Formation of amorphous sapphire by a femtosecond laser pulse induced micro-explosion

We report on structural characterization of void-structures created by a micro-explosion at the locus of a tightly focused femtosecond laser pulse inside the crystalline phase of Al₂O₃ (R3c space group). The transmission electron microscopy (TEM), micro-X-ray diffraction (XRD) analysis, and Raman scattering revealed a presence of strongly structurally modified amorphous regions around the void-structures. We discuss issues of achieving the required resolution for structural characterization and assignment of newly formed phases of nano-crystallites by TEM, XRD, and Raman scattering from micro-volumes of modified materials enclosed inside the bulk of the host phase.     

GaAs nanocrystals: Structure and vibrational properties

GaAs nanocrystals were grown on indium tin oxide substrate by an electrodeposition technique. Atomic force microscopic measurement indicates an increase in the size of the nanocrystal with decrease in the electrolysis current density accompanied by the change in the shape of the crystallite. Transmission electron microscopic measurements identify the crystallite sizes to be in the range of 10-15 nm and the crystal structure to be orthorhombic. On account of the quantum size effect, the first optical transition was blue shifted with respect to the band gap of the bulk GaAs and the excitonic peak appeared prominent. A localized phonon mode ascribed to certain point defect occurred in the room temperature micro-Raman spectrum.     

Controlled synthesis and phase characterization of Fe-based nanoparticles obtained by thermal decomposition

Iron oxide nanoparticles were synthesized by the thermal decomposition of Fe(acac)₃ and Fe(CO)₅. Three different homogeneous procedures were used for the controlled synthesis of Fe₃O₄, γ-Fe₂O₃ and Fe₃O₄/γ-Fe₂O₃ mixture nanocrystals. A combination of characterization techniques was used in order to distinguish these oxides. The controllable size, the narrow distribution and the rhombic self-assembly of the nanoparticles were revealed by the high-resolution transmission electron microscopy images and the X-ray powder diffraction results. For the quantitative analysis of the samples manganometry was used. Preliminary magnetic measurements indicated the size and composition dependence of saturation magnetization, a superparamagnetic behavior of the samples and some ferromagnetic features.     

Nonlinear optical properties of periodic gold nanoparticle arrays

Periodic Au nanoparticle arrays were fabricated on silica substrates using nanosphere lithography. The identical single-layer masks were prepared by self-assembly of polystyrene nanospheres with radius R = 350 nm. The structural characterization of nanosphere masks and periodic particle arrays was investigated by atomic force microscopy. The nonlinear optical properties of the Au nanoparticle arrays were determined using a single beam z-scan method at a wavelength of 532 nm with laser duration of 55 ps. The results show that periodic Au nanoparticle arrays exhibit a fast third-order nonlinear optical response with the nonlinear refractive index and nonlinear absorption coefficient being n₂ = 6.09 × 10⁻⁶ cm²/kW and β = −1.87 × 10⁻⁶ m/W, respectively.     

Nonlinear optical properties of Au/ZnO nanoparticle arrays

The triangular-shaped Au/ZnO nanoparticle arrays were fabricated on fused quartz substrate using nanosphere lithography. The structural characterization of the Au/ZnO nanoparticle arrays was investigated by atomic force microscopy. The absorption peak due to the surface plasmon resonance of Au particles at the wavelength of about 570 nm was observed. The nonlinear optical properties of the nanoparticle arrays were measured using the z-scan method at a wavelength of 532 nm with pulse duration of 10 ns. The real and imaginary part of third-order nonlinear optical susceptibility, Re χ⁽³⁾ and Im χ⁽³⁾, were determined to be 1.15 × 10⁻⁶ and −5.36 × 10⁻⁷ esu, respectively. The results show that the Au/ZnO nanoparticle arrays have great potential for future optical devices.     

Influence of annealing temperature on microstructure and optical properties of sol-gel derived tungsten oxide films

Tungsten oxide (WO₃) thin films have been extensively studied for their interesting physical properties and a variety of potential applications in electrochromic devices. In order to explore the possibility of using these in electrochromic devices, a preliminary and thorough study of the optical properties of the host materials is an important step. Based on this, the influence of annealing temperature on the structural, surface morphological, optical and electrochromic properties has been investigated in the present work. The host material, WO₃ films, has been prepared from an ethanolic acetylated peroxotungstic acid sol containing 5 wt.% oxalic acid dehydrate (OAD) by sol-gel technique. The monoclinic structure and textured nature change of the films with the temperature increasing have been investigated by X-ray diffraction analysis. The surface morphology evolution of the films has been characterized by SEM. The shift in absorption edge towards the higher wavelength region observed from optical studies may be due to the electron scattering effects and the optical band filling effect that reveals the crystallization of the film. The amorphous film shows better optical modulation (ΔT = 76.9% at λ = 610 nm), fast color-bleach kinetics (t_c ∼ 4 s and t_b ∼ 9 s) and good reversibility (Q_b/Q_c = 90%), thereby rendering it suitable for smart window applications.     

Influence of Cr interlayer on the structure and optical properties of Ag films on glass substrate by magnetron sputtering

Optical properties and microstructure of Ag film on glass substrate with Cr intermediate layer were studied by using spectrophotometer and XRD. The spectra results showed that introducing Cr intermediate layer reduced the surface roughness and promoted the reflectivity of Ag film. The XRD analysis showed that the crystalline grains increased and the stress decreased. The adhesion was also improved by using the tape test method.     

Assembly of high-anisotropy L10 FePt nanocomposite films

In this paper we report results on the synthesis and magnetic properties of L1₀ FePt nanocomposite films. Three fabrication methods have been developed to produce high-anisptropy FePt films: non-epitaxial growth of (0 0 1)-oriented FePt:X (X=Ag, C) composite films that might be used for perpendicular media; monodispersed FePt(CF_x) core–shell nanocluster-assembled films grown with a gas-aggregation technique and having uniform cluster size and narrow size distribution; and template-mediated self-assembled FePt clusters prepared with chemical synthesis by a hydrogen reduction technique, which has a high potential for controlling both cluster size and orientation. The magnetic properties are controllable through variations in the nanocluster properties and nanostructure. Analytical and numerical simulations have been done for these films, providing better understanding of the magnetization reversal mechanisms. The films show promise for development as magnetic recording media at extremely high areal densities.     

Interphase synthesis and some characteristics of aqueous nickel dispersions

The facilities of one-step preparation method of nickel nanoparticles by the interphase reduction of nickel oleate using sodium borohydride at room temperature without soluble polymer as a protective agent were studied. Nickel obtained by such technique was concentrated in aqueous phase as a black dispersion. The composition and morphology of the colloid's dispersive phase were investigated by transmission electron microscopy, XRD and IR-spectroscopy. The dispersive phase of the prepared colloidal solution represents crystalline spherical nickel nanoparticles with some admixture of nickel boride. Their average size varies between 2 and 6 nm. In accordance with the IR-spectroscopy results the stability of the nickel colloidal dispersions was provided by the surfactant produced through the interphase reaction.     

Patterned aluminum nanowires produced by electron beam at the surfaces of AlF3 single crystals

Cubic- and rectangular-shape single crystals of α-AlF₃ in sizes of 5-50 μm have been synthesized by a solid-vapor phase process. Using the electron beam induced decomposition of AlF₃, a method is demonstrated for fabricating patterned aluminum nanowires in AlF₃ substrate in a scanning electron microscope. By controlling the accelerating voltage, the beam current and scanning time, it is possible to fabricate metallic nanowires of different sizes. The aluminum nanowires may act as nano-interconnects for nanoelectronics. This work demonstrates a potential technique for e-beam nanofabrication.     

Effect of structure variation on thermal conductivity of hydrogenated silicon film

Hydrogenated silicon film was fabricated by using plasma enhanced chemical vapor deposition method. The influence of crystalline volume fraction variation on the thermal conductivity was investigated. The relation between crystalline volume and film thickness was characterized by using spectroscopic ellipsometry with Bruggeman effective medium (BEMA) model. The thermal conductivity of silicon film was measured based on Fourier thermal transmitting law using sputtering platinum as electrode. The results demonstrate that the thermal conductivity of silicon film is proportional to the volume fraction of crystalline silicon, and there is crystalline and thermal conductive gradient between surface and bottom in the microcrystalline film.     

Effect of substrate bias voltages on the diffusion barrier properties of Zr-N films in Cu metallization

Zr-N diffusion barriers were deposited on the Si substrates by rf reactive magnetron sputtering under various substrate bias voltages. Cu films were subsequently sputtered onto the Zr-N films by dc pulse magnetron sputtering without breaking vacuum. The Cu/Zr-N/Si specimens were then annealed up to 650 °C in N₂ ambient for an hour. The effects of deposition bias on growth rate, film resistivity, microstructure, and diffusion barrier properties of Zr-N films were investigated. An increase in negative substrate bias resulted in a decrease in deposition rate together with a decrease in resistivity. It was found that the sheet resistances of Cu/Zr-N(−200 V)/Si contact system were lower than those of Cu/Zr-N(−50 V)/Si specimens after annealing at 650 °C. Cu/Zr-N(−200 V)/Si contact systems showed better thermal stability so that the Cu₃Si phase could not be detected.     

Room temperature photoluminescence from amorphous silicon nanoparticles in SiOx thin films

Amorphous SiO_x thin films with four different oxygen contents (x=1.15, 1.4, 1.5, and 1.7) have been prepared by thermal evaporation of SiO in vacuum and then annealed at 770 or 970 K in argon for various times ?40 min. The influence of annealing conditions and the initial film composition on photoluminescence (PL) from the annealed films has been explored. Intense room temperature PL has been observed from films with x?1.5, visible with a naked eye. It has been shown that PL spectra of most samples consists of two main bands: (i) a ‘green’ band centered at about 2.3 eV, whose position does not change with annealing conditions and (ii) an ‘orange-red’ band whose maximum moves from 2.1 to 1.7 eV with increasing annealing time and temperature and decreasing initial oxygen content. These observations have been explained assuming recombination via defect states in the SiO_x matrix for the first band and emission from amorphous Si nanoparticles for the second one.     

Cobalt-containing nanocomposites based on zeolites of MFI framework type

Here we report the synthesis of cobalt-containing magnetic nanocomposites based on ZSM-5 zeolite and investigation of their magnetic properties. Preparation of the samples was carried out by thermal decomposition of cobalt carbonyl inside zeolite channels. It was shown that Co@ZSM-5 samples possess ferromagnetic behavior at room temperature owing to formation of anisotropic nanostructures in pores of the matrix.     

Helical nanostructures of SiOx synthesized through the heating of Co-coated substrates

This paper presents the use of the simple annealing technique at 1000 °C to produce the helical nanostructures of SiO_x. We have employed the Co-coated Si substrates, with Co layer and Si substrate utilized as catalyst and Si source, respectively. Beside the ordinary straight nanowires, the helical nanowires such as nanosprings and nanorings were observed. The product was an amorphous structure of SiO_x. We have discussed the possible growth mechanism. Photoluminescence spectrum of the SiO_x nanostructures showed a blue emission at 428 nm and a green emission at 534 nm, respectively.     

Area-selectively sputtering the RuO2 nanorods array

The RuO₂ nanorods array is grown selectively on the SiO₂-patterned sapphire (SA) wafers using reactive sputtering. The area-selectivity is attributed to an early nucleation of RuO₂ and its fast surface coverage on SA (1 0 0) and (0 1 2), in contrast to the sluggish nucleation on glassy SiO₂ in the initial sputtering period. The growth domain is explored by investigating the temperature windows at sputtering power 40, 50, and 60 W. The low-temperature bound is limited by the mobility of precursors on SiO₂ surface, which enables the precursors to depart before aggregating into a large size to smear the non-growth region. The high-temperature bound is set by the horizontal growth which enlarges the rod width and deteriorates its one-dimensional feature. The temperature window shrinks with increasing sputtering power. The X-ray photoelectron spectra indicate the as-sputtered rod surface is ruthenium rich. The X-ray diffraction analysis shows that RuO₂ growth on SA (1 0 0) and (0 1 2) follows the epitaxial relations between RuO₂ and SA crystals.     

Dependence of photoluminescence from a-Si nanoparticles on the annealing time and exciting wavelength

Thin films of SiO_x having thickness of 0.2 μm and oxygen content x=1.5 or 1.7 are prepared by thermal evaporation of SiO in vacuum. Then some samples are furnace annealed for various times (in the range ) at 770 and 970 K and some others are rapid thermal annealed at 970 K for 30 and 60 s. Photoluminescence (PL) measurements are carried out at room temperature using the 442 nm line of a He-Cd laser and the 488 nm of an Ar laser for excitation. The effect of the annealing conditions and wavelength of the exciting light on the shape of the PL from these films is explored. The deconvolution of the PL spectra measured with the 442 nm line from samples annealed at 770 K for reveals two distinct PL bands peaked at around 2.3 and 2.5 eV, which do not shift appreciably with increasing annealing time. In addition, at longer annealing times, a weak third band is resolved centred in the range 2.0-2.1 eV. It exists in the spectra of all samples annealed at 970 K being more prominent in the samples with x=1.5. The intensity of this band shows different dependences on the annealing time in the films with different initial composition. The results obtained are discussed in terms of radiative recombination via defect states in the SiO_x matrix (the 2.5 eV band) or at the a-Si-SiO_x interface (the 2.3 eV band). The band centred in the 2.0-2.1 eV range is related to recombination in amorphous silicon nanoparticles grown upon annealing.     

Hydrothermal preparation of one-dimensional assemblies of PbS nanoparticles

The preparation of one-dimensional assemblies of PbS nanoparticles is described. By treating the suspension of PbCl₂ powders in aqueous thioacetamide solution at 120 °C for 18 h, PbS nanoparticles were synthesized in regular chain-like patterns. The particles were less than 100 nm in sizes, and were organized into micron-length assemblies. The starting agents have much influence on the morphology of the products. The possible growth mechanism is also discussed.     

Influence of substrate temperature on the optical and piezoelectric properties of ZnO thin films deposited by rf magnetron sputtering

In this study, ZnO thin films were fabricated using the rf magnetron sputtering method and their piezoelectrical and optical characteristics were investigated for various substrate temperatures. The ZnO thin film has the largest crystallization orientation for the (0 0 2) peak and the smallest FWHM value of 0.56° at a substrate temperature of 200 °C. The surface morphology shows a relatively dense surface structure at 200 °C compared to the other substrate temperatures. The surface roughness shows the smallest of 1.6 nm at a substrate temperature of 200 °C. The piezoelectric constant of the ZnO thin film measured using the pneumatic loading method (PLM) has a maximum value of 11.9 pC/N at a substrate temperature of 200 °C. The transmittance of the ZnO thin film measured using spectrophotometry with various substrate temperatures ranged from 75 to 93% in the visible light region. By fitting the refractive index from the transmittance to the Sellmeir dispersion relation, we can predict the refractive index of the ZnO thin film according to the wavelength. In the visible light range, the refraction index of the ZnO thin film deposited at a substrate temperature of 200 °C is the range of 1.88-2.08.     

Effects of hydrogen etching process on the structural and optical properties of nano-crystalline diamond films

In this work, hydrogen etching method is applied to improve the quality of nano-crystalline diamond (NCD) films grown from hot-filament assisted chemical vapor deposition (HFCVD) system. From the characteristics of the structure and optical property, the grain size and surface roughness decrease while the optical transmission increase obviously under certain deposition parameters (gas pressure and substrate temperature) and longer etching time. Soft X-ray transmission measurements by synchrotron radiation are also carried out on the NCD films. The result shows that the X-ray transmission has an obvious improvement when the NCD film is fabricated from the hydrogen etching method. And the transmittance reaches 53.3% at X-ray photon energy of 258 eV, which has met the requirement for X-ray mask materials.