Fe-N软磁薄膜的结构和性能

用RF溅射制备厚度为200 nm的Fe-N薄膜在250℃, 12000 A/m磁场下真空热处理后，当N含量在5%～7%(原子百分数)范围内形成α′+α″相时，4πM_S可达2.4 T, H_c＜80 A/m, 2～10 MHz下高频相对导磁率μ_r=1500，可满足针对10 Gb/in2存储密度的GMR/感应式复合读写磁头中写入磁头的需要. Fe-N系薄膜中α′相的形成机理和点阵常数与块状试样按Bain机理形成的α′相有明显的差别，得到了薄膜中α′相的a,c与Cα′_N之间的线性关系式.     

激光分子束外延制备高质量的YBCO超导薄膜

利用活化气体做氧源,使生长气压比普通脉冲激光沉积方法(PLD)低2～3个数量级,用激光分子束外延在SrTiO₃(100)衬底上制备出临界转变温度T_c0=85～87K,临界电流密度J_c≥1×10⁶A/cm²的高质量YBCO超导薄膜.原子力显微镜(AFM)测得表面无明显颗粒,均方根粗糙度约为7.8nm.在这种薄膜基础上制备的Josephson量子干涉器件(DC-SQUID)具有良好的温度循环稳定性.     

微波滤波器的高温超导薄膜研制

介绍适用于制备微波滤波器的高温超导薄膜YBa₂Cu₃O_7-δ(YBCO)的激光沉积工艺和Tl₂Ba₂CaCu₂O₂(Tl-2212)的先驱膜制备及铊化工艺. 讨论了基片选择的要求和薄膜的形貌、微结构与微波表面电阻的关系.     

ZnAl2O4/α-Al2O3复合衬底的制备和GaN薄膜的生长

利用脉冲激光淀积法(PLD)在α-Al₂O₃衬底上淀积了ZnO薄膜, 通过ZnO和α-Al₂O₃固相反应制备了具有ZnAl₂O₄覆盖层的α-Al₂O₃衬底. X射线衍射谱(XRD)表明ZnAl₂O₄薄膜随反应时间由单一(111)取向转变为多晶取向, 然后变为不完全的(111)择优取向. 同时扫描电子显微镜(SEM)照片表明ZnAl₂O₄表面形貌随反应时间由均匀的岛状结构先变为棒状结构, 然后再变为突起的线状结构. 另外, XRD谱显示低温制备的ZnAl₂O₄在高温下不稳定. 在ZnAl₂O₄覆盖的α-Al₂O₃衬底上利用光加热低压MOCVD法直接生长了GaN薄膜. XRD测量表明随ZnAl₂O₄厚度增加GaN由c轴单晶变为多晶, 单晶GaN的摇摆曲线半高宽为0.4°. 结果表明薄ZnAl₂O₄覆盖层的岛状结构有利于GaN生长初期的成核, 从而提高了GaN的晶体质量.     

氢化非晶硅氧薄膜微结构

以Raman散射、X射线电子能谱和红外吸收光谱细致研究了PECVD法250℃衬底温度下制备的氢化非晶硅氧(a-SiO_x∶∶H)薄膜的微结构及键构型. 研究表明, 在0.52≤x≤1.58的氧含量范围内，a-SiO_x∶∶H薄膜成分和结构不是均一的，依赖于局域键构型氧化程度的不同，大致存在着5种在一定程度上相互分离的结构组分，即Si, Si₂O(∶H), SiO(∶H), Si₂O₃(∶H)和SiO₂. 其中的Si相以非氢化的非晶硅(a-Si)颗粒形式存在，随氧含量x的增加其尺度持续减小但始终存在. 提出一种多壳层模型来描述a-SiO_x∶H薄膜的结构，认为a-SiO_x∶H薄膜中a-Si颗粒依次为Si₂O(∶H), SiO(∶H), Si₂O₃(∶H)和SiO₂壳层所包围. 随薄膜氧含量x的增加，各壳层厚度相应变化但各自的化学构成基本保持不变.     

测量ICF靶丸内充气量的直接法

分析了露点法测量ICF靶丸内充气量的不足,采用Benedict-Webb-Rubin（BWR）方程和平面相下D₂气体的实验数据拟合了准确度高的状态方程,提出通过测量充气过程的状态参量温度和压强,以数值方法求解状态方程,从而实现对ICF靶丸内充气量的直接测量和计算.该方法克服了露点法原理上的缺陷和设备方面的复杂性.由于该方法在原理上与露点法不同,因此可通过提高D₂气体的P-V-T数据的测量精度来提高状态方程的准确度,从而提高对靶丸内所充气体的质量测量精确度.这种方法还可以处理混和充气的情况.通过计算结果与实验值的比较发现二者误差很小,在此基础上预测了一些可能的充气情况,并建议了合理的充气温度和压强.     

脉冲激光制备薄膜材料的机理

给出脉冲激光作用块状靶材的烧蚀模型.根据能量平衡原理,导出烧蚀面的位置随时间的变化关系.利用绝热近似、温度连续性条件和能量平衡原理来获得烧蚀面与固液相界面边界条件.结合热传导方程,利用精确解与积分近似法相结合的方案,给出固液两相的温度分布与时间和位置的变化关系,以及固液相界面的位置随时间的变化规律,并将理论结果与实验数据进行比较.由流体动力学理论,得出了脉冲激光产生的等离子体的空间输运方程,将此方程与靶材烧蚀率公式结合起来,根据实验数据研究了不同激光功率密度和波长对KTN(KTa_0.65Nb_0.35O₃)薄膜沉积特性的影响,得到了一些有价值的结果,并对结果进行了详细的讨论.     

高速激光作用下薄膜的瞬态温升过程及其非平衡热物理性质

本文报道了薄膜非平衡热物性实验研究工作的最新进展,建立了0.1μs脉冲二氧化碳激光高速加热系统、高速光电测长系统及高速红外辐射测温系统,测量系统响应时间可达0.1μs.应用此系统测量了室温范围微秒量级的温度变化过程,在此基础上测量了50μm薄膜的热扩散率,并且观测到瞬态激光加热后薄膜试样的瞬态温升与膨胀的不同步变化.     

异常大磁阻La-Sn-Mn-O外延单晶薄膜的研究 *

首次报道采用脉冲激光沉积方法在(100)LaAlO₃ 单晶基底上外延生长La-Sn-Mn-O薄膜 ,由X射线的衍射分析确定薄膜属于钙钛矿型结构 .薄膜在低温发生金属到半导体转变 ,它的电阻随磁场的变化而变化 ,其磁阻的最大变化率约为 1 0 3 ,表明此薄膜具有异常大磁阻效应 .磁化强度的测量表明其室温为顺磁性低温为铁磁性 .居里温度值与薄膜出现最大磁阻变化率的温度值十分接近 ,表明其中的磁阻效应是与铁磁到顺磁转变紧密相连的 .为进一步探讨La-Sn-Mn-O在将来集成薄膜器件中的应用前景 ,测量了薄膜表面的平整度 .     

刚体位移对应变测试的影响

通过运用波前干涉理论,得到了贴片云纹干涉法测圆柱壳的位移与应变公式,分析了刚体位移及曲率对测试结果的影响情况.指出了在对压力容器及管道进行测试时应注意的事项.     

Some New Exact Solutions for Time Fractional Thin-film Equation

In this paper, the invariant subspace method is utilized to obtain some new exact solutions for the time fractional thin-film equation. The frac- tional derivative in the considered equation is given in Remain-Liouville and Caputo senses. Some new invariant subspaces have been obtained that are not reported in the literature before.     

Initial propagation of support in thin-film flow

We study the behaviour for small time of interfaces connected with supports of strong solutions of one-dimensional thin-film equation with compactly supported initial functions. In some sense, sharp upper estimates of interfaces are obtained for initial functions with arbitrary asymptotic behaviour near the boundary of their supports.     

A REPRESENTATION FORMULA RELATED TO SCHR(O)DINGER OPERATORS

Schr(o)dinger operator is a central subject in the mathematical study of quantum mechanics.Consider the Schrodinger operator H = -△ V on R, where △ = d2/dx2 and the potential function V is real valued. In Fourier analysis, it is well-known that a square integrable function admits an expansion with exponentials as eigenfunctions of -△. A natural conjecture is that an L2 function admits a similar expansion in terms of "eigenfunctions" of H, a perturbation of the Laplacian (see [7], Ch. Ⅺ and the notes), under certain condition on V.     

On a class of self-similar processes with stationary increments in higher order Wiener chaoses

We study a class of self-similar processes with stationary increments belonging to higher order Wiener chaoses which are similar to Hermite processes. We obtain an almost sure wavelet-like expansion of these processes. This allows us to compute the pointwise and local Hölder regularity of sample paths and to analyse their behaviour at infinity. We also provide some results on the Hausdorff dimension of the range and graphs of multidimensional anisotropic self-similar processes with stationary increments defined by multiple Wiener–Itô integrals.     

On a class of Riemann surfaces

It is considered the class of Riemann surfaces with dimT1 = 0, where T1 is a subclass of exact harmonic forms which is one of the factors in the orthogonal decomposition of the spaceΩH of harmonic forms of the surface, namely The surfaces in the class OHD and the class of planar surfaces satisfy dimT1 = 0. A.Pfluger posed the question whether there might exist other surfaces outside those two classes. Here it is shown that in the case of finite genus g, we should look for a surface S with dimT1 = 0 among the surfaces of the form Sg\K , where Sg is a closed surface of genus g and K a compact set of positive harmonic measure with perfect components and very irregular boundary.     

CONTENTS OF VOLUME 30

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Instructions for contributions

正Applied Mathematics-A Journal of Chinese Universities,Series B(Appl.Math.J.Chinese Univ.,Ser.B)is a comprehensive applied mathematics journal jointly sponsored by Zhejiang University,China Society for Industrial and Applied Mathematics,and Springer-Verlag.It is a quarterly journal with     

Journal of Mathematical Research with Applications Guide for Authors

正Journal overview:Journal of Mathematical Research with Applications(JMRA),formerly Journal of Mathematical Research and Exposition(JMRE)created in 1981,one of the transactions of China Society for Industrial and Applied Mathematics,is a home for original research papers of the highest quality in all areas of mathematics with applications.The target audience comprises:pure and applied mathematicians,graduate students in broad fields of sciences and technology,scientists and engineers interested in mathematics.