Reactive epitaxy of cobalt disilicide on Si(100)

The growth of cobalt disilicide on the Si(100) surface by reactive epitaxy at T=350°C was studied within the 10–40 ML cobalt coverage range. A new method of mapping the atomic structure of the surface layer by inelastically scattered medium-energy electrons was employed. The films thus formed were shown to consist of CoSi₂(221) grains of four azimuthal orientations turned by 90° with respect to one another. This domain structure originates from substrate surface faceting by (111) planes, a process occurring during silicide formation. B-oriented CoSi₂(111) layers grow epitaxially on (111) facets.     

On new two-dimensional structures produced on the Si (111) and Si (100) surface upon molecular-beam epitaxy of cobalt and silicon

Highly perfect epitaxial heterostructure CoSi₂ films have been grown on the surface of Si (111) and Si (100) single crystals by the method of molecular-beam epitaxy. The optimal regimes of the film growth with different thicknesses have been determined. It has been shown that short-term annealing of epitaxial films at T = 900–950 K leads to the formation of new CoSi₂/Si(111)-2 × 2 and CoSi₂/Si(100)−2 × 4 superstructures.     

Nucleation and growth during molecular beam epitaxy (MBE) of Si on Si(111)

The nucleation of Si on Si(111) has been studied during deposition in UHV by spot profile analysis of low energy electron diffraction (SPA-LEED). A new method of evaluation is developed by separating the measured spot profile into a central spike and a broad shoulder. The energy dependence of the fraction of the central spike out of the total diffracted intensity provides the vertical distribution of surface atoms over different levels. With this method it is shown that the first nucleation occurs in islands of double height. Only after deposition of several layers a layer-by-layer growth is found with a well defined nucleation of a new layer before the former one is completed.     

Molecular beam epitaxy of monotype CrSi2 on Si(111)

Low energy electron diffraction (LEED), angle-resolved ultraviolet (ARUPS), and X-ray (XPS) photoemission spectroscopy and work function measurements were used to investigate the growth of epitaxial CrSi₂ on a Si(111) surface. The CrSi₂layers ) (~ 100 Å) are formed by the MBE technique, in which Cr and Si are coevaporated in their stoichiometric ratio on the Si(111) substrate maintained at ~450°C. In comparison with the CrSi₂ epitaxy previously obtained by the SPE technique, where two kinds of CrSi₂ domains with equal formation probability are always observed, the epitaxial CrSi₂ layers obtained by the MBE technique essentially present one definite orientation characterized by CrSi₂(0001)∥Si(111) and CrSi₂[112̄0] ∥[112̄].     

Electron diffraction on GaAs nanowhiskers grown on Si(100) and Si(111) substrates by molecular-beam epitaxy

The crystal structure of GaAs nanowhiskers grown by molecular-beam epitaxy on Si(111) and Si(100) substrates is investigated using reflection high-energy electron diffraction (RHEED). It is revealed that, in both cases, the electron diffraction images contain a combination (superposition) of systems of reflections characteristic of the hexagonal (wurtzite and/or 4H polytype) and cubic (sphalerite) phases of the GaAs compound. The growth on the Si(111) substrates leads to the formation of nanowhiskers with hexagonal (wurtzite and/or 4H polytype) and cubic (sphalerite) structures with one and two orientations, respectively. In the case of the Si(100) substrates, the grown array contains GaAs nanowhiskers that have a cubic structure with five different orientations and a hexagonal structure with eight orientations in the (110) planes of the substrate. The formation of the two-phase crystal structure in nanowhiskers is explained by the wurtzite—sphalerite phase transitions and/or twinning of crystallites.     

Initial stages of Ge epitaxy on Si(111) under quasi-equilibrium growth conditions

The results of the structural and morphological studies of Ge growth on a Si(111) surface at the initial stages of epitaxy by means of scanning tunneling microscopy and high-resolution transmission electron microscopy are presented. Epitaxy of Ge has been performed in the temperature range of 300 to 550°C under the quasi-equilibrium growth conditions and low deposition rates of 0.001–0.01 bilayers per minute. The stages of the formation and decay of the nanoclusters as a result of the redistribution of the Ge atoms into two-dimensional pseudomorphic Ge islands before the formation of the continuous wetting layer have been experimentally detected. The positions of the preferable nucleation of three-dimensional Ge islands on the wetting layer formed after the coalescence of the two-dimensional islands have been analyzed. The c2 × 8 → 7 × 7 → c2 × 8 phase transitions due to the lateral growth of the islands and the plastic relaxation of the misfit strains occur on the surface of the three-dimensional Ge islands when their strain state changes. The misfit dislocations gather at the interface and two types of steps lower than one bilayer are formed on the surface of the three-dimensional islands during the relaxation process.     

Molecular beam epitaxy growth of monolayer hexagonal MnTe2 on Si(111) substrate

Monolayer MnTe₂ stabilized as 1T structure has been theoretically predicted to be a two-dimensional (2D) ferromagnetic metal and can be tuned via strain engineering. There is no naturally van der Waals (vdW) layered MnTe₂ bulk, leaving mechanical exfoliation impossible to prepare monolayer MnTe₂. Herein, by means of molecular beam epitaxy (MBE), we successfully prepared monolayer hexagonal MnTe₂ on Si(111) under Te rich condition. Sharp reflection high-energy electron diffraction (RHEED) and low-energy electron diffraction (LEED) patterns suggest the monolayer is atomically flat without surface reconstruction. The valence state of Mn⁴⁺ and the atom ratio of ([Te]:[Mn]) further confirm the MnTe₂ compound. Scanning tunneling spectroscopy (STS) shows the hexagonal MnTe₂ monolayer is a semiconductor with a large bandgap of ~2.78 eV. The valence-band maximum (VBM) locates at the Γ point, as illustrated by angle-resolved photoemission spectroscopy (ARPES), below which three hole-type bands with parabolic dispersion can be identified. The successful synthesis of monolayer MnTe₂ film provides a new platform to investigate the 2D magnetism.     

Surface and interface studies of GaN epitaxy on Si(111) via buffer layers

Gallium nitride films, epitaxially grown on Si(111) via a lattice-matched ZrB(2) buffer layer by plasma-assisted molecular beam epitaxy, have been studied in situ by noncontact atomic force microscopy and also in real time by reflection high-energy electron diffraction. The grown films were determined to be always N-polar. First-principles theoretical calculations modeling the interface structure between GaN(0001) and ZrB(2)(0001) clarify the origin of the N polarity.     

Synthesis of aligned GaN nanorods on Si (111) by molecular beam epitaxy

Straight and well-aligned GaN nanorods have been successfully synthesized by molecular beam epitaxy (MBE) method. The GaN nanorods have been characterized by field-emission scanning electron microscopy (FE-SEM) equipped with energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), transmission electron microscopy (TEM) and selected area electron diffraction (SAED). SEM images show that GaN nanorods are constituted with two parts of which shapes are different from each other. The upper part of the nanorod is very thin and its lower part is relatively thick. The XRD and EDS analysis have identified that the nanorods are pure hexagonal GaN with single crystalline wurtzite structure. The TEM images indicate that the nanorods are well crystallized and nearly free from defects. The XRD, HRTEM, and SAED pattern reveal that the growth direction of GaN nanorods is 〈0001〉. The photoluminescence (PL) spectra indicate the good emission property for the nanorods. Finally, we have demonstrated about the two-step growth of the nanorods. PACS 81.07.Bc; 81.05.Ea; 81.15.Hi     

Anisotropic growth of titanium disilicide nanocrystals on Si(113) surface

Growth of titanium disilicide (TiSi₂) particles on a Ti-deposited Si(113) surface was observed with a scanning tunneling microscope. The direction of the particle growth was specifically related to the anisotropy of the high-index surface. The particles were identified as C54 nano-crystals, and their orientation was determined from the morphology of the silicide facets. The Si(113)-specific growth orientation is explained in terms of the lattice mismatch between C54 TiSi₂ and the reconstructed surface structure.     

Hydrogen vibrations on Si (111)

High resolution electron energy loss spectra are reported for atomic hydrogen and deuterium adsorption on the Si (111) 7x7 surface. The experiments were carried out for various hydrogen exposures and different substrate temperatures. Clear evidence is given for the formation of SiH₂ and/or SiH₃ complexes in the early stages of adsorption. Strong indications are also obtained for the removal of adsorbed hydrogen probably via the formation and desorption of silane during hydrogen exposure.     

Thermal oxidation of cobalt disilicide

The thermal oxidation kinetics of cobalt disilicide on Si substrates have been investigated in the temperature range of 650–1100 °C in dry oxygen and wet oxygen. A surface layer of SiO₂ grows parabolically with time. The growth rate is independent of the substrate orientation (111 or 100) and thickness of the CoSi₂ layer. We surmize that the oxidation mechanism is dominated by the diffusion of an oxidant through the growing SiO₂. Activation energies for the dry and wet oxidation are 1.49±0.05 eV and 1.05±0.05 eV, respectively. The kinetics is exactly the same as for NiSi₂ oxidation which suggest that the same mechanism controls the oxidation of these two similar suicides.     

Properties of Si nanostructural modification on Si (111) surface

Si nanostructures (Si-NSs) epitaxially grown or adsorbed on Si (111) surface, with various shapes including pit-like, bars, islands, hill-like, diamond-like and double cage, were studied theoretically using density-functional theory (DFT) calculations. The electronic and optical properties of these Si-NSs were calculated, showing that the designed Si-NSs modifications can enhance the optical absorption for Si surface.