SEM/EDS study of metal-assisted oxide desorption

Strongly-enhanced desorption of a thick (100 nm) silicon oxide layer by the pre-sputtering of a thin germanium surface film was observed under high-temperature vacuum annealing conditions. High-resolution SEM imaging reveals that germanium nanoislands are first formed on the sample surface, and that these then act as nucleation centres for the formation of voids in the oxide, leading to a rapid desorption of the silicon oxide layer. EDS analysis of the silicon surface after oxide decomposition shows that the introduced germanium impurities are fully consumed in this desorption process.     

Photoemission study of interfacial reactions during annealing of ultrathin yttrium on SiO2/Si(1 0 0)

X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and work-function measurements have been used to investigate the Y/SiO₂/Si(1 0 0) interfaces in situ as a function of annealing temperature. The results show that yttrium is very reactive with SiO₂ and can react with SiO₂ to form Y silicate and Y₂O₃ even at room temperature. Annealing leads to the continual growth of the Y silicate. Two distinctive reaction mechanisms are suggested for the annealing processes below and above 600 K. The reaction between metallic yttrium and SiO₂ dominates the annealing processes below 600 K, while at annealing temperatures above 600 K, a reaction between the new-formed Y₂O₃ and SiO₂ becomes dominant. No Y silicide is formed during Y deposition and subsequent annealing processes. UPS valence-band spectra indicate the silicate layer is formed at the top surface. After 1050 K annealing, a Y-silicate/SiO₂/Si structure free of Y₂O₃ is finally formed.     

Thermal stability of the Co/β-Si3N4/Si(111) interface: A photoemission study

The thermal stability of the Co/β-Si₃N₄/Si(111) interface has been studied by high-resolution photoemission spectroscopy in a temperature range extending from room temperature to 650 °C. It is demonstrated the ability of a very thin crystalline buffer layer of silicon nitride to prevent the interfacial reaction between cobalt and silicon at room temperature. The behaviour of the interface at higher temperature shows the formation of cobalt silicides already at 300 °C. Moreover, the presence of new components in the decomposition of the photoemission spectra is discussed in the light of the existing literature.     

Effect of in vacuo surface pre-treatment on the growth kinetics and chemical constitution of ultra-thin oxide films on Al–Mg alloy substrates

The effect of in vacuo substrate surface pre-treatment on the growth kinetics and chemical constitution of ultra-thin (<3 nm) oxide films grown on bare Al–1.1 at.% Mg alloy surfaces was studied by a combined experimental approach of real-time in situ spectroscopic ellipsometry (RISE) and angle-resolved X-ray photoelectron spectroscopy (AR-XPS). One alloy surface pre-treatment prior to oxidation consisted of the removal of the native oxide and other contaminants on the alloy surface by sputter-cleaning under UHV conditions. A second surface pre-treatment involved exposing such sputter-cleaned surfaces to a short in vacuo annealing step at 460 K. Next, ultra-thin (<3 nm) oxide films were grown on these two pre-treated alloy surfaces by exposure to O₂(g) within the temperature range of T = 300–485 K (at pO₂ = 1 × 10^?4 Pa). It was found that, as long as the chemical segregation of Mg from the alloy’s interior to the alloy/oxide interface is kinetically hindered, the oxide-film growth kinetics, the developing oxide-film constitution, as well as the local chemical states of the Al and Mg cations in the oxide layer depend strongly on the alloy surface pre-treatment. At T ? 450 K, the thermally-activated interfacial segregation of Mg becomes pronounced and, only then, the developing oxide-film constitution is approximately independent of the surface pre-treatment.     

In-situ formation of SiC nanocrystals by high temperature annealing of SiO2/Si under CO: A photoemission study

We have studied CO interaction with SiO₂/Si system at high temperature (~ 1100 °C) and 350 mbar by core-level photoemission. Even for short annealing time (5 min) the signal from Si2p and C1s core levels shows a clear change upon CO treatment. Shifted components are attributed to formation of SiC. This is confirmed by TEM imaging which further shows that the silicon carbide is in the form of nano-crystals of the 3C polytype. Photoemission spectroscopy moreover reveals the formation of silicon oxicarbide which could not be evidenced by other methods. Combining these results with previous Nuclear Resonance Profiling study gives a deeper insight into the mechanisms involved in the nanocrystals growth and especially for the reaction equation leading to SiC formation. We show that CO diffuses as a molecule through the silica layer and reacts with the silicon substrate according the following reaction: 4 CO + 4 Si → SiO₂ + 2SiC + SiO₂C₂.     

The influence of oxygen on the growth of silver on Cu(110)

The influence of the (2 × 1)O reconstruction on the growth of Ag on a Cu(110) surface was studied by scanning tunneling microscopy (STM) and Auger electron spectroscopy (AES). On the bare Cu(110) surface, Stranski–Krastanov growth of silver is observed at sample temperatures between 277 K and 500 K: The formation of a Ag wetting layer is followed by the growth of three-dimensional Ag wires. In contrast, on the oxygen-precovered Cu(110) surface, the growth of silver depends heavily on the substrate temperature. Upon Ag deposition at room temperature, a homogeneous, polycrystalline Ag layer is observed, whereas at 500 K, three-dimensional wires separated by (2 × 1)O reconstructed areas are formed. The behavior of a deposited Ag layer upon annealing is also influenced greatly by the presence of oxygen. On the bare surface, annealing does not change the Ag wetting layer and gives rise to Ostwald ripening of the Ag wires. On the oxygen-precovered surface, however, the initial polycrystalline Aglayer first transforms into Ag wires at around 500 K. Above this temperature, the depletion of the (2 × 1)O reconstructed areas due to Ag-induced O desorption is balanced by the formation of a Ag wetting layer. On both, the bare and the oxygen-precovered Cu(110) surface, the deposited silver diffuses into the Cu bulk at temperatures above 700 K.     

First principles and classical modeling of the oxidized titanium (0001) surface

The formation of a native oxide layer on the Ti(0001) surface is studied by means of FPMD simulations. In agreement with experimental findings, at low temperature we observe quick saturation of the surface reactivity, whereas incorporation of further O₂ molecules in the oxide network takes place after thermal annealing at ～ 800 K. At an O coverage of 2 ML the oxide layer presents an amorphous structure, an approximate TiO stoichiometry, and a broad distribution of Ti oxidation states from + 1 to + 4. We find consistency between the computed Bader atomic charges on Ti atoms and the correspondent charges computed classically by simple electrostatic minimization methods. On this basis we develop an analytic potential to simulate Ti/TiO_x interfaces, including only Coulomb interaction and short-range atomic repulsion terms. Two different parameter sets are proposed and their transferability among TiO₂ allomorphs and thin-layer oxide structures is tested both in static relaxations and in room-temperature MD simulations. These show only negligible changes in the topology of the oxide network after annealing and relaxation of the reference quantum model at the classical level. Moreover, we show that superficial oxide layers can be successfully generated purely classically by truncation of a large-scale Ti/amorphous–TiO₂ system. This may enable large-scale applications of our potential to tribology and biomolecular adsorption phenomena.     

The oxidation of Fe(111)

The oxidation of Fe(111) was studied using Auger electron spectroscopy (AES), low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), ion scattering spectroscopy (ISS) and scanning tunnelling microscopy (STM). Oxidation of the crystal was found to be a very fast process, even at 200 K, and the Auger O signal saturation level is reached within ~ 50 × 10^? 6 mbar s. Annealing the oxidised surface at 773 K causes a significant decline in apparent surface oxygen concentration and produces a clear (6 × 6) LEED pattern, whereas after oxidation at ambient temperature no pattern was observed. STM results indicate that the oxygen signal was reduced due to the nucleation of large, but sparsely distributed oxide islands, leaving mainly the smooth (6 × 6) structure between the islands. The reactivity of the (6 × 6) layer towards methanol was investigated using temperature programmed desorption (TPD), which showed mainly decomposition to CO and CO₂, due to the production of formate intermediates on the surface. Interestingly, this removes the (6 × 6) structure by reduction, but it can be reformed from the sink of oxygen present in the large oxide islands simply by annealing at 773 K for a few minutes. The (6 × 6) appears to be a relatively stable, pseudo-oxide phase, that may be useful as a model oxide surface.     

Morphology and thermal stability of AlF3 thin films grown on Cu(100)

The growth of ultrathin epitaxial layers of aluminum fluoride on Cu(100) has been studied by a combination of surface science techniques. Deposition at room temperature results in step decoration followed by the formation of dendritic two-dimensional islands that coalesce to form porous films. Ultrathin layers (up to 2 monolayers in thickness) are morphologically unstable upon annealing; de-wetting takes place around 430 K with the formation of three-dimensional islands and leaving a large fraction of the Cu surface uncovered. Films several nanometers thick, on the contrary, are stable up to ca. 730 K where desorption in molecular form sets on. The effect of electron irradiation on the AlF₃ has also been characterized by different spectroscopic techniques; we find that even small quantities of stray electrons from rear electron beam heating can provoke significant decomposition of the aluminum fluoride, resulting in the release of molecular fluorine and the formation of deposits of metallic aluminum. These features make AlF₃ an interesting material for spintronic applications.     

Adsorption of thiophene on silica-supported Mo clusters

The adsorption/decomposition kinetics/dynamics of thiophene has been studied on silica-supported Mo and MoS_x clusters. Two-dimensional cluster formation at small Mo exposures and three-dimensional cluster growth at larger exposures would be consistent with the Auger electron spectroscopy (AES) data. Thermal desorption spectroscopy (TDS) indicates two reaction pathways. H₄C₄S desorbs molecularly at 190–400 K. Two TDS features were evident and could be assigned to molecularly on Mo sites, and S sites adsorbed thiophene. Assuming a standard preexponential factor (ν = 1 × 10¹³/s) for first-order kinetics, the binding energies for adsorption on Mo (sulfur) sites amount to 90 (65) kJ/mol for 0.4 ML Mo exposure and 76 (63) kJ/mol for 2 ML Mo. Thus, smaller clusters are more reactive than larger clusters for molecular adsorption of H₄C₄S. The second reaction pathway, the decomposition of thiophene, starts at 250 K. Utilizing multimass TDS, H₂, H₂S, and mostly alkynes are detected in the gas phase as decomposition products. H₄C₄S bond activation results in partially sulfided Mo clusters as well as S and C residuals on the surface. S and C poison the catalyst. As a result, with an increasing number of H₄C₄S adsorption/desorption cycles, the uptake of molecular thiophene decreases as well as the H₂ and H₂S production ceases. Thus, silica-supported sulfided Mo clusters are less reactive than metallic clusters. The poisoned catalyst can be partially reactivated by annealing in O₂. However, Mo oxides also appear to form, which passivate the catalyst further. On the other hand, while annealing a used catalyst in H/H₂, it is poisoned even more (i.e., the S AES signal increases). By means of adsorption transients, the initial adsorption probability, S₀, of C₄H₄S has been determined. At thermal impact energies (E_i = 0.04 eV), S₀ for molecular adsorption amounts to 0.43 ± 0.03 for a surface temperature of 200 K. S₀ increases with Mo cluster size, obeying the capture zone model. The temperature dependence of S₀(T_s) consists of two regions consistent with molecular adsorption of thiophene at low temperatures and its decomposition above 250 K. Fitting S₀(T_s) curves allows one to determine the bond activation energy for the first elementary decomposition step of C₄H₄S, which amounts to (79 ± 2) kJ/mol and (52 ± 4) kJ/mol for small and large Mo clusters, respectively. Thus, larger clusters are more active for decomposing C₄H₄S than are smaller clusters.     

Characterization of Rh,Mo and Rh–Mo particles formed on TiO2(110) surface: A TDS,AES and RAIRS study

The structural and chemical characterization of Rh, Mo and Rh–Mo nanosized clusters formed by physical vapor deposition on TiO₂ single crystal was performed by Auger Electron Spectroscopy (AES), Thermal Desorption Spectroscopy (TDS) and Reflection Absorption Infrared Spectroscopy (RAIRS), applying CO as test molecule. On a slightly reduced titania surface 2D-like growth of Rh was revealed at 300 K up to 0.23 ML coverage by AES and CO-desorption experiments. For CO-saturated Rh particles TDS showed molecular CO desorption in a broad temperature range with T_p = 400, 440, 490 and 540 K (α-states), the latter state appearing only on the smallest Rh particles. The population of γ-state (T_p = 780–820 K) originating from the recombination of C and O atoms on the support began at Θ_Rh = 0.23ML and was maximized at around 1–2 ML Rh coverage, corresponding to 30% dissociation of CO. A possible dissociation precursor on Rh particles is identified as linearly bonded CO on step sites characterized by ν(C–O) of 2017 cm^? 1. Deliberation of CO₂ could not be detected between 170 and 900 K, showing the absence of disproportionation reaction. Instead of oxidizing CO molecules, oxygen atoms stemming from the dissociation of CO attached to the reduced centers of titania, indicating the role of adsorption sites at the perimeter of Rh particles in the decomposition process. 2 ML of predeposited Mo enhanced markedly the dispersion of Rh particles as a result of strong Rh–Mo interaction, but it slightly reduced the molecular α-CO desorption possibly due to enhanced dissociation. The formation of γ-CO was suppressed considerably through elimination of adsorption centers by Mo on the TiO₂ substrate. The reactivity of Rh layers deposited on Mo-covered surface towards CO was reduced after repeated annealing to 600 K due to partial encapsulation of Rh by titania, manifesting in the suppression of the more strongly bonded α-state. Mo-deposits (up to 0.5ML) on Rh particles decreased the saturation coverage of α-CO through a site-blocking mechanism without detectable influence on the binding energy of CO to Rh, indicating Mo island formation. The carbon arising from the decomposition of CO dissolved in the Mo-containing particles formed a solid solution stable even at 900 K, suggesting a possible role of molybdenum carbide regarding the enhanced catalytic activity of Rh clusters.     

Adsorption of O2 and CO2 on the Si(111)-7 × 7 surfaces

The interaction of O₂ and CO₂ with the Si(111)-7 × 7 surface has been studied with X-ray photoelectron spectroscopy (XPS). It was found that both O₂ and CO₂ molecules can readily oxidize the Si(111)-7 × 7 surface to form thin oxide films. Two oxygen species were identified in the oxide film: oxygen atoms binding to on-top sites of adatom/rest atoms with an O 1s binding energy of ~ 533 eV as well as to bridge sites of adatom/rest atom backbonds at ~ 532 eV. These two oxygen species can be interconverted thermally during the annealing process. Due to the low oxidation capability, the silicon oxide film formed by CO₂ has a lower O/Si ratio than that of O₂.     

The interaction of O2 with the surface of polycrystalline gadolinium at the temperature range 300–670 K

Auger-Electron-Spectroscopy (AES) and Direct-Recoils-Spectrometry (DRS) were applied to study the interaction of O₂ with a polycrystalline gadolinium surface, in the temperature range 300–670 K and oxygen pressure up to 2 × 10^? 6 Torr. It has been found that initial uptake of oxygen, at coverage measurable by the techniques used here, results in rapid oxide island formation. The subsurface is believed to be a mixture of oxide particles and oxygen dissolved in the Gd metal, the latter being the mobile species, even at relatively low temperatures.Enhanced inward diffusion of oxygen starts as early as 420 K and dictates the surface oxygen concentration and effective thickness of the forming oxide. The oxygen accumulation rate at the near-surface region, as measured by the O(KLL) AES signal intensity, goes through a maximum as a function of temperature at 420 K. This is a result of the combination of still efficient oxygen chemisorption that increases surface occupation and slow inward diffusion. The thickest oxide, ~ 1.7 nm, is formed at 300 K and its effective thickness was found to decrease with increasing temperature (due to oxygen dissolution into the metal bulk).Diffusion coefficients of the oxygen dissolution into the bulk were evaluated for various temperatures utilizing models for infinitely thin oxide layer and thick oxide layer, respectively. The best fit under our experimental procedure was obtained by the thick layer model, and the coefficients that were calculated are D₀ = 2.2 × 10^? 16m²s^? 1 and E_a = 46kJ/mol.     

Epitaxial growth of well-ordered ultra-thin Al2O3 film on NiAl (1 1 0) by a single-step oxidation

Well-ordered ultra-thin Al₂O₃ films were grown on NiAl (1 1 0) surface by exposing the sample at various oxygen absorption temperatures ranging from 570 to 1100 K at dose rates 6.6 × 10⁻⁵ and 6.6 × 10⁻⁶ Pa. From the results of low-energy electron diffraction (LEED), Auger electron spectrometer (AES) and X-ray photon spectroscopy (XPS) observations, it was revealed that oxidation mechanism above 770 K is different from well-known two-step process. At high temperature, oxidation and crystallization occurred simultaneously while in two-step process oxidation and crystallization occurred one after another. At high-temperature oxidation well-ordered crystalline oxide can be formed by a single-step without annealing. Well-ordered Al₂O₃ layer with thickness over 1 nm was obtained in oxygen absorption temperature 1070 K and a dose rate 6.6 × 10⁻⁶ Pa at 1200 L oxygen.     

Fabrication of Gd0.5Sr0.5CoO3 film for SOFC cathode by pulsed laser deposition

Gd_0.5Sr_0.5CoO₃ (GSCO) film has been fabricated by pulsed laser deposition (PLD) to be used as the cathode of the solid oxide fuel cell (SOFC). The GSCO thin film obtained has a columnar crystalline structure so that it will have a high permeation property. The PLD technique has been found suitable for growing a film of complex composition because of its good control of stoichiometry and thus for fabricating a GSCO film used as the cathode of the SOFC. The GSCO film has been studied for porosity electrical conductivity and power density. The GSCO film grown at a substrate temperature of 1100 K and oxygen gas pressure of 100 Pa has high electrical conductivity which is 820 S cm^− 1 at 973 K with post annealing at a rather low temperature (1000 K). This value is higher than that of the GSCO film prepared by RF-sputtering with post annealing at a higher temperature (1273 K).     

Comparison of electrochromic amorphous and crystalline electron beam deposited WO3 thin films

Tungsten oxide (WO₃) thin films were prepared by an electron beam deposition technique. Films were deposited onto fluorine-doped tin oxide (FTO)-coated glass substrates maintained at 523 K. The as-deposited films were found to be amorphous and crystallized after annealing at 673 K. The electrochromic and optical properties, structure, and morphology are strongly dependent on the annealing conditions. Cyclic voltammetry (C-V) was carried out in the potential range −1 to +1 V. Before and after colouration, the films were characterized by measuring transmittance and reflectance. The colouration efficiencies at 630 nm are about 39.4 cm² C⁻¹ and 122.2 cm² C⁻¹ for amorphous and crystalline films, respectively. An investigation of self-bleaching for the coloured film revealed that the film fades gradually over time.     

Adsorption and decomposition of NO on Pt (112)

Adsorption and decomposition of NO on Pt (1 1 2) have been studied by temperature programmed desorption (TPD), ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS). NO adsorbs molecularly on Pt (1 1 2) at 95 K. About half amount of NO molecules adsorbs at the terrace sites and remaining half amount adsorbs at the step sites at a full monolayer coverage. Then about half of NO molecules adsorbed at step sites decomposes at around 483 K desorbing N₂, promptly.     

Dynamical LEED analyses of the clean and the NO-adsorbed Ir(111) surface

The adsorption structure of nitric oxide (NO) on Ir(111) was studied by thermal desorption spectroscopy (TDS) and dynamical analyses of low-energy electron diffraction (LEED). At the saturation coverage at about 100 K, a 2 × 2 pattern was observed by LEED and two peaks appeared at 365 and 415 K in TDS. No change in the LEED I–V curves was observed by annealing at 280 K, which means that the NO-saturated surface was retained at this temperature. On the contrary, partial desorption and changes of the LEED I–V curves were observed by annealing at 360 K. Combined with previous vibrational studies, it is suggested that one adsorption species is not affected, while another species is partially desorbed and the rest of them are dissociated by annealing at 360 K. Dynamical analyses of LEED were performed for the 280 K-annealed and the 360 K-annealed surfaces, which correspond to the NO-saturated and the NO-dissociated Ir(111) surfaces, respectively. These revealed that NO occupies the atop, fcc-hollow and hcp-hollow sites (atop-NO + fcc-NO + hcp-NO) for the NO-saturated Ir(111) surface with the saturation coverage of 0.75 ML. For the 360 K-annealed surface, the atop-NO is not affected but the fcc-NO and the hcp-NO are partially desorbed as NO and partially dissociated to N and O, both of which occupy the fcc-hollow site on the surface.     

Surface stoichiometry of La0.7Sr0.3MnO3 during in vacuo preparation; A synchrotron photoemission study

We present a study of the surface stoichiometry and contamination of La_0.7Sr_0.3MnO₃ thin films following exposure to air and subsequent in vacuo preparation. Samples were studied using both soft X-ray synchrotron photoemission (hν = 150 to 350 eV) and traditional Mg-Kα XPS (hν = 1253.6 eV) whilst annealing incrementally to ≈ 510°C in low pressures of O₂. In all cases, a Mn depleted and Sr rich surface oxide layer is observed, it is of reduced crystalline quality and is charge depleted. This surface layer is weakly affected by subsequent annealing, and is partially reversed by annealing in higher O₂ pressure. Surface carbon contamination is incrementally removed by annealing at increased temperatures, and at 270 °C, it is reduced to ≈ 0.4% of the topmost unit cell. The modification of the surface stoichiometry and electronic properties is consistent with the reported loss of magnetic properties in thin LSMO films.     

Reversible and irreversible reactions of three oxygen precursors on InAs(0 0 1)-(4 × 2)/c(8 × 2)

The substrate reactions of three common oxygen sources for gate oxide deposition on the group III rich InAs(0 0 1)-(4 × 2)/c(8 × 2) surface are compared: water, hydrogen peroxide (HOOH), and isopropyl alcohol (IPA). Scanning tunneling microscopy reveals that surface atom displacement occurs in all cases, but via different mechanisms for each oxygen precursor. The reactions are examined as a function of post-deposition annealing temperature. Water reaction shows displacement of surface As atoms, but it does not fully oxidize the As; the reaction is reversed by high temperature (450 °C) annealing. Exposure to IPA and subsequent low-temperature annealing (100 °C) show the preferential reaction on the row features of InAs(0 0 1)-(4 × 2)/c(8 × 2), but higher temperature anneals result in permanent surface atom displacement/etching. Etching of the substrate is observed with HOOH exposure for all annealing temperatures. While nearly all oxidation reactions on group IV semiconductors are irreversible, the group III rich surface of InAs(0 0 1) shows that oxidation displacement reactions can be reversible at low temperature, thereby providing a mechanism of self-healing during oxidation reactions.