Yb:YAG晶体性能实验测量

为了测量脉冲时间宽度小于20 ns时的射线时间分辨图像,发展了新型无机闪烁体Yb:YAG,并实验测量了晶体的发光衰减时间、X射线激发发光光谱、相对发光效率和空间分辨等性能,研究了Yb:YAG晶体的发光性能。实验表明,Yb:YAG发光有三种衰减成分,快成分衰减常数为1.2 ns,慢成分衰减常数与射线种类有关;X射线激发发光光谱在250~800 nm范围,有三个发光峰,分别为320,380和500 nm,且320 nm处强度最大;相对发光效率为1900 ph/MeV;使用钨分辨卡测得Yb: YAG空间分辨能力为2 lp/m,使用刀口法测得空间调制传递函数为0.5时的频率为0.7 lp/mm。结果说明Yb:YAG晶体性能能够满足所需测量要求。     

Yb3+离子掺杂浓度对Yb∶YAG晶体发光及荧光寿命的影响

研究了不同掺杂浓度Yb∶YAG晶体的发光特性和荧光寿命.Yb3+在YAG晶体中的掺杂浓度分别为5at%、10at%、20at%、30at%.Yb3+离子掺杂浓度越高，Yb∶YAG晶体的吸收系数越大.采用940 nm波长的LD泵浦源和TRIA X550荧光谱仪，对这一系列掺有不同浓度Yb3+的Yb∶YAG晶体进行了荧光光谱的测定.结果表明:在1030 nm主发光波段的荧光强度以10at%Yb∶YAG的为最强.同时发现它在450 nm-680 nm波段有明显的可见发光，其强度随Yb3+掺杂浓度的增加而迅速地增强.Yb∶YAG晶体的荧光寿命存在浓度猝灭现象，对猝灭机制进行了分析研究，指出浓度猝灭的主要原因是合作发光和痕量稀土离子的上转换发光.     

Yb:YAG晶体性能实验测量

为了测量脉冲时间宽度小于20 ns时的射线时间分辨图像,发展了新型无机闪烁体Yb:YAG,并实验测量了晶体的发光衰减时间、X射线激发发光光谱、相对发光效率和空间分辨等性能,研究了Yb:YAG晶体的发光性能。实验表明,Yb:YAG发光有三种衰减成分,快成分衰减常数为1.2 ns,慢成分衰减常数与射线种类有关;X射线激发发光光谱在250~800 nm范围,有三个发光峰,分别为320,380和500 nm,且320 nm处强度最大;相对发光效率为1900 ph/MeV;使用钨分辨卡测得Yb: YAG空间分辨能力为2 lp/m,使用刀口法测得空间调制传递函数为0.5时的频率为0.7 lp/mm。结果说明Yb:YAG晶体性能能够满足所需测量要求。     

Yb:YAG晶体的合作发光现象

研究了Yb：YAG晶体的合作发光现象。当用940nm的近红外光激发时,Yb:YAG晶体有明显的上转换蓝色发光。实验发现498 nm的蓝色发光强度与激发功率的平方成正比,而且Yb3+掺杂浓度越高,蓝色发光越强。分析表明这是Yb3+间强的相互作用导致的合作发光,是由于Yb3+在共价性的YAG基质中,它的4f13电子易于与近邻离子发生相互作用导致的。     

AlP/SiO2纳米复合材料的光致发光研究

本文对用溶胶-凝胶方法制备的xAlP/100SiO₂凝胶玻璃的光致发光进行了研究,表明585nm附近的发光是凝胶玻璃中的AlP纳米晶粒表面态和缺陷复合发光.发光峰位与AlP的参杂量无关,但发光峰的强度随x的增加而减弱;另外与H₂的反应时间越长,发光强度减弱.     

W和Si使基质发光材料NaEu(MoO4)4发光增强的现象

本文研究了基质发光材料Na5Eu(MoO4)4制备过程中加入H2WO4或SiO2后发光增强的现象.对Na5Eu(Mo1-xWxO4)4体系,当0x=0.033时,增强达约30%.对Na5Eu(MoO4)4-SiO2体系,当Si与(Si+Mo)的摩尔数比y在0y=0.028时,增强达约50%.     

氟氧化物氟化物五磷酸盐玻璃中Er3+的直接上转换增敏发光的比较

本文研究了ErYb共掺的氟氧化物玻璃 (ErYb:FOG)、氟化物ZBLAN玻璃和五磷酸盐非晶在 966nm半导体激光激发下的直接上转换敏化发光现象。发现有丰富的上转换发光现象 ,这是由于样品中Yb3 的浓度很高 ,Er3 Yb3 ,Yb3 Yb3 离子之间的相互作用和能量传递作用都很强造成的。研究发现ErYb :FOG玻璃的直接上转换增敏发光比磷酸盐大 1 0 0～ 1 0 0 0 0 0倍 ;而很有趣的结果在于氟氧化物玻璃的直接上转换增敏发光与ZBLAN玻璃接近 ;这对于提高频率上转换的综合性能是很有意义的。     

Yb~(3 )离子掺杂浓度对Yb∶YAG晶体发光及荧光寿命的影响

研究了不同掺杂浓度Yb∶YAG晶体的发光特性和荧光寿命·Yb3 在YAG晶体中的掺杂浓度分别为5at%、10at%、20at%、30at%·Yb3 离子掺杂浓度越高,Yb∶YAG晶体的吸收系数越大·采用940nm波长的LD泵浦源和TRIAX550荧光谱仪,对这一系列掺有不同浓度Yb3 的Yb∶YAG晶体进行了荧光光谱的测定.结果表明:在1030nm主发光波段的荧光强度以10at%Yb∶YAG的为最强·同时发现它在450nm~680nm波段有明显的可见发光,其强度随Yb3 掺杂浓度的增加而迅速地增强·Yb∶YAG晶体的荧光寿命存在浓度猝灭现象,对猝灭机制进行了分析研究,指出浓度猝灭的主要原因是合作发光和痕量稀土离子的上转换发光·     

Na2SrSiO4∶Ce3+,Tb3+,Yb3+的制备及近红外量子剪裁发光性质

采用高温固相法制备了新型Na2SrSiO4∶Ce3+,Tb3+,Yb3+的近红外发光材料.对样品可见和近红外激发光谱、发射光谱及荧光寿命的研究表明,Na2SrSiO4∶Ce3+,Tb3+,Yb3+中存在高效的Tb3+→Yb3+的量子剪裁下转换效应,下转换量子效率约为182.4％.Ce3+的共掺大大提高了样品的紫外光吸收,显著敏化了样品的近红外发光效率.研究了Ce3+,Tb3+和Yb3+掺入量对其发光性质的影响.结果表明,当Ce3+的浓度为2％,Tb3+的浓度为13％和Yb3+的浓度为16％时,样品的近红外发光最强.     

Ga1-xAlxAs LED深能级对其发光效率的影响

本文用DLTS法测量了发光效率不同的三只Ga1-xAlxAs LED的深能级浓度.深度和俘获截面,并计算出电子和空穴的寿命,同时测量了它们的发光光谱和光通.从发光效率正比于载流子寿命的观点出发,分析了实验结果.表明1*与3*LED发光效率比R1大致等于它们的寿命比Rτ,但2*与3*却差别很大,文中从光谱角度作了一些分析,差值有所改进.从载流子寿命分析,找出了△Em=0.28、0.33与0.32eV三个能级是分别影响三个LED效率的主要能级。指出了8800Å的红外峰是使发光效率降低的另一个原因,它可能起因于外延层与村底界面处GaAs的带间复合和通过杂质的复合,要得到高效的LED必须制备出好的Ga1-xAlxAs与GaAs界面,应尽可能使红外峰减少.实验表明,效率高的LED仅有一个深能级(0.28eV),在室温下视察不到明显的红外峰。     

Au/(SiO2/Si/SiO2)纳米双势垒/n+-Si结构的电致发光研究

利用射频磁控溅射方法,在n⁺-Si衬底上淀积SiO₂/Si/SiO_{2纳米双势垒单势阱结构,其中Si层厚度为2至4nm,间隔为0.2nm,邻近n⁺-S i衬底的SiO2层厚度固定为1.5nm,另一SiO2层厚度固定为3nm.为了 对比研究,还制备了Si层厚度为零的结构,即SiO2(4.5nm)/n⁺-Si 结构.在经过600℃氮气下退火30min,正面蒸上半透明Au膜,背面也蒸Au作欧姆接触后,所 有样品都在反向偏置(n^＋-Si的电压高于Au电极的电压)下发光,而在正向偏压 下不发光.在一定的反向偏置下,电流和电致发光强度都随Si层厚度的增加而同步振荡,位 相相同.所有样品的电致发光谱都可分解为相对高度不等的中心位于2.26eV(550nm)和1.85eV (670nm)两个高斯型发光峰.分析指出该结构电致发光的机制是：反向偏压下的强电场使Au/( SiO2/Si/SiO2)纳米双势垒/n⁺-Si结构发生了雪崩击穿 ,产生大量的电子-空穴对,它们在纳米SiO2层中的发光中心(缺陷或杂质)上复 合而发光. 关键词： 电致发光 纳米双势垒 高斯型发光峰 雪崩击穿}     

Local structure of porous silicon studied by means of X-ray emission spectroscopy

2,3 X-ray emission spectra of porous silicon (P-Si) and of spark-processed silicon (sp-Si). Both types of Si-structure display strong photoluminescence in the visible range of the spectrum. Porous samples were prepared by anodization of n^-- and p⁺-Si-wafers. Whereas for the P-Si processed from p⁺-Si the presence of some amorphous silicon is detected, the X-ray emission spectra of porous Si prepared from n^--Si display a higher content of SiO₂. For spark-processed Si the Si L_2,3 X-ray emission spectra reveal a much stronger degree of oxidation which extends to depths larger than 10000 Å. Furthermore, the chemical state of silicon atoms of sp-Si measured at the center of the processed area is close to that of silicon dioxide, and it has an influence on the photoluminescence energy. Specifically, green photoluminescent sp-Si shows a higher degree of oxidation than the blue luminescent specimen. However, the depth of oxidation consistently decreases in areas with weak or no PL. Possible origins of the observed photoluminescence are discussed. Accepted: 6 March 1997     

The photovoltaic effect in poly(alkylthiophene) films on a silicon substrate

A study of photovoltage was made for a series of sandwich structures on the basis of poly(3-dode-cylthiophene) films having characteristic thicknesses 100 and 500 nm and being deposited on n-Si and p-Si substrates from a solution. Semitransparent Al and Au electrodes were obtained on the surfaces of these films by thermal evaporation. A clear photoresponse was obtained in films on an n-Si substrate. Two distinct spectral components of the photovoltage were observed in the 1.3-to 3.6-eV (900–300 nm) energy range for incident quanta. The first component corresponds to the absorption edge of the Si substrate (1.4–1.6 eV). The other corresponds to the π-π* absorption of the polythiophene films (1.7–2.1 eV). The dependences of the photovoltage upon radiation intensity are different for these two spectral components. The relaxation time of the photoresponse for the second component, corresponding to the absorption in the film, is 10–20 min. This is 3–4 orders of magnitude higher than the relaxation time for the first component. A model of the potential barrier at the polythiophene/n-Si interface, allowing one to explain the main experimental results, is proposed. This barrier is formed as a result of the chemical interaction of the polythiophene molecules with the substrate.     

硅表面硅镱键合与量子级联结构的发光

用纳秒强激光脉冲制备了纳米硅和硅表面的硅镱键合结构,检测了纳米硅表面硅镱键合的发光特性,并对这种结构相应的光致发光(PL)和电致发光(EL)的动力学机理进行了研究。观察到纳米硅表面硅镱键合在700nm附近尖锐的强发光峰,结合第一性原理计算认为是硅镱键合在弯曲纳米硅表面的局域态发光;利用纳秒脉冲激光沉积技术(PLD)制备多晶硅薄膜,发现由硅镱界面的失配形成表面的突触,其上的硅镱键合产生带隙中的电子局域态,该局域态发光分布在1250~1650nm波长范围,有增强的EL发光;用PLD方法制备硅镱多层膜量子级联结构,测量到光通信窗口的多个发光峰,并观察到随膜层数增加且发光峰增多。     

硅表面硅镱键合与量子级联结构的发光

用纳秒强激光脉冲制备了纳米硅和硅表面的硅镱键合结构,检测了纳米硅表面硅镱键合的发光特性,并对这种结构相应的光致发光（PL）和电致发光（EL）的动力学机理进行了研究。观察到纳米硅表面硅镱键合在700 nm附近尖锐的强发光峰,结合第一性原理计算认为是硅镱键合在弯曲纳米硅表面的局域态发光;利用纳秒脉冲激光沉积技术（PLD）制备多晶硅薄膜,发现由硅镱界面的失配形成表面的突触,其上的硅镱键合产生带隙中的电子局域态,该局域态发光分布在1250~1650 nm波长范围,有增强的EL发光;用PLD方法制备硅镱多层膜量子级联结构,测量到光通信窗口的多个发光峰,并观察到随膜层数增加且发光峰增多。     

Characterization of luminescent chromophore obtained from silica spheres

Blue light emitting chromophores have been separated from silica spheres by soaking them into acetone for 120 days. The luminescent chromophores were not obtained from other solvents, including ether, methanol, ethanol, 2-propanol, chloroform and tetrahydrofuran. According to the Fourier transform infrared spectrum, the luminescent material is composed of C–OH, –CH₂, –CH₃, C=O, and Si–O–Si. UV–visible absorption peak of the chromophore is at 5.17 eV (240 nm). Field emission scanning electron microscope images show small cracks on the surface of aged spheres. The luminescence peak was at 2.81 eV (441 nm) for excitation energy between 3.88 and 3.35 eV and slightly shifted toward lower energy for excitation energy lower than 3.35 eV. The deconvoluted luminescent spectrum shows two emission bands at 3.08 and 2.74 eV, which are well-matched the oxygen deficient center model. Compared to the absorption peak (5.17 eV) and the emission peak (2.81 eV), large Stokes shift (2.36 eV) is observed.     

A high efficient antireflective down-conversion Y<Subscript>2</Subscript>O<Subscript>3</Subscript>:Bi<Superscript>3+</Superscript>, Yb<Superscript>3+</Superscript> thin films

The high efficient antireflective down-conversion Y₂O₃:Bi, Yb films have been prepared successfully on Si(100) substrates by pulsed laser deposition (PLD) method, Upon excitation of ultraviolet photon varying from 300 to 400 nm, near-infrared emission of Yb³⁺ was observed for the film, can be efficiently absorbed by silicon (Si) solar cell. Most interestingly, there is a very low average reflectivity 1.46% for the incident light from 300 to 1100 nm. To the best of our knowledge, this is the lowest reflectance for the down-conversion thin films prepared by cost efficient method. The surface topography of the high efficient antireflective films can be controllably tuned through the substrate template regulation by optimizing process parameters. Besides, the results showed that there is a close relationship between luminescent property and morphology of the film. With the change of the surface morphology, the intensity of Bi³⁺ and Yb³⁺ emission peaks increase first and then decrease. The obtained results demonstrate that this film can enhance the Si solar cell efficiency through light trapping and spectrum shifting.     

Yb3+-Tm3+共掺钨钼酸盐纳米晶体的发光特性

以聚乙二醇为络合剂,采用水热法制备了发光性能优越的Yb3+-Tm3+共掺BaGd2(WO4)0.5(MoO4)0.5纳米晶体。改变稀土掺杂量并生产不同掺杂量的BaGd2(WO4)0.5(MoO4)0.5∶Yb3+/Tm3+。以X射线衍射仪(XRD)、扫描电子显微镜(SEM)及透射电子显微镜(TEM)对样品进行表征。结果表明,BaGd2(WO4)0.5-(MoO4)0.5∶Yb3+/Tm3+纳米晶属四方晶系,粒径在25~40nm之间,使用Hitachif-4500分光光度计分析样品,发现当Yb3+/Tm3+为4∶1、Yb3+离子浓度为6.0%时,BaGd2(WO4)0.5(MoO4)0.5∶Yb3+/Tm3+的发光效率最高。当Tm3+离子发生1G4→3H6跃迁时会产生可见光发射,对应于光谱图中475nm处的蓝光;当Tm3+离子发生1G4→3F4跃迁时产生的可见光发射,对应于光谱图中650nm处的红光。光谱图像及泵浦功率的双对数曲线表明,其中蓝光发射是三光子发射过程,红光发射是双光子发射过程。样品的量子产率接近0.9%。Yb3+-Tm3+共掺BaGd2(WO4)0.5(MoO4)0.5纳米晶体的发光性能优异,具有很高的应用价值。     

Annealing of γ-ray irradiated lithium compensated p-type silicon

Abstract

Annealing behavior of electrical properties and photoluminescence spectra both at 77 °K in electron-irradiated melt-grown n-GaAs were investigated. Defects electrically active in the Hall mobility and carrier removal anneal through two stages centered at 250° and 460 °K. From the temperature dependence of carrier concentration the existence of a defect level located near 0.15 eV below the conduction band is supposed. Several emission bands are resolved at 1.51, 1.47, 1.415, 1.305 and ～1.2 eV in photoluminescence experiments. Electron irradiation (1.5–2.0 MeV) causes a remarkable decrease in emission intensity of 1.51 and ～1.2 eV bands. Recovery of emission intensity occurs remarkably when samples are annealed to 520 °K which would correspond to the 460 °K annealing stage for carrier concentration and Hall mobility. The 250 °K annealing stage is not observed in photoluminescence experiments. The 1.415 eV peak appears clearly after irradiation and grows remarkably with the 520 °K annealing, especially in Si-doped samples, resulting in large reverse annealing. This band is tentatively speculated to be a complex of Si on As site with As vacancy. Moreover, in samples doped with Te a new emission band at 1.305 eV (9500 Å) is observed after 470°–620 °K annealing.     

Fabrication of composite based on GeSi with Ag nanoparticles using ion implantation

Comparative analysis of the structural and optical properties of composite layers fabricated with the aid of implantation of single-crystalline silicon (c-Si) using Ge⁺ (40 keV/1 × 10¹⁷ ions/cm²) and Ag⁺ (30 keV/1.5 × 10¹⁷ ions/cm²) ions and sequential irradiation using Ge⁺ and Ag⁺ ions is presented. The implantation of the Ge⁺ ions leads to the formation of Ge: Si fine-grain amorphous surface layer with a thickness of 60 nm and a grain size of 20–40 nm. The implantation of c-Si using Ag⁺ ions results in the formation of submicron porous amorphous a-Si structure with a thickness of about 50 nm containing ion-synthesized Ag nanoparticles. The penetration of the Ag⁺ ions in the Ge: Si layer stimulates the formation of pores with Ag nanoparticles with more uniform size distribution. The reflection spectra of the implanted Ag: Si and Ag: GeSi layers exhibit a sharp decrease in the intensity in the UV (220–420 nm) spectral interval relative to the intensity of c-Si by more than 50% owing to the amorphization and structuring of surface. The formation of Ag nanoparticles in the implanted layers gives rise to a selective band of the plasmon resonance at a wavelength of about 820 nm in the optical spectra. Technological methods for fabrication of a composite based on GeSi with Ag nanoparticles are demonstrated in practice.