Effects of ion damage on the surface of ITO films during plasma treatment

During a surface treatment using CF₄/O₂ gas plasma, energetic ions affected the defect structures on the top surface of ITO thin films. C-AFM and local I-V measurements showed the formation of the depleted layer after a plasma treatment with a bias of 20 W; XPS showed the creation of new defect structures. Donor concentration in the damaged top surface of the ITO films was found to be decreased. Sn-based neutral defect complexes and reduced oxygen, which could trap the electrons, have been proposed to be formed. This can also explain the increase of the work function of ITO.     

Oxidation and reduction of thin Ru films by gas plasma

The oxidation and reduction of Ru thin films grown on a Si(1 0 0) surface were studied by X-ray photoemission spectroscopy (XPS). Ru thin films were oxidized with O₂ plasma generated by an rf discharge, and their XPS spectra were measured. The spectra were decomposed into several components for Ru suboxides attributable to different stages of oxidation. After sufficient exposure to oxygen, a stoichiometric rutile RuO₂ layer was found to have formed near the surface. Thermal annealing at 500 K resulted in a thicker RuO₂ layer. Experiments demonstrated that the Ru oxide layer can be removed by H(D) atoms via the desorption of water molecules.     

Low energy repetitive miniature plasma focus device as high deposition rate facility for synthesis of DLC thin films

Diamond-like carbon (DLC) films were deposited on Si (1 0 0) substrate using a low energy (219 J) repetitive (1 Hz) miniature plasma focus device. DLC thin film samples were deposited using 10, 20, 50, 100 and 200 focus shots with hydrogen as filling gas at 0.25 mbar. The deposited samples were analyzed by XRD, Raman Spectroscopy, SEM and XPS. XRD results exhibited the diffraction peaks related to SiO₂, carbon and SiC. Raman studies verified the formation amorphous carbon with D and G peaks. Corresponding variation in the line width (FWHM) of the D and G positions along with change in intensity ratio (I_D/I_G) in DLC films was investigated as a function of number of deposition shots. XPS confirmed the formation sp² (graphite like) and sp³ (diamond like) carbon. The cross-sectional SEM images establish the 220 W repetitive miniature plasma focus device as the high deposition rate facility for DLC with average deposition rate of about 250 nm/min.     

Characterization of an atmospheric pressure plasma jet for surface modification and thin film deposition

In this paper, an experimental study is presented to characterize a commercially available atmospheric pressure plasma jet (APPJ) kINPen which can be used for local surface modification, e.g. changing the wettability as well as for thin film deposition with silicon-organic and metal-organic precursors to enhance scratch resistance or to lower the gas permeability. Characterization of the jet discharge has been carried out by three methods: (i) measurement of the energy influx from the jet plasma to a substrate by a calorimetric probe, (ii) spatial resolved investigation of the plasma beam by optical emission spectroscopy (OES) and (iii) observation of the plasma jet by video imaging. The deposited SiO _x and AlO _x films were analyzed by XPS measurements.     

Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing

Tin dioxide (SnO₂) thin films were deposited by plasma enhanced-atomic layer deposition (PE-ALD) on Si(1 0 0) substrate using dibutyl tin diacetate (DBTA) ((CH₃CO₂)₂Sn[(CH₂)₃-CH₃]₂) as precursor. The process parameters were optimized as a function of substrate temperature, source temperature and purging time. It is observed that the surface phenomenon of the thin films was changed with film thickness. Atomic force microscopy (AFM) images and X-ray diffraction (XRD) pattern were used to observe the texture and crystallanity of the films. The films deposited for 100, 200 and 400 cycles were characterized by XPS to determine the chemical bonding properties. XPS results reveal that the surface dominant oxygen species for 100, 200 and 400 cycles deposited films are O₂⁻, O⁻ and O²⁻, respectively. The 200 cycles film has exhibited highest concentration of oxygen (O⁻) species before and after annealing. Conductivity studies revel that this film has best adsorption strength to the oxygen ions forming on the surface. The sensor with 200 cycles SnO₂ thin film has shown highest sensitivity to CO gas than other films. A correlation between the characteristics of Sn3d_5/2 and O1s XPS spectra before and after annealing and the electrical behavior of the SnO₂ thin films is established.     

氧对于在Ar/O氛围下用近空间升华法制备的CdS薄膜的影响

采用近空间升华法（CSS）在氩/氧气氛中制备了硫化镉（CdS）多晶薄膜.利用XRD,XPS,AFM,UV-VIS光谱和四探针技术等测试和分析手段系统研究了氧对薄膜的成分、结构、光学和电学等性质的影响.结果表明,用近空间升华法制备的CdS薄膜具有六方相结构,膜层致密、均匀,平均晶粒大小约为40 nm,富硫.氧掺入后部分与镉生成氧化镉,并随着氧含量的增加,薄膜的成分有趋于化学计量比的趋势,光学带隙加宽,光暗电导比增加.此外,还利用扫描电镜（SEM）观察了CdS/CdTe断面结合光谱响应（QE）的结果讨论了氧对CdS/CdTe界面互扩散的影响.发现,随着CdS薄膜制备气氛中氧分压的升高,CdS/CdTe界面的互扩散程度降低,有利于提高器件在500—600 nm波长范围内的光谱响应.认为,氧含量的增加不但使CdS薄膜在光伏应用方面的质量得到改善,而且CdTe太阳电池器件中的CdS/CdTe界面也得到了优化. 关键词： CdS多晶薄膜 近空间升华法 窗口层 界面     

Electrochemical corrosion behaviors of a-C:H and a-C:NX:H films

The a-C:H and a-C:N_X:H films were deposited onto silicon wafers using radio frequency (rf) plasma enhanced chemical vapor deposition (PECVD) and pulsed-dc glow discharge plasma CVD, respectively. Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to characterize chemical nature and bond types of the films. The results demonstrated that the a-C:H film prepared by rf-CVD (rf C:H) has lower I_D/I_G ratio, indicating smaller sp² cluster size in an amorphous carbon matrix. The nitrogen concentrations of 2.9 at.% and 7.9 at.% correspond to carbon nitride films prepared with rf and pulse power, respectively.Electrochemical corrosion performances of the carbon films were investigated by potentiodynamic polarization test. The electrolyte used in this work was a 0.89% NaCl solution. The corrosion test showed that the rf C:H film exhibited excellent anti-corrosion performance with a corrosion rate of 2 nA cm⁻², while the carbon nitride films prepared by rf technique and pulse technique showed a corrosion rate of 6 nA cm⁻² and 235 nA cm⁻², respectively. It is reasonable to conclude that the smaller sp² cluster size of rf C:H film restrained the electron transfer velocity and then avoids detriment from the exchange of electrons.     

AlNxOy thin films deposited by DC reactive magnetron sputtering

AlN_xO_y thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resistivity of the coatings are strongly correlated with discharge parameters. Varying the reactive gas mixture partial pressure, the film properties change gradually from metallic-like films, for low reactive gas partial pressures, to stoichiometric amorphous Al₂O₃ insulator films, at high pressures. For intermediate reactive gas pressures, sub-stoichiometric AlN_xO_y films were obtained, with the electrical resistivity of the films increasing with the non-metallic/metallic ratio.     

Ternary semiconductor compounds CuInS2 (CIS) thin films synthesized by electrochemical atomic layer deposition (EC-ALD)

In this paper the formation and characterization of the I-III-VI₂ semiconductor compound CuInS₂ (CIS) on gold substrate at room temperature by electrochemical atomic layer deposition (EC-ALD) method are reported. Optimum deposition potentials for each element are determined using cyclic voltammetry (CV) technique and Amperometric I-t method is used to prepare the semiconductor compound. These thin films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FE-SEM) and Fourier transform infrared spectroscopy (FT-IR). XRD results indicate that the CIS thin films have a (1 1 2) preferred orientation. The XPS analyses of the films reveal that Cu, In and S are present in an atomic ratio of approximately 1:1:2. And their semiconductor band gaps are found to be 1.50 eV by FT-IR.     

Characteristics of nitrogen-incorporated silicon oxycarbide films and plasmas for plasma enhanced chemical vapor deposition with TMOS/N2/NH3

Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxycarbide thin films obtained from the gas mixture of TMOS (tetramethoxysilane), N₂, and NH₃ is studied. The effects of the TMOS to N₂ pressure ratio on the properties of the film and the plasma are investigated. The deposited films are analyzed by in situ ellipsometry, ex situ Fourier transform infrared spectroscopy (FTIR), and by X-ray photoelectron spectroscopy (XPS). The plasma is characterized by using optical emission spectroscopy (OES). The mass spectra of the constituents in the plasma are obtained by quadrupole mass spectroscopy. The correlation between the film properties and the plasma characteristics is explained wherever possible. As the partial pressure of N₂ is decreased, the refractive index begins to decrease, reaches a minimum, and then saturates. The FTIR absorption bands are observed from about 850 to 1000 cm⁻¹ and from 1000 to 1250 cm⁻¹, and can be attributed to the formation of a nitrogen-incorporated silicon oxycarbide thin film. The variation of the refractive index is discussed in relationship with the deposition rate, the OES spectra, the mass spectra of the plasma, the film composition obtained by XPS, and FTIR spectra.     

XPS characterisation of plasma treated and zinc oxide coated PET

At first, X-ray photoelectron spectroscopy (XPS) analyses of reference and carbon dioxide plasma treated polyethylene terephthalate (PET) were carried out. Significant chemical modifications were outlined in the treated PET surface in comparison with the reference one. The formation of new oxygenated groups was evidenced. These modifications heighten the level of interactions between the polymer substrate and the deposited coating.In a second stage, zinc oxide thin films were elaborated by r.f. magnetron sputtering from a ceramic target and with a reactive gas (mixture of argon-1% oxygen) under optimised conditions on CO₂ plasma treated PET. The interfacial chemistry between the plasma treated PET and the zinc oxide was also studied by XPS. The line shape changes in the high-resolution core level spectra of carbon C1s, oxygen O1s, and zinc (Zn2p3/2, Zn3p), with the progressive deposition of zinc oxide coatings being recorded. The obtained spectra were fitted to mixed Gaussian-Lorentzian components using XPS CASA software.An interaction scheme between the zinc oxide thin layer and its polymer substrate, in the first stage of deposition, was proposed and checked by corroborating the findings of the different XPS spectra and their decompositions. It suggests the formation of ZnOC complexes at the interface, which are promoted by an electron transfer from zinc to oxygen in oxygenated species, mainly alcohol groups, generated by the CO₂ plasma treatment of PET.     

Nanomechanical characterization of amorphous hydrogenated carbon thin films

Amorphous hydrogenated carbon (a-C:H) thin films deposited on a silicon substrate under various mixtures of methane-hydrogen gas by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) was investigated. Microstructure, surface morphology and mechanical characterizations of the a-C:H films were analyzed using Raman spectroscopy, atomic force microscopy (AFM) and nanoindentation technique, respectively. The results indicated there was an increase of the hydrogen content, the ratio of the D-peak to the G-peak (I_D/I_G) increased but the surface roughness of the films was reduced. Both hardness and Young's modulus increased as the hydrogen content was increased. In addition, the contact stress-strain analysis is reported. The results confirmed that the mechanical properties of the amorphous hydrogenated carbon thin films improved using a higher H₂ content in the source gas.     

X-ray photoelectron spectroscopy analysis for undegraded and degraded Gd2O2S:Tb phosphor thin films

This paper presents the X-ray Photoelectron Spectroscopy (XPS) analysis for the undegraded and degraded Gd₂O₂S:Tb³⁺ thin film phosphor. The thin films were grown with the pulsed laser deposition (PLD) technique. XPS measurements were done on Gd₂O₂S:Tb³⁺ phosphor thin films before and after electron degradation. The XPS technique has proven the presence of Gd₂O₃ on the degraded and undegraded thin film spots. The presence of the SO₂ bonding was also detected after degradation. This clearly indicates that surface reactions did occur during prolonged electron bombardment in an oxygen atmosphere.     

Oxygen incorporation in ZnTe thin films grown by plasma-assisted pulsed laser deposition

We studied oxygen incorporation into ZnTe thin films with nitrogen and oxygen plasma during a plasma-assisted pulsed laser deposition (PA-PLD). It was shown that ZnTe:O layer formed with oxygen plasma exhibits an enhancement of optical transparency in visible spectral region due to the formation of amorphous TeO_x. Especially, the ZnTe:NO deposited by PA-PLD under nitrogen and oxygen partial pressures with N₂:O₂ of 10:3 sccm showed p-type semiconducting characteristics and the formation of intermediate band at about 0.5–0.8 eV below the ZnTe band edge. These results for oxygen incorporation in ZnTe thin film such as the enhancement of optical transparency in visible spectral region and the intermediate band formation will be useful for optoelectronic devices or intermediate band solar cells.     

Substrate effects on the microstructure of hydrogenated amorphous carbon films

In this work, plasma enhanced chemical vapour deposition was used to prepare hydrogenated amorphous carbon films (a-C:H) on different substrates over a wide range of thickness. In order to observe clear substrate effect the films were produced under identical growth conditions. Raman and near edge X-ray absorption fine structure (NEXAFS) spectroscopies were employed to probe the chemical bonding of the films. For the films deposited on silicon substrates, the Raman I_D/I_G ratio and G-peak positions were constant for most thickness. For metallic and polymeric substrates, these parameters increased with film thickness, suggesting a change from a sp³-bonded hydrogenated structure to a more sp² network, NEXAFS results also indicate a higher sp² content of a-C:H films grown on metals than silicon. The metals, which are poor carbide precursors, gave carbon films with low adhesion, easily delaminated from the substrate. The delamination can be decreased/eliminated by deposition of a thin (∼10 nm) silicon layer on stainless steel substrates prior to a-C:H coatings. Additionally we noted the electrical resistivity decreased with thickness and higher dielectric breakdown strength for a-C:H on silicon substrate.     

Compositional control of plasma enhanced chemical vapor deposited diamond-like carbon/SiO<Subscript>2</Subscript> nanocomposite thin films

Using the common alkoxy silane, tetraethoxysilane (TEOS), diamond-like carbon/SiO₂ nanocomposite thin films were deposited at room temperature using a plasma enhanced chemical vapor deposition process. Compositional control could be obtained by adding oxygen to the TEOS/Ar RF plasma and also by varying the RF power. The index of refraction could be varied from 1.563 to 1.492 (at 634.1 nm) by adding 0 to 200 sccm of O₂ (at 0.18 W/cm² RF); and the addition of O₂ increased the optical clarity of the nanocomposite in the visible spectrum until it was completely transparent. However, this addition decreased the deposition rate substantially and shifted the carbon-bonding structure to graphitic carbon from diamond-like carbon, yet still remained hard enough to pass an elementary scratch test. TEOS presents itself as a versatile single-source precursor with the ability to deposit tunable dielectrics depending on flow chemistry or RF power. PACS 61.46.+w; 78.67.-n; 81.07.-b     

First nucleation steps of vanadium oxide thin films studied by XPS inelastic peak shape analysis

The initial states of deposition of vanadium oxide thin films have been studied by analysis of the peak shape (both inelastic background and elastic contributions) of X-ray photoemission spectra (XPS) after successive deposition experiments. This study has permitted to assess the type of nucleation and growth mechanisms of the films. The experiments have been carried out in situ in the preparation chamber of a XPS spectrometer. Thin films of vanadium oxide have been prepared on Al₂O₃ and TiO₂ by means of thermal evaporation, ion beam assisted deposition and plasma enhanced chemical vapour deposition. The thin films prepared by the first two procedures consisted of V₂O₄, while those prepared by the latter had a V₂O₅ stoichiometry. The analysis of the inelastic background of the photoemission spectra has shown that the films prepared by thermal evaporation on Al₂O₃ are formed by big particles that only cover completely the surface of the substrate when their height reaches 16 nm. By contrast, the thin films prepared with assistance of ions on Al₂O₃ or with plasma on TiO₂ consist of smaller particles that succeed in covering the substrate surface already for a height of approximately 4 nm. Thin films prepared by plasma-assisted deposition on Al₂O₃ depict an intermediate situation where the substrate is completely covered when the particles have a height of approximately 6 nm. The type of substrates, differences in the deposition procedure or the activation of the adatoms by ion bombardment are some of the factors that are accounted for by to explain the different observed behaviours.     

Ferromagnetism in carbon-doped In2O3 thin films

Carbon-doped In₂O₃ thin films exhibiting ferromagnetism at room temperature were prepared on Si (100) substrates by the rf-magnetron co-sputtering technique. The effects of carbon concentration as well as oxygen atmosphere on the ferromagnetic property of the thin films were investigated. The saturated magnetizations of thin films varied from 1.23 to 4.86 emu/cm³ with different carbon concentrations. The ferromagnetic signal was found stronger in samples with higher oxygen vacancy concentrations. In addition, deposition temperature and different types of substrates also affect the ferromagnetic properties of carbon-doped In₂O₃ thin films. This may be related to the oxygen vacancies in the thin film system. The experiment suggests that oxygen vacancies play an important role in introducing ferromagnetism in thin films.     

FT-IR, XPS and PEC characterization of spray deposited hematite thin films

Hematite thin films were prepared by spraying ethanolic solution of ferric trichloride and have been characterized by using Fourier transform infra-red (FT-IR) and X-ray photoelectron spectroscopic (XPS) techniques. The film prepared by spray consists of a single phase of α-Fe₂O₃. The XPS studies confirm that chemical states of Fe³⁺ and O²⁻ in the film; thereby confirming the formation of the hematite thin films. The photoelectrochemical (PEC) studies have been carried out by forming a three-electrode system using 1 M NaOH electrolyte. The junction is illuminated with white light to obtain I-V characteristics in chopped light. The studies indicate the films exhibit n-type conductivity.     

The effects of plasma treatment on the thermal stability of HfO2 thin films

The thermal stability of pure HfO₂ thin films is not high enough to withstand thermal processes, such as S/D activation or post-metal annealing, in modern industrial CMOS production. In addition, plasma nitridation technology has been employed for increasing the dielectric constant of silicon dioxide and preventing boron penetration. In this experiment, atomic layer deposition (ALD) technology was used to deposit HfO₂ thin films and inductively coupled plasma (ICP) technology was used to perform plasma nitridation process. The C-V and J-V characteristics of the nitrided samples were observed to estimate the effect of the nitridation process. According to this study, plasma nitridation process would be an effective method to improve the thermal stability of HfO₂ thin films.