Growth mode and interface structure of Ag on the HF-treated Si(111):H surface

A growth mode and interface structure analysis has been performed for Ag deposited at a high temperature of 300°C on the HF-treated Si(111):H surface by means of medium-energy ion scattering and elastic recoil detection analysis of hydrogen. The measurements show that Ag grows in the Volmer-Weber mode and that the Ag islands on the surface are epitaxial with respect to the substrate. The preferential azimuthal orientation is A-type only when Ag is deposited slowly. The interface does not reconstruct to the √3 × √3-Ag structure, which is normally observed for Ag deposition above 200°C on the Si(111)7 × 7 surface, but retain bulk-like structure. The presence of hydrogen at the interface is demonstrated after deposition of thick (1100 Å) Ag films. However, the amount of hydrogen at the interface is not a full monolayer. This partial desorption of hydrogen from the interface explains why the Schottky barrier heights of Ag/Si(111):H diodes are close to those of Ag/Si(111)7 × 7 and Ag/Si(111)2 × 1.     

Study of the wurtzite zinc-blende mixed-structured GaAs nanocrystals grown on Si (111) substrates

The structure and growth mechanism of GaAs nanocrystals grown on Si (111) substrates by using the molecular beam epitaxy method have been studied using transmission electron microscopy. The isolated nanocrystals had hexangular shapes, with aspect ratio ～1 and high symmetry. The crystal structure of the GaAs nanocrystals contains a mixture of a stable state of zinc-blende and a metastable state of wurtzite. A number of thin wurtzite layers parallel to the Si (111) plane are introduced into the zinc-blende GaAs nanocrystals as stacking faults. Formation of partial dislocations near the GaAs/Si interface and the small difference in the Gibbs free energy between the zinc-blende and wurtzite structures could cause formation of wurtzite as stacking faults in the zinc-blende structure     

Silver schottky contacts on Si(111)∶ H-(1×1) surfaces prepared by wet-chemical etching

Schottky contacts were prepared by evaporation of silver on H-terminated Si(111) surfaces at room temperature. The Si(111)H-(1×1) surfaces were obtained by wet-chemical etching in buffered hydrofluoric acid. The zero-bias barrier heights and the ideality factors, which were determined fromI/V characteristics measured with these contacts, were found to be linearly correlated. This plot gives a zero-bias barrier height of 0.74 eV for an ideality factor of 1.01 which is obtained for image-force lowering of the barrier only. The barrier heights observed here equal the one found with Ag/Si(111)-(1×1) contacts. They were prepared by Ag evaporation onto clean Si(111)-(7×7) surfaces at room temperature and subsequent heat treatments. The present result is explained by the desorption of the hydrogen adatoms during the deposition of Ag and the existence of a (1×1)-structure at the Ag/Si(111) interface.     

Photoemission investigation on the oxidation of Si(111)Ag interfaces and its relation to the interface structure

We give the first photoemission results on the enhancement of Si reactivity to oxygen when a noble metal (Ag) is present. The tunability of synchrotron radiation (SR) has been used to get high surface sensitivity and to take advantage of cross section energy dependence. We show that when one monolayer of Ag is deposited onto Si(111), the exposure to oxygen (30 × 10⁶L) originates the overgrowth of an oxide phase which is basically SiO₂. This indicates that Ag breaks the sp³ configuration of Si atoms with a consequent dramatic increase in the Si reactivity. This behaviour rules out the model of Ag adsorbed on top of Si with an atomically abrupt interface.     

Angle resolved photoemission measurements on AgSi(111) 7 × 7 interfaces

The AgSi(111) interface is investigated by LEED, AES and angle resolved photoemission spectroscopy using 50 eV synchrotron radiation in p-polarization. Results on room temperature (RT) silver growth on Si(111) 7 × 7 are characterized by an evolution of the LEED pattern and of the d band shape which is consistent with 2D island formation in the submonolayer range. When the Ag coverage (Θ) is increased, a progressive build-up of Ag layers occurs with a possible interdiffusion of the atomic constituents. The ordered $\text{Si(111)}\text{3}\text{×}\text{3}\text{R(30°)Ag}$ structure (R₃) obtained by annealing a 1 ML RT deposit gives rise to new interface states near E_F. In contrast to the RT deposit at the same Θ, two well defined d band peaks are present while the bulk Si emission near 3.4 eV is clearly seen. The R₃ data would favour recent crystallographic models which conclude to an embedment of the Ag atoms in a threefold hollow adsorption site.     

Polar oxide interface stabilization by formation of metallic nanocrystals

In situ x-ray photoelectron spectroscopy and ex situ transmission electron microscopy and diffraction studies of a model Fe3O4(111)/MgO(111) polar oxide interface exclude stabilization by interface faceting, reconstruction, or by formation of a continuous interfacial layer with altered stoichiometry, and uncover stabilization by dominant formation of metallic Fe(110) nanocrystals. The iron nanocrystals nucleate both at the interface and within the magnetite film and grow in a Nishiyama-Wasserman orientation relationship with a bimodal size distribution related to twinning. Minority magnetite nanocrystals were also observed, growing in the less polar (100) orientation than the magnetite (111) film. Electron transfer and bond hybridization mechanisms are likely at the metal/oxide and oxide/oxide interfaces and remain to be explored.     

IR absorption enhancement for physisorbed methanol on Ag island films deposited on the oxidized and H-terminated Si(111) surfaces: effect of the metal surface morphology

Infrared absorption measurements using a multiple internal reflection geometry are reported for condensed methanol at 90 K on Ag island films deposited on the oxidized and hydrogen-terminated surfaces of Si(111). The attenuated total reflection (ATR) spectra obtained as a function of methanol exposure (up to 14 L) show that a 1-nm mass thickness of Ag island film on the oxidized Si(111) surface yields an absorption intensity 2–3 times larger than the intensity in the absence of Ag on the oxidized surface. Deposition of the same thickness of Ag on the hydrogen-terminated Si(111) surface results in approximately twice the enhancement. The different magnitudes of the enhancement are discussed based on SEM micrographs for Ag island films formed on the oxidized and H-terminated Si(111) surfaces. Received: 1 March 1999 / Accepted: 8 March 1999 / Published online: 5 May 1999     

Growth and ordering of Ni(II) diphenylporphyrin monolayers on Ag(111) and Ag/Si(111) studied by STM and LEED

The room temperature self-assembly and ordering of (5,15-diphenylporphyrinato)nickel(II) (NiDPP) on the Ag(111) and Ag/Si(111)-(√3 × √3)R30° surfaces have been investigated using scanning tunnelling microscopy and low-energy electron diffraction. The self-assembled structures and lattice parameters of the NiDPP monolayer are shown to be extremely dependent on the reactivity of the substrate, and probable molecular binding sites are proposed. The NiDPP overlayer on Ag(111) grows from the substrate step edges, which results in a single-domain structure. This close-packed structure has an oblique unit cell and consists of molecular rows. The molecules in adjacent rows are rotated by approximately 17° with respect to each other. In turn, the NiDPP molecules form three equivalent domains on the Ag/Si(111)-(√3 × √3)R30° surface, which follow the three-fold symmetry of the substrate. The molecules adopt one of three equivalent orientations on the surface, acting as nucleation sites for these domains, due to the stronger molecule-substrate interaction compared to the case of the Ag(111). The results are explained in terms of the substrate reactivity and the lattice mismatch between the substrate and the molecular overlayer.     

Electronic structure of Ag adsorbed on Si(111); experiment and theory

Experimental results (low energy electron loss spectroscopy) and band structure calculations relating to the early stages of Ag growth on a Si(111) surface are presented. Crystallography and thermal desorption kinetics studies of this interface, previously published, gave rise to the following conclusions. At room temperature and below 200°C, two-dimensional (2D) (111) epitaxial layers develop on top of a first ordered layer (√3 × √3), while at higher temperatures three-dimensional (3D) clusters develop over this first layer. Low energy electron loss experiments were performed at various surface coverages θ. They display different evolutions according to the growth modes. For the 2D epitaxial growth, one observes the disappearance of the peaks characteristic of a Si surface and the onset of Ag induced peaks located at 7.1 and 4.6 eV at completion of the √3 layer. These peaks narrow and shift to the bulk Ag excitation energies at 7.5 and 4 eV when a second Ag layer is deposited. In order to explain these results, we present a theoretical calculation of the electronic density of states of the interface using a tight binding approximation. This calculation accounts for the development of the Ag d band from the √3 coverage range to the (111) epitaxial Ag planes. The evolution of the spectra when θ is increased is discussed in view of these results.     

Ag growth on Si(111) with an Sb surfactant investigated by scanning tunneling microscopy

We have investigated a room-temperature growth mode of ultrathin Ag films on a Si(111) surface with an Sb surfactant using STM in a UHV system. On the Sb-passivated Si surface, small sized islands were formed up to 1.1 ML. Flat Ag islands were dominant at 2.1 ML, coalescing into larger islands at 3.2 ML. Although the initial growth mode of Ag films on the Sb-terminated Si(111) surface was Volmer-Weber (island growth), the films were much more uniform than Ag growth on clean (Si(111) at the higher coverages. From the analysis of STM images of Ag films grown with and without an Sb surfactant, the uniform growth of Ag films using an Sb surfactant appears to be caused by the kinetic effects of Ag on the preadsorbed Sb layer. Our STM results indicated that Sb suppresses the surface diffusion of Ag atoms and increases the Ag-island density. The increased island density is believed to cause coalescence of Ag islands at higher coverages of Ag, resulting in the growth of atomically flat and uniform Ag islands on the Sb surfactant layer.     

Initial growth process and surface structure of Ag on Si(111) studied by low-energy Ion-Scattering Spectroscopy (ISS) and LEED-AES

The growth process of silver on a Si(111) substrate has been studied in detail by low-energy ion-scattering spectroscopy (ISS) combined with LEED-AES. Neon ions of 500 eV were used as probe ions of ISS. The ISS experiments have revealed that the growth at room temperature and at high temperature are quite different from each other even in the submonolayer coverage range. The following growth models have been proposed for the respective temperatures. At room temperature, the deposited Ag forms a two-dimensional (2D) island at around 2/3 monolayer (ML) coverage, where the Ag atoms are packed commensurately with the Si(111)1 substrate. One third of the substrate Si surface remains uncovered there. Then it starts to develop into Ag crystal, and at a few ML coverage a 3D island of bulk Ag crystal grows directly on the substrate. An intermediate layer, which covers uniformly the whole surface before the growth of Ag crystal, does not exist. At high temperatures (>~200°C), the well-known Si(111)√3-Ag layer is formed as an intermediate layer, which consists of 2/3 ML of Ag atoms and covers the whole surface uniformly. These Ag atoms are embedded in the first double layer of the Si substrate. It is concluded that the formation of the √3 structure needs relatively high activation energy which may originate from the large displacement of Si atoms owing to the embedment of the Ag atoms, and does not proceed below about 200°C. The most stable state of the Ag atoms on the outermost Si layer is in the shape of an island, both for the Si(111) surface and for the Si(111)√3-Ag surface.     

Structure and energetics of Si nanocrystals embedded in a-SiO2

We develop realistic models of Si nanocrystals embedded in a-SiO2 using a Monte Carlo approach. The interface structure and its energetics are studied as a function of the nanocrystal size. We find that the low-energy geometries at the interface are Si-O-Si bridge bonds. Remarkably, their fraction strongly declines as the size becomes smaller. Concurrently, the embedding causes substantial deformation in such small nanocrystals. Based on these findings, an alternative explanation is given for the reduced optical gaps in this size regime.     

Growth of nanosize Ag dots with uniform height on?a?Si(111)-7×7-C2H5OH surface, and their electronic properties

C₂H₅OH adsorbs by dissociating on Si-adatom/Si-rest atom pair sites on Si(111)-7×7 surfaces. A half of six Si adatoms and three Si rest atoms are changed to Si-OC₂H₅ and Si-H in every half unit cell at the saturation. When an Ag atom was deposited on this surface, it was stabilized on an intact Si adatom remained in the half unit cell and it did not migrate by hopping. With the increasing number of deposited atoms, uniform height with ca. 5-nm size Ag dots were grown in wide area. A similar growth mode was observed by depositing Ga and Zn on this surface. We deduced that the uniform height growth of 5-nm dots may be given by a layer-by-layer growth of dots in the natural templates composed of six half unit cells. Scanning tunneling spectroscopy indicated that one-monolayer Ag dots had nonmetallic energy gap of ca. 2.2 V at the Fermi level, but the energy gap became narrower with the increasing number of layers and became metallic at eight or nine layers.     

Size control of Si nanocrystals by two-step rapid thermal annealing of sputtered Si-rich oxide/SiO2 superlattice

Controllable size of silicon (Si) nanocrystals can be achieved by a two-step rapid thermal annealing technique consisting of rapid annealing at 1000°C in nitrogen ambient and rapid oxidation at 600–800°C of a radio frequency magnetron co-sputtered Si-rich oxide/SiO₂ superlattice structure. The photoluminescence (PL) spectra related to Si nanocrystals were observed in the visible range (600–900 nm). After rapid oxidation, the size of the nanocrystals was reduced and the quality of the Si nanocrystal/SiO₂ interface was improved, resulting in a blue shift and an increase of the PL peak intensity. Finally, annealing in air increases the PL intensity further.     

MD simulation of nanoindentation on (001) and (111) surfaces of Ag–Ni multilayers

We perform MD simulations of the nanoindentation on (001) and (111) surfaces of Ag–Ni multilayers with different modulation periods, and find that both the hardness and maximum force increase with the increase of modulation period, in agreement with the inverse Hall–Petch relation. A prismatic partial dislocation loop is observed in the Ni(111)/Ag(111) sample when the modulation period is relatively large. We also find that misfit dislocation network shows a square shape for the Ni(111)/Ag(111) interface, while a triangle shape for the Ni(001)/Ag(001) interface. The pyramidal defect zones are also observed in Ni(001)/Ag(001) sample, while the intersecting stacking faults are observed in Ni(111)/Ag(111) sample after dislocation traversing interface. The results offer insights into the nanoindentation behaviors in metallic multilayers, which should be important for clarifying strengthening mechanism in many other multilayers.     

Investigation of the initial stages of growth of Ag films on Si(111)7 × 7 by a combination of LEED,AES, and UPS

The formation of the Si(111) √3 Ag intermediate layer occurs by two-dimensional nucleation and is not completed before one monolayer. The density of the Ag 4d band is fully developed at a substrate temperature of 800 K but not yet at 525 K. At lower temperatures an intermediate layer is also formed, but with different geometry and density of states. The development of the Ag band structure with film thickness and cluster size is discussed.     

Quasi-one-dimensional quantized states in an epitaxial Ag film on a one-dimensional surface superstructure

The in-plane energy dispersion of quantized states in an ultrathin Ag film formed on the one-dimensional (1D) surface superstructure Si(111)-(4 x 1)-In shows clear 1D anisotropy instead of the isotropic two-dimensional free-electron-like behavior expected for an isolated metal film. The present photoemission results demonstrate that an atomic layer at the film-substrate interface can regulate the dimensionality of electron motion in quantum films.     

Structure of the Ag on Si(111) 7 × 7 interface by means of surface exafs

Polarization dependent surface extended X-ray absorption fine structure (SEXAFS) measurements are used to determine the structure of the Ag on Si(111)7 × 7 system at the early stages (< 3 monolayers (ML)) of interface formation. At room temperature (RT) Ag is found to initially (< 0.5 ML) chemisorb in the threefold hollow site, approximately 0.7 Å above the outermost Si layer with an average Ag-Si distance of 2.48±0.05 Å. Above monolayer coverage the SEXAFS spectrum is dominated by the Ag-Ag distance indicating Ag island formation on the surface. Upon heating (200 ?T? 600°C) a (√3 ×√3)R30° LEED pattern is observed. At the lowest coverage ( < 0.7 ML) this pattern is determined to arise from Ag atoms which are embedded in the threefold hollows, ~ 0.7 Å below the first and above the second Si layer, with a Ag-Si distance of 2.48 ± 0.04 Å. At higher coverage ($\text{\$}\text{?}$1 ML) Ag clusters are found to grow on this interface with the same Ag-Ag distance as in Ag metal. Our results are discussed in the context of previous experimental and theoretical results.     

Asymmetric distribution of surface second harmonic generation for thin silver films deposited on Si(111)

The asymmetric distributions of surface optical second harmonic generation (SHG) through azimuthally angular scans of (111) silicon wafers on which thin silver films were deposited, have been detected with different polarizations of output beams. On account of the inversion symmetry of silicon crystals, the SHG for the Ag/Si system is mainly contributed by the silver film and the silicon surface. In this work, we found that the interface strain implies an asymmetric intensity variation of SHG with respect to the surface azimuthal angles as an ultra thin Ag film is deposited on silicon wafers. This asymmetric behavior is prominent as the deposited silver layer is heated so that the continuous film aggregates to become granular nanoparticles. Similar changes of the surface asymmetric SHG are observed for a bare Si wafer imposed upon by an external force.     

Correlation of size and oxygen bonding at the interface of Si nanocrystal in Si–SiO2 nanocomposite: A Raman mapping study

Raman spectroscopy/mapping is used to investigate the variation of Si phonon wavenumbers, i.e., lower wavenumber (LW ~ 495–510 cm⁻¹) and higher wavenumber (HW ~ 515–519 cm⁻¹) phonons, observed in Si–SiO₂ multilayer nanocomposite (NCp) grown using pulsed laser deposition. Sensitivity of Raman spectroscopy as a local probe to surface/interface is effectively used to show that LW and HW phonons originate at surface (Si–SiO₂ interface) and core of Si nanocrystals, respectively. The consistent picture of this understanding is developed using Raman spectroscopy monitored laser heating/annealing and cooling experiment at the site of the desired wavenumber, chosen with the help of Raman mapping. Raman spectra calculations for Si₄₁ cluster with oxygen and hydrogen termination show strong mode at 512 cm⁻¹ for oxygen terminated cluster corresponding to the vibration of surface Si atoms. This supports our attribution of LW phonons to be originating at the Si–SiO₂ surface/interface. These results along with XPS show that nature of interface (oxygen bonding) in turn depends on the size of nanocrystals and LW phonons originate at the surface of smaller Si nanocrystals. The understanding developed can conclude the ongoing debate on large variation in Si phonon wavenumbers of Si–SiO₂ NCps in the literature. Copyright © 2015 John Wiley & Sons, Ltd.