Multilayer Au/TiO2Composite Films with Ultrafast Third-Order Nonlinear Optical Properties

We report on the ultrafast third-order optical nonlinearity in multilayer Au/TiO2 composite films fabricated on quartz substrates by pulsed laser deposition technique. The linear optical properties of the films are determined and optical absorption peaks due to surface plasmon resonance of Au particles are observed at about 590hm. The third-order optical nonlinearities of the films are investigated by z-scan method using a femtosecond laser （50 fs） at the wavelength of 800 nm. The sample showed fast nonlinear optical responses with nonlinear absorption coefficient and nonlinear refractive index being -3.66 × 10^-10 m/W and -2.95 × 10^-17 m^2/W, respectively. The results also show that the nonlinear optical effects increase with the increasing Au concentration in the composite films.     

Femtosecond Third-Order Optical Nonlinearity of Au：Bi203 Nanocomposite Films

Ultrafast third-order optical nonlinearities of the as-deposited and annealed Au：Bi2O3 nanocomposite films deposited by magnetron cosputtering are investigated by using femtosecond time-resolved optical Kerr effect （OKE） and pump probe techniques. The third-order optical nonlinear susceptibility is estimated to be 2.6Ф×10^- 10 esu and 1.8 × 10.9 esu at wavelength of 800nm, for the as-deposited and the annealed film, respectively. The OKE signal of the as-deposited film is nearly temporally symmetrical with a peak centred at zero delay time, which indicates the dominant contribution from intraband transition of conduction electrons. For the annealed film, the existence of a decay process in OKE signal implies the important contribution of hot electrons. These characteristics are in agreement with the hot electron dynamics observed in pump probe measurement.     

Measurement of Density Inhomogeneity for Glass Pendulum

The density inhomogeneity of a glass pendulum is determined by an optical interference method. The relative variations of the densities over a volume with sizes of 5 × 5×5 mm^3 are （0.64 ± 0.97） × 10^-5 and （0.99 ± 0.92） × 10^-5 for the K9 glass and silica glass pendulum, respectively. These variations of densities contributing to the relative uncertainties of the Newtonian gravitational constant G are 0.20 ppm and 0.21 ppm in our experiment on measurement of G.     

Atomic Diffusion in Cu/Si （111） and Cu/SiO2/Si （111） Systems by Neutral Cluster Beam Deposition

The Cu films are deposited on two kinds of p-type Si （111） substrates by ionized duster beam （ICB） technique. The interface reaction and atomic diffusion of Cu/Si （111） and Cu/SiO2/Si （111） systems are studied at different annealing temperatures by x-ray diffraction （XRD） and Rutherford backscattering spectrometry （RBS）. Some significant results are obtained： For the Cu/Si （111） samples prepared by neutral dusters, the interdiffusion of Cu and Si atoms occurs when annealed at 230℃. The diffusion coefficients of the samples annealed at 230℃ and 500℃ are 8.5 ×10^-15 cm^2.s^-1 and 3.0 ×10^-14 cm^2.s^-1, respectively. The formation of the copper-silicide phase is observed by XRD, and its intensity becomes stronger with the increase of annealing temperature. For the Cu/SiO2//Si （111） samples prepared by neutral dusters, the interdiffusion of Cu and Si atoms occurs and copper silicides are formed when annealed at 450℃. The diffusion coefficients of Cu in Si are calculated to be 6.0 ×10^-16 cm^2.s^-1 at 450℃, due to the fact that the existence of the SiO2 layer suppresses the interdiffusion of Cu and Si.     

Magneto-Optical Trapping of Ytterbium Atoms with a 398.9nm Laser

We report the realization of ytterbium magneto-optical trap （MOT） operating on the dipole-allowed ^1S0 - ^1P1 transition at 398.9nm. The MOT is loaded by a slowed atomic beam produced by a Zeeman slower. All seven stable isotopes of Yb atoms could be trapped separately at different laser detuning values. Over 10^7 174 Yb atoms are collected in the MOT, whereas the atom number of fermionic isotope ^171Yb is roughly 2.3 × 10^6 due to a lower abundance. Without the Zeeman slower the trapped atom numbers are one order of magnitude lower. Both the even and odd isotopes are recognized as excellent candidates of optical clock transition, so the cooling and trapping of ytterbium atoms by the blue MOT is an important step for building an optical clock.     

Effect of Ag Nanoparticles on Optical Properties of R6G Doped PMMA Films

The composite PMMA films containing Ag nanoparticles and rhodamine 6G are prepared. We investigate the fluorescence properties and nonlinear optical properties of R6G/PMMA films influenced by Ag nanoparticles. The fluorescence enhancement factor is about 3.3. The corresponding nonlinear refractive index is measured to be -2.423 ×10^-8 esu using the Z-scan technique, which is much enhanced compared with the R6G/PMMA film. The results indicate that these enhancements are attributed to surface plasmon resonance of Ag nanoparticles.     

Measurement of the KLL Dielectronic Recombination Resonances in He-like to C-like Kr Ions

The KLL dielectronic recombination processes of highly charged He-like to C-like Kr ions have been studied experimentally. The measurement was performed on the newly developed Shanghai electron beam ion trap （Shanghai-EBIT） facility. Characteristic x-rays from both dielectronic recombination and radiative recombination are detected as the electron beam energy is scanned through the resonances. The KLL resonant strengths obtained are 5.41×10^-19, 4.33×10^-19, 3.59×10^-19, 2.05×10^-19 and 0.98×10^-19 cm^2 eV for He-like to C-like Kr ions, respectively.     

High-Temperature Characteristics of Ti/Al/Ni/Au Ohmic Contacts to n-GaN

We present the high-temperature characteristics of Ti/Al/Ni/Au（15 nm/220 nm/40 nm/50 nm） multiplayer contacts to n-type GaN （Nd = 3.7 × 10^17 cm^-3, Nd = 3.0 × 10^18 cm^-3）. The contact resistivity increases with the measurement temperature. Furthermore, the increasing tendency is related to doping concentration. The higher the doped, the slower the contact resistivity with decreasing measurement temperature. Ti/Al/Ni/Au ohmic contact to heavy doping n-GaN takes on better high temperature reliability. According to the analyses of XRD and AES for the n-GaN/Ti/Al/Ni/Au, the Au atoms permeate through the Ni layer which is not thick enough into the AI layer even the Ti layer.     

Ultra-Stable Rubidium-Stabilized External-Cavity Diode Laser Based on the Modulation Transfer Spectroscopy Technique

We construct an ultra-stable external-cavity diode laser via modulation transfer spectroscopy referencing on a hyperfine component of the ST Rb D2 lines at 780 nm. The Doppler-free dispersion-like modulation transfer signal is obtained with high signal-to-noise-ratio. The instability of the laser frequency is measured by beating with an optical frequency comb which is phase-locked to an ultra-stable oven controlled crystal oscillator. The Allan deviation is 3.9 × 10-13 at I s averaging time and 9.8 ×10-14 at 90s averaging time.     

Extremely Low Density InAs Quantum Dots with No Wetting Layer

Extremely low density InAs quantum dots （QDs） are grown by molecular beam droplet epitaxy. The gallium deposition amount is optimized to saturate exactly the excess arsenic atoms present on the GaAs substrate surface during growth, and low density InAs/GaAs QDs （4× 10^6 cm^-2） are formed by depositing 0.65 monolayers （MLs） of indium. This is much less than the critical deposition thickness （1.7 ML）, which is necessary to form InAs/GaAs QDs with the conventional Stranski-Krastanov growth mode. The narrow photoluminescence linewidth of about 24 meV is insensitive to cryostat temperatures from IO K to 250K. All measurements indicate that there is no wetting layer connecting the QDs.     

石油醚在流体静高压下的超声声速、衰减、密度和绝热压缩系数

 专门设计了用脉冲-回波-重合法在不同静水压下测量液体声速的装置，并对石油醚在0.1~650 MPa流体静压力范围内测量了其超声声速和衰减系数。还通过测量体积压缩量和质量得到石油醚密度ρ随流体静压力的变化。最后，给出了石油醚的绝热压缩系数β与流体静压力的关系。     

Electrical Characterization of Deep Trap Properties in High-k Thin-Film HfO2 Dielectric

Deep-trap properties of high-dielectric-constant （k） HfO2 thin films are investigated by deep-level transient spectroscopy and capacitance-voltage methods. The hole traps of the HfO2 dielectric deposited on a p-type Si substrate by sputtering are investigated in a metal-oxide-semiconductor structure over a temperature range of 300-500K. The potential depth, cross section and concentration of hole traps are estimated to be about 2.5eV, 1.8 ×10^-16 cm^2 and 1.0 × 10^16 cm^-3, respectively.     

Growth and Characterization of InN Thin Films on Sapphire by MOCVD

Indium nitride thin films are grown on sapphire substrates by metal-organic chemical vapour deposition （MOCVD） By employing three-step layer buffers, the mirror-like layers on two-inch sapphire wafers have been obtained. The structural, optical and electrical characteristics of InN are investigated by x-ray diffraction, scanning electron microscopy, atomic force microscopy, photoluminescence and infrared optical absorption. The photoluminescence and the absorption studies of the materials reveal a marked energy bandgap structure around 0.70eV at room temperature. The room-temperature Hall mobility and carrier concentration of the film are typically 939 cm^2 /Vs, and 3.9 × 1018cm^-3, respectively.     

Effects of Proton Irradiation on a CMOS Image Sensor

We perform 9 MeV proton irradiation of a complementary metal oxide semiconductor （CMOS） image sensor at doses from 1 × 10^9 to 4 × 10^10 cm^-2. In general, the average brightness of dark output images increases with an increasing dose, and reaches the maximum at 1 × 10^10 cm^-2. The captured colour images become very blurry at 4 × 10^10 cm^-2. These can be explained by change of concentrations of irradiation-induced electron-hole pairs and vacancies in the various layers of CMOS image sensor calculated by the TRIM simulation programme with dose.     

高压下FexN化合物的相分解

 本文研究了室温下压力对Fe_xN化合物相分解的影响。X射线衍射分析表明，高压促使氮原子从Fe_xN化合物的晶格中脱溶出来，引起相分解，形成母相与α-Fe。这种相分解现象随压力增大而加强。通过分析不同压力下母相Fe_xN与α-Fe的相对含量，研究了氮从Fe_xN中脱溶的动力学过程，并计算出激活体积。对于Fe₃N和Fe₄N化合物，其激活体积分别为2.24×10^-5 m³/mol和1.62×10^-5 m³/mol。本实验还指出，通过对Fe_xN化合物的高压处理以及适当条件下退火，可以获得Fe₁₆N₂化合物。     

Nitrogen-Doped Chemical Vapour Deposited Diamond： a New Material for Room-Temperature Solid State Maser

Electron spin resonance （ESR） in polycrystalline diamond films grown by dc arc-jet and microwave plasma chemical vapour deposition is studied. The films with nitrogen impurity concentration up to 8 × 10^18 cm^-3 are also characterized by Raman, cathodoluminescence and optical absorption spectra. The ESR signal from P1 centre with g-factor of 2.0024 （nitrogen impurity atom occupying C site in diamond lattice） is found to exhibit an inversion with increasing the microwave power in an H102 resonator. The spin inversion effect could be of interest for further consideration of N-doped diamonds as a medium for masers operated at room temperature.     

Estimation of Plasma Density by Surface Plasmons for Surface-Wave Plasmas

An estimation method of plasma density based on surface plasmons theory for surface-wave plasmas is proposed. The number of standing-wave is obtained directly from the discharge image, and the propagation constant is calculated with the trim size of the apparatus in this method, then plasma density can be determined with the value of 9.1 × 10^17m^-3. Plasma density is measured using a Langmuir probe, the value is 8.1 × 10^17m^-3 which is very close to the predicted value of surface plasmons theory. Numerical simulation is used to check the number of standing-wave by the finite-difference time-domain （FDTD） method also. All results are compatible both of theoretical analysis and experimental measurement.     

Comment on `Electronic Properties of Red P-Type Tl2S5 Single Crystals'

Recently, Gamal et al. [Chin. Phys. Lett. 22 (2005) 1530] reported the results of electrical conductivity, Hall effect and thermoelectric measurements on p-type Tl₂S₅ single crystals. From the experimental data for the temperature dependence of differential thermoelectric power, Gamal et al. determined thevalues of 2.66×10^-41kg and 2.50×10^-41kg, respectively, for the effective masses of electrons and holes in p-type Tl₂S₅, which are about ten orders of magnitude smaller than the free electron mass (9.11×10^-31kg). We argue that the anomalously small values obtained for the effective mass of chargecarriers in Tl₂S₅ have no physical significance.     

Large Storage Window in a-SiNx/nc-Si/a-SiNx Sandwiched Structure for Nanocrystalline Silicon Floating Gate Memory Application

An a-SiNx/nanocrystalline silicon [（nc-Si）/a-SiNx] sandwiched structure is fabricated in a plasma enhanced chemical vapour deposition （PECVD） system at low temperature （250℃）. The nc-Si layer is fabricated from a hydrogen-diluted silane mixture gas by using a layer-by-layer deposition technique. Atom force microscopy measurement shows that the density of nc-Si is about 2 ×10^11 cm^-2. By the pretreatment of plasma nitridation, low density of interface states and high-quality interface between the Si substrate and a-SiNs insulator layer are obtained. The density of interface state at the midgap is calculated to be 1 ×10^10 cm^-2eV^-1 from the quasistatic and high frequency C - V data. The charging and discharging property of nc-Si quantum dots is studied by capacitance-voltage （C- V） measurement at room temperature. An ultra-large hysteresis is observed in the C - V characteristics, which is attributed to storage of the electrons and holes into the nc-Si dots. The long-term charge-loss process is studied and ascribed to low density of interface states at SiNx/Si substrate.     

三硝基甲苯起爆机理实验研究

 用单脉冲化学激波管实验方法,使用自由基清扫剂和对比速率,测定了邻位和对位硝基甲苯在高温下,裂解瞬间（500 μs） 的化学反应机理,并测定了化学反应速率常数。作为邻位硝基甲苯的同分异构体,对位硝基甲苯的主要裂解通道与其不同。通过实验发现了邻位硝基甲苯的裂解重要通道,测到它的产1氧-2氮-3,4-环丁二稀基异嚙唑（Anthranil） 在瞬间随温度变化生成和很快消失的过程。由此,测得这一化学性质极不稳定的产物的消失速率常数为：k(Anthranil)＝3.7×10¹⁵·exp(－25 800/T) s^-1。分析这一过程的机理,认为第一步是硝基甲苯的裂解,第二步是Anthranil的生成,第三步是Anthranil中的N－O键的断裂。