反射式变掺杂GaAs光电阴极量子效率模型研究

借助指数掺杂与均匀掺杂光电阴极的量子效率公式,提出了采用加权平均法表示的反射式变掺杂光电阴极量子效率理论模型.使用该模型对某掺杂结构的反射式GaAs光电阴极量子效率曲率进行了拟合,获得了最佳的拟合效果,且模型的拟合结果能够定量地揭示材料的变掺杂结构,在不同入射光波段对阴极量子效率的贡献不相同这一现象.针对此现象进行了深入地分析和探讨. 关键词： GaAs 变掺杂 光电阴极 量子效率     

不同变掺杂结构GaAs光电阴极的光谱特性分析

为定量研究变掺杂结构对阴极量子效率的作用效果,设计生长了两种不同掺杂方式的反射式梯度掺杂GaAs光电阴极,激活后测量了两者的光谱响应曲线。将光谱响应曲线转换为对应的量子效率曲线,对不同入射光波段的量子效率进行了拟合分析,得到了体现变掺杂结构贡献程度的变掺杂系数K值。研究发现,同一阴极材料对不同波段的入射光,其掺杂结构产生的作用效果各不相同。同时,不同掺杂结构光电阴极对于相同波段范围内的入射光,其作用效果也不相同。产生这些差别的根本原因,是由于不同掺杂结构下,材料中内建电场的位置和强度不同而造成的。该研究为评判不同掺杂方式下光电阴极的结构性能提供了有效的分析手段,对研究阴极变掺杂结构的优化设计具有非常重要的应用价值。     

Comparative research for transmission-mode GaAs photocathodes of different doping structures on surface photovoltage

In order to well study the internal body performance for transmission-mode GaAs photocathode of different varied doping structures, two GaAs photocathodes of exponential doping structure and gradient doping structure were designed respectively. Because surface photovoltage spectrum has close relation with the internal properties of GaAs photocathodes, the connection between surface photovoltage and internal electronic field was well discussed through deduction and calculation. The difference of two structures and the value of internal electronic energy were exactly calculated and verified by experiments. The internal band bending energy could form an internal electronic field with the same direction, which could help the photo-excited electrons to move toward surface barrier layer. This research shows a better method to well study the varied doping structures for GaAs photocathode materials and will help to improve the growth structure for transmission-mode GaAs photocathode module in the future.     

利用梯度掺杂获得高量子效率的GaAs光电阴极

获得高量子效率且稳定性良好的阴极一直是近年来发展GaAs光电阴极的重要方向。对晶面为(100),掺杂Be,厚度为1μm分子束外延生长的反射式GaAs发射层,设计了一种从体内到表面掺杂浓度由高到低分布的新型梯度掺杂结构。掺杂浓度的范围从1×1019cm-3到1×1018cm-3,并利用(Cs,O)激活技术制备了GaAs光电阴极。光谱响应测试曲线显示,与传统均匀掺杂的GaAs光电阴极相比,梯度掺杂的GaAs光电阴极的量子效率在整个波段都有提高,积分灵敏度可达1580μA/lm,且具有更好的稳定性。讨论了这种新型GaAs光电阴极获得更高量子效率的内在机理。该设计结构是现实可行的,且具有很大发展潜力,它为国内发展高性能GaAs光电阴极提供了一条重要途径。     

GaAs光电阴极激活后的表面势垒评估研究

根据阴极制备过程中单独Cs激活和Cs-O交替激活两个阶段产生的光电流的峰值比,结合对电子穿过表面单势垒和双势垒后能量分布的理论曲线,提出了一种评估NEA GaAs光阴极表面势垒参数的新方法.利用该方法研究的结果完全符合双偶极层模型理论,并且和对实测阴极电子能量分布曲线拟合的结果非常一致.该方法简单、有效,在不增加测试手段的前提下,丰富了对NEA GaAs光电阴极激活效果及表面特征评价的方法和途径. 关键词： GaAs 光电阴极 表面势垒 能量分布     

GaAs光电阴极激活时Cs的吸附效率研究

从NEA GaAs光电阴极的激活光电流曲线发现,当系统真空度不很高时,在首次Cs激活阶段,表面掺杂浓度较低的阴极材料,其光电流产生需要的时间也较长.同时,随着系统真空度的提高,这种时间上的差异又变得不再明显.该现象表明,Cs原子在阴极表面的吸附效率同表面层掺杂浓度以及系统真空度之间有直接的联系.为定量分析这种关系,本文根据实验数据建立了Cs在阴极表面吸附效率的数学模型,利用该模型仿真的结果同实验现象非常符合.该研究对进一步开展变掺杂阴极结构设计和制备工艺研究具有重要的价值和意义. 关键词： GaAs光电阴极 吸附效率 真空度 表面掺杂浓度     

大梯度指数掺杂透射式GaAs光电阴极响应特性的理论分析

讨论了一种具有超快时间响应特性的新光电阴极, 即大梯度指数掺杂透射式GaAs 负电子亲和势 (NEA) 光电阴极, 模拟了它的量子效率、时间分辨和空间分辨能力等特性. 理论分析结果表明, 由于大梯度指数掺杂设计方式, 在吸收层内形成较大的内建电场, 因此光生电子在GaAsNEA阴极内的渡越时间大大缩短, 当GaAs吸收层厚度～0.9 μm时, 其响应时间达到～ 10 ps, 说明这种新NEA阴极具有远优于传统均匀掺杂NEA阴极的超快响应特性. 同时在整个光谱响应范围内, 量子效率达到约10%-20%, 空间分辨力显著高于以往的计算结果. 分析结果表明,在保证较高的量子效率条件下, 这种新阴极能够突破常规GaAsNEA阴极的时间分辨率极限, 提高GaAsNEA阴极本身的分辨力, 有望用于超快摄影、电子加速器和自由电子激光器的电子源等领域, 进一步扩展NEA光电阴极的应用范围.     

Photoemission of graded-doping GaN photocathode

We study the photoemission process of graded-doping GaN photocathode and find that the built-in electric fields can increase the escape probability and the effective diffusion length of photo-generated electrons,which results in the enhancement of quantum efficiency.The intervalley scattering mechanism and the lattice scattering mechanism in high electric fields are also investigated.To prevent negative differential mobility from appearing,the surface doping concentration needs to be optimized,and it is calculated to be 3.19×10 17 cm 3.The graded-doping GaN photocathode with higher performance can be realized by further optimizing the doping profile.     

超二代像增强器多碱阴极光电发射特性研究

通过测量超二代像增强器多碱阴极的光谱反射率和透射率,根据能量守恒定律计算得到了多碱阴极的光谱吸收率.结果表明,只有当光子的能量大于1.333 eV以后,多碱阴极的吸收率才开始快速增大.这说明多碱阴极的光谱吸收存在一个1.333 eV的长波吸收限,入射光的光子能量如果小于该吸收限,多碱阴极将不吸收.在多碱阴极的表面电子亲合势进一步降低的情况下,多碱阴极光电发射的长波理论阈值由长波吸收限所决定.多碱阴极在吸收光子之后的电子跃迁过程中,跃迁电子的能量增加小于所吸收入射光子的能量,即存在一个"能量损失".光子的能量越高,所激发的跃迁电子所处的能级越高,能量损失越大.同时光子的能量越高,跃迁电子所处的能级越高,电子跃迁的几率越低.多碱阴极的量子效率由吸收率、跃迁几率和跃迁能级、扩散过程中的能量损失等因素共同决定,因此多碱阴极的量子效率存在长波阈的同时也存在短波阈.多碱阴极的量子效率在2.11 eV达到最大值之后,随着光子能量的增加而单调减小,在3.6 eV时,量子效率减小到零.多碱阴极在3.6 eV时的吸收系数仍然很高,但由于电子跃迁的几率低,同时电子扩散过程中的能量损失大,导致尽管多碱阴极对短波具有较高的吸收系数,但量子效率仍然较低.因此对多碱阴极所吸收的光子能量中,转换成为光电导、晶格热振动等其他非光电发射形式能量的比例而言,短波较长波高,对光电发射的贡献率而言,短波较长波低.     

用光致荧光研究多碱阴极光电发射机理

本文介绍了多碱光电阴极的特点及其在微光像增强器中的应用,叙述了光致荧光的原理,探索了利用光致荧光方法来研究多碱阴极Na₂KSb膜层电子跃迁几率的方法,并测量了两个不同灵敏度多碱阴极的荧光谱及同一个多碱阴极在工作和非工作两种状态下的荧光谱.测试结果表明,多碱阴极的荧光强度与其电子跃迁的几率及阴极灵敏度成正比,同时多碱阴极在工作状态下,荧光强度比非工作状态下有所降低,原因是一部分跃迁电子逸出多碱阴极产生光电发射,而这部分电子不再回到基态,因此不再发出荧光.另外本文还测量了多碱阴极在不同波长激光激发条件下的荧光谱.结果表明,长波激发与短波激发相比,长波激发所获得的荧光强度更高,这说明长波激发产生跃迁电子的几率高,同时荧光谱峰值波长与激光波长的偏移较小,因此跃迁电子数多且能量损失小,有利于光电发射.将多碱阴极的荧光谱与多碱阴极的量子效率相比较,看出跃迁电子数量和所处能级这两个对光电发射过程有影响的关键因素中,能级因素对光电发射过程的影响更大.但对多碱阴极而言,由于短波激发时的电子跃迁几率低于长波激发时的电子跃迁几率,跃迁电子扩散过程中的能量损失较大,因此短波的量子效率随波长的增加而增加.实践证明,光致荧光是研究多碱阴极光电发射过程的一种有效手段,通过对多碱阴极荧光谱的研究,进一步揭示了多碱阴极的光电发射的机理,为进一步改进工艺和提高多碱阴极的灵敏度提供了重要的参考价值.     

Equivalent Method of Solving Quantum Efficiency of Reflection-Mode Exponential Doping GaAs Photocathode

The mathematical expression of the electron diffusion and drift length LDE of exponential doping photocathode is deduced. In the quantum efficiency equation of the reflection-mode uniform doping cathode, substituting LDE for LD, the equivalent quantum efficiency equation of the reflection-mode exponential doping cathode is obtained. By using the equivalent equation, theoretical simulation and experimental analysis shows that the equivalent index formula and formula-doped cathode quantum efficiency results in line. The equivalent equation avoids complicated calculation, thereby simplifies the process of solving the quantum efficiency of exponential doping photocathode.     

Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures.On the basis of our early research on the surface photovoltage of GaAs photocathodes,and comparative research before and after activation of reflection-mode GaAs photocathodes,we further the comparative research on transmission-mode GaAs photocathodes.An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer.By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure,we can obtain the equations for the surface photovoltage(SPV) curve before activation and the spectral response curve(SRC) after activation.Through experiments and fitting calculations for the designed material,the body-material parameters can be well fitted by the SPV before activation,and proven by the fitting calculation for SRC after activation.Through the comparative research before and after activation,the average surface escape probability(SEP) can also be well fitted.This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method,which only measures the body parameters by SRC after activation.It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes,and optimize the Cs-O activation technique in the future.     

高温Cs激活GaAs光电阴极表面机理研究

研究了高温Cs激活过程中,GaAs光电阴极表面势垒的变化机理。在考虑GaAs材料体内负电性p型掺杂杂质与材料表面正电性Cs+所形成的偶极子对表面势垒的作用后,通过求解均匀掺杂阴极中电子所遵循的一维连续性方程,得到了反射式均匀掺杂阴极的量子效率公式,通过求解薛定谔方程得到了到达阴极表面的光电子的逸出概率公式,利用公式对GaAs光电阴极的Cs激活过程进行了分析。分析发现,激活过程中GaAs光电阴极的量子效率和光电子的逸出概率正比于偶极子层的电场强度。     

Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures. On the basis of our early research on the surface photovoltage of GaAs photocathodes, and comparative research before and after activation of reflection-mode GaAs photocathodes, we further the comparative research on transmission-mode GaAs photocathodes. An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer. By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure, we can obtain the equations for the surface photovoltage (SPV) curve before activation and the spectral response curve (SRC) after activation. Through experiments and fitting calculations for the designed material, the body-material parameters can be well fitted by the SPV before activation, and proven by the fitting calculation for SRC after activation. Through the comparative research before and after activation, the average surface escape probability (SEP) can also be well fitted. This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method, which only measures the body parameters by SRC after activation. It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes, and optimize the Cs-O activation technique in the future.     

梯度掺杂结构GaN光电阴极的稳定性

利用GaN光电阴极多信息量测试评估系统,对反射式梯度掺杂和均匀掺杂GaN光电阴极样品进行了激活及衰减后的量子效率测试,并测试衰减速率。在同样的衰减时间内,和均匀掺杂样品相比,梯度掺杂样品的衰减比例较小,衰减速率较慢,其原因在于梯度掺杂结构可在其发射层内部产生系列内建电场,致使其能带连续向下弯曲,导致其表面真空能级比均匀掺杂样品下降得更低,发射层表面形成的负电子亲和势更明显,造成发射层内的光生电子更易逸出,阴极量子效率的衰减变慢,从而使其稳定性强于均匀掺杂结构。     

Affection of different doping structure on quantum efficiency and spectrum response of reflection-mode GaN photocathode

In order to analyze the effect of varied doping structure on the quantum efficiency and spectrum response of the photocathode, six kinds of reflective varied doping GaN photocathode samples are designed and grown. The quantum efficiency curves and the spectrum response curves are obtained after these samples are activated. Through the analysis of experiment result, the factors and the reasons that can affect the quantum efficiency and spectrum response are concluded. The experiment result shows that the photocathode with exponential-doping structure has the best spectrum response and the highest quantum efficiency. The experiment result provides suggestions for the study on optimizing design of photocathode doping structure.     

Optimizing GaN photocathode structure for higher quantum efficiency

To improve the quantum efficiency of GaN photocathode, we optimized the photocathode's structure in three aspects. We use AlN replacing GaN as the buffer layer, which can act as potential barrier to reflect electrons back to surface. The optimal thickness of emission layer is calculated as 162.5 nm, and considering the graded doping profile, we optimized the thickness as 180 nm. Three built-in electric fields are introduced by Mg graded dope, and the intensities of the high fields are calculated to give the quantitive results of their influence. After surface cleaning and activation, quantum efficiency of the optimized sample was increased and the highest value of 56% was achieved at 240 nm. More quantum efficiency enhancement is possible by further optimizing the photocathode structure.     

指数掺杂结构对透射式GaAs光电阴极量子效率的影响研究

通过在一维连续性方程光电子产生函数项中加入短波约束因子,修正了指数掺杂和均匀掺杂透射式GaAs光电阴极量子效率公式.利用修正的透射式阴极量子效率公式分别拟合制备的指数掺杂和均匀掺杂透射式阴极量子效率实验曲线,符合得很好.另外拟合得到的阴极性能参数表明,由于内建电场的作用,指数掺杂阴极的性能要好于均匀掺杂阴极,指数掺杂结构能够明显提高透射式阴极的量子效率. 关键词： 透射式光电阴极 指数掺杂 量子效率 内建电场     

均匀掺杂GaAs材料光电子的输运性能研究

通过建立原子结构的理论模型和电离杂质散射理论公式,研究了光电子在透射式均匀掺杂GaAs光电阴极体内的输运过程,分析了光电阴极的掺杂浓度、发射层厚度、电子扩散长度等相关因素对阴极出射面的弥散圆斑以及到达阴极出射面的光电子数与激发光电子总数之比的影响.计算结果表明,当透射式均匀掺杂GaAs光电阴极发射层厚度为2 μm、电子扩散长度为3.6 μm、掺杂浓度为1×10¹⁹ cm^-3时,其极限线分辨率为769 mm^-1.此GaAs材料光电子的输运性能 关键词： GaAs 光电阴极 光电子输运 弥散圆斑 分辨率     

Improvement of photoemission performance of a gradient-doping transmission-mode GaAs photocathode

Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response, one has a gradient-doping structure and the other has a uniform-doping structure. The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one. As a result of the downward graded band-bending structure, the cathode performance parameters, such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves, are greater for the gradient-doping photocathode. The electron diffusion length is within a range of from 2.0 to 5.4 μm for doping concentration varying from 10¹⁹ to 10¹⁸ cm^-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2 μm.