Ba deposition and oxidation on theta-Al2O3/NiAl(100) ultrathin films. Part II: O2(g) assisted Ba oxidation

Ba deposition on a theta-Al(2)O(3)/NiAl(100) substrate and its oxidation with gas-phase O(2) at various surface temperatures are investigated using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and temperature programmed desorption (TPD) techniques. Oxidation of metallic Ba by gas-phase O(2) at 800 K results in the growth of 2D and 3D BaO surface domains. Saturation of a metallic Ba layer deposited on theta-Al(2)O(3)/NiAl(100) with O(2)(g) at 300 K reveals the formation of BaO(2)-like surface states. These metastable peroxide (O(2)(2-)) states are converted to regular oxide (O(2-)) states at higher temperatures (800 K). In terms of thermal stability, BaO surface layers (theta(Ba) < 5 ML) that are formed by O(2)(g) assisted oxidation on the theta-Al(2)O(3)/NiAl(100) substrate are significantly more stable (with a desorption/decomposition temperature of c.a. 1050 K) than the thick (2 < theta(Ba) < 10 ML) metallic/partially oxidized Ba layers prepared in the absence of gas-phase O(2), whose multilayer desorption features appear as low as 700 K.     

Low temperature H2O and NO2 coadsorption on theta-Al2O3/NiAl(100) ultrathin films

The coadsorption of H(2)O and NO(2) molecules on a well-ordered, ultrathin theta-Al(2)O(3)/NiAl(100) film surface was studied using temperature programmed desorption (TPD), infrared reflection absorption spectroscopy (IRAS), and X-ray photoelectron spectroscopy (XPS). For H(2)O and NO(2) monolayers adsorbed separately on the theta-Al(2)O(3)/NiAl(100) surface, adsorption energies were estimated to be 44.8 and 36.6 kJ/mol, respectively. Coadsorption systems prepared by sequential deposition of NO(2) and H(2)O revealed the existence of coverage and temperature-dependent adsorption regimes where H(2)O molecules and the surface NO(x) species (NO(2)/N(2)O(4)/NO(2)(-),NO(3)(-)) form segregated and/or mixed domains. Influence of the changes in the crystallinity of solid water (amorphous vs crystalline) on the coadsorption properties of the NO(2)/H(2)O/theta-Al(2)O(3)/NiAl(100) system is also discussed.     

Ba deposition and oxidation on theta-Al2O3/NiAl(100) ultrathin films. Part I: Anaerobic deposition conditions

Room-temperature Ba deposition on an oxygen-terminated theta-Al(2)O(3)/NiAl(100) ultrathin film substrate under ultrahigh vacuum (UHV) conditions is studied using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and temperature programmed desorption (TPD) techniques. In addition, Ba oxidation by the ions of the alumina substrate at 300 K < T < 1200 K in the absence of a gas-phase oxidizing agent is investigated. Our results indicate that at room temperature Ba grows in a layer-by-layer fashion for the first two layers, and Ba is partially oxidized. Annealing at T < 700 K results in further oxidation of the Ba species, whereas annealing at higher temperatures leads to loss of Ba from the surface via desorption and subsurface diffusion.     

NO2 adsorption on ultrathin theta-Al2O3 films: formation of nitrite and nitrate species

Interaction of NO2 with an ordered theta-Al2O3/NiAl(100) model catalyst surface was investigated using temperature programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS). The origin of the NO(x) uptake of the catalytic support (i.e., Al2O3) in a NO(x) storage catalyst is identified. Adsorbed NO2 is converted to strongly bound nitrites and nitrates that are stable on the model catalyst surface at temperatures as high as 300 and 650 K, respectively. The results show that alumina is not completely inert and may stabilize some form of NO(x) under certain catalytic conditions. The stability of the NO(x) formed by exposing the theta-Al2O3 model catalyst to NO2 adsorption increases in the order NO2 (physisorbed or N2O4) < NO2 (chemisorbed) < NO2- < NO3-.     

Agglomeration, sputtering, and carbon monoxide adsorption behavior for Au/Al(2)O(3) prepared by Au(n)(+) deposition on Al(2)O(3)/NiAl(110)

Size-selected gold clusters, Au(n)(+) (n = 1, 3, 4), were deposited on an ordered Al(2)O(3) film grown on NiAl(110), and changes in morphology and electronic properties with deposition/annealing temperature and cluster size were investigated by X-ray photoelectron spectroscopy (XPS) and ion-scattering spectroscopy (ISS). Extensive agglomeration was observed by ISS for annealing temperatures above 300 K, accompanied by large shifts in the Au XPS binding energy. Agglomeration is more extensive in room-temperature deposition, compared to samples prepared by low-temperature deposition, then annealed to room temperature. Agglomeration is also observed to be dependent on deposited cluster size. CO adsorption was studied by ISS and temperature-programmed desorption, and we looked for CO oxidation under conditions where substantial activity is seen for Au(n)/TiO(2). No activity was observed for Au(n)/Al(2)O(3). The differences between the two systems are interpreted in terms of the nature of the metal-support interactions.     

Temperature-dependent structuring of Au-Pt bimetallic nanoclusters on a thin film of Al2O3/NiAl(100)

Au-Pt bimetallic nanoclusters on a thin film of Al(2)O(3)/NiAl(100) undergo significant structural evolution on variation of the temperature. Au and Pt deposited sequentially from the vapor onto thin-film Al(2)O(3)/NiAl(100) at 300 K form preferentially bimetallic nanoclusters (diameter ≦ 6.0 nm and height ≦ 0.8 nm) with both Au and Pt coexisting at the cluster surface, despite the order of metal deposition. These bimetallic clusters are structurally ordered, have a fcc phase and grow with their facets either (111) or (001) parallel to the θ-Al(2)O(3)(100) surface. Upon annealing the clusters to 400-500 K, the Au atoms inside the clusters migrate toward the surface, resulting in formation of a structure with a Pt core and an Au shell. Annealing the sample to 500-650 K reorients the bimetallic clusters--all clusters have their (001) facets parallel to the oxide surface--and induces oxidation of Pt. Such annealed bimetallic clusters become encapsulated with the aluminium-oxide materials and a few Au remain on the surface.     

Low-temperature decomposition of methanol on Au nanoclusters supported on a thin film of Al2O3/NiAl100

With a variety of surface probe techniques, we investigated low-temperature decomposition of methanol on Au nanoclusters formed by vapor deposition onto an ordered Al(2)O(3)/NiAl(100) thin film. Upon adsorption of methanol on the Au clusters (with mean diameter 1.5-3.8 nm and height 0.45-0.85 nm) at 110 K, some of the adsorbed methanol dehydrogenates directly into carbon monoxide (CO); the produced hydrogen atoms (H) begin to desorb near 125 K whereas most of the CO desorbs above 240 K. The reaction exhibits a significant dependence on the Au coverage: the produced CO increases in quantity with the Au coverage, reaches a maximum at about 1.0-1.5 ML Au, whereas decreases with further increase of the Au coverage. The coverage-dependence is rationalized partly by an altered number of reactive sites associated with low-coordinated Au in the clusters. At least two kinds of reactive sites for the low-temperature decomposition are distinguished through distinct C-O stretching frequencies (2050 cm(-1) and 2092 cm(-1)) while the produced CO co-adsorbs with H and methanol.     

Atomic imaging of nucleation of trimethylaluminum on clean and H2O functionalized Ge(100) surfaces

The direct reaction of trimethylaluminum (TMA) on a Ge(100) surface and the effects of monolayer H(2)O pre-dosing were investigated using ultrahigh vacuum techniques, such as scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS), and x-ray photoelectron spectroscopy (XPS), and density functional theory (DFT). At room temperature (RT), a saturation TMA dose produced 0.8 monolayers (ML) of semi-ordered species on a Ge(100) surface due to the dissociative chemisorption of TMA. STS confirmed the chemisorption of TMA passivated the bandgap states due to dangling bonds. By annealing the TMA-dosed Ge surface, the STM observed coverage of TMA sites decreased to 0.4 ML at 250?°C, and to 0.15 ML at 450?°C. XPS analysis showed that only carbon content was reduced during annealing, while the Al coverage was maintained at 0.15 ML, consistent with the desorption of methyl (-CH(3)) groups from the TMA adsorbates. Conversely, saturation TMA dosing at RT on the monolayer H(2)O pre-dosed Ge(100) surface followed by annealing at 200?°C formed a layer of Ge-O-Al bonds with an Al coverage a factor of two greater than the TMA only dosed Ge(100), consistent with Ge-OH activation of TMA chemisorption and Ge-H blocking of CH(3) chemisorption. The DFT shows that the reaction of TMA has lower activation energy and is more exothermic on Ge-OH than Ge-H sites. It is proposed that the H(2)O pre-dosing enhances the concentration of adsorbed Al and forms thermally stable Ge-O-Al bonds along the Ge dimer row which could serve as a nearly ideal atomic layer deposition nucleation layer on Ge(100) surface.     

Interactions of O(2) with Pd nanoparticles on alpha-Al(2)O(3)(0001) at low and high O(2) pressures

The interaction of O(2) with small Pd particles (2-10 nm) supported on an alpha-Al(2)O(3)(0001) single crystal under both ultrahigh vacuum (UHV) and high-pressure conditions has been studied by temperature-programmed desorption (TPD), temperature-programmed low-energy ion scattering (TP-LEIS), and X-ray photoelectron spectroscopy (XPS). A low O(2) exposure (30 L) at 500 K leads to surface oxygen adatoms on the Pd nanoparticles, which desorb in TPD as O(2) in a peak at approximately 880 K. Surface O adatoms on the smallest Pd particles move to subsurface sites starting at 400 K, and they almost all move subsurface by approximately 750 K, desorbing mainly at considerably higher temperature. The dominant oxygen species above 700 K is subsurface, implying that it is more stable than oxygen adatoms on Pd. Exposures of the Pd nanoparticles to 25 Torr O(2) at 373-473 K readily convert the Pd to a species whose Pd XPS peak shifts by the same amount as the binding energy difference between bulk Pd and bulk PdO. We attribute this to PdO nanoparticles (or a thin film of PdO on or under the Pd for the larger particles). The decomposition of the PdO on these nanoparticles to Pd in an equilibrium O(2) pressure of 10-7 Torr does not occur until approximately 750 K, or approximately 200 K higher than the equilibrium decomposition of bulk PdO. This is attributed to the higher energy of Pd nanoparticles compared to bulk Pd and, for the larger particles, to the adhesion energy of the PdO film to the Pd, both of which stabilize the PdO on these Pd nanoparticles relative to bulk PdO. This PdO-like film on the larger particles may be similar to the ordered oxide thin film previously reported to form on Pd(111) but may also reside at the alpha-Al(2)O(3) interface and be partially stabilized by adhesion to this interface.     

Hydrazine decomposition over Irn/Al2O3 model catalysts prepared by size-selected cluster deposition

Hydrazine decomposition chemistry was probed over a temperature range from 100 to 800 K for a series of model catalysts prepared by mass-selected Ir(n)(+) deposition on planar Al(2)O(3)/NiAl(110). Two sets of experiments are reported. Temperature-programmed desorption (TPD) was used to study hydrazine desorption and decomposition on Al(2)O(3)/NiAl(110) and on a model catalyst prepared by deposition of Ir(+) on Al(2)O(3)/NiAl(110) at a density large enough (5 x 10(14) cm(-2)) that formation of a distribution of small Ir(n) clusters on the surface is expected. This model catalyst was found to have hydrazine decomposition properties qualitatively similar to those observed on single-crystal Ir and polycrystalline Rh. This catalyst was also studied by X-ray photoelectron spectroscopy (XPS), to probe TPD-induced changes in the samples. A substantial decrease in the Ir XPS intensity suggests that considerable sintering takes place when the samples are heated to 800 K. In addition, a significant fraction of the nitrogen contained in the hydrazine is converted to an aluminum nitride (or mixed Al(x)O(y)N(z)) compound. Continuous flow experiments were used to probe relative reactivity at 300 and 400 K of samples prepared by depositing differently sized Ir(n)(+) clusters. At 300 K, samples prepared with preformed Ir(n)(+) (n = 5, 7, 10) are about twice as active, per Ir atom, as samples prepared with Ir(+) deposition, and there is a weaker trend to higher activity with increasing cluster size. At 400 K the trends are similar, but weaker, suggesting that thermal modification of the samples is already significant.     

Reduction of the (001) surface of gamma-V2O5 compared to alpha-V2O5

The defect-free gamma-V(2)O(5)(001) surface and ordered structures of oxygen vacancies have been studied for a wide range of defect concentrations, Theta ((1)/(6) monolayer (ML) < or = Theta < or = 1 ML), combining density functional theory and statistical thermodynamics. The gamma polymorph of V(2)O(5) is characterized by two structurally different vanadium sites, V(A) and V(B). The V(A) sites having a weaker bond to an adjacent crystal layer are easier to reduce. Up to (1)/(2) ML, the V(A) defect structures with defects aligned along the [010] direction are increasingly more stable as in alpha-V(2)O(5)(001). At higher defect concentrations, the different coordination of the V(B) vanadium atoms at the gamma-V(2)O(5) surface causes an increase in the vacancy formation energy of approximately 0.8 eV/atom at Theta = 1.0 compared to Theta = (1)/(2). For alpha-V(2)O(5), this increase amounts to 0.2 eV/atom only. Under conditions (low oxygen partial pressures and high temperatures) at which the alpha-V(2)O(5)(001) surface would be fully reduced, the gamma-V(2)O(5)(001) surface is only partially reduced. The presence of surface vanadyl oxygen groups at V(B) sites may change the surface reactivity compared to that of alpha-V(2)O(5)(001).     

Acetone and water on TiO2(110): H/D exchange

Isotopic H/D exchange between coadsorbed acetone and water on the TiO2(110) surface was examined using temperature programmed desorption (TPD) as a function of coverage and two surface pretreatments (O2 oxidation and mild vacuum reduction). Coadsorbed acetone and water interact repulsively on reduced TiO2(110) on the basis of results from the companion paper to this study, with water exerting a greater influence in destabilizing acetone and acetone having only a nominal influence on water. Despite the repulsive interaction between these coadsorbates, about 0.02 monolayers (ML) of a 1 ML d6-acetone on the reduced surface (vacuum annealed at 850 K to a surface oxygen vacancy population of 7%) exhibits H/D exchange with coadsorbed water, with the exchange occurring exclusively in the high-temperature region of the d6-acetone TPD spectrum at approximately 340 K. The effect was confirmed with combinations of d0-acetone and D2O. The extent of exchange decreased on the reduced surface for water coverages above approximately 0.3 ML due to the ability of water to displace coadsorbed acetone from first layer sites to the multilayer. In contrast, the extent of exchange increased by a factor of 3 when surface oxygen vacancies were pre-oxidized with O2 prior to coadsorption. In this case, there was no evidence for the negative influence of high water coverages on the extent of H/D exchange. Comparison of the TPD spectra from the exchange products (either d1- or d5-acetone depending on the coadsorption pairing) suggests that, in addition to the 340 K exchange process seen on the reduced surface, a second exchange process was observed on the oxidized surface at approximately 390 K. In both cases (oxidized and reduced), desorption of the H/D exchange products appeared to be reaction limited and to involve the influence of OH/OD groups (or water formed during recombinative desorption of OH/OD groups) instead of molecularly adsorbed water. The 340 K exchange process is assigned to reaction at step sites, and the 390 K exchange process is attributed to the influence of oxygen adatoms deposited during surface oxidation. The H/D exchange mechanism likely involves an enolate or propenol surface intermediate formed transiently during the desorption of oxygen-stabilized acetone molecules.     

Site-dependent electron-stimulated reactions in water films on TiO2(110)

Electron-stimulated reactions in thin [<3 ML (monolayer)] water films adsorbed on TiO(2)(110) are investigated. Irradiation with 100 eV electrons results in electron-stimulated dissociation and electron-stimulated desorption (ESD) of adsorbed water molecules. The molecular water ESD yield increases linearly with water coverage theta for 0< or =theta< or =1 ML and 11 ML, the water ESD yield per additional water molecule adsorbed (i.e., the slope of the ESD yield versus coverage) is 3.5 times larger than for theta<1 ML. In contrast, the number of water molecules dissociated per incident electron increases linearly for theta< or =2 ML without changing slope at theta=1 ML. The total electron-stimulated sputtering rate, as measured by postirradiation temperature programmed desorption of the remaining water, is larger for theta>1 ML due to the increased water ESD for those coverages. The water ESD yields versus electron energy (for 5-50 eV) are qualitatively similar for 1, 2, and 40 ML water films. In each case, the observed ESD threshold is at approximately 10 eV and the yield increases monotonically with increasing electron energy. The results indicate that excitations in the adsorbed water layer are primarily responsible for the ESD in thin water films on TiO(2)(110). Experiments on "isotopically layered" films with D(2)O adsorbed on the Ti(4+) sites (D(2)O(Ti)) and H(2)O adsorbed on the bridging oxygen atoms (H(2)O(BBO)) demonstrate that increasing the water coverage above 1 ML rapidly suppresses the electron-stimulated desorption of D(2)O(Ti) and D atoms, despite the fact that the total water ESD and atomic hydrogen ESD yields increase with increasing coverage. The coverage dependence of the electron-stimulated reactions is probably related to the different bonding geometries for H(2)O(Ti) and H(2)O(BBO) and its influence on the desorption probability of the reaction products.     

First-principles study of the separation of Am(III)/Cm(III) from Eu(III) with Cyanex301

The experimentally observed extraction complexes of trivalent lanthanide Eu(III) and actinide Am(III)/Cm(III) cations with purified Cyanex301 [bis(2,4,4-trimethylpentyl)dithiophosphinic acid, HBTMPDTP denoted as HL], i.e., ML(3) (M = Eu, Am, Cm) as well as the postulated complexes HAmL(4) and HEuL(4)(H(2)O) have been studied by using energy-consistent 4f- and 5f-in-core pseudopotentials for trivalent f elements, combined with density functional theory and second-order M?ller-Plesset perturbation theory. Special attention was paid to explaining the high selectivity of Cyanex301 for Am(III)/Cm(III) over Eu(III). It is shown that the neutral complexes ML(3), where L acts as a bidentate ligand and the metal cation is coordinated by six S atoms, are most likely the most stable extraction complexes. The calculated metal-sulfur bond distances for ML(3) do reflect the cation employed; i.e., the larger the cation, the longer the metal-sulfur bond distances. The calculated M-S and M-P bond lengths agree very well with the available experimental data. The obtained changes of the Gibbs free energies in the extraction reactions M(3+) + 3HL → ML(3) + 3H(+) agree with the thermodynamical priority for Am(3+) and Cm(3+). Moreover, the ionic metal-ligand dissociation energies of the extraction complexes ML(3) show that, although EuL(3) is the most stable complex in the gas phase, it is the least stable in aqueous solution.     

Computational study on the reactions of H2O2 on TiO2 anatase (101) and rutile (110) surfaces

This study investigates the adsorption and reactions of H(2)O(2) on TiO(2) anatase (101) and rutile (110) surfaces by first-principles calculations based on the density functional theory in conjunction with the projected augmented wave approach, using PW91, PBE, and revPBE functionals. Adsorption mechanisms of H(2)O(2) and its fragments on both surfaces are analyzed. It is found that H(2)O(2) , H(2)O, and HO preferentially adsorb at the Ti(5c) site, meanwhile HOO, O, and H preferentially adsorb at the (O(2c))(Ti(5c)), (Ti(5c))(2), and O(2c) sites, respectively. Potential energy profiles of the adsorption processes on both surfaces have been constructed using the nudged elastic band method. The two restructured surfaces, the 1/3 ML oxygen covered TiO(2) and the hydroxylated TiO(2), are produced with the H(2)O(2) dehydration and deoxidation, respectively. The formation of main products, H(2)O(g) and the 1/3 ML oxygen covered TiO(2) surface, is exothermic by 2.8 and 5.0 kcal/mol, requiring energy barriers of 0.8 and 1.1 kcal/mol on the rutile (110) and anatase (101) surface, respectively. The rate constants for the H(2)O(2) dehydration processes have been predicted to be 6.65 × 10(-27) T(4.38) exp(-0.14 kcal mol(-1)/RT) and 3.18 × 10(-23) T(5.60) exp(-2.92 kcal mol(-1)/RT) respectively, in units of cm(3) molecule(-1) s(-1).     

Infrared spectroscopy and surface chemistry of beta-Ga(2)O(3) nanoribbons

The structure and surface chemistry of crystalline beta-Ga2O3 nanoribbons (NRs), deposited in a thin layer on various metallic and dielectric substrates (mainly on Au), have been characterized using vibrational spectroscopy. The results have been analyzed with the aid of a previous ab initio theoretical model for the beta-Ga2O3 surface structure. Raman spectra and normal-incidence infrared (IR) transmission data show little if any difference from corresponding results for bulk single crystals. For a layer formed on a metallic substrate, IR reflection-absorption spectroscopy (IRRAS) shows longitudinal-optic (LO) modes that are red-shifted by approximately 37 cm-1 relative to those of a bulk crystal. Evidence is also seen for a bonding interaction at the Ga2O3/Au interface following heating in room air. Polarization-modulated IRRAS has been used to study the adsorption of pyridine under steady-state conditions in ambient pressures as high as approximately 5 Torr. The characteristic nu19b and nu8a modes of adsorbed pyridine exhibit little or no shift from the corresponding gas-phase values. This indicates that the surface is only weakly acidic, consistent with the theoretical prediction that singly unsaturated octahedral Ga sites are the only reactive cation sites on the NR surface. However, evidence for adsorption at defect sites is seen in the form of more strongly shifted modes that saturate in intensity at low pyridine coverage. The effect of H atoms, formed by thermal cracking of H2, has also been studied. No Ga-H or O-H bonds are observed on the pristine NR surface. This suggests that the previously reported presence of such species on Ga2O3 powders heated in H2 is a result of a partial reduction of the oxide surface. The heat of adsorption of atomic H on the pristine beta-Ga2O3(100) surface at 0 K is computed to be -1.79 eV per H at saturation (average of Ga-H and O-H sites), whereas a value of +0.45 eV per H is found for the dissociative adsorption of H2. This suggests that rapid recombinative desorption of H2 may limit the coverage of chemisorbed H on this surface.     

Adsorption of [D2]methanol on Ru(001)--O surfaces: the influence of preadsorbed oxygen on the methoxide geometry.

The influence of oxygen precoverage on the bonding geometry of methoxide on Ru(001) was studied using the isotopically labeled molecule CHD2OH by reflection-absorption infrared spectroscopy (RAIRS). This molecule is an excellent model because the vibrational spectra of CHD2O- may be unambiguously correlated with the adsorption configuration. For Ru(001)--O layers with an effective oxygen coverage (theta0) between 0.25 and 0.6 ML (ML=monolayer), the influence of the oxygen precoverage was shown to vary with the initial methanol exposure. For an extremely low dose of [D2]methanol (0.01 L; L=Langmuir, 1 L=10(-6) torr s), at 90 K, no oxygen-coverage effects were detected on the geometry of [D2]methoxide: it adsorbs in an upright orientation (pseudo-C(3v) local symmetry), just as on clean Ru(001). An increase in the methanol exposure to 0.1 L, at the same temperature, results in the formation of a disordered layer of tilted methoxide: for theta(O)=0.25 ML, C(s)/C1 and intrinsic C1 configurations are present on the surface, whereas for theta(O)> or =0.5 ML, only the former species were identified. The thermal activation of these tilted layers to 105 K results in a lower coverage of upright methoxide for any oxygen precoverage, coadsorbed with decomposition products, as confirmed by the detection of adsorbed formaldehyde and, on the denser oxygen layer (theta(O)=0.6 ML), formate. The influence of the oxygen precoverage becomes determinant when annealing a [D2]methanol multilayer to 105 K: for theta(O)=0.25 ML, the RAIR spectrum correlates with a disordered layer of tilted methoxide and formaldehyde, whereas for theta(O)=0.6 ML upright methoxide, formate, and carbon monoxide were identified. On clean Ru(001), for methanol exposures > or =0.1 L, the C(3v) methoxide configuration was never attained upon thermal activation.     

La2O3对Ni/γ-Al2O3甲烷化催化剂的助催化作用

我国将稀土作为助剂引入镍基甲烷化催化剂,大大提高了催化剂的活性和热稳定性,并已投入工业应用［1－3］．稀土对不同镍催化剂反应性能及其作用机理的研究已有一些报导［3－7］．谢有畅等观察到镍负载在经单层La2O3改性的γ－Al2O3表面,其晶粒要比没有La2O3时小得多．Rotgerink等认为添加La后反应速率的增加不只是由于几何效应,而是La对甲烷化本身有促进作用,单位镍表面的活性是随La含量不同而改变的,活性增加的同时表观活化能也增加［5］．作为助剂的La2O3在氢还原和反应过程中的变化及其作用的研究和讨论较少,目前一般认为添…     

Kinetics of electron-induced decomposition of CF2Cl2 coadsorbed with water (ice): a comparison with CCl4

The kinetics of decomposition and subsequent chemistry of adsorbed CF(2)Cl(2), activated by low-energy electron irradiation, have been examined and compared with CCl(4). These molecules have been adsorbed alone and coadsorbed with water ice films of different thicknesses on metal surfaces (Ru; Au) at low temperatures (25 K; 100 K). The studies have been performed with temperature programmed desorption (TPD), reflection absorption infrared spectroscopy (RAIRS), and x-ray photoelectron spectroscopy (XPS). TPD data reveal the efficient decomposition of both halocarbon molecules under electron bombardment, which proceeds via dissociative electron attachment (DEA) of low-energy secondary electrons. The rates of CF(2)Cl(2) and CCl(4) dissociation increase in an H(2)O (D(2)O) environment (2-3x), but the increase is smaller than that reported in recent literature. The highest initial cross sections for halocarbon decomposition coadsorbed with H(2)O, using 180 eV incident electrons, are measured (using TPD) to be 1.0+/-0.2 x 10(-15) cm(2) for CF(2)Cl(2) and 2.5+/-0.2 x 10(-15) cm(2) for CCl(4). RAIRS and XPS studies confirm the decomposition of halocarbon molecules codeposited with water molecules, and provide insights into the irradiation products. Electron-induced generation of Cl(-) and F(-) anions in the halocarbon/water films and production of H(3)O(+), CO(2), and intermediate compounds COF(2) (for CF(2)Cl(2)) and COCl(2), C(2)Cl(4) (for CCl(4)) under electron irradiation have been detected using XPS, TPD, and RAIRS. The products and the decomposition kinetics are similar to those observed in our recent experiments involving x-ray photons as the source of ionizing irradiation.     

The growth of silver on an ordered alumina surface

The growth of Ag on an ordered Al2O3 surface was studied by low energy ion scattering spectroscopy (LEIS), scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), and temperature programmed desorption (TPD). Three-dimensional (3D) growth of Ag clusters was observed with STM and LEIS, with the cluster size increasing with Ag coverage. The XPS core level binding energies and the Auger parameters indicate a weak interaction between the Ag clusters and the Al2O3 support. Final state effects are determined to be the primary contribution to the Ag core level binding energy shift. Nonzero order kinetics was observed for Ag desorption in TPD with the Ag sublimation energy decreasing with decreasing cluster size.