超声波辅助酸蚀提高熔石英损伤阈值

为了提高熔石英元件表面抗激光损伤阈值,利用超声波辅助HF酸研究平滑光学元件表面缺陷形貌和去除刻蚀后残留物效果,通过扫描电子显微镜电镜和原子力显微镜记录表面形貌结构,以及单脉冲激光辐照测试抗损伤阈值确定实验参数。研究表明,超声波场的引入能催化HF酸的刻蚀速率、提高钝化效果并且更易剥离嵌入的亚μm级杂质粒子。经过实验测试,获得了熔石英类元件相匹配的超声辅助HF酸刻蚀实验参数,研究结果对应用超声波辅助HF酸研究熔石英表面抗激光损伤有重要意义。     

超声波辅助酸蚀提高熔石英损伤阈值

为了提高熔石英元件表面抗激光损伤阈值,利用超声波辅助HF酸研究平滑光学元件表面缺陷形貌和去除刻蚀后残留物效果,通过扫描电子显微镜电镜和原子力显微镜记录表面形貌结构,以及单脉冲激光辐照测试抗损伤阈值确定实验参数。研究表明,超声波场的引入能催化HF酸的刻蚀速率、提高钝化效果并且更易剥离嵌入的亚m级杂质粒子。经过实验测试,获得了熔石英类元件相匹配的超声辅助HF酸刻蚀实验参数,研究结果对应用超声波辅助HF酸研究熔石英表面抗激光损伤有重要意义。;     

熔石英亚表面划痕激光诱导损伤阈值实验研究

用原子力显微镜和光学显微镜观测酸蚀后熔石英亚表面划痕,并根据形貌特征将其分为Boussinesq-point-force crack(BPFC)、Hertzian-conical scratch(HCS)和Plastic indent(PI)三类,测试了各类划痕的损伤阈值,讨论了激光损伤机制。结果表明锐度较大的BPFC损伤阈值不超过2.0 J/cm<>2;深度小于1 μm的 HCS阈值可达2.6 J/cm2;形变较大的PI阈值至2.8 J/cm2,形变较小的PI的激光损伤阈值与无缺陷材料相当。BPFC 和深度超过1 μm的HCS是导致熔石英损伤阈值低的主要因素。     

熔石英亚表面划痕激光诱导损伤阈值实验研究

 用原子力显微镜和光学显微镜观测酸蚀后熔石英亚表面划痕,并根据形貌特征将其分为Boussinesq-point-force crack(BPFC)、Hertzian-conical scratch(HCS)和Plastic indent(PI)三类,测试了各类划痕的损伤阈值,讨论了激光损伤机制。结果表明锐度较大的BPFC损伤阈值不超过2.0 J/cm<>2;深度小于1 μm的 HCS阈值可达2.6 J/cm²;形变较大的PI阈值至2.8 J/cm2,形变较小的PI的激光损伤阈值与无缺陷材料相当。BPFC 和深度超过1 μm的HCS是导致熔石英损伤阈值低的主要因素。     

Nanosecond and femtosecond excimer laser ablation of fused silica

Ablation of fused silica using standard excimer lasers (20–30 ns pulse duration at 193, 248, and 308 nm) and a short pulse laser system (500 fs at 248 nm) is reported. Ablation rates range from several hundred nm/pulse (193 nm or fs-laser) up to about 6 m/pulse (308 nm). The performance of the ablation is found to depend not only on wavelength and pulse duration but also on the existing or laser induced surface quality (e.g., roughness) of the material. Special ablation phenomena are observed. At 193 nm and moderate fluence (3 J/cm²) ablation takes place at the rear side of a plate without affecting the front side, whereas at higher fluence normal ablation at the front side occurs. At 248 nm (standard excimer) the existence of two consecutive ablation phases is observed: smooth ablation at low rate is followed by explosive ablation at high rate. Using fs-pulses smooth shaped holes are formed during the first pulses, whereas high pulse numbers cause the development of a ripple structure in the ablation craters.The results lead to the conclusion that two different ablation mechanisms are involved: the first is based on two photon bulk absorption, the second on controlled surface damage in relation with (partially laser induced) singularity conditions at the surface.Presented at LASERION '91, June 12–14, 1991, München (Germany)     

酸蚀与紫外激光预处理结合提高熔石英损伤阈值

采用HF酸刻蚀和紫外激光预处理相结合的方式提升熔石英元件的负载能力,用质量分数为1%的HF缓冲溶液对熔石英刻蚀1~100 min,综合透过率、粗糙度和损伤阈值测试结果,发现刻蚀时间为10 min的熔石英抗损伤能力最佳。采用355 nm紫外激光对HF酸刻蚀10 min的熔石英进行预处理,结果表明：紫外预处理能量密度在熔石英零损伤阈值的60%以下时,激光损伤阈值单调递增;能量到达80%时,阈值反而低于原始样片的损伤阈值。适当地控制酸蚀时间和紫外激光预处理参数能有效提高熔石英的抗损伤能力。     

Femtosecond laser writing of porous capillaries inside fused silica glass

We demonstrate that within a restricted optical pulse duration-pulse energy parameter space tightly focused femtosecond laser radiation can be used to fabricate porous capillaries in bulk fused silica glass by simply moving the laser focus through the material. We show that the rate of penetration of liquids into the porous capillaries can be controlled by the laser polarization, which determines their morphology. The fluid propagation is measured using the form birefringence of nanocrack/nanovoid structures produced inside the capillaries. We also demonstrate the nanofiltration capabilities of the capillaries by separating the relatively small molecules of Rhodamine 6G dye from their solvent.     

Spatio-temporal evolution scenarios of femtosecond laser pulse filamentation in fused silica

We investigated the evolution of femtosecond laser pulses at different wavelengths corresponding to normal, zero, and anomalous regimes of group velocity dispersion (GVD) in fused silica. The laser pulse filamentation in different GVD regimes under the same similarity parameters was first considered. It was established numerically that the scenario of the pulse filamentation depends both on temporal factors, which are determined by pulse GVD and self-phase modulation, and spatial factors associated with Kerr self-focusing and plasma defocusing. In presence of strong normal GVD the dispersive stretching causes, a pulse power decrease followed by lowering of the intensity in filament, electron density reduction in plasma channel, and suppressing of the refocusing. For zero GVD the multipeak regime of radiation propagation is realized in the filament as a result of recurring self-focusings of powerful pulse tail, which was defocused in laser plasma. When GVD is anomalous a sequence of ??light bullets?? with duration about 10 fs forms in the filament. And the peak intensity in ??light bullet?? stays the same ?? 5 × 10¹³ W/cm². In the regime of anomalous GVD power is transferred from the pulse edges to its center, where the repeated self-focusings occur and form a ??light bullet?? sequence.     

Optical and ultrasonic monitoring of femtosecond laser filamentation in fused silica

Millimeter-long filaments and accompanying luminous plasma and defect channels created in fused silica (FS) by single focused femtosecond laser pulses with supercritical powers were probed in situ using optical imaging and contact ultrasonic techniques. Above the threshold pulse energy E_opt = 5 μJ corresponding to a few megawatt power levels pulses collapse due to self-focusing, producing channels filled by electron-hole plasma and luminescent defects, and exhibits predominantly compressive pressure transients. Analysis of the optical and ultrasonic response versus the laser pulse energy suggests that filamentary pulse propagation in the channels occurs with considerable dissipation of about ∼10 cm⁻¹. The predominant ionization mechanism is most likely associated with avalanche ionization, while the main mechanism of optical absorption is free-carrier absorption via inverse Bremsstrahlung interaction with the polar lattice.     

纳秒激光诱导损伤熔石英玻璃的动力学过程

采用超快时间分辨阴影成像技术研究了纳秒激光诱导损伤熔石英玻璃前后表面和体内的动力学过程,对比分析了前后表面和体内的损伤差异及损伤机制。在前表面,观察了空气和材料中的等离子体和冲击波的产生与发展过程;亚纳秒激光辐照下,前表面材料内观察到三个应力波,并观察到材料体内的损伤过程。在后表面,除观察到冲击波的产生与发展过程,还观察到表面物质的烧蚀去除与喷发过程。在材料内部,损伤由自聚焦和点缺陷吸收两种机制主导,而且点缺陷吸收诱导材料体内损伤有时间先后顺序。     

熔石英紫外激光初始损伤形态分析

采取355 nm激光脉冲辐照熔石英样品,利用Nomarski微分干涉差显微镜、原子力显微镜和扫描电子显微镜观测手段对前后表面产生的损伤点进行了观察分析。对前后表面损伤形态做出详细的描述和分类,从理论上对每种损伤类型产生的条件与机理做出推测。实验结果表明：熔石英前表面存在小麻点群损伤和星状裂纹损伤两种损伤形态,横向尺寸分别为0.8～2.5和1.0～5.5 μm;后表面存在小麻点群损伤、壳状剥离损伤和火山口3种损伤形态,损伤横向尺寸分别为0.48～1.33,4～20和12～30 μm。实验证明了1 μm尺度损伤点的产生与再沉积层密切相关。     

355 nm皮秒激光辐照下熔石英的损伤特性

利用光学元件激光损伤测试平台,测试了355 nm皮秒激光辐照下熔石英光学元件的初始损伤及损伤增长情况,并通过荧光检测分析了损伤区缺陷。研究结果表明：皮秒激光较高的峰值功率导致熔石英损伤阈值较低,前表面损伤阈值为3.98 J/cm2,后表面损伤阈值为2.91 J/cm2;前后表面损伤形貌存在较大差异,后表面比前表面损伤程度轻且伴随体内丝状损伤;随脉冲数的增加后表面损伤直径增长缓慢,损伤深度呈线性增长;皮秒激光的动态自聚焦和自散焦导致熔石英体内损伤存在细丝和炸裂点重复的现象;与纳秒激光损伤相比,损伤区缺陷发生明显改变。     

熔石英紫外激光初始损伤形态分析

 采取355 nm激光脉冲辐照熔石英样品,利用Nomarski微分干涉差显微镜、原子力显微镜和扫描电子显微镜观测手段对前后表面产生的损伤点进行了观察分析。对前后表面损伤形态做出详细的描述和分类,从理论上对每种损伤类型产生的条件与机理做出推测。实验结果表明：熔石英前表面存在小麻点群损伤和星状裂纹损伤两种损伤形态,横向尺寸分别为0.8～2.5和1.0～5.5 μm;后表面存在小麻点群损伤、壳状剥离损伤和火山口3种损伤形态,损伤横向尺寸分别为0.48～1.33,4～20和12～30 μm。实验证明了1 μm尺度损伤点的产生与再沉积层密切相关。     

355 nm皮秒激光辐照下熔石英的损伤特性

利用光学元件激光损伤测试平台,测试了355 nm皮秒激光辐照下熔石英光学元件的初始损伤及损伤增长情况,并通过荧光检测分析了损伤区缺陷。研究结果表明:皮秒激光较高的峰值功率导致熔石英损伤阈值较低,前表面损伤阈值为3.98 J/cm2,后表面损伤阈值为2.91 J/cm2;前后表面损伤形貌存在较大差异,后表面比前表面损伤程度轻且伴随体内丝状损伤;随脉冲数的增加后表面损伤直径增长缓慢,损伤深度呈线性增长;皮秒激光的动态自聚焦和自散焦导致熔石英体内损伤存在细丝和炸裂点重复的现象;与纳秒激光损伤相比,损伤区缺陷发生明显改变。     

CO2激光扫描辐照修复熔石英表面损伤

采用振镜系统结合10.6 m的CO2激光,对熔石英表面损伤点进行辐照,成功地修复了直径500 m的大尺寸损伤点,损伤修复后表面无烧蚀残留,损伤内部完全愈合,无气泡和残余裂纹。和定点修复方式相比,这种修复具有修复尺度大、面形影响区域小、应力分布范围小的优势。80%扫描辐照修复的损伤点的初始损伤阈值恢复甚至超过了基底的初始损伤阈值。     

杂质诱导熔石英激光的损伤机理

发展了355 nm纳秒激光下亚波长杂质粒子引起熔石英损伤的基本模型。通过Mie散射理论和热传导方程,计算了粒子与熔石英边界处的温度随粒子尺寸的变化关系,并分析了达到临界温度时,不同粒子诱导损伤所需的关键能量密度,讨论了各粒子最易引起熔石英损伤的尺寸。实验采用355 nm纳秒激光脉冲作用熔石英及其HF刻蚀样品,测得两者的损伤概率。研究表明:粒子吸收激光能量,随着粒子半径的增加,其边缘温度先增大后减小,一定尺寸范围内的粒子才会引起熔石英的损伤;关键能量密度所对应的粒子半径为最易引起熔石英损伤的关键粒子半径;经刻蚀后,熔石英样品表面杂质数密度降低,损伤概率降低,损伤阈值提高。     

Structural changes in fused silica after exposure to focused femtosecond laser pulses

Using in situ Raman scattering in a confocal microscopy setup, we have observed changes in the network structure of fused silica after modifying regions inside the glass with tightly focused 800-nm 130-fs laser pulses at fluences of 5-200 J cm(-2). The Raman spectra show a large increase in the peaks at 490 and 605cm(-1), owing to 4- and 3-membered ring structures in the silica network, indicating that densification occurs after exposure to the femtosecond laser pulses. The results are consistent with the formation of a localized plasma by the laser pulse and a subsequent microexplosion inside the glass.     

Wavelength-tunable multicolored femtosecond laser pulse generation in a fused silica glass plate

We obtained an array of multicolored femtosecond laser pulses with as many as 17 different colors that are spatially isolated. The mechanism of generation was proved to be cascaded four-wave mixing and with the following procedure. The output beam from a femtosecond laser was split into two. One of the two beams was pulse-compressed with a hollow core fiber and the intensity of the other was reduced. The two beams were synchronized and combined with a small crossing angle in a plate of fused silica glass plate. The wavelengths of the sidebands are continuously tunable from near-ultraviolet to near-infrared. The pulse duration, spatial mode, spectrum, and energy stability of the sidebands were studied. As many as fifteen spectral up-shifted pulses and two spectral downshifted pulses were obtained with spectral bandwidths broader than 1.8 octaves. Properties such as pulse energy as high as 1 μmJ, 45 fs pulse duration, smaller than 1.1 times of the diffraction limit Gaussian spatial profile, and better than 2% RMS power stability of the generated sidebands make it can be used in various experiments. The characterization showed that the sidebands have sufficiently good qualities to enable application to for various multicolor femtosecond laser experiments, for example, a multicolor pump-probe experiment.     

High power supercontinuum generation by dual-color femtosecond laser pulses in fused silica

High power supercontinuum (SC) is generated by focusing 800 nm and 400 nm femtosecond laser pulses in fused silica with a microlens array. It is found that the spectrum of the SC is getting broader compared with the case of a single laser pulse, and the spectral energy density between the two fundamental laser wavelengths is getting significantly higher by optimizing the phase matching angle of the BBO. It exceeds μJ/nm over 490 nm range which is from 380 nm to 870 nm, overcoming the disadvantage of relative lower power in the ranges far from the fundamental wavelength.