心CSCD

提出了一种基于光时分复用技术的高速成像系统。飞秒激光器中心波长1557nm,脉冲宽度90fs,对USAF-1951分辨率板线性扫描成像,扫描频率为38.88 MHz。在连续时间序列编码放大显微成像技术的基础上,运用光时分复用技术,复制光脉冲信号并携带检测物体相同的空间信息。原光脉冲和复制光脉冲以相同的采样率分别采样,通过相应的数据处理将两次采样数据整合在一起还原图像。实验结果表明,与传统的超快成像方法相比,成像系统利用10GHz的数字采样设备可以达到20GHz的采样率,采样点数是传统超快成像方法的两倍。该方法有效克服了成像系统采样率不足的问题,提高了成像系统的空间分辨率。与此同时,该系统算法复杂程度不高,有利于进一步促进超高速成像技术的发展。     

Analytical modeling to design the vertically aligned Si-nanowire metal-oxide-semiconductor photosensors for direct color sensing with high spectral resolution

In the current work, an analytical model for the design of vertically aligned silicon (Si) nanowire metal-oxide-semiconductor (MOS) capacitor based multi-color photodetectors has been developed for the detection of entire visible spectrum with high spectral resolution. The photogeneration phenomena within the nanostructures are analyzed in detail by developing a quantum field model associated with second quantization electron-photon field operators. The non-equilibrium Green's function (NEGF) formalism is employed to solve the relevant equations. The study shows that the proposed device with specified design of diameter-voltage combinations is capable of detecting 64 spectral bands of the entire visible spectrum (380 nm to700 nm) directly with a very high resolution of 5 nm wavelength. Such direct sensing of each wavelength is observed to be independent of the fluctuations of illumination intensity. The device is designed to obtain a full-width-at-half-maximum (FWHM) smaller than the spectral resolution (5 nm) for each wavelength of the visible range, which indicates a very high quality digital imaging/sensing method. Such devices may be a potential alternative for the future nanoelectronics based photodevices for superior sensing/imaging applications.     

SPDM: light microscopy with single-molecule resolution at?the?nanoscale

Far-field fluorescence techniques based on the precise determination of object positions have the potential to circumvent the optical resolution limit of direct imaging given by diffraction theory. In order to use localization to obtain structural information far below the diffraction limit, the ‘point-like’ components of the structure have to be detected independently, even if their distance is lower than the conventional optical resolution limit. This goal can be achieved by exploiting various photo-physical properties of the fluorescence labeling (‘spectral signatures’). In first experiments, spectral precision distance microscopy/spectral position determination microscopy (SPDM) was limited to a relatively small number of components to be resolved within the observation volume. Recently, the introduction of photoconvertable molecules has dramatically increased the number of components which can be independently localized. Here, we present an extension of the SPDM concept, exploiting the novel spectral signature offered by reversible photobleaching of fluorescent proteins. In combination with spatially modulated illumination (SMI) microscopy, at the present stage, we have achieved an estimated effective optical resolution of approximately 20 nm in the lateral and 50 nm in the axial direction, or about 1/25th–1/10th of the exciting wavelength.     

Nanometric size control and treatment of historic paper manuscript and prints with laser light at 157 nm

Laser cleaning of historic paper infected by foxing is far more effective at 157 nm than in other laser wavelengths because at 157 nm localized photo-dissociation of organic matter is taking place at low laser energy. In addition spatial control over exposed areas with resolution better than 100 nm is possible at this wavelength. In order to optimize the methods of laser cleaning of historic paper, foxing ablation experiments at 157 nm indicate that infected paper areas can be removed with controllable spatial resolution in the nanometer scale. In addition foxing samples were investigated by scanning electron microscopy and X-ray analysis. It was found that biological activity was present on paper areas containing traces of iron. PACS  87.50.Hj; 42.62.-b; 87.15.Mi     

Nano‐imaging through tip‐enhanced Raman spectroscopy: Stepping beyond the classical limits

The spatial resolution in optical imaging is restricted by so‐called diffraction limit, which prevents it to be better than about half of the wavelength of the probing light. Tip‐enhanced Raman spectroscopy (TERS), which is based on the SPP‐induced plasmonic enhancement and confinement of light near a metallic nanostructure, can however, overcome this barrier and produce optical images far beyond the diffraction limit. Here in this article, the basic phenomenon involved in TERS is reviewed, and the high spatial resolution achieved in optical imaging through this technique is discussed. Further, it is shown that when TERS is combined with some other physical phenomena, the spatial resolution can be dramatically improved. Particularly, by including tip‐applied extremely localized pressure in TERS process, it has been demonstrated that a spatial resolution as high as 4 nm could be achieved.