Strain accumulation in InAs/In<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Ga<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>As quantum dots

The effect of strain accumulation in the InAs/In _x Ga_1−x As quantum dots (QDs) system was studied in this work. We found strain in the In _x Ga_1−x As layer with accumulation in the QD layer. This effect resulted in a dramatic reduction of growth-mode transition thickness of the QD layer. For InAs/In_0.25Ga_0.75As QDs, critical thickness is measured to be as low as 1.08 ML. The experimental results in this work highlight the importance of strain accumulation in the design and fabrication of QD-based devices with metamorphic buffer layer involved.     

Strain accumulation in InAs/In<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Ga<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>As quantum dots

The effect of strain accumulation in the InAs/In _x Ga_1−x As quantum dots (QDs) system was studied in this work. It was found that strain in the In _x Ga_1−x As layer accumulation in the QD layer. This effect resulted in a dramatic reduction of growth mode transition thickness of the QD layer. For InAs/In_0.25Ga_0.75As QDs, critical thickness is measured to be as low as 1.08 ML. The experimental results in this work highlight the importance of strain accumulation in the design and fabrication of QD-based devices with metamorphic buffer layer involved.     

Materials and device properties of pseudomorphic In x Ga1−x As/Al0.3Ga0.7As/GaAs high electron mobility transistors (0<x<0.5)

Modulation doped Al_0.3Ga_0.7As/In _x Ga_1–x As/GaAs high electron mobility transistor structures for device application have been grown using molecular beam epitaxy. Initially the critical layer thickness for InAs mole fractions up to 0.5 was investigated. For InAs mole fractions up to 0.35 good agreement with theoretical considerations was observed. For higher InAs mole fractions disagreement occurred due to a strong decrease of the critical layer thickness. The carrier concentration for Al_0.3Ga_0.7As/In _x Ga_1–x As/GaAs high electron mobility transistor structures with a constant In _x Ga_1–x As quantum well width was investigated as a function of InAs mole fraction. If the In _x Ga_1–x As quantum well width is grown at the critical layer thickness the maximum carrier concentration is obtained for an InAs mole fraction of 0.37. A considerable higher carrier concentration in comparison to single-sided -doped structures was obtained for the structures with -doping on both sides of the In _x Ga_1–x As quantum well. Al_0.3Ga_0.7As/In _x Ga_1–x As/GaAs high electron mobility transistor structures with InAs mole fractions in the range 0–0.35 were fabricated for device application. For the presented field effect transistors best device performance was obtained for InAs mole fractions in the range 0.25–0.3. For the field effect transistors with an InAs mole fraction of 0.25 and a gate length of 0.15 m a f _T of 115 GHz was measured.Dedicated to H.-J. Queisser on the occasion of his 60th birthday     

Optical properties of vertically aligned self-assembled InGaAs quantum dot layers on (311)A/B and (100) GaAs substrates

In this work, we present substrate orientation effects on optical properties in vertically stacked In_0.5Ga_0.5As layers grown by molecular beam epitaxy on (311)A/B and reference (100) GaAs substrates. Samples were grown for different GaAs spacer thicknesses. The spacer thickness variation shows the influence on PL spectra for all planes. The differences in peak shape, peak position, amplitude and integrated luminescence have been observed for all surfaces. These differences suggest that indium migration in spacer layers is caused by the strain fields induced by islands buried below, and is different at the three surfaces. Vertical electronic coupling between quantum dots is confirmed by photoluminescence temperature dependence.     

InxGa1-xAs-GaAs应变层量子阱结构的流体静压光荧光研究

本文报道了对分子束外延(MBE)生长的In_0.25Ga_0.75As-GaAs应变层量子阱结构在77K下的压力光荧光(PL)研究的结果。流体静压力从0到50kbar.,给出了In_0.25Ga_0.75As-GaAs应变层量子阱的Γ谷压力系数,实验观察到了量子阱中能级与势垒GaAs中X谷的能级交叉。通过对其压力行为的分析,给出了In_0.25Ga_0.75As-GaAs异质结的导带与价带跃变比:Q_c=△E_c:△E_v=0.68:0.32。对(InGa)As-GaAs应变量子阱常压下的理论分析与实验符合很好。本文也对Al_0.3Ga_0.70As-GaAs量子阱进行了讨论。 关键词：     

LP MOVPE growth of AlGalnP/GalnP and its application to visible laser diodes

High-quality and uniform bulk layers of (Al _x Ga_1–x )_0.5In_0.5P (x=0–0.7) and AlGalnP/GainP quantum wells (QWs) are grown on 2°-off (100) GaAs substrates by low-pressure metal organic vapour phase epitaxy at a low growth rate of 0.3 nm s^-1. The amount of lattice mismatch and the variation of PL peak energy of (Al_0.5Ga_0.5)_0.5In_0.5P on the 50-mm substrate are less than 6×10^-4 and 2 meV, respectively. (Al_0.5Ga_0.5)_0.5In_0.5P/Ga_0.5In_0.5P SQWs show narrow PL spectra even from a 0.6 nm well measured at 20 K. The variation of PL peak energy from (Al_0.5Ga_0.5)_0.5In_0.5P/Ga_0.5In_0.5P MQWs is less than 10 meV. Also, as-cleaved AlGalnP/GalnP lasers fabricated by a three-step MOVPE show a pulsed threshold current of 82 mA at room temperature, output power of 12 mW, and the lasing wavelength at 668.2 nm.     

Exciton relaxation in Ga1 − xInxAs/GaAs self-organized quantum dots

The exciton dynamics in Ga_1 − xIn_xAs/GaAs self-organized quantum dots grown on GaAs (111)B substrates are studied by the time-resolved photoluminescence (PL). We have found the intra-dot exciton relaxation by the reduction of the linewidth and peak energy and also by the energy-dependent PL rise time in the transient PL spectra. Compared with the energy relaxation in the reference quantum wells, we have confirmed that the exciton relaxation in three-dimensionally confined quantum dots is slower than in the quantum wells.     

Reasons of emission inhomogeneity in InAs quantum dot structures

The photoluminescence (PL) inhomogeneity has been studied in InAs quantum dots (QDs) embedded in the symmetric In_0.15Ga_0.85As/GaAs quantum wells (QWs) with QDs grown at different temperatures. It was shown that three reasons are responsible for the emission inhomogeneity in studied QD structures: (i) the high concentration of nonradiative recombination centers in the capping In_0.15Ga_0.85As layer at low QD growth temperatures, (ii) the QD density and size distributions for the structure with QD grown at 510 ^°C, (iii) the high concentration of nonradiative recombination centers in the GaAs barrier at higher QD growth temperatures.     

Large negative magnetoresistance introduced by line dislocations in a modulation doped Ga0.25In0.75As/InP quantum well

A large negative magnetoresistance at low magnetic fields of a high mobility two dimensional electron gas in a modulation-doped Ga_0.25In_0.75As/InP quantum well containing dislocations is reported. The effect is attributed to electrons on open orbits caused by scattering against the potential created by line dislocations formed in the Ga_0.25In_0.75As layer when the critical thickness for growth on InP was exceeded. By comparing the magnetoresistance for the structures containing dislocations with those without, but with etched trenches with a similar distribution as the line dislocations, we conclude that the dislocations introduce a strong potential in the two dimensional electron gas.     

Stacking of multilayer InAs quantum dots with combination capping of InAlGaAs and high temperature grown GaAs

We are reporting the growth of multilayer stacks of quantum dots (10 periods) with a combination capping of In_0.21Al_0.21Ga_0.58As (30 Å) and GaAs (70–180 Å) grown by solid source molecular beam epitaxy (MBE). Reflection high energy electron diffraction (RHEED) has been used for the insitu monitoring of quantum dot (QD) formation in heterostructure samples. The samples were also characterized by other exsitu techniques like cross sectional transmission electron microscopy (XTEM) and photoluminescence measurements (PL). For a heterostructure sample with thin barrier thickness (<100 Å), an XTEM image showed the stacking of QDs only up to the 5th layer and in the upper layers there was hardly any formation of dots. We presume the stoppage of dot formation is due to the uneven surface of the InAlGaAs alloy overgrown on the InAs QDs, as a result of the local compositional deviations of the Group-III atoms. Samples grown with thicker barriers (>100 Å of GaAs) showed good stacking of islands until the tenth layer. The thick GaAs layer overgrown on the InAlGaAs at 590 ^°C is believed to remove the surface modifications of the quaternary layer thereby creating a smoother surface front for the growth of subsequent QD layers.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

New mechanism of surface polariton resonance at an isolated interface between transparent dielectric media (non-Tamm quasistationary surface polariton states)

A system of quantum dots on the basis of Al_xIn_1-xAs/Al_yGa_1-y As solid solutions has been studied. The usage of broadband Al_xIn_1-x solid solutions as the basis of quantum dots makes it possible to expand considerably the spectral emission range into the short-wave region, including the wavelength region near 770 nm being of interest for the design of aerospace systems of quantum cryptography. The optical characteristics of single Al_xIn_1-xAs quantum dots grown according to the Stranski–Krastanov mechanism are studied by the cryogenic microphotoluminescence method. The fine structure of exciton states of quantum dots is studied in the wavelength region near 770 nm. It is shown that the splitting of exciton states is comparable with the natural width of exciton lines, which is of great interest for the design of emitters of pairs of entangled photons on the basis of Al_xAs_1-x quantum dots.     

Weak localization in Al0.25Ga0.75As/In0.2Ga0.8As/GaAs wires

The phase coherence length L_Ø, its temperature dependence and the spin-orbit scattering length L_SO in Al_0.25Ga_0.75As/In_0.2Ga_0.8As/GaAs wires fabricated by electron-beam lithography and CH₄/H₂ Reactive Ion Etching (RIE), were extracted by fitting a 1-dimensional weak localization theory to two-terminal measurements in the temperature range between 2 K and 50 K. The scattering mechanism was found to be Nyquist (electron-electron collisions with small energy transfer).     

GaAs/AlxGa1-xAs球形量子点中的电子结构

详细讨论了GaAs/Al_xGa_1-xAs球形量子点内的单电子束缚能级随量子点半径、Al组分以及外电场的变化规律,并计算了考虑量子点内外电子有效质量不同后对电子能级的修正. 另外,用解析和平面波展开两种方法对球形量子点内的电子能级进行了计算,并对计算结果做了比较,发现它们符合的很好. 结论和方法为量子点的研究和应用提供了有益的信息和指导. 关键词： 球形量子点 解析方法 平面波展开方法 有效质量     

Band offsets in In0.15Ga0.85As/ GaAs and In0.15Ga0.85As/Al0.15Ga0.85As studied by photoluminescence and cathodoluminescence

Photoluminescence and cathodoluminescence measurements of strained undoped In_0.15Ga_0.85As/GaAs and In_0.15Ga_0.85As/Al_0.15Ga_0.85As quantum well structures with emission lines attributed to the first electron–first heavy hole and first electron–first light hole excitonic transitions have been analysed theoretically within the eight-band effective mass approximation. For In_0.15Ga_0.85As/GaAs the results are consistent with either type I or type II alignment of the light hole band. In the case of In_0.15Ga_0.85As/Al_0.15Ga_0.85As our results indicate type II alignment for the light hole band and offset ratio ofQ = 0.83.     

Growth of InGaAs-capped InAs quantum dots characterized by Atomic Force Microscope and Scanning Electron Microscope

Atomic force microscopy (AFM) is typically used to measure the quantum dot shape and density formed by lattice mismatched epitaxial growth such as InAs on GaAs. However, AFM images are distorted when two dots are situated in juxtaposition with a distance less than the AFM tip width. Scanning electron Microscope (SEM) is much better in distinguishing the dot density but not the dot height. Through these measurements of the growth of In_xGa_1-xAs cap layer on InAs quantum dots, it was observed that the InGaAs layer neither covered the InAs quantum dots and wetting layer uniformly nor 100% phase separates into InAs and GaAs grown on InAs quantum dots and wetting layer, respectively.     

Band edge offsets in strained (InGa)As-(AlGa)As heterostructures

The excitonic transitions between the ground electron and hole quantum well sublevels in strained In_xGa_1-xAs-Al_yGa_1-yAs multiple quantum well structures (x = 0.12−0.35 and y = 0.2−0.35) have been investigated by means of photoluminescence and photoconductivity measurements. The molecular beam epitaxy grown structures contained an Al_yGa_1-yAs matrix with one unstrained GaAs and three strained In_xGa_1-xAs quantum wells one of which was in the GaAs cladding layers. The ratio of the conduction band edhe line up to the band gap offset for the strained In_xGa_1-xAs-unstrained Al_yGa_1-yAs interface has been found to be 0.67 ± 0.08 for the studied regions of x and y.     

高稳定线性调谐GaAs基波长可调谐共振腔增强型探测器

研制了一种GaAs基波长可调谐共振腔增强型探测器. 采用分子束外延设备生长In_0.25Ga_0.75As/GaAs量子阱作为器件的有源区, 无偏压时器件的响应峰波长在1071 nm,器件在21 V的直流调谐电压下,实现了波长大于23 nm的调谐. 统计结果表明,当调谐电压大于5 V时,调谐电压与响应波长之间具有稳定、精确的对应关系, 且近似线性调谐,同时对器件响应峰的特性进行了理论分析. 关键词： GaAs 共振腔增强型探测器 高稳定 线性调谐     

Effect of interdiffusion of In and Al atoms on excitonic states in In<Subscript>x</Subscript>Ga<Subscript>1−x</Subscript>As/Al<Subscript>y</Subscript>Ga<Subscript>1−y</Subscript>As quantum dots

The effect of interdiffusion of aluminum and indium atoms on the exciton emission energy and binding energy in In_xGa_1?xAs/Al_yGa_1?yAs quantum dots is studied. It is shown that the emission energy increases monotonically with increasing diffusion length, while the binding energy has a maximum.     

Investigation of weak damage in Al0.25Ga0.75As/GaAs by using RBS/C and Raman spectroscopy

The weak damage induced by 0.8 MeV Si ion implantation in the Al_0.25Ga_0.75As films epitaxially grown on GaAs substrates was studied by using Rutherford backscattering spectrometry/channeling (RBS/C) and Raman spectroscopy. RBS/C spectra measured from the implanted samples showed rather low damage level induced by the ion implantation with ion dose from 1×10¹⁴ to 5×10¹⁵ cm⁻². The Raman spectra were measured on these samples. Two kinds of phonon modes, GaAs-like and AlAs-like, are observed, which indicate the existence of multiple phonon vibrational modes in the epitaxial Al_0.25Ga_0.75As films on the GaAs substrate. Compared with the unimplanted sample, the Raman photon peaks for the implanted sample shift gradually to lower energy with the increase of the implantation dose. The strains induced in the implanted layer were also evaluated from the Raman spectra. The result from high resolution double crystal X-ray diffractometry (HRXRD) also verified the evolution of the strains in the implanted layers.