Oxidation behavior with quantum dots formation from amorphous GaAs thin films

ABSTRACT

We investigated the oxidation behaviour of an amorphous GaAs thin film deposited onto a micro/nanotextured Si surface by an electron beam. After the deposited film was exposed to air, microcrystallites were formed with octahedral cubic and monoclinic structures of arsenic oxides. Short time exposure after thin film deposition showed the formation of cubic arsenolite while long time exposure showed the formation of monoclinic claudetites as well as cubic arsenolites. These oxide microcrystallites at the GaAs thin film surface disappeared after the sample annealing process. However, the amorphous GaAs thin film included high-density GaAs nanodots. From UV and inverse photoemission spectroscopies, the thin film showed n-type band structure with an energy gap of 2.73?eV. Photoluminescence measurement showed an emission peak at (450–513)?nm with the energy of (2.41–2.75)?eV corresponding to dot size of (4.1–4.5)?nm.     

厚度对未掺杂ZnO薄膜光谱性能的影响

X射线衍射光谱、拉曼光谱和紫外可见透射光谱技术是薄膜材料检测的重要技术手段。通过对薄膜材料光谱性能的分析,可以获得薄膜材料的物相、晶体结构和透光性能等信息。为了解厚度对未掺杂ZnO薄膜的X射线衍射光谱、拉曼光谱和紫外可见透射光谱性能的影响,利用溶胶-凝胶法在石英衬底上旋涂制备了不同厚度的未掺杂ZnO薄膜样品,并对薄膜样品进行了X射线衍射光谱、拉曼光谱和紫外可见透射光谱的检测。首先,通过X射线衍射光谱检测发现,薄膜样品呈现出（002）晶面的衍射峰,ZnO薄膜为六角纤锌矿结构,均沿着C轴择优取向生长,且随着薄膜厚度的增加,衍射峰明显增强,ZnO薄膜的晶粒尺寸随着膜厚的增加而长大。利用扫描电子显微镜对薄膜样品的表面形貌分析显示,薄膜表面致密均匀,具有纳米晶体的结构,其晶粒具有明显的六角形状。通过拉曼光谱检测发现,薄膜样品均出现了437 cm-1的拉曼峰,这是ZnO纤锌矿结构的特征峰,且随着薄膜厚度的增加,其特征拉曼峰强度也增加,进一步说明了随着ZnO薄膜厚度的增加,ZnO薄膜晶化得到了加强。最后,通过紫外可见透射光谱测试发现,随着膜厚的增加,薄膜的吸收边发生一定红移,薄膜样品在可见光区域内的透过率随着膜厚度增加而略有降低,但平均透过率都超过90%。通过对薄膜样品的紫外-可见透射光谱进一步分析,估算了薄膜样品的折射率,定量计算了薄膜样品的光学禁带宽度,计算结果表明：厚度的改变对薄膜样品的折射率影响不大,但其禁带宽度随着薄膜厚度的增加而变窄,且均大于未掺杂ZnO禁带宽度的理论值3.37 eV。进一步分析表明,ZnO薄膜厚度的变化与ZnO晶粒尺寸的变化呈正相关,本质上,吸收边或光学禁带宽度的变化是由于ZnO晶粒尺寸变化引起的。     

Magnetic pole pinning at rectangular defects on MnAs/GaAs(0 0 1)

Strong magnetic poles at characteristic rectangular defects have been observed using a magnetic force microscope on a MnAs(  1 0 0) thin film with the thickness of 30 nm. The MnAs thin film was epitaxially grown on a GaAs(0 0 1) substrate. The magnetic poles were in one-arranging direction, being independent of the magnetization direction of the film. The poles were pinned at the edges of the rectangular defects until just below the Curie temperature, and formed a stable magnetic-field loop on the MnAs surface. The stability of the magnetic pole pinning shows the distinctive feature of the magnetic domain structure on the surface with a strong anisotropy, which was built in the heterostructure of MnAs and GaAs.     

ZnO薄膜的分子束外延生长及性能

利用分子束外延(MBE)和氧等离子体源辅助MBE方法分别在Si(100)、GaAs(100)和蓝宝石Al2O3(0001)衬底上用Zn、ZnS或以一定Zn-O化学计量比作缓冲层,改变衬底生长温度和氧压,并在氧气氛下,进行原位退火处理,得到ZnO薄膜。依据X射线衍射(XRD)图,表明样品的结晶性能尚好,且呈c轴择优取向;实验结果表明在不同衬底上生长的ZnO薄膜,由于晶格失配度不同,其衍射峰也有区别。用原子力显微镜(AFM)观测薄膜的表面形貌,为晶粒尺寸约几十纳米的ZnO纳米晶,且ZnO晶粒呈六边形柱状垂直于衬底的表面。采用掠入射X射线反射率法测膜厚。在360nm激发下,样品的发光光谱是峰值为410,510nm的双峰谱,是与样品表面氧缺陷有关的深能级发光。     

不同晶向SrTiO3上外延GaAs薄膜的光谱研究

利用MBE生长技术,成功地在不同晶向SrTiO3(100)(111)(110)衬底上生长了GaAs薄膜,利用显微Raman和荧光光谱（PL）对此进行了研究。实验结果表明,在不同晶向SrTiO3上生长的GaAs薄膜有不同的晶向和应力状态。荧光光谱（PL）研究表明在SrTiO3(100)(111)晶面上生长的GaAs薄膜的PL峰发生明显的蓝移。研究表明在SrTiO3(110)面上生长的GaAs薄膜和体单晶基本上一致,有更好的光学质量。     

Low-energy electron energy-loss spectroscopy with Ge:GaAs (110) heterostructures

Electronic properties and chemical composition of Ge films grown by molecular beam epitaxy on GaAs (110) surfaces were studied in situ by electron energy-loss spectroscopy. The loss peaks involving core-level excitations proved that As atoms segregate at the surface of the growing film. The well known 20 eV loss peak of the clean GaAs (110) surface, being attributed to transitions from Ga(3d) to Frenkel-type excitons of dangling-bond surface states, was found to persist, slightly shifted to 19.7 eV, with the growing Ge (110) film. Since the Ga coverage amounts to below approximately 0.05 of a monolayer this transition seems to contain a strong intraatom contribution.     

氢对GaAs薄膜的钝化作用

报导了射频磁控溅射与沉积气氛掺氢相结合制备单层(13~20 nm厚)高质量GaAs多晶态纳米薄膜的方法,研究了氢钝化对薄膜微观结构及光学性质的影响.对GaAs薄膜进行了X射线衍射、原子力显微镜、吸收光谱、光致荧光谱的研究分析.结果表明,衬底温度500℃的掺氢薄膜和520℃的薄膜呈面心立方闪锌矿结构,薄膜的晶团尺寸较大,微观表面较为粗糙,其吸收光谱出现了吸收边蓝移和明显的激子峰,带隙光致荧光峰强明显增加,说明氢在衬底温度500℃~520℃下对薄膜有重要的钝化作用.     

Transition of 3D to 2D growth modes of InAs grown on GaAs

We report a method to grow thin strain-released InAs layer on GaAs (1 0 0) substrates by molecular beam epitaxy. We have shown that by controlling the growth parameters, a thin 2D InAs layer can be grown during initial stages, which eventually serves as a buffer layer to trap dislocations and epitaxial regrowth of InAs on this buffer results in high crystal quality. The size dependence of the InAs islands formed during initial stages with growth time has been studied by atomic force microscopy. With continuous short-time epitaxial growth during various stages, the InAs growth mode transfers from 3D to 2D. The introduction of dislocations into InAs epitaxial islands and their behavior during initial growth stage has been theoretically studied. The theoretical results are in remarkable agreement with the experimental results and shows that once the film is formed, the film strain is totally relaxed. The 200 nm thick InAs epilayer grown on this buffer shows a narrow X-ray diffraction peak. Such InAs strain-released buffer layer would be useful for regrowth of high In content based materials on top of it for electronics and optoelectronics device applications.     

不同生长环境下砷化镓纳米颗粒的应变场模拟

对于埋嵌在薄膜材料中的纳米颗粒,在其生长过程中总是不可避免地伴随着应变场的产生,而这种应变场的分布能反映纳米颗粒的结构变化,纳米颗粒结构与它的物理性能有重要的关系.研究埋嵌在不同薄膜材料中的纳米颗粒生长过程中的应变场分布对于调控纳米颗粒的物理性能有着重要的意义.本文利用有限元算法分别计算了埋嵌在非晶氧化铝薄膜和非晶二氧化硅薄膜材料中的砷化镓纳米颗粒生长过程中的应变场分布.砷化镓纳米颗粒在以上两薄膜材料生长过程中都受到非均匀偏应变作用.对于埋嵌在氧化铝薄膜中的砷化镓纳米颗粒,其生长过程中,纳米颗粒内部受到的应变大于纳米颗粒表面受到的应变;而对于埋嵌在二氧化硅薄膜中的砷化镓纳米颗粒,纳米颗粒内部受到的应变小于纳米颗粒表面受到的应变.选择砷化镓纳米颗粒生长的薄膜材料可以调控纳米颗粒生长过程中的应变场分布,从而进一步调控纳米颗粒的晶格结构和形貌及其物理性能.     

矩形折射率调制型薄膜长周期光纤光栅特性研究

镀膜长周期光纤光栅传感器是目前光纤光栅传感研究的一个热点,但关于此类传感器模型的全面的理论分析目前还很少。本文基于严格的四层模型,从理论上对芯层折射率调制为矩形波调制的薄膜长周期光纤光栅的特性进行了详细的分析。在充分考虑材料色散对光纤芯层和包层的影响后,对薄膜参数、占空比和环境折射率的变化对镀膜长周期光纤光栅的谱特性的影响进行了数值研究。研究结果表明,薄膜参数对透射谱有重要影响,合理设计薄膜厚度可以获得较佳的损耗峰。研究还发现,镀膜后占空比对透射谱的影响减小,而对环境折射率变化的敏感度增加。在占空比为0.5时光栅具有最大的损耗峰值。     

不同衬底和CdCl2退火对磁控溅射CdS薄膜性能的影响

在科宁7059玻璃, FTO, ITO, AZO四种衬底上磁控溅射CdS薄膜, 并在CdCl₂+干燥空气380 ℃退火, 分别研究了不同衬底和退火工艺对CdS薄膜形貌、结构和光学性能的影响. 扫描电子显微镜形貌表明: 不同衬底原位溅射CdS薄膜的形貌不同, 退火后相应CdS薄膜的晶粒度和表面粗糙度明显增大. XRD衍射图谱表明: 不同衬底原位溅射和退火CdS薄膜均为六角相和立方相的混相结构, 退火前后科宁7059玻璃, FTO, AZO衬底上CdS薄膜有 H(002)/C(111) 最强衍射峰, ITO衬底原位溅射CdS薄膜没有明显的最强衍射峰, 退火后出现 H(002)/(111) 最强衍射峰. 紫外-可见分光光度计分析表明: AZO, FTO, ITO, 科宁7059玻璃衬底CdS薄膜的可见光平均透过率依次减小, 退火后相应衬底CdS薄膜的可见光平均透过率增大, 光学吸收系数降低; 退火显著增大了不同衬底CdS薄膜的光学带隙. 分析得出: 上述结果是由于不同衬底类型和退火工艺对CdS多晶薄膜的形貌、结构和带尾态掺杂浓度改变的结果. 关键词： CdS薄膜 磁控溅射 退火再结晶 带尾态     

Surface chemistry and growth mechanisms studies of homo epitaxial (1 0 0) GaAs by laser molecular beam epitaxy

In this paper, GaAs thin film has been deposited on thermally desorbed (1 0 0) GaAs substrate using laser molecular beam epitaxy. Scanning electron microscopy, in situ reflection high energy electron diffraction and in situ X-ray photoelectron spectroscopy are applied for evaluation of the surface morphology and chemistry during growth process. The results show that a high density of pits is formed on the surface of GaAs substrate after thermal treatment and the epitaxial thin film heals itself by a step flow growth, resulting in a smoother surface morphology. Moreover, it is found that the incorporation of As species into GaAs epilayer is more efficient in laser molecular beam epitaxy than conventional molecular beam epitaxy. We suggest the growth process is impacted by surface chemistry and morphology of GaAs substrate after thermal treatment and the growth mechanisms are discussed in details.     

Photoluminescence spectra of doped GaAs films

We have studied the dependence of the photoluminescence (PL) spectrum on the doping level and the film thickness of n-GaAs thin films, both experimentally and theoretically. It has been shown theoretically that modification of the PL spectrum of p-type material by p-type doping is very small due to the large valence-band hole effective mass. The PL spectrum of n-type material is affected by two factors: (1) the electron concentration which determines the Fermi level in the material; (2) the thickness of the film due to re-absorption of the PL signal. For the n-type GaAs thin films under current investigation, the doping level as well as the film thickness can be very well calibrated by the PL spectrum when the doping level is less than 2×10¹⁸ cm^-3 and the film thickness is in the range of the penetration length of the PL excitation laser. PACS 78.20.-e; 78.55.Cr; 78.66.Fd     

Formation of arsenic sulfide on GaAs surface under illumination in acidified thiourea electrolytes

The present article reports the formation of arsenic sulfide films on GaAs by the potentiodynamic polarization in acidified thiourea (TU) electrolytes under photo-illumination. Oxidation of TU competes with the oxidation of GaAs itself and leads to the formation of surface arsenic-sulfide films. Surface chemical composition is investigated by X-ray photoelectron spectroscopy (XPS), demonstrating the formation of As-sulfide as the XPS peaks at binding energies of 42.6 and 162.5 eV for As 3d and S 2p, respectively, are observed. XPS results also show diminishing of Ga species from the surface while As-sulfide is forming. Though, As-sulfide is predominantly formed on the surface, but the inductive coupling plasma-mass spectroscopy (ICP-MS) analysis still shows a preferential dissolution of As ions into electrolytes. These results indicate that Ga ions diffuse into the bulk of the electrode material. The formation of As-sulfide, initially, enhances the photocurrent generation; presumably, due to suppressing electron-hole recombination processes. Further deposition of As-sulfide deteriorates GaAs photoactivity due to retarding light absorptivity because of depositing a thick As-sulfide film. The morphology of the As-sulfide film is characterized by scanning electron microscopy (SEM) that shows the formation of smooth and nonporous films in TU electrolytes acidified by H₂SO₄ of concentration ≥0.2 M. Electrochemical impedance measurements show that GaAs corrosion is limited by the growth and oxidation of the sulfide layer.     

纳米银导电膜的制备及其光谱学分析

为了以温和的化学反应制备纳米银导电膜,在PET薄膜上涂布柠檬酸银乳液,并用抗坏血酸(Vc)还原,用红外光谱仪、紫外-可见光分光光度计、X射线衍射仪(XRD)、扫描电子显微镜、原子力显微镜等,研究柠檬酸银乳液及其还原涂层的微观形貌、晶体结构和导电性能。发现PVP保护的柠檬酸银乳液粒径分布在60～150 nm。银膜的UV-Vis吸收峰位于430 nm,表明其具有纳米结构。XRD分析表明,还原后的涂层形成了不完整的银晶体,水洗比乙醇处理更能促进柠檬酸银的彻底还原和银膜的晶型完善,降低银膜表面电阻。     

Molecular dynamics and experimental studies on deposition mechanisms of ion beam sputtering

Molecular dynamics (MD) simulation and experimental methods are used to study the deposition mechanism of ionic beam sputtering (IBS), including the effects of incident energy, incident angle and deposition temperature on the growth process of nickel nanofilms. According to the simulation, the results showed that increasing the temperature of substrate decreases the surface roughness, average grain size and density. Increasing the incident angle increases the surface roughness and the average grain size of thin film, while decreasing its density. In addition, increasing the incident energy decreases the surface roughness and the average grain size of thin film, while increasing its density. For the cases of simulation, with the substrate temperature of 500 K, normal incident angle and 14.6 × 10⁻¹⁷ J are appropriate, in order to obtain a smoother surface, a small grain size and a higher density of thin film. From the experimental results, the surface roughness of thin film deposited on the substrates of Si(1 0 0) and indium tin oxide (ITO) decreases with the increasing sputtering power, while the thickness of thin film shows an approximately linear increase with the increase of sputtering power.     

固体电解质ZrO2薄膜气敏光学特性的研究

本文采用溶胶凝胶法制备了ZrO₂薄膜,并研究它在乙醇蒸汽和氨蒸汽中的透射光谱,发现当掺入适量的稳定剂后,其光学特性显著增大,光学透过率随乙醇蒸汽和氨蒸汽的浓度增大而单调上升,敏感波段扩展至整个可见光区域.其气敏光学特性的灵敏度、单调性、可重复性表明了该材料是一种有实用价值的气敏光纤传感器新材料.本文亦讨论了ZrO₂薄膜的气敏光学机理.     

Thickness dependent magnetic and structural properties of Co films grown on GaAs (100)

The structural, magnetic and transport properties measurements carried out on Co thin films deposited by electron beam evaporation on GaAs substrate as a function of layer thickness ranging from 50 Å to 1000 Å are presented here. Structural measurements show the film to be amorphous in nature at lower thickness which becomes crystalline at higher thickness. Magnetic measurements show an increase in saturation magnetization (M_S) with film thickness. M_S values are found to vary from 521 emu/cm³ to 1180 emu/cm³ for thicknesses ranging from 50 Å to 1000 Å. The coercivity and saturation field value shows a systematic decrease up to 600 Å thickness and increase thereafter. Various microstructural parameters were also calculated using GIXRR technique. A clear grain growth is observed in AFM technique with film thickness and its influence on transport properties was also seen. Different surface morphology and magnetic domain structures were obtained on different thin film samples by AFM and MFM techniques, respectively. XPS measurements reveal formation of CoAs phase at the interface between Co and GaAs. All these results are discussed and interpreted in detail in this communication.     

Passivation of defect states in Si-based and GaAs structures

Formation of defect states on semiconductor surfaces, at its interfaces with thin films and in semiconductor volumes is usually predetermined by such parameters as semiconductor growth process, surface treatment procedures, passivation, thin film growth kinetics, etc. This paper presents relation between processes leading to formation of defect states and their passivation in Si and GaAs related semiconductors and structures. Special focus is on oxidation kinetics of yttrium stabilized zirconium/SiO₂/Si and Sm/GaAs structures. Plasma anodic oxidation of yttrium stabilized zirconium based structures reduced size of polycrystalline silicon blocks localised at thin film/Si interface. Samarium deposited before oxidation on GaAs surface led to elimination of EL2 and/or ELO defects in MOS structures. Consequently, results of successful passivation of deep traps of interface region by CN⁻ atomic group using HCN solutions on oxynitride/Si and double oxide layer/Si structures are presented and discussed. By our knowledge, we are presenting for the first time the utilization of X-ray reflectivity method for determination of both density of SiO₂ based multilayer structure and corresponding roughnesses (interfaces and surfaces), respectively.     

金属超微粒子-介质复合薄膜(Ag-BaO)的光吸收特性

测量了真空热蒸发沉积法制备的贵金属Ａｇ超微粒子－介质（ＢａＯ）复合薄膜近紫外到可见的吸收光谱。这种薄膜的透射电镜显微像表明，Ａｇ在介质中形成了较均匀的超微粒子，粒径为１５ｎｍ。观察到吸收谱在４１０ｎｍ处有明显的等离子激元共振吸收峰，这是电偶极振荡的吸收。与以往文献的结果做了比较，讨论了吸收光谱对金属微粒尺寸的依赖关系。