The anodization of ZK60 magnesium alloy in alkaline solution containing silicate and the corrosion properties of the anodized films

The anodization of ZK60 magnesium alloy in an alkaline electrolyte of 100 g/l NaOH + 20 g/l Na₂B₄O₇·10H₂O + 50 g/l C₆H₅Na₃O₇·2H₂O + 60g/l Na₂SiO₃·9H₂O was studied in this paper. The corrosion resistance of the anodic films was studied by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization techniques and the microstructure and composition of films were examined by SEM and XRD. The influence of anodizing time was studied and the results show that the anodizing time of 60 min is suitable for acquiring films with good corrosion resistance. The influence of current density on the corrosion resistance of anodizing films was also studied and the results show that the film anodized at 20 mA/cm² has the optimum corrosion resistance. The film formed by anodizing in the alkaline solution with optimized parameters show superior corrosion resistance than that formed by the traditional HAE process. The XRD pattern shows that the components of the anodized film consist of MgO and Mg₂SiO₄.     

Flame structure studies of rich ethylene-oxygen-argon mixtures doped with CO2, or with NH3, or with H2O

Structures of several premixed ethylene-oxygen-argon rich flat flames burning at 50 mbar have been established by using molecular beam mass spectrometry in order to investigate the effect of CO₂, or NH₃, or H₂O addition on species concentration profiles. The aim of this study is to examine the eventual changes of profiles of detected hydrocarbon intermediates which could be considered as soot precursors (C₂H₂, C₄H₂, C₅H₄, C₅H₆, C₆H₂, C₆H₄, C₆H₆, C₇H₈, C₆H₆O, C₈H₆, C₈H₈, C₉H₈ and C₁₀H₈). The comparative study has been achieved on four flames with an equivalence ratio (f) of 2.50: one without any additive (F2.50), one with 15% of CO₂ replacing the same quantity of argon (F2.50C), one with 3.3% of NH₃ in partial replacement of argon (F2.50N) and one with 13% of H₂O in replacement of the same quantity of argon (F2.50H). The four flat flames have similar final flame temperatures (1800 K).CO₂, or NH₃, or H₂O addition to the fresh gas inlet causes a shift downstream of the flame front and thus flame inhibition. Endothermic processes CO₂ + H = CO + OH and H₂O + H = H₂ + OH are responsible of the reduction of the hydrocarbon intermediates in the CO₂ and H₂O added flames through the supplementary formation of hydroxyl radicals. It has been demonstrated that such processes begin to play at the end of the flame front and becomes more efficient in the burnt gases region.The replacement of some Ar by NH₃ is responsible only for a slight decrease of the maximum mole fraction of C₂H₂, but NH₃ becomes much more efficient for C₄H₂ and C₅ to C₁₀ species. Moreover, the efficiency of NH₃ as a reducing agent of C₅ to C₁₀ intermediates is larger than that of CO₂ and H₂O for equal quantities added.     

Properties of NiO thin films deposited by chemical spray pyrolysis using different precursor solutions

NiO thin films have been deposited by chemical spray pyrolysis using a perfume atomizer to grow the aerosol. The influence of the precursor, nickel chloride hexahydrate (NiCl₂·6H₂O), nickel nitrate hexahydrate (Ni(NO₃)₂·6H₂O), nickel hydroxide hexahydrate (Ni(OH)₂·6H₂O), nickel sulfate tetrahydrate (NiSO₄·4H₂O), on the thin films properties has been studied. In the experimental conditions used (substrate temperature 350 °C, precursor concentration 0.2-0.3 M, etc.), pure NiO thin films crystallized in the cubic phase can be achieved only with NiCl₂ and Ni(NO₃)₂ precursors. These films have been post-annealed at 425 °C for 3 h either in room atmosphere or under vacuum. If all the films are p-type, it is shown that the NiO films conductivity and optical transmittance depend on annealing process. The properties of the NiO thin films annealed under room atmosphere are not significantly modified, which is attributed to the fact that the temperature and the environment of this annealing is not very different from the experimental conditions during spray deposition. The annealing under vacuum is more efficient. This annealing being proceeded in a vacuum no better than 10⁻² Pa, it is supposed that the modifications of the NiO thin film properties, mainly the conductivity and optical transmission, are related to some interaction between residual oxygen and the films.     

Effect of electrolyte temperature on the formation of self-organized anodic niobium oxide microcones in hot phosphate-glycerol electrolyte

Nanoporous niobium oxide films with microcone-type surface morphology were formed by anodizing at 10 V in glycerol electrolyte containing 0.6 mol dm⁻³ K₂HPO₄ and 0.2 mol dm⁻³ K₃PO₄ in a temperature range of 428-453 K. The microcones appeared after prolonged anodizing, but the required time was largely reduced by increasing electrolyte temperature. The anodic oxide was initially amorphous at all temperatures, but crystalline oxide nucleated during anodizing. The anodic oxide microcones, which were crystalline, appeared on surface as a consequence of preferential chemical dissolution of initially formed amorphous oxide. The chemical dissolution of an initially formed amorphous layer was accelerated by increasing the electrolyte temperature, with negligible influence of the temperature on the morphology of microcones up to 448 K.     

Gas sensing properties of nanostructured MoO3 thin films prepared by spray pyrolysis

Thin films of molybdenum trioxide (MoO₃) were deposited on common glass using the chemical spray pyrolysis technique. A (NH₄)₆Mo₇O₂₄4H₂0 solution 0.1 M was used as the precursor one. The influence of substrate temperature on the crystallographic structure, surface morphology and electrical behavior of MoO₃ thin films was studied. MoO₃ can exist in two crystalline forms, the thermodynamically stable orthorhombic α-MoO₃ and the metastable monoclinic β-MoO₃ phase. XRD-spectra showed a growth of α-MoO₃ phase percentage as substrate temperature increases from 420 K up to 670 K. Films deposited in the 500–600 K range have a clearly porous surface structure of nanometer order as can be seen in SEM images. Changes up to six magnitude orders were observed in MoO₃ thin films electrical resistance when films temperature varied from 100 K up to 500 K. The sensing property of these MoO₃ films was also studied. The sensitivity was investigated in the temperature range 160 and 360 K for H₂O and CO gases, respectively. Both of them are of reducing nature. In all studied cases sensitivity decreases slowly as film temperature is raised. At room temperature the sensitivity changes from 12 up to 75% depending on substrate temperature. The sensitivity for CO gas was found to be lower than that of H₂O.     

Effect of structure on the photocatalytic activity of Pt-doped TiO2 nanotubes

Highly ordered TiO₂ nanotubes with different tube length were fabricated by anodization using C₂H₂O₄·2H₂O containing 0.5 wt.% NH₄F (electrolyte A) and anhydrous dimethyl sulfoxide containing 1% HF (electrolyte B), respectively. Then cathodic reduction method was used to dope Pt in TiO₂ nanotubes in chloroplatinic acid. The results indicated that cathodic reduction could efficiently platinize TiO₂ nanotubes. Pt-doped TiO₂ nanotubes with the longer length had the higher photocatalytic activity for degrading methyl orange under UV and visible irradiation. The longer tube length has a positive effect on the photocatalytic activity of Pt-doped TiO₂ nanotubes. Besides, as the content of anatase further decreases, the photocatalytic activity drops gradually due to the reduction reaction in the surface area.     

Formation mechanism of Si(1 0 0) surface morphology in alkaline fluoride solutions

Formation mechanism of Si(1 0 0) surface morphology in alkaline fluoride solutions was investigated both theoretically and experimentally. By analysis of Raman spectra of silicon wafer surfaces and three kinds of etching solutions (NaOH, NaOH/NH₄F, and NaOH/NH₄F/Na₂CO₃) with and without addition of Na₂SiO₃·9H₂O, no Si-F bond is formed, F⁻ and CO₃²⁻ ions accelerate the condensation of Si-OH groups. Based on experimental results, it is proposed that bare silicon and silicon oxide coexist at the wafer surface during etching process and silicon oxide of different structure, size, and site at the surface manufacture different surface morphology in alkaline fluoride solution.     

Properties of highly oriented spray-deposited fluorine-doped tin oxide thin films on glass substrates of different thickness

Transparent conducting thin films of fluorine-doped tin oxide (FTO) have been deposited onto the preheated glass substrates of different thickness by spray pyrolysis process using SnCl₄·5H₂O and NH₄F precursors. Substrate thickness is varied from 1 to 6 mm. The films are grown using mixed solvent with propane-2-ol as organic solvent and distilled water at optimized substrate temperature of 475 °C. Films of thickness up to 1525 nm are grown by a fine spray of the source solution using compressed air as a carrier gas. The films have been characterized by the techniques such as X-ray diffraction, optical absorption, van der Pauw technique, and Hall effect. The as-deposited films are preferentially oriented along the (2 0 0) plane and are of polycrystalline SnO₂ with a tetragonal crystal structure having the texture coefficient of 6.19 for the films deposited on 4 mm thick substrate. The lattice parameter values remain unchanged with the substrate thickness. The grain size varies between 38 and 48 nm. The films exhibit moderate optical transmission up to 70% at 550 nm. The figure of merit (φ) varies from 1.36×10⁻⁴ to 1.93×10⁻³ Ω⁻¹. The films are heavily doped, therefore degenerate and exhibit n-type electrical conductivity. The lowest sheet resistance (R_s) of 7.5 Ω is obtained for a typical sample deposited on 4 mm thick substrate. The resistivity (ρ) and carrier concentration (n_D) vary over 8.38×10⁻⁴ to 2.95×10⁻³ Ω cm and 4.03×10²⁰ to 2.69×10²¹ cm⁻³, respectively.     

Effect of surface preparation on the properties of Au/p-Cd1−xZnxTe

The effect of bromine methanol (BM) etching and NH₄F/H₂O₂ passivation on the Schottky barrier height between Au contact and semi-insulated (SI) p-Cd_1−xZn_xTe (x ≈ 0.09-0.18) was studied through current-voltage (I-V) and capacitance-voltage (C-V) measurements. Near-infrared (NIR) spectroscopy technique was utilized to determine the Zn concentration. X-ray photoelectron spectroscopy (XPS) for surface composition analysis showed that BM etched sample surface left a Te⁰-rich layer, however, which was oxidized to TeO₂ and the surface [Te]/([Cd] + [Zn]) ratio restored near-stoichiometry after NH₄F/H₂O₂ passivation. According to I-V measurement, barrier height was 0.80 ± 0.02-0.85 ± 0.02 eV for Au/p-Cd_1−xZn_xTe with BM etching, however, it increased to 0.89 ± 0.02-0.93 ± 0.02 eV with NH₄F/H₂O₂ passivation. Correspondingly, it was about 1.34 ± 0.02-1.43 ± 0.02 eV and 1.41 ± 0.02-1.51 ± 0.02 eV by C-V method.     

Adsorption and reaction of hydrogen sulfide on thin-film cerium oxide

The adsorption and reaction of hydrogen sulfide, H₂S, have been studied on cerium oxide thin films that were vapor deposited on Ru(0 0 0 1). The behavior of the H₂S was examined as a function of Ce oxidation state. H₂S weakly chemisorbs on fully oxidized CeO₂ desorbing near 155 K. Hydrogen from the H₂S reacts with the surface O to desorb as water between 200 K and 450 K. When ca. 20% of the Ce⁴⁺ is reduced to Ce³⁺ more H₂S dissociates to -OH and -SH and water is produced near 580 K. When the ceria is ca. 70% reduced, water formation is suppressed and H₂ desorbs near 580 K. S 2p photoelectron spectroscopy indicates the decomposition of H₂S into -SH and then -S as the sample is annealed from 100 K to 600 K. O 1s photoemission indicated the presence of H₂O and -OH.     

Novel fabrication of net-like and flake-like Fe doped TiO2 thin films

New morphologies of net-like and flake-like TiO₂ thin films with different concentrations of Fe dopant were successfully fabricated by micro-arc oxidation (MAO) process of Ti plates and a subsequent chemical treatment of the as-prepared MAO-TiO₂ thin films. It was found that Fe ions can be easily introduced into the MAO-TiO₂ samples with the increase concentration of K₄(FeCN)₆·3H₂O precursor, and the amount of Fe determined the morphologies of TiO₂ thin films after chemical treatment; net-like morphology was observed with low Fe dopant, while it transformed to a flake-like one when Fe exceeds 1.7 at.%. UV-vis spectroscopy test showed that the absorption edge of the Fe ions doped TiO₂ thin films with new morphologies has an obvious red shift.     

Application of ultrasonic wave to clean the surface of the TiO2 nanotubes prepared by the electrochemical anodization

In this study, the TiO₂ nanotubes were fabricated by electrochemical anodization in a NH₄F/Na₂SO₄/PEG400/H₂O electrolyte system. Ultrasonic wave (80 W, 40 kHz) was used to clean the surface of TiO₂ nanotube arrays in the medium of water after the completion of the anodization. Surface morphology (FESEM) and X-ray diffraction spectrum of the nanotubes treated by sonication at 0 min, 9 min, 40 min and 60 min were compared. The experimental results showed that the precipitate on the surface of the nanotube arrays could be removed by the ultrasonic wave. The treating time had an influence on the precipitate removal and 9 min (corresponding to 12 Wh) is the suitable time for surface cleaning of the TiO₂ nanotubes on this experimental condition.     

Magnetic properties of CoFeP films prepared by electroless deposition

Structure and magnetization of CoFeP films prepared by the electroless deposition were systematically investigated by varying the bath composition and deposition parameters to optimize soft magnetic properties. The cobalt content in the CoFeP films varies from 40.4 to 94.9 wt% by controlling the bath composition. Increase of the metallic ratio FeSO₄·7H₂O/(CoSO₄·7H₂O+FeSO₄·7H₂O) affects the films’ microstructure, which switches from amorphous to crystalline structure. The magnetic properties of CoFeP films reveal that the coercivity (H_c) values range from 80 up to 185 A/m and the saturation magnetization (M_s) from 82 to 580 eum/g depending on the bath composition, deposition parameters and heat-treatment conditions. Increase of M_s and remanent magnetization (M_r) as well as decrease of H_c are observed for the CoFeP films with bath pH, temperature and the metallic molar ratio increasing. It is also found that the H_c is enhanced with the increase of NaH₂PO₂·H₂O concentration. CoFeP films showing good soft magnetic properties with coercivities less than 140 A/m and M_s close to 600 emu/g can be obtained in high pH bath and thereafter heat treatment. The deposit is found to be suitable as soft magnetic materials for core materials.     

Enhancement in hydrophobicity of silica films using metal acetylacetonate and heat treatment

Water is one of the most affecting chemicals that can cause damage to the solid surface. To protect the surface due to the action of water, the surface should be made hydrophobic. In the present study, the improvement in hydrophobicity of silica films using metal acetylacetonate (M-acac) by employing heat treatment to methyltrimethoxy silane (MTMS) based silica coatings is reported as a novel attempt. Instead of following the established trends of the surface derivatization or co-precursor method, iron acetylacetonate Fe(acac)₃, copper acetylacetonate Cu(acac)₂ and heat treatment were used to incorporate hydrophobicity with silica coatings. As M-acac is readily soluble in organic solvents, Fe(acac)₃ and Cu(acac)₂ were dissolved in methanol (MeOH) and their concentration was varied from 0 to 0.025 M. The coating solution was prepared by optimizing molar ratio of MTMS:MeOH:basic H₂O to 1:7.15:6.34, respectively. Gelation time (t_g) for Cu(acac)₂ containing silica sol and that containing Fe(acac)₃ were noted to be 30 and 55 min, respectively. The substrates were taken out after gelation and heat treated at 150 °C for 2 h. The heat treated films showed a dramatic increase in the static water contact angle from 82° to as high as 142°.     

Study of structural and electronic environments of hydrogenated amorphous silicon carbonitride (a-SiCN:H) films deposited by hot wire chemical vapor deposition

Hydrogenated amorphous silicon carbon nitride (a-SiCN:H) thin films were deposited by hot wire chemical vapor deposition (HWCVD) using SiH₄, CH₄, NH₃ and H₂ as precursors. The effects of the H₂ dilution on structural and chemical bonding of a-SiCN:H has been investigated by Raman and X-ray photoelectron spectroscopy (XPS). Increasing the H₂ flow rate in the precursor gas more carbon is introduced into the a-SiCN:H network resulting in decrease of silicon content in the film from 41 at.% to 28.8 at.% and sp² carbon cluster increases when H₂ flow rate is increased from 0 to 20 sccm.     

Effect of ambient hydrogen sulfide on the physical properties of vacuum evaporated thin films of zinc sulfide

Evaporated thin films of zinc sulfide (ZnS) have been deposited in a low ambient atmosphere of hydrogen sulfide (H₂S ∼10⁻⁴ Torr). The H₂S atmosphere was obtained by a controlled thermal decomposition of thiourea [CS(NH₂)₂] inside the vacuum chamber. It has been observed that at elevated substrates temperature of about 200 °C helps eject any sulfur atoms deposited due to thermal decomposition of ZnS during evaporation. The zinc ions promptly recombine with H₂S to give better stoichiometry of the deposited films. Optical spectroscopy, X-ray diffraction patterns and scanning electron micrographs depict the better crystallites and uniformity of films deposited by this technique. These deposited films were found to be more adherent to the substrates and are pinhole free, which is a very vital factor in device fabrication.     

Adsorption of water and ammonia on TiO2-anatase cluster models

Density functional theory (DFT) calculations performed at B3LYP/6-31G^∗∗ level are employed to study water and ammonia adsorption and dissociation on (1 0 1) and (0 0 1) TiO₂ anatase surfaces both represented by totally fixed and partially relaxed Ti₂O₉H₁₀ cluster models. PM3 semiempirical calculations were also conducted both on Ti₂O₉H₁₀ and Ti₉O₃₃H₃₀ clusters in order to assess the effect of cluster size. Following dissociation, the adsorption of H₂O and NH₃ by H-bonding on previously H₂O and NH₃ dissociated systems, respectively are also considered. It is found that the adsorption energies and geometries of water and ammonia molecules on (1 0 1) and (0 0 1) anatase cluster models depend on surface relaxation. The vibration frequency values are also calculated for the optimized geometries. The adsorption energies and vibration frequency values computed are compared with the available theoretical and experimental literature.     

The tuning of quantum magnetization for organic/inorganic hybrid materials composed of Mn12-acetate and azobenzene casted into PMMA films on PVA films

In order to examine the effects of polymer matrix substituting crystalline solvents and photoisomerization of azobenzene in photo-modulation of AC susceptibility discovered recently, we have compared various quantum magnetic properties of new organic/inorganic hybrid materials composed of Mn₁₂-acetate (a typical single-molecule magnet, [Mn₁₂(CH₃COO)₁₆(H₂O)₄O₁₂]·2CH₃COOH·4H₂O) containing or not containing azobenzene casted into polymethylmethacrylate (PMMA) films on Polyvinylalchol (PVA) films. The M-H hysteresis loops below blocking temperature for both materials exhibited distinct differences of the dM/dH vs. H plots, which suggested azobenzene as well as crystalline solvents resulted in tuning of magnetic properties. Moreover, the AC susceptibility at 0.1-1000 Hz frequencies provided activation energy U_eff=87 K from Arrhenius law for both materials, albeit Cole-Cole plots indicated perturbation of quantum magnetization for both hybrid materials in polymer matrix.     

Characterization of native and anodic oxide films formed on commercial pure titanium using electrochemical properties and morphology techniques

Potentiostatically anodized oxide films on the surface of commercial pure titanium (cp-Ti) formed in sulfuric (0.5 M H₂SO₄) and in phosphoric (1.4 M H₃PO₄) acid solutions under variables anodizing voltages were investigated and compared with the native oxide film. Potentiodynamic polarization and electrochemical impedance spectroscopy, EIS, were used to predicate the different in corrosion behavior of the oxide film samples. Scanning electron microscope, SEM, and electron diffraction X-ray analysis, EDX, were used to investigate the difference in the morphology between different types of oxide films. The electrochemical characteristics were examined in phosphate saline buffer solution, PSB (pH 7.4) at 25 °C. Results have been shown that the nature of the native oxide film is thin and amorphous, while the process of anodization of Ti in both acid solutions plays an important role in changing the properties of passive oxide films. Significant increase in the corrosion resistance of the anodized surface film was recorded after 3 h of electrode immersion in PSB. On the other side, the coverage (θ) of film formed on cp-Ti was differed by changing the anodized acid solution. Impedance results showed that both the native film and anodized film formed on cp-Ti consist of two layers. The resistance of the anodized film has reached to the highest value by anodization of cp-Ti in H₃PO₄ and the inner layer in the anodized film formed in both acid solutions is also porous.     

The n-butyl amine TPD measurement of Brönsted acidity for solid catalysts by simultaneous TG/DTG-DTA

The method for Brönsted acidity measurement based on TPD of alkyl amines desorption by gas-chromatography or thermogravimetry was adapted for simultaneous TG/DTG-DTA analysis. The acidity measurements were focused on the 12-tungstophosphoric acid (H₃PW₁₂O₄₀) and its salts, especially with Cesium since these posses the highest Brönsted acidity and they are among the most interesting catalysts. The n-butyl amine (NBA) desorption takes place in three steps for Cs_xH_3−xPW₁₂O₄₀, x = 0-2, and four steps for the Cs_2.5H_0.5PW₁₂O₄₀. The steps of desorption correspond to the release of NBA molecules in stages, as NBA or butene molecules resulted from the Hofmann elimination reaction and NH₃ + H₂O formed by decomposition of ammonium salt. The quantities of desorption products, C₄H₈ and NH₃ + H₂O, corresponding to the stages with the maximum desorption rates at 400-420 °C, respectively 560-600 °C, are in the stoichiometric ratio with the Brönsted acidity.