NH_x(x=1～3)在金属Ir表面吸附与解离的第一性原理研究

采用密度泛函理论,在slab模型下,研究了NH_x(x=1~3)在Ir(100)、Ir(111)和Ir(110)表面上的最稳定吸附位置、几何构型以及逐步脱氢分解过程,计算了相应的吸附能和活化能.计算结果表明,在Ir(100)、Ir(111)面上,NH_3是以C_3轴垂直吸附在顶位,在Ir(110)上,NH_3是以N-Ir键与表面成68.6°吸附在顶位,且吸附能依赖于表面的结构而不同,相比而言,NH_3更容易吸附在开放表面Ir(100)、Ir(110)面上,说明NH_3在这些表面的吸附具有结构敏感性.NH_(x(x=1~3))的分解,在Ir(100),NH_3的吸附与分解存在竞争,在Ir(110)面NH_3最容易分解,在Ir(111)面NH_3是分子性吸附,不能分解.NH_2、NH在三个表面均能够分解,在Ir(110)面活化能均较高.     

First-principles calculations of ammonia decomposition on Ni(110) surface

First-principles calculations based on density functional theory (DFT) have been performed to study the adsorption and decomposition of NH₃ on Ni(110). The adsorption sites, the adsorption energies, the transition states and the activation energies of the stepwise dehydrogenation of NH₃ and the associative desorption of N are determined, and the zero point energy correction is included, which makes it possible to compute the rate constants of the elementary steps in NH₃ decomposition. Combined DFT calculations and kinetic analysis at 350 K indicate that the associative desorption of N has a reaction rate lower than NH_x dehydrogenation and is therefore the rate determining step. The distinctly different rate constants over Ni(110), Ni(111) and Ni(211) imply that ammonia decomposition over Ni-based catalyst is a structure-sensitive reaction.     

Adsorption and dissociation of ammonia on Au(1 1 1) surface: A density functional theory study

Periodic density functional theory (DFT) calculations using plane waves had been performed to systematically investigate the stable adsorption amine and its dehydrogenated reaction on Au(1 1 1) surface. The equilibrium configuration including on top, bridge, and hollow (fcc and hcp) sites had been determined by relaxation of the system. The adsorption both NH₃ on top site and NH₂ on bridge site is favorable on Au(1 1 1) surface, while the adsorption of NH on hollow (fcc) site is preferred. The adsorbates are adsorbed on the gold surface with the interaction between p orbital of adsorbate and the d orbital of gold atoms. The interaction between adsorbate and gold slab is more evident on the first layer than on any others. Furthermore, the dissociation reaction of NH₃ on clean gold surface, as well as on the pre-covered oxygen atom and pre-covered hydroxyl group surface had been investigated. The results show that the dehydrogenated reaction energy barrier on the pre-covered oxygen gold surface is lower. The adsorbed O can promote the dehydrogenation of amine. Additionally, OH as the product of the NH₃ dissociation reaction participates in continuous dehydrogenation reaction, and the reaction energy barrier is the lowest (22.77 kJ/mol). The results indicated that OH_ads play a key role in the dehydrogenated reaction on Au(1 1 1) surface.     

Atomic and molecular adsorption on Pd(111)

The adsorption properties of a variety of atomic species (H, O, N, S, and C), molecular species (N₂, HCN, CO, NO, and NH₃) and molecular fragments (CN, NH₂, NH, CH₃, CH₂, CH, HNO, NOH, and OH) are calculated on the (111) facet of palladium using periodic self-consistent density functional theory (DFT–GGA) calculations at ¼ ML coverage. For each species, we determine the optimal binding geometry and corresponding binding energy. The vibrational frequencies of these adsorbed species are calculated and are found to be in good agreement with experimental values that have been reported in literature. From the binding energies, we calculate potential energy surfaces for the decomposition of NO, CO, N₂, NH₃, and CH₄ on Pd(111), showing that only the decomposition of NO is thermochemically preferred to its molecular desorption.     

DFT study on complete ethylene decomposition on flat and stepped Pd

We applied density functional theory (DFT) calculations to study ethylidyne (CCH₃) adsorption and decomposition to C and H over flat and stepped Pd surfaces. Our calculations show that ethylidyne is the most stable molecule among all the possible dehydrogenation or decomposition residues of ethylene. We discuss various possible reaction pathways for ethylidyne decomposition and point out that the most probable one is via ethynyl (CCH) species suggested also by experimental observations. Our calculations indicate that the presence of steps modify the potential energy surface by increasing the binding of most of the species, and also lowering the activation barrier for several reactions. Furthermore we show that the energetics related to dehydrogenation of ethylene and its derivatives manifest a Brønsted–Evans–Polanyi type of behavior.     

DFT study of NH3 dissociation on Si(1 1 1)-7 × 7. The role of intermolecular interactions

The adsorption of NH₃ molecule on the Si(1 1 1)-7 × 7 surface modelled with a cluster has been studied using density functional theory (DFT). The results indicate the existence of a precursor state for the non-dissociative chemisorption. The active site for the molecular chemisorption is the adatom; while the NH₃ molecule adsorbs on the Si restatom via this preadsorbed state, the adsorption on the Si adatom is produced practically without an energy barrier. The ammonia adsorption on the adatom induces an electron transfer from the dangling bond of this atom to the dangling bond of the adjacent Si restatom, hindering this site for the adsorption of a second NH₃ incoming molecule. However, this second molecule links strongly by means of two H-bonds. The dissociative chemisorption process was studied considering one and two ammonia molecules. For the dissociation of a lonely NH₃ molecule an energy barrier of ∼0.3 eV was calculated, yielding NH₂ on the adatom and H on the restatom. When two molecules are adsorbed, the NH₃-NH₃ interaction yields the weakening of a N-H bond of the ammonia molecule adsorbed closer the Si surface. As a consequence, the dissociation barrier practically disappears. Thus, the presence of a second NH₃ molecule at the adatom-restatom pair of the Si(1 1 1)-7 × 7 surface makes the dissociative reaction self-assisted, the total adsorption process elapsing with a negligible activation barrier (less than 0.01 eV).     

H2 分子在Li3N(110)表面吸附的第一性原理研究

采用第一性原理方法研究了H₂分子在Li₃N(110)晶面的表面吸附. 通过研究H₂/Li₃N(110)体系的吸附位置、吸附能和电子结构发现: H₂分子吸附在N桥位要比吸附在其他位置稳定,此时在Li₃N(110)面形成两个-NH基,其吸附能为1.909 eV,属于强化学吸附;H₂与Li₃N(110)面的相互作用主要是H 1s轨道与N 关键词： 第一性原理 3N(110)')" href="#">Li₃N(110) 2')" href="#">H₂ 吸附和解离     

NH3在Ni/Pt(111)和Ni/WC(001)表面上分解的第一性原理研究

采用密度泛函理论和slab模型,研究NH₃在Ni单原子层覆盖的Pt（111）和WC（001）表面上的物理与化学行为,计算了Ni单原子覆盖表面的电子结构以及NH₃的吸附与分解.表面覆盖的单原子层中,Ni原子的性质与Ni（111）面上的Ni原子明显不同.与Ni（111）相比,Ni/Pt（111）和Ni/WC（001）表面上Ni原子dz²轨道上的电子更多地转移到了其它位置,该轨道上电荷密度降低有利于NH₃吸附.在Ni/Pt（111）和Ni/WC（001）面上NH₃吸附能均大于Ni（111）,NH₃分子第一个N-H键断裂的活化能则明显比Ni（111）面上低,有利于NH₃的分解,吸附能增大使NH₃在Ni/Pt（111）和Ni/WC（001）面上更倾向于分解,而不是脱附.N₂分子的生成是NH₃分解的速控步骤,该反应能垒较高,说明N₂分子只有在较高温度下才能生成.WC与Pt性质相似,但Ni/Pt（111）和Ni/WC（001）的电子结构还是有差异的,与Ni（111）表面相比,NH₃在Ni/Pt（111）表面上分解速控步骤的能垒降低,而在Ni/WC（001）上却升高.要获得活性好且便宜的催化剂,需要对Ni/WC（001）表面做进一步改进,降低N₂分子生成步骤的活化能.     

Spectroscopic identification of the reaction intermediates in the thermal decomposition of trimethylindium at GaAs(100) surfaces

High resolution electron energy loss spectroscopy (HREELS) has been used to study the adsorption and thermal decomposition of trimethylindium (TMIn) on Ga-terminated GaAs(100) surfaces. HREEL spectra recorded for adsorption at room temperature are dominated by strong CH₃ deformation and stretching modes and indicate that the surface species is based on methyl groups. The intensities of these bands decrease with increasing temperature consistent with a primary decomposition route involving the loss of CH₃ groups from the surface. A small upward shift in the frequency of the symmetric and asymmetric CH₃ deformation modes is also observed with increasing temperature and indicates that decomposition takes place via an exchange reaction in which CH₃ groups switch from In to Ga due to the stronger Ga-C bond. At temperatures greater than 350°C, the spectra are dominated by CH₂ rocking, deformation and stretching vibrations. The presence of a surface methylene species at elevated temperatures suggests a second, minority decomposition pathway which involves dehydrogenation of surface CH₃ groups to CH₂.     

Computational study of singlet and triplet sulfonylnitrenes insertion into the C―C or C―H bonds of ethylene

Formation of N‐sulfonylaziridines, N‐ethylidenesulfonamides, N‐vinylsulfonamides and 4,5‐dihydro‐1,2,3‐oxathiazole 2‐oxides by the reaction of singlet and triplet trifluoromethyl‐, methyl‐ and tosylnitrenes with ethylene is studied computationally at the B3LYP/6‐311++G(d,p) level of theory in both gas phase and in solution. Singlet sulfonylnitrenes react with ethylene via [1 + 2]‐cycloaddition exothermically to give N‐sulfonylaziridines. Triplet sulfonylnitrenes are formed from the singlet ones by the intersystem crossing with the energy barrier not exceeding 2.5 kcal/mol and react in a stepwise fashion by C‐addition or H‐abstraction. The C‐addition gives rise to the formation of N‐sulfonylaziridines or N‐ethylidenesulfonamides depending on the S―N―C_sp3―C_sp2 dihedral angle, with the barrier to rotation about the N―C_sp3 bond not exceeding 2.5 kcal/mol. The H‐abstraction results in N‐vinylsulfonamides. Transformation of N‐sulfonylaziridines to N‐ethylidenesulfonamides requires to overcome the barrier of 57–60 kcal/mol, N‐ethylidenesulfonamides to 4,5‐dihydro‐1,2,3‐oxathiazole 2‐oxides—74–80 kcal/mol and N‐vinylsulfonamides to N‐ethylidenesulfonamides—about 64 kcal/mol. The use of the polarizable continuum model does not lead to a change of the course of the reaction of trifluoromethanesulfonylnitrene with ethylene and only slightly affects the relative energies of the products, intermediates and transition states. Copyright © 2014 John Wiley & Sons, Ltd.     

Computational study of adsorption, diffusion, and dissociation of precursor species on the GaN (0 0 0 1) surface during GaN MOCVD

The adsorption, diffusion, and dissociation of precursor species, MMGa (monomethylgallium) and NH₃, on the GaN (0 0 0 1) surface have been investigated using the DFT (density functional theory) calculation combined with a GaN (0 0 0 1) surface cluster model. The energetics of NH₃(ad) dissociation on the surface proposed of NH₃(ad) via NH₂(ad) to NH(ad) was facile with small activation barriers. A combined analysis with surface diffusion of adatoms demonstrated Ga(ad) and NH(ad) become primary reactant species for 2D film growth, and N(ad) develops into a nucleation center. Our studies suggest the control of NH₃(ad) dissociation are essential to improve epitaxial film quality as well as Ga-rich condition. In addition, the adsorbability of H(ad)s resulted from NH₃(ad) dissociation were found to influence on the surface chemistry during film growth.     

NH3 adsorption on Ni(110) and the production of the NH2 species by electron irradiation

The adsorption of NH₃ on Ni(110) has been examined using electron stimulated desorption ion angular distribution (ESDIAD), low energy electron diffraction (LEED) and thermal desorption spectrometry (TDS). At ～ 85 K the NH₃ molecule enters into a series of chemisorption and physisorption states whose structures have been partially characterized by means of ESDIAD and LEED. Upon heating, these NH₃ states desorb without dissociation; for adsorption below 300 K there is essentially no thermal decomposition. The ammonia adiayer was found to be extremely sensitive to electron irradiation effects. Evidence was found to support the irradiation induced conversion of NH₃(ads) to an amido intermediate, nh_2(ads). The NH₂ adsorbs with its C_2v axis normal to the surface and its NH bonds aligned along the [001] and [001?] directions. In the absence of further electron irradiation the nh_2(ads) species is stable to 375 K whereupon it dissociates to N_(ads)and H_2(g). The remaining N_(ads) desorbs near 750 K with significant attractive N…N interaction. No evidence is found for an imido intermediate, nh_(ads). nh_2(ads) also undergoes a disproportionation/recombination reaction upon heating to produce an additional NH₃ desorption state. A significant isotope effect for NH versus ND scission, sensitive to the adsorption state of the ammonia, is found to occur upon electron irradiation.     

Photo-induced site-specific nitridation of plasma-deposited B10C2Hx films: A new pathway toward post-deposition doping of semiconducting boron carbides

We show that dopant impurities can be introduced in a controlled, site-specific manner into pre-deposited semiconducting boron carbide films. B―N bond formation has been characterized by X-ray photoelectron spectroscopy for semiconducting B₁₀C₂H_x films exposed to vacuum ultraviolet photons in the presence of NH₃. Core level photoemission data indicate that B―NH₂ bonds are formed at B sites bonded to other boron atoms (B―B), and not at boron atoms adjacent to carbon atoms (B―C) or at carbon atom sites. Nitridation obeys diffusion-limited kinetics. These results indicate that dopant species can be introduced in a controlled, site-specific manner into pre-deposited boron carbide films, as opposed to currently required dopant incorporation during the deposition process.     

Comparison of O–H and C–H activation of methanol on Ni-based cluster: a DFT investigation

Using the density functional theory, the initial dehydrogenation of methanol on Ni_xM_y (M?=?Ni, Co, Fe, Mn, Cr, x?+?y?=?4, y?=?1, 2) clusters is investigated. Two adsorption and dehydrogenation mechanisms of methanol are studied: one proceeds along the C–H scission and another begins with the breaking of the O-H bond. The adsorption sites of methanol on the Ni or M sites of the Ni_xM_y clusters are considered. The adsorption of methanol on Ni₄ cluster is stronger than those on bimetallic clusters, while the initial dehydrogenation barriers on Ni_xM_y clusters are lower than that on Ni₄ cluster. The comparable energy barriers of two pathways (O–H or C–H dissociation) on Ni-based clusters indicate that these two paths are quite competitive. In addition, the Ni₂M₂ clusters show superior activation performance compared with the Ni₃M clusters, especially for Ni₂Mn₂ and Ni₂Cr₂ clusters. The effects of alloyed metal on the catalytic activity of Ni for methanol initial dehydrogenation, including the adsorption energy, O–H or C–H bond scission barrier and frontier molecular orbital levels, are discussed. It can be concluded that the addition of Co, Fe, Mn and Cr to Ni catalyst is able to enhance the activity of the methanol dehydrogenation reaction.     

A NEXAFS study on the adsorption of ammonia on clean and potassium-promoted iron

The adsorption of ammonia on thin films of iron with and without potassium has been investigated with near-edge X-ray absorption fine-structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS). The NEXAFS results suggest that for low coverages of chemisorbed ammonia on iron there is a dilation of the NH bond length with respect to solid ammonia. At higher ammonia coverages there is less perturbation of NH₃, as inferred from NEXAFS and XPS experiments, suggesting that the adsorption energy of the ammonia is a strong function of surface coverage. The coadsorption of potassium metal is found to prevent the ammonia NH bond dilation observed over clean iron.     

LiNH2储氢材料中间隙H与掺杂原子交互作用对其释氢性能影响机理研究

采用基于密度泛函理论的赝势平面波第一性原理方法,研究了LiNH₂缺陷及其掺杂原子交互作用对其释氢影响.通过对其进行优化求得它们的局域最稳定结构并计算了含间隙H原子缺陷的LiNH₂及其掺杂合金的结合能、间隙缺陷形成能、态密度和电荷布居.结果表明: 系统结合能不能反映LiNH₂及其掺杂合金的释氢性质;平衡时,LiNH₂中有一定的间隙氢原子存在,Mg,Ti掺杂使形成能大大降低,大大增大了间隙氢的浓度. 间隙H原子在带隙引入了缺陷能级使带隙大大减小,提高释氢能力.间隙H原子导致[NH₂]^-中N-H原子间相互作用减弱,容易释氢.间隙H与[NH₂]^-中N存在共价作用,可以解释LiNH₂释氢反应中NH₃的放出.当存在掺杂时,N-H键的键强不均衡,部分较弱,部分较强,较弱的N-H键中H容易放出. 关键词： 储氢材料 第一性原理 缺陷 释氢机理     

Adsorption of hydrazine and ammonia on aluminium

The adsorption and decomposition of hydrazine and ammonia by clean polycrystalline aluminium surfaces have been studied by X-ray photoelectron spectroscopy. At 85 K both ammonia and hydrazine are adsorbed molecularly, with N(1s) peaks at 400.5 eV. At 290 K hydrazine is initially adsorbed to give an N(1s) peak at about 399 eV, but with time (and further exposure) the position of the peak maximum drift to lower N(1s) values, finally approaching 397 eV after heating the ad-layer to 390 K. These observations are interpreted in terms of a slow dissociative chemisorption process: N₂H₄(a) → NH₂(a) → NH(a) → N(a). There is no doubt that the NN bond in hydrazine is broken and that hydrogen ad-atoms formed inhibit the subsequent adsorption of N₂H₄ at 290 K. Ammonia dissociates more slowly than hydrazine to give mainly amine (NH₂) species at 290 K.     

Ammonia activation on platinum {1 1 1}: A density functional theory study

By means of density functional theory calculations we have investigated the role of adsorbed atomic oxygen and adsorbed OH in the oxidation of ammonia on Pt{1 1 1}. We have investigated the dissociation of NH_3,ads, NH_2,ads and NH_ads on Pt{1 1 1} and the oxidation of these species by O_ads and OH_ads. We have done normal mode frequency analysis and work function calculations to characterise reactant, product and transition states. We have determined reaction energies, activation entropies, kinetic parameters and corrected total energies with the zero point energy. We have shown that O_ads only activates the dehydrogenation of NH_3,ads and that OH_ads activates the dehydrogenation of all NH_x,ads species and have reasoned this difference in activation by a bond order conservation principle. We have pointed out the importance of a zero point energy correction to the reaction energies and barriers. We have compared the calculated vibrational modes of the adsorbates with corresponding experimental EELS data. This has led to a revise of the frequency assignment of ν(Pt-OH₂), a revise in the identification of a NH₂ species on the Pt{1 1 1} surface after electron bombardment of pre-adsorbed NH₃ and the confirmation of an ammonia dimer binding model at the expense of a hollow site occupation by ammonia on the Pt{1 1 1} surface.     

Intermediate product identification for ammonia decomposition at Ni (110)

Ammonia decomposition at Ni(110) has been identified to proceed via NH₃(ad) → NH₂(ad) → NH(ad) → N + H. The decomposition activation of NH is determined to be 47 kcal/mol, suggesting an amazing stability of the NiNH bond. Decomposition of NH₂ occurs up from about 350 K; no kinetic data can be given yet. NH₃ decomposition is found to proceed slower than NH₃ desorption at least below 300 K.