Excitation of He+ in a hollow cathode arc discharge

Population densities of the excited He(II) levels i=4 to i=10 in hollow cathode arc discharge have been determined and compared with those calculated from a collisional-radiative model. In the experiment the electron temperature was about 2x10⁵K and the electron density about 3x10¹⁹ m^-3. The observed population densities agree within 50% with those calculated by Drawin and Emard, but differ by a factor 4–6 from the ones found by McWhirter and Hearn. The results of the present experiment suggest that near the threshold energies the cross sections for electronic excitation of He⁺ levels from the He⁺ ground state are half those expected from the calculations of Burgess. We conclude that Drawin and Emard's calculations should preferably be employed for the determination of the electron density and the electron temperature from observed population densities.     

采用空心阴极放电等离子体化学气相沉积方法制备a-CH薄膜

 研究了不同衬底-阴极距离、直流电压和H₂流量对a-CH薄膜沉积速率的影响。结果表明：衬底-阴极距离必须大于0.5cm，随着该距离的增加，薄膜的沉积速率减少；直流电压达550V时沉积速率最大；随着H2含量的增加，CH₄含量相对减少，沉积速率随之降低。用AFM观察了以该方法制得的448.4nm CH薄膜的表面形貌，表面粗糙度约为10nm。最后测出了不同条件下CH薄膜的UV-VIS谱，由此可以计算得到薄膜的禁带宽度及折射率。     

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采用蒙特卡罗模型对氮空心阴极放电等离子体鞘层离子(N2 、N )的输运过程进行了模拟研究,计算了阴极鞘层中氮离子(N2 、N )的能量及角分布的空间变化和粒子密度及平均能量随放电参数的变化规律。研究结果表明:空心阴极放电产生的氮离子,在鞘层输运过程中,N2 是密度几乎不变的低能粒子;N 是密度逐渐减少的高能粒子。随着电压增加,N 密度减小,平均能量增加;N2 密度和平均能量变化不明显。能量及入射角的相对分布规律与平板电极氮直流辉光放电基本类似,但圆筒空心阴极放电更有利于氮离子的产生。     

采用空心阴极放电等离子体化学气相沉积方法制备a-CH薄膜

研究了不同衬底-阴极距离、直流电压和H2流量对a-CH薄膜沉积速率的影响。结果表明：衬底-阴极距离必须大于0.5cm,随着该距离的增加,薄膜的沉积速率减少;直流电压达550V时沉积速率最大;随着H2含量的增加,CH4含量相对减少,沉积速率随之降低。用AFM观察了以该方法制得的448.4nm CH薄膜的表面形貌,表面粗糙度约为10nm。最后测出了不同条件下CH薄膜的UV-VIS谱,由此可以计算得到薄膜的禁带宽度及折射率。     

氧气空心阴极放电模拟

本文利用流体模型对气压为266 Pa的氧气环境下空心阴极放电的放电特性及不同粒子的生成损耗机制进行了模拟研究.模型中包含11种粒子和48个反应.在该模拟条件下,周围阴极所对应的负辉区产生重叠,表明放电中存在较强的空心阴极效应.计算得到了不同带电粒子与活性粒子的密度分布.带电粒子密度主要位于放电单元中心区域,电子和负氧离子O~-是放电体系中主要的负电荷,其密度峰值分别达到5.0×10¹¹ cm^-3和1.6×10¹¹ cm^-3;O₂~+是放电体系中主要的正电荷,其密度峰值为6.5×10¹¹ cm^-3.放电体系中同时存在丰富的活性氧粒子,并且其密度远高于带电粒子,按其密度高低依次为基态氧原子O、单重激发态氧分子O₂(a~1Δ_g)、激发态氧原子O(~1D)、臭氧分子O₃.对电子、O~-和O₂~+的生成和损耗的反应动力学过程进行了深入分析,同时给出了不同活性...     

Study of the rectangular hollow cathode discharge

The rectangular hollow cathode discharge is studied with respect to the applicability of similarity mechanisms analogously to other gas discharge types. Probe characteristics of the discharge are measured, the conditions of steady and continuous discharge glow in the cathode cavity are determined.     

Glow discharge with an annular hollow cathode

A discharge system with peripheral discharge chambers (Penning cells) and common hollow cathode with only one cell supplied with power is studied. It is shown that a jumpwise transition from a dark discharge to a glow discharge is accompanied by the penetration of plasma into the hollow cathode.     

Non-local model of hollow cathode and glow discharge

A general form of the non-local equation for an ionization source in glow discharge and hollow cathode 3D-simulation is formulated. It is a fundamental equation in hollow cathode theory, which allows formulation of a complete set of field equations for a self-consistent problem in a stationary glow discharge and hollow cathode. It enables us to describe the region of negative glow and the hollow cathode effect and compare calculation results of electrical dependencies (pressure-voltage) with experimental data, – under conditions of gradual appearance of the hollow cathode effect.     

空心阴极放电条纹特性的光谱诊断

利用发射光谱法,研究了圆柱型空心阴极放电条纹的特性.测量了条纹区的发射光谱,在此基础E计算得到r电子激发温度、相对电子密度和电子平均能量的空间分布特性.结果表明条纹区的光强、电子激发温度和电子密度均呈非等幅的周期性变化.与暗纹中心处相比,明纹中心具有较高的电子激发温度和较低的电子密度.由阴极向阳极,明纹中心处的电子激发温度幅值逐渐减小.此外,条纹区的电子激发温度随着电流的增加而增加.     

Electron sources with a plasma emitter based on discharge reflection with a hollow cathode

An examination is made of the physical processes in electron sources with plasma emitter based on discharge reflection with a hollow cathode. The mechanisms of ionization of the gas in the cavity are studied theoretically. Calculations are made of the plasma parameters in the intercathode discharge space, taking into account features of the particle motion in the crossed electric and magnetic fields. It is shown that the emission canal has an important effect on the source characteristics. An analysis is made of the features of primary shaping of the beam. Experience in the practical application of the electron sources is described.Tomsk Institute of Automatic Control Systems and Radioelectronics. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 5, pp. 5–23, May, 1992.     

Laser action in an indium hollow cathode discharge

Hollow cathode discharge excitation of indium is shown to produce laser action at 468.1, 689.2, 1342.8, and 1720nm. The cw468.1 nm and 1720 nm ionic lines are excited by charge exchange effect whereas the 689.2 nm cw ionic line is excited by a radiative cascade. The 1342.8 nm atomic line appears in the afterglow of the pulsed discharge and its population inversion is produced by recombination of the indium ions and the electrons. Shanghai Institute of Optics and Fine-Mechanics, Academia Sinica. Research Fellow 1979–1980 of the Alexander-von-Humboldt-Stiftung     

Laser action in a gallium hollow cathode discharge

cw laser action was observed for the 6335 and 7199 Å transitions of Ga II in a hollow cathode discharge. Charge exchange and radiative cascade processes are suggested to be responsible for the population of the upper laser levels.     

Determinations of plasma density and decay time in the hollow cathode discharge by microwave transmission

The microwave （MW） transmission method is employed to measure both the plasma density and the plasma decay time in the hollow cathode discharge （HCD） in argon at low pressure. The plasma density in DC-driven or pulsed HCD is on the order of 1012 cm-3, which can block the X-band MW effectively. In the case of pulsed HCD, the MW transmittance shows the same waveform as the pulsed current during the rising edge if the driving frequency is low, but with a longer delay during the falling edge. The MW transmittance reaches a constant low level when the driving frequency is high enough. The plasma decay time in the HCD system is measured to be about 100 μs around a pressure of 120 Pa. The ambipolar diffusion is considered to be the major mechanism in the decay process.     

Time evolution of hollow cathode ionization processes in the finalbreakdown phase of a transient hollow cathode discharge

The enhanced ionization processes taking place inside the hollow cathode region (HCR) of a transient hollow cathode discharge (THCD) are essential events which lead to final electrical breakdown. This ionization growth is permanently assisted by a virtual anode moving in the anode-cathode gap (A-K gap), which extends the anode potential to within the hollow cathode region. In the paper, the ionization growth inside the HCR under the enhanced field due to the close proximity of the anode potential has been studied using a statistical technique in a range of pressures, with three different cathode apertures. Statistical time distributions of an extensive experimental data set are analyzed to understand the mechanisms involved in the final stages, just before electric breakdown     

空心阴极等离子体电子枪研究

对空心阴极等离子体电子枪的理论与机理做了较详细的分析，介绍了空心阴极放电特性，论 述了激励电极和调制电极在空心阴极内等离子体形成过程中的作用，分析了等离子体中电子 和离子的运动及主要参数，推导出空心阴极内电场与电流密度的表达式，研究了形成稳定电 子束流的基本条件.利用泊松方程、电流连续性方程和运动方程对其进行了数值模拟计算， 并给出了优化结果. 在此基础上设计出了输出束流脉宽为1μs、幅值达2kA的空心阴极等离 子体电子枪. 关键词： 空心阴极 等离子体 电子枪     

空心阴极辉光放电包覆铜纳米粉末

 简要叙述了自悬浮定向流方法制备铜纳米粉末的原理和包覆层薄膜的生长机理，采用空心阴极辉光放电对铜纳米粉末进行有机包覆，实验中CH4和H2的流量分别为6 ml/min和12 ml/min，工作电压为450 V，衬底与空心阴极的底端距离为2 cm，背景真空和工作气压分别为6 Pa和100 Pa，沉积速率为7.5 nm/min。用透射电镜(TEM)对铜纳米粉末进行了观察和分析，结果表明：铜纳米粉末呈球状，其粒径分布在10～100 nm之间, 平均粒径大小为50 nm；其包覆层的厚度大约为15 nm，而且该厚度可以通过调节空心阴极辉光放电的参数来控制。     

空心阴极辉光放电包覆铜纳米粉末

简要叙述了自悬浮定向流方法制备铜纳米粉末的原理和包覆层薄膜的生长机理,采用空心阴极辉光放电对铜纳米粉末进行有机包覆,实验中CH4和H2的流量分别为6 ml/min和12 ml/min,工作电压为450 V,衬底与空心阴极的底端距离为2 cm,背景真空和工作气压分别为6 Pa和100 Pa,沉积速率为7.5 nm/min。用透射电镜(TEM)对铜纳米粉末进行了观察和分析,结果表明：铜纳米粉末呈球状,其粒径分布在10～100 nm之间, 平均粒径大小为50 nm;其包覆层的厚度大约为15 nm,而且该厚度可以通过调节空心阴极辉光放电的参数来控制。