Interface-directed sol-gel: direct fabrication of the covalently attached ultraflat inorganic oxide pattern on functionalized plastics

For plastic electronics and optics, the fabrication of smooth, transparent and stable crack-free inorganic oxide films (and patterning) on flexible polymeric substrates with strong bonding strength and controllable thickness from nanometers to micrometers is a key but still remains a challenge. Among versatile inorganic oxides, silica oxide film as SiO _x is especially important because this semiconductor material could provide crucial properties in devices or serve as a base layer for further multilayer construction. In this paper, we describe a new interface-directed sol-gel method to fabricate flexible high quality silicon oxide film onto commodity plastics. The resulting crack-free silica film has strong covalent bonding with polymer substrates, homogeneous morphology with ultralow roughness, highly optical transparency, tunable thickness from nm to μm, and easy patterning ability. Such fabrication strategy relies on a novel photocatalytic oxidation reaction by photosensitive ammonium persulfate (APS), which is able to fabricate highly reactive hydroxyl monolayer surface on inert polymeric substrates. This kind of hydroxylated surface could serve as nucleation and growth sites to initiate surface sol-gel process. As a result, well-defined SiO _x film deposition (gelation) occurs, and patterned hydroxylation regions could be easily utilized to induce the formation of patterned oxide film arrays. Our strategy also excludes the requirements of clean room and vacuum devices so as to fulfill low-cost and fast fabrication demands. Two application examples from such high quality SiO _x layer onto plastics are given but should not be limited within these. One is that oxygen permeation rate of SiO _x deposited polymer film decreases 25 times than pristine polymer substrate, which is good for the potential packaging materials. The other one is that silanization monolayer, for example, 3-aminopropyltriethoxysilane (APTES), could be successfully constructed onto silica layer through classical silanization reaction, which is applicable for many potential purposes, for instance, proteins could be accordingly immobilized onto plastic support with effective signal-to-background ratio. Moreover, we further demonstrate that this interface-directed sol-gel strategy is a general method which could be successfully extended to other high quality oxide film fabrication, e.g., TiO₂.     

Large‐Area Plasmonic Substrate of Silver‐Coated Iron Oxide Nanorod Arrays for Plasmon‐Enhanced Spectroscopy

One‐dimensional iron oxide materials fabricated on conducting glass substrates and their unique properties make these nanostructures promising candidates for a wide range of applications. Herein, vertically oriented α‐Fe₂O₃ nanorod arrays synthesized under hydrothermal conditions over a large area are described, as an active platform for surface‐enhanced resonance Raman scattering (SERRS) and surface‐enhanced fluorescence (SEF). From scanning electron microscopy images the formation of a homogeneous distribution of vertically oriented rods in a large area is confirmed. For activating the localized surface plasmon resonances, which are responsible for SERRS and SEF, a 6 nm layer of Ag is deposited onto the α‐Fe₂O₃ nanorod arrays by physical vapor deposition to form Ag islands.     

Synthesis and Electrosurface Properties of One- and Two-Component Nanostructures

One- and two-component (titanium and aluminum oxides) oxide nanostructures are synthesized by molecular layer-by-layer deposition from the gas phase onto silicon oxide and boehmite substrates. Two-component nanostructures are prepared by the consecutive deposition of nanolayers of aluminum and titanium oxides onto a dispersed silica substrate. Electrosurface properties of thus-prepared samples are studied and compared. It is shown that the positions of the isoelectric point and the point of zero charge of a 5TiO₂/5Al₂O₃/SiO₂ composite sample are governed by an outer titanium oxide nanolayer and are similar to those of bulk titanium oxide and a nanostructured film of titanium oxide deposited onto an aluminum hydroxide substrate.__________Translated from Kolloidnyi Zhurnal, Vol. 67, No. 4, 2005, pp. 469–474.Original Russian Text Copyright © 2005 by Bogdanova, Ermakova, Chikhachev, Sidorova, Aleksandrov, Savina.     

Formation of cadmium sulfide (CdS) nanofilm on a Cd(OH)2/SiO2 precursor layer

Dense thin nanostructured films of cadmium sulfide CdS obtained by chemical deposition from aqueous solutions are strongly bound to a substrate due to the formation of cadmium hydroxide Cd(OH)₂ in the system. By X-ray reflectometry and grazing incidence diffraction it is found that at the beginning of the deposition a dense Cd(OH)₂/SiO₂ layer is produced on the surface of a silicon or glass substrate. This layer is formed through the atomic-layer adsorption of crystalline 1–3 nm thick Cd(OH)₂ film by the oxygencontaining substrate surface. During sulfidation of this cadmium-containing substrate layer, a surface nucleation layer of CdS/Cd(OH)₂/SiO₂ forms, which provides the growth, denseness, and strong adhesion to the substrate of nanostructured CdS film with a disordered structure. According to the obtained experimental data, a “hydroxide scheme” of film deposition is confirmed and refined, and the stages of CdS nanofilm formation are determined.     

A study on electrodeposited of ZnO/ZnS heterostructures

ZnO/ZnS heterostructures were synthesized by a two steps electrochemical deposition method. Firstly, ZnS layer was deposited from an aqueous solution containing Na₂S₂O₃ and ZnSO₄ onto indium-doped tin oxide (ITO) coating glass substrate at two deposition potentials. Then, ZnO nanostructures were deposited from an aqueous solution of Zn(NO₃) onto ZnS surface. The as-obtained samples were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), Raman and UV-visible analysis. The results indicate that the electrodeposition of ZnS layer at ?0.9 V give the best proprieties of ZnO/ZnS heterostructures. Homogeneous and uniform surface of ZnO/ZnS heterostructure was confirmed by AFM images. The XRD patterns indicates a high crystallinity of ZnO/ZnS. A high transmittance of 65% was also noted from UV-Visible spectra and band gap energy as large as 3.6?eV was found.     

Kinetics of Silicon Nitride Formation on SiO2‐Derived Rice Husk Ash Using the Chemical Vapor Infiltration Method

Since silicon nitride coatings on silicon dioxide are attractive for the semiconductor and electronics industries, cognizance of their formation kinetics is crucial for optimization of production parameters. In this contribution, the deposition kinetics (rate constant and activation energy) of Si₃N₄ by the hybrid system chemical vapor infiltration route (HYSY‐CVI), starting from N₂:NH₃ and SiF₄ (produced by the decomposition of Na₂SiF₆) has been studied. The deposition rate equation for Si₃N₄ was established from several possible gas‐phase or surface reaction steps involved in the growth of Si₃N₄ coatings onto silica‐derived rice husk ash (RHA). Based on a judicious analysis of four different models, it was found that Freundlich's adsorption model satisfactorily represents the rate of Si₃N₄ deposition process onto RHA.     

Spectrophotometric determination of silicon in thorium oxide

A method is described for the spcctrophotometric determination of microgram quantities of silicon in the presence of thorium. Thorium oxide is dissolved by heating it at 70 to 8o°C in 4M HNO₃ that contains 2 drops of HF. Under these conditions, no silicon is lost through volatilization. The silicon is estimated as the blue ailicomolybdate complex. Under the conditions selected for development of color, a precipitate of thorium molybdate is obtained ; the thorium molybdate is, however, dissolved without affecting the color of the complex by the addition of tartrate and adjusting the pH of the solution to 3.0. The lower limit of detection is about 5 p.p.m. of silicon.     

Unusual catalytic properties of nanostructured nickel films obtained by laser electrodispersion

Nanostructured nickel films deposited by laser electrodispersion onto a silicon (semiconducting) or thermally oxidized silicon (insulating) substrate show a remarkably high catalytic activity (of the order of 10³–10⁴ (mol product) (mol Ni)^?1 h^?1) in the isomerization of chlorinated hydrocarbons and olefin hydrogenation. The special properties of the laser-deposited films are likely due to the small size (2.5 nm), developed surface, and amorphism of the nickel particles, as well as to highly active, charged particles appearing on the insulating substrate. The latter result from thermal fluctuations of electrons between closely spaced particles. In a film deposited on silicon covered with a natural oxide layer, a significant role is also played by charge redistribution between the substrate and metal particles.     

Surface’s weights of electrodeposited thorium samples determined by alpha spectrometry

The aim of this work was the preparation of samples with thorium on the steel discs by electrodeposition for determination of natural thorium by alpha spectrometry and for following analysis by secondary ion mass spectrometry. The samples with ²³²Th isotope were prepared by electrodeposition from solution Th(NO₃)₄·12H₂O on steel discs in electrodeposition cell with use of solutions of Na₂SO₄, NaHSO₄, KOH and ammonia oxalate by electric current of 0.75 A. Weights of electrodeposited thorium samples were calculated on the basis of intensities of peak of ²³²Th isotope in the alpha spectra. The layer thickness was calculated for following analysis of surface layers of thorium using secondary ion mass spectrometry.     

Photo-Induced Hydrophilicity of TiO<Subscript>2</Subscript> Films Deposited on Stainless Steel via Sol-Gel Technique

The photo-induced hydrophilicity of TiO₂ films deposited on stainless steel substrates and silicon wafers using two different sol-gel routes has been investigated. The results indicate that crystalline titanium oxide films with excellent hydrophilic properties can be obtained on silicon wafer with both routes. XPS and XRD data reveal that films deposited on stainless steel exhibit crystallization features similar to those of films deposited on silicon wafers, and only differ by their oxidation degree owing to a TiO₂ reduction process associated to a diffusion of iron ions during deposition of the acidic sol and/or high temperature post-treatment. Consequently, hydrophilic properties of films deposited on stainless steel are inhibited. The deposition of a SiO_x barrier layer at the film/substrate interface allows preventing such a detrimental substrate influence. A low temperature deposition route of the TiO₂ film associated to the presence of a barrier layer yields best results in preventing iron contamination of the films.     

Development of cerium‐based conversion coatings on 2024‐T3 Al alloy after rare‐earth desmutting

The deposition of Ce‐based conversion coatings onto 2024‐T3 Al alloy sheet was studied using Rutherford backscattering spectroscopy, scanning electron microscopy, Auger electron spectroscopy, x‐ray photoelectron spectroscopy and atomic force microscopy. The Al sheet was pretreated with an alkaline clean followed by treatment in a Ce(IV) and H₂SO₄‐based desmutter. The Ce(IV)‐based conversion coating solution contained 0.1 M CeCl₃·7H₂O and 3% H₂O₂ and was acidified to pH 1.9 with HCl. Upon immersion, there was an induction period that included activation followed by aluminium oxide growth over the matrix and cerium oxide deposition onto cathodic intermetallic particles and along rolling marks on the surface. After the induction period cerium oxide deposited generally across the whole surface and thickened. The strongest anodic sites initially were adjacent to the intermetallic cathodes and resulted in aluminium dissolution but also oxide thickening. Copyright © 2004 John Wiley & Sons, Ltd.     

Ag活化的p型硅(111)表面化学镀Ag膜表面形貌研究

A method of electroless silver deposition on silver activated p-type silicon（111） wafer was proposed. The silver seed layer was deposited firstly on the wafer in the solution of 0.005 mol/L AgNO3 ＋0.06 mol/L HE Then the silver film was electrolessly deposited on the seed layer in the electroless bath of AgNO3＋NH3＋acetic acid＋NH2NH2 （pH 10.2）. The morphology of the seed layer and the silver films prepared under the condition of the different bath composition was compared by atomic force microscopy. The reflectance of the silver films with different thickness was characterized by Fourier transform infrared spectrometry. The experimental results indicate that the seed layer possesses excellent catalytic activity toward electroless silver deposition and rotating of the silicon wafer during the electroless silver deposition could lead to formation of the smoother silver film.     

Study on Microcontamination of Silver onto p-Type Crystalline Silicon(111) from an Aqueous Solution Using Cyclic Voltammetry

The microcontamination process of silver onto p-type crystalline silicon(111) in a solution of 0.01 mol L⁻¹ AgNO₃ at room temperature was investigated by studying the anodic stripping behavior using cyclic voltammetry (CV). This paper shows that the rate of Ag deposition is rapid and that deposition is almost fully accomplished within 1 s. Calculating the surface coverage (Γ) for 1 s, 10 min, or 1 h immersion based on the CV curves demonstrated that the silver layer was only a monolayer.     

Liquid-phase Reductive Deposition as Novel Preparation Method for Highly Dispersive Nickel Catalysts

We have been developing the selective deposition method onto TiO₂ nanoparticles, named as the liquid-phase selective-deposition method, where TiO₂ plays a role of formation center of Ni nanoparticles as well as protection from the aggregative growth of the particles. The concept of this method is to well disperse and stabilize Ni nanoparticles on TiO₂ surface by specific adsorption of Ni precursory complexes and then heterogeneous nucleation on the adsorption sites. The particle size was decreased with increasing the amount of Zn added, thus the catalytically active Ni surface area was increased. The selective deposition onto TiO₂ surface and addition of Zn to the nanoparticle promoted the catalytic activity of Ni–Zn nanoparticle, e.g. the catalytic activity of Ni–Zn/TiO₂ was ca. 10 times higher than that of the unsupported Ni nanoparticles. Ni in the nanocomposite was assigned as metallic, although their surface was oxidized under the atmospheric condition, but Zn and B were deposited as their oxide.     

Model Studies on the Ozone-Mediated Synthesis of Cobalt Oxide Nanoparticles from Dicobalt Octacarbonyl in Ionic Liquids

Low-temperature synthesis in ionic liquids (ILs) offers an efficient route for the preparation of metal oxide nanomaterials with tailor-made properties in a water-free environment. In this work, we investigated the role of 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide [C₄C₁Pyr][NTf₂] in the synthesis of cobalt oxide nanoparticles from the molecular precursor Co₂(CO)₈ with ozone. We performed a model study in ultra-clean, ultrahigh vacuum (UHV) conditions by infrared reflection absorption spectroscopy (IRAS) using Au(111) as a substrate. Exposure of the pure precursor to ozone at low temperatures results in the oxidation of the first layers, leading to the formation of a disordered Co_xO_y passivation layer. Similar protection to ozone is also achieved by deposition of an IL layer onto a precursor film prior to ozone exposure. With increasing temperature, the IL gets permeable for ozone and a cobalt oxide film forms at the IL/precursor interface. We show that the interaction with the IL mediates the oxidation and leads to a more densely packed Co_xO_y film compared to a direct oxidation of the precursor.     

Effect of the mechanochemical treatment of a V<Subscript>2</Subscript>O<Subscript>5</Subscript>/MoO<Subscript>3</Subscript> oxide mixture on its properties

The mechanochemical treatment of a V₂O₅/MoO₃ oxide mixture (V/Mo = 70/30 at %) was performed in planetary and vibratory mills under varying treatment times and media. The resulting samples were characterized using XRD analysis, micro-Raman spectroscopy, and XPS; their specific surface areas and catalytic activities in n-butane and benzene oxidation reactions were determined. It was found that the treatment of the oxide mixture in water resulted in chaotic degradation of the parent oxides, a decrease in crystallite sizes, and an increase in the specific surface area at a sufficiently uniform oxide distribution over the sample. The treatment in ethanol was accompanied by an anisotropic deformation of the V₂O₅ crystal by layer sliding in parallel to the vanadyl plane (010) and a chaotic degradation of MoO₃ crystals. This process was accompanied by the partial nonuniform supporting of vanadium oxide crystals onto the surface of molybdenum oxide to increase the V/Mo ratio on the sample surface. In this case, the particle size of oxides decreased and the specific surface areas of samples increased. It was found that the treatment of the oxide mixture in air (dry treatment) resulted in the most significant decrease in the sizes of V₂O₅ and MoO₃ crystals and a growth in the specific surface area. The amorphization of the parent oxides and the formation of MoV₂O₈ were observed as the treatment time was increased; in this case, an excess of amorphous vanadium oxide was supported onto the surface of this compound. It was found that, in all types of mechanochemical treatment, the binding energies of the core electrons of vanadium and molybdenum remained almost unchanged to indicate the constancy of the oxidation states of these elements. Mechanochemical treatment resulted in an increase in the activity of the samples in n-butane and benzene oxidation reactions and in an increase in the selectivity of maleic anhydride formation. In this case, an increase in the specific catalytic activity of the samples correlated with a decrease in the crystallite size of vanadium oxide, whereas selectivity correlated with an increase in the relative concentration of the V₂O₅ plane (010). In these reactions, samples after dry treatment exhibited a maximum activity, which can be related to the formation of MoV₂O₈.     

Palladium nanoparticles and nanowires deposited electrochemically: AFM and electrochemical characterization

Palladium nanoparticles and nanowires electrochemically deposited onto a carbon surface were studied using cyclic voltammetry, impedance spectroscopy and atomic force microscopy. The ex situ and in situ atomic force microscopy (AFM) topographic images showed that nanoparticles and nanowires of palladium were preferentially electrodeposited to surface defects on the highly oriented pyrolytic graphite surface and enabled the determination of the Pd nanostructure dimensions on the order of 50–150 nm. The palladium nanoparticles and nanowires electrochemically deposited onto a glassy carbon surface behave differently with respect to the pH of the electrolyte buffer solution. In acid or mild acid solutions under applied negative potential, hydrogen can be adsorbed/absorbed onto/into the palladium lattice. By controlling the applied negative potential, different quantities of hydrogen can be incorporated, and this process was followed, analysing the oxidation peak of hydrogen. It is also shown that the growth of the Pd oxide layer begins at negative potentials with the formation of a pre-monolayer oxide film, at a potential well before the hydrogen evolution region. At positive potentials, Pd(0) nanoparticles undergo oxidation, and the formation of a mixed oxide layer was observed, which can act as nucleation points for Pd metal growth, increasing the metal electrode surface coverage. Depending on thickness and composition, this oxide layer can be reversibly reduced. AFM images confirmed that the PdO and PdO₂ oxides formed on the surface may act as nucleation points for Pd metal growth, increasing the metal electrode surface coverage. Dedicated to Professor Dr. Algirdas Vaskelis on the occasion of his 70th birthday.     

XPS and ToF‐SIMS characterization of a Finemet surface: effect of cooling

The surface composition of amorphous Finemet, Fe₇₃Si_15.8B_7.2Cu₁Nb₃, was studied by X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). The as‐received sample in the original state and after Ar⁺ sputter‐cleaning was analyzed at room temperature as well as after cooling to ? 155 °C. In the cooled state, the surface oxide layer composed of oxides of the alloy constituents was found to become enriched with elemental iron and depleted of elemental silicon, boron, oxygen and carbon as compared to the state at room temperature. Interaction of residual water vapor and hydrogen with the complex oxide layer occurring at low temperatures is believed to be responsible for the enhanced formation of surface hydroxides of the alloy constituents. The processes resulting in the observed redistribution of the elements on the surface of Finemet at low temperatures are discussed. Copyright © 2006 John Wiley & Sons, Ltd.     

Electrochemical impedance spectroscopy as a probe for wet chemical silicon oxide characterization

The kinetics of the chemical growth of silicon oxide in H₂O₂-containing ammonia solutions and its break-up by dilute ammonia solutions was investigated using electrochemical techniques and more specifically electrochemical impedance spectroscopy. The recording of the open circuit potential (OCP), complemented by successive impedance diagrams, demonstrates clearly the build-up of a silicon oxide passivating layer when hydrophobic Si surfaces are immersed in NH₃+H₂O₂ solutions. The thickening of the chemical oxide coating mainly results in the decrease of the capacitance value together with the enhancement of the ohmic surface resistance. On the other hand, pure ammonia dilute solutions lead to the progressive destruction of this hydrophilic passivating surface oxide, which is revealed by the simultaneous decay of the real component of the impedance. Finally, we observed the break-up of the passive layer, characterized by a sudden drop of the OCP to a value quite identical to that obtained with a bare Si surface. This process resulted in a dramatic corrosion of the substrate surface. Electronic Publication     

Copper nanowire arrays surface wettability control using atomic layer deposition of TiO<Subscript>2</Subscript>

Template two step electrodeposition method and atomic layer deposition were used to synthesize copper nanowires of varied length (1.2 to 26.2 μm) and copper nanowires coated with titanium dioxide. As a result of the atomic layer deposition of TiO₂, coated nanowires demonstrated an up to 10-fold decrease in the wetting angle, compared with uncoated nanowires. It was found the dissipation rate is substantially higher for nanowires coated by the atomic layer deposition method (100 s) as compared with the uncoated copper nanowires (400 s), which assumes the positive properties of water propagation along the surface, necessary for improving the heat transfer. It was also found that the water contact angle for uncoated nanowires and those coated with TiO₂ by the atomic layer deposition (ALD) gradually increases as the samples are kept in air. A gradual increase in wettability was also observed for smooth silicon wafers coated by ALD of TiO₂, which were exposed to air. On the coated silicon substrates, the wetting angle gradually increased from 10° to approximately 56° in the course of four days. In addition, it was shown that copper nanowires coated with TiO₂ by the atomic layer deposition method have an excellent corrosion resistance, compared with uncoated nanowires, when brought in contact with air and water.