Temperature dependence of photoluminescence from ordered GaInP2 epitaxial layers

The temperature behavior of the integrated intensity of photoluminescence (PL) emission from ordered GaInP₂ epitaxial layer was measured at temperatures of 10 ‐ 300 K. Within this temperature range the PL emission is dominated by band‐to‐band radiative recombination. The PL intensity temperature dependence has two regions: at low temperatures it quenches rapidly as the temperature increases, and above 100 K it reduces slowly. This temperature behavior is compared with that of disordered GaInP₂ layer. The specter of the PL emission of the disordered layer has two peaks, which are identified as due to donor‐accepter (D‐A) and band‐to‐band recombination. The PL intensity quenching of these spectral bands is very different: With increasing temperature, the D‐A peak intensity remains almost unchanged at low temperatures and then decreases at a higher rate. The intensity of the band‐to‐band recombination peak decays gradually, having a higher rate at low temperatures than at higher temperatures. Comparing these temperature dependencies of these PL peaks of ordered and disordered alloys and the temperature behavior of their full width at half maximum (FWHM), we conclude that the different morphology of these alloys causes their different temperature behavior. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Polarization‐angle dependence of photoluminescence intensity of ordered GaInP2 layers: observation of polarization memory

We compare measured and calculated polarization‐angle dependencies of the intensity of the photoluminescence emission from MOVPE‐grown GaInP₂ layers with different ordering parameters. We measured the polarization‐angle dependencies of the emission propagating along the [001], [110] and [1 0] directions at room temperature. Symmetry considerations were used to calculate the dependence of the relative intensity of the PL emission which was linearly polarized along different directions and to estimate the value of the valence‐band splitting by fitting the measured dependencies with calculated curves. An intriguing influence of the polarization of the exciting beam on the relative amount of the polarized PL emission was observed in the emission from the (110) plane. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Infrared photoluminescence from TlGaS2 layered single crystals

Photolimuniscence (PL) spectra of TlGaS₂ layered crystals were studied in the wavelength region 500‐1400 nm and in the temperature range 15‐115 K. We observed three broad bands centered at 568 nm (A‐band), 718 nm (B‐band) and 1102 nm (C‐band) in the PL spectrum. The observed bands have half‐widths of 0.221, 0.258 and 0.067 eV for A‐, B‐, and C‐bands, respectively. The increase of the emission band half‐width, the blue shift of the emission band peak energy and the quenching of the PL with increasing temperature are explained using the configuration coordinate model. We have also studied the variations of emission band intensity versus excitation laser intensity in the range from 0.4 to 19.5 W cm^‐2. The proposed energy‐level diagram allows us to interpret the recombination processes in TlGaS₂ crystals. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Low-temperature Er3+ emission in Ge–S–Ga glasses excited by host absorption

The photoluminescence (PL) of a series of (GeS₂)₈₀(Ga₂S₃)₂₀ glasses doped with different amounts of Er (0.17, 0.35, 0.52, 1.05 and 1.39 at.%) at 77 and 4.2 K has been studied. The influence of the temperature on the emission cross-section of the PL bands at ∼1540, 980 and 820 nm under host excitation has been defined. A quenching effect of the host photoluminescence has been established from the compositional dependence of the PL intensity. It has been found that the present Er³⁺-doped Ge–S–Ga glasses posses PL lifetime values about 3.25 ms.     

Excitation energy dependence of the photoluminescence band at 2.7 and 4.3 eV in silica glass at low temperature

In this paper, we report the excitation energy dependence of the 2.7 and 4.3 eV photoluminescence (PL) bands in oxygen deficient silica glass at low temperature (20 K). The increase or decrease of the PL intensity at low temperatures is different for different exciting light wavelengths. The PL intensity tended to decrease with low temperatures when the excitation was near the upper and lower end of the excited level. The peak energy of the excitation spectrum increases with cooling. These results indicate that the change in excitation level with cooling is associated with the low-temperature dependence of light emission. Thermal motion is suppressed, when the sample temperature is lowered, and the energy-width of the excited level decreases, i.e., the light emission probability decreases (the emission intensity decreases), when near the upper and lower end of the excitation level. These phenomena were observed in the low-temperature dependence of the 4.3 eV emission intensity.     

Zur Realstruktur von Ga1–xInxAs LPE-Schichten

Ga_1–xIn_xAs epitaxial layers (0.02 ≦ × ≦ 0.12) are grown on (111)-oriented GaAs substrates from nonstoichiometric melts. The etch pit densities – determined by chemical etching – yield values between 2 · 10⁵ cm⁻² and 3 · 10⁷ cm⁻² and were found to be dependent on composition, layer thickness and cooling rate. X-ray topography of cleaved {110}-planes gives information on layer quality and indicates the existence of stress in the substrate lattice near the heterojunction. The validity of Vegard's law in the investigated concentration range was confirmed by X-ray determination of the lattice constants. The half width of double crystal spectrometer rocking-curves, the epd and the relative intensity of photoluminescence show similar dependence on the composition of the mixed crystal layers.     

引入Si掺杂层调控InGaAs/GaAs表面量子点的光学特性

在InGaAs/GaAs表面量子点(SQDs)的GaAs势垒层中引入Si掺杂层,以研究Si掺杂对InGaAs/GaAs SQDs光学特性的影响。荧光发光谱(PL)测量结果显示,InGaAs/GaAs SQDs的发光强烈依赖于Si掺杂浓度。随着掺杂浓度的增加, SQDs的PL峰值位置先红移后蓝移; PL峰值能量与激光激发强度的立方根依赖关系由线性向非线性转变;通过组态交互作用方法发现SQDs的PL峰位蓝移减弱;时间分辨荧光光谱显示了从非线性衰减到线性衰减的转变。以上结果说明Si掺杂能够填充InGaAs SQDs的表面态,并且改变表面费米能级钉扎效应和SQDs的荧光辐射特性。本研究为深入理解与InGaAs SQDs的表面敏感特性关联的物理机制和载流子动力学过程,以及扩大InGaAs/GaAs SQDs传感器的应用提供了实验依据。     

Excitation intensity and temperature‐dependent photoluminescence and optical absorption in Tl4Ga3InSe8 layered crystals

Photoluminescence (PL) spectra of Tl₄Ga₃InSe₈ layered crystals grown by Bridgman method have been studied in the wavelength region of 600‐750 nm and in the temperature range of 17‐68 K. A broad PL band centered at 652 nm (1.90 eV) was observed at T = 17 K. Variations of emission band has been studied as a function of excitation laser intensity in the 0.13 to 55.73 mW cm^‐2 range. Radiative transitions from donor level located at 0.19 eV below the bottom of conduction band to shallow acceptor level located at 0.03 eV above the top of the valence band were suggested to be responsible for the observed PL band. From X‐ray powder diffraction and optical absorption study, the parameters of monoclinic unit cell and the energy of indirect band gap were determined, respectively. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Electrical and Photoelectrical Properties of n-CuInS2 Single Crystals

The temperature dependences of free electron density and mobility in n-CuInS₂ single crystals have been determined from the Hall effect measurements. The ionization energy of donors and their densities have been estimated. The results of measurements show that the crystals are strongly compensated. The spectral distribution of photoconductivity, the dependence of photoconductivity on excitation intensity, and the photoconductivity decay with time have been measured in the n-CuInS₂ crystals at different temperatures. The results of photo-conductivity measurements suggest linear recombination of photo-electrons at weak excitation and quadratic recombination at high excitation intensity. The compensated deep acceptor probably acts as the recombination centre.     

Synthesis by organic molten salt method and characterization of chalcopyrite AgInS2 nanorods

In this paper, chalcopyrite AgInS₂ nanorods were synthesized for the first time by a one‐step, ambient pressure, environment friendly organic molten salt (OMS) method at 200 °C. The as‐synthesized products were characterized by X‐ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS), respectively. The XRD results reveal that the as‐synthesized products at 120–160 °C under ambient pressure contain AgIn₅S₈ which will decrease with the increase of growth temperature. A sample containing only the chalcopyrite AgInS₂ phase is successfully obtained at 200 °C. Furthermore, the elemental compositions are found to become increasingly stoichiometric with increasing temperature. UV‐Vis and photoluminescence (PL) spectra are utilized to investigate the optical properties of AgInS₂ nanorods. By testing on UV‐Vis spectra, it is concluded that the limiting wavelength of the AgInS₂ nanorods is 661 nm and the band gap is 1.88 eV. A broad red emission band peak centered at about 1.874 eV (662 nm) is clearly observed at room temperature, and the intensity of the emission increases with excitation wavelength. In addition, the photoluminescence quantum yield (PLQY) of the nanocrystals at the excitation wavelength of 250 nm was determined to be 13.2%. A possible growth mechanism of AgInS₂ nanorods was discussed. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Photoluminescence and radiation damage in W,Mg, Ca doped Bi4Ge3O12 crystals

Spectral properties and radiation damage in W, Mg and Ca doped Bi₄Ge₃O₁₂ (W:BGO, Mg:BGO, Ca:BGO) crystals before and after thermal treatment and gamma‐ray (γ‐) or ultraviolet (UV) radiation were studied. The absorption and the photoluminescence (PL) spectra of doped BGO crystals in visible region were measured. Before γ or UV radiation, the emission intensity of W:BGO crystal is stronger than that of pure BGO at about 500 nm. After γ radiation (10k Gy), the emission intensities of doped BGO are all weaker than pure BGO under identically condition. However, the emission intensity of W:BGO is stronger than that of pure BGO after UV exposure (10k Gy). Thermal treated (annealed in N₂ at 550 °C for 6 h) W:BGO has shown a much stronger emission intensity than others. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Flux Bridgman growth and the influence of annealing temperatures on PL properties of ZnO single crystals

Transparent ZnO crystals were obtained by the flux Bridgman method from high temperature solution of 22 mol% ZnO‐78 mol% PbF₂ system. The influence of annealing temperatures on the photoluminescence (PL) of ZnO crystal was investigated. An ultraviolet emission peak at about 379 nm was observed in PL spectra and the peak position has a weak blueshift for annealed samples. A green band centered at 523 nm appeared in the annealed samples and its intensity enhanced with the increase of annealing temperatures, while the intensity of the ultraviolet peak decreased considerably. However, the ultraviolet emission peak became the strongest after annealing at 1000 °C. This phenomenon was considered to be associated with oxygen vacancy and F^‐ impurities induced by the PbF₂ flux. The results show that high temperature annealing in air seems helpful for improving the PL properties of ZnO crystal. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Zum Wachstum von AIIIBV-Halbleitern aus nichtstöchiometrischen Schmelzen (II) Dotierung von GaAs und Ga1−xAlxAs mit Zink

Doping of GaAs and Ga_1−xAl_xAs with Zn in the LPE process was studied by a radioanalytical method. It is found that Zn diffuses from the Ga-(Al)-As-Zn-solution into the n-GaAs substrate before epitaxial growth starts. This “pre-diffusion” and the following diffusion of Zn out of the epitaxial layer into the substrate results in three regions with distinct Zn-graduation in the vicinity of the pn-junction. There are no striking differences for GaAs/GaAs and Ga_1−xAl_xAs/GaAs structures. The Zn concentration in GaAs epitaxial layers decreases exponentially from the substrate up to the layer surface. From this profile the temperature dependence of the Zn segregation coefficient is calculated. At 900°C a value k_eff = 5,2 · 10⁻² is found. The doping profile in Ga_1−xAl/As layers is more complex. It is influenced by the changings of temperature during the growth of the layer and by the nonuniform Aldistribution over the layer thickness.     

Gettering Properties of Praseodymium in GaAs,In0.53Ga0.47As,and InP Grown by Liquid Phase Epitaxy

The incorporation of praseodymium (Pr) into GaAs, In_0.53Ga_0.47As, and InP during liquid-phase epitaxy were investigated by double crystal x-ray diffraction, Hall effect, low temperature photoluminescence (PL) measurements. The lattice mismatch slightly vary with Pr concentration in the growth melts. Examinations of the electrical property illustrate that the lower carriers concentrations and a higher mobilities are obtain from Pr-doped epilayers than undoped sample (In_0.53Ga_0.47As and InP). The PL spectra (15-K) show that the intensity of the impurity related peaks decreases and the near-band-to-band luminescence intensity increase. They also reveal that the impurities are gettered by Pr ions during LPE growth. Thus, for the purpose of purification, proper amount of Pr in the growth melts is suggested. No intra-4f-shell transition line is observed from the Pr-doped GaAs, In_0.53Ga_0.47As, and InP layers.     

Influence of the growth temperature and substrate orientation on the layer properties of MOVPE-growth (Ga,In)(As,P)/GaAs

The luminescence properties of In_1−xGa_xAs_yP_1−y layers and heterostructures grown lattice matched to GaAs by metalorganic vapour-phase epitaxy (MOVPE) were studied and correlated to the crystalline properties. For laser structures emitting around 800 nm a red-shift of the emission from the active layer (y = 0.72) grown at 680°C together with an anomalous temperature behaviour and excitation dependence of the bandgap is observed. Although some degree of ordering is observed for thick layers of this composition, polarization dependent photoluminescence does not indicate ordering of the quantum well to be the main reason for this excitation dependence. Instead, interfacial In-rich layers are found to be responsible. The thickness of these interfacial layers strongly depends on substrate misorientation and growth conditions.     

Optical property of self-assembled GaInNAs quantum dots grown by solid source molecular beam epitaxy

Self-assembled GaInNAs/GaAs quantum dots (QDs) are promising structures for extending the emission wavelength of GaInNAs/GaAs quantum wells from 1.3 to 1.55 μm and beyond. We report herein the growth of GaInNAs/GaAs quantum dot samples of different deposited thickness by solid source molecular beam epitaxy using active nitrogen radicals generated by a radio frequency nitrogen plasma source. Images from atomic force spectroscopy reveal the increase of non-uniformity QDs size following the increase in the deposited thickness. Temperature-dependent photoluminescence (PL) measurements show PL line width shrinkage at low temperature suggests the relaxation of carriers into neighboring QD local-energy minimum. The low thermal activation energy of ∼72 meV, estimated from the temperature-dependent integrated PL intensity curve suggests the existence of non-radiative recombination centers that quench the luminescence intensity at higher temperature.     

Temperature and excitation intensity tuned photoluminescence in Tl4GaIn3S8 layered single crystals

Photoluminescence spectra of Tl₄GaIn₃S₈ layered crystals grown by Bridgman method have been studied in the wavelength region of 500–780 nm and in the temperature range of 26–130 K with extrinsic excitation source (λ_exc = 532 nm), and at T = 26 K with intrinsic excitation source (λ_exc = 406 nm). Three emission bands A, B and C centered at 514 nm (2.41 eV), 588 nm (2.11 eV) and 686 nm (1.81 eV), respectively, were observed for extrinsic excitation process. Variations in emission spectra have been studied as a function of excitation laser intensity in the 0.9‐183.0 mW cm^–2 range for extrinsic excitation at T = 26 and 50 K. Radiative transitions from the donor levels located at 0.03 and 0.01 eV below the bottom of the conduction band to the acceptor levels located at 0.81 and 0.19 eV above the top of the valence band were proposed to be responsible for the observed A‐ and C‐bands. The anomalous temperature dependence of the B‐band peak energy was explained by configurational coordinate model. From X‐ray powder diffraction and energy dispersive spectroscopic analysis, the monoclinic unit cell parameters and compositional parameters of Tl₄GaIn₃S₈ crystals were determined, respectively. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Amorphous carbon-based films with surface-plasmon-enhanced full-color photoluminescence

A series of amorphous carbon-based films were deposited on the nanostructured Ag layers to observe surface plasmon (SP) enhanced photoluminescence (PL). The dependence of PL peak wavelength and intensity on the film composition and the nanostructure of the Ag layers were systematically investigated. The PL wavelength was tuned from 442 nm to 635 nm by varying the carbon content of the as-deposited carbon-based films. The nanostructure of Ag layers varied from nanoparticles (NPs) to continuous films via process control. With the SPs generated at the carbon-based film/Ag layer interface, the PL intensity was found to be significantly enhanced with a peak enhancement factor of 6, and the light emission range of the composite films was extended to 434–653 nm. The dependence of PL intensity on the spectral overlap between the carbon-based films and plasmon resonant Ag layers, Ag surface morphology and the internal quantum efficiency (IQE) of the carbon-based films was discussed. The redshift of SP resonance with the increasing refractive index of the upper carbon-based films was observed.     

Photoluminescence in doped and annealed GeSe2 glass

Photodoping of GeSe₂ glass with Ag, Zn, In and Sn shifted the centre of the photoluminescence (PL) band towards lower energies and gave rise to a decrease in its half width, but no new band appeared. The excitation spectrum at 77 K and the temperature dependence of the PL intensity of Ag-doped samples were measured in the temperature range (77–280) K. An activation energy of (253 ± 10) meV for non radiative transitions was foundat T > 210 K which is smaller than that measured in undoped GeSe₂ glass. Thermal annealing shifted the peak of the PL band towards higher energies but had no effect on its half width.     

Effects of passivation and postannealing on the photoluminescence properties of MgO/SiO2 core‐shell nanorods

MgO nanorods were grown by the thermal evaporation of Mg₃N₂ powders on the Si (100) substrate coated with a gold thin film. The MgO nanorods grown on the Si (100) substrate were a few tens of nanometers in diameter and up to a few hundreds of micrometers in length. MgO/SiO₂ core‐shell nanorods were also fabricated by the sputter‐deposition of SiO₂onto the MgO nanorods. Transmission electron microscopy (TEM) and X–ray diffraction (XRD) analysis results indicated that the cores and shells of the annealed core‐shell nanorods were a face‐centered cubic‐type single crystal MgO and amorphous SiO₂, respectively. The photoluminescence (PL) spectroscopy analysis results showed that SiO₂ coating slightly decreased the PL emission intensity of the MgO nanorods. The PL emission of the MgO/SiO₂ core‐shell nanorods was, however, found to be considerably enhanced by thermal annealing and strongly depends on the annealing atmosphere. The PL emission of the MgO/SiO₂ core‐shell nanorods was substantially enhanced in intensity by annealing in a reducing atmosphere, whereas it was slightly enhanced by annealing in an oxidative atmosphere. The origin of the PL enhancement by annealing in a reducing atmosphere is discussed with the aid of energy‐dispersive X‐ray spectroscopy analyses. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)