Visible photoluminescence of co-sputtered Ge–Si duplex nanocrystals

The photoluminescence (PL) characteristics of co-sputtered Ge–Si duplex nanocrystal films were examined under excitation by a 325-nm HeCd laser, combined with Raman and Fourier-transform infrared reflection spectra analysis. A broad visible PL spectrum from the as-deposited Ge–Si nanocrystal films was observed in the wavelength range 350–700 nm. Basically, the PL spectrum can be considered to consist of two distinct parts originating from different emission mechanisms: (i) the spectrum in the range 350–520 nm, consisting of characteristic double peaks at 410 and 440 nm with PL intensities decreasing after vacuum annealing, probably due to vacancy defects in Si nanocrystals; and (ii) the spectrum in the range 520–700 nm, consisting of a characteristic peak at 550 nm with a PL intensity not affected by vacuum annealing, probably due to Ge-related interfacial defects. No size dependence of PL peak energy expected from quantum confinement effects was observed in the wavelength range investigated. However, with an increase of crystal size, the PL peak intensity in the blue zone decreased. The PL intensity is found to be strongly affected by silicon concentration. A film heated in air has a different PL mechanism from the as-deposited and vacuum-annealed films. PACS 78.67.Bf; 81.05.Cy; 81.15.Cd     

Effect of localized spins in coherent transport through quantum dots

The effect of localized spins on the quantum coherence in solids is discussed. A quantum dot with an odd number of electrons can be a model system for a localized spin. It is experimentally shown that a spin flip scattering by a quantum dot pulls the trigger of quantum decoherence. On the other hand, spin flip scattering is the basic process to construct the Kondo singlet state around a magnetic impurity. Through an interference effect of the Kondo state (the Fano–Kondo effect) in a side-coupled dot system, we show experimentally that the Kondo singlet state is quantum mechanically coherent. The analysis of the Fano–Kondo lineshape indicates the locking of the phase shift to π/2, which is in agreement with theoretical predictions. The Fano–Kondo effect is also observed in an Aharonov–Bohm ring, in which a quantum dot is embedded, and also indicates the phase shift locking to π/2.     

Optical properties of arrays of Si nanopillars on the (1 0 0) surface of crystalline Si

We studied Si nanopillars arrays interesting for potential applications in both photonics and electronics. Two types of the Si nanopillars arrays were investigated. The first type is a regular array (square lattice with the spacing of 270 nm) made up of nanopillars with diameters of 60–70 nm (non-quantum nanopillars). Polarized reflection spectra displaying photonic band gap features and the corresponding photonic band structures were studied. The second type is a non-regular array made up of nanopillars with diameters of 10–20 nm (quantum nanopillars). Enhancement of the optical phonon Raman band, change of selection rules and a low-frequency shift of 0.5 cm⁻¹ of the band corresponding to the quantum size effect in Si cylinders with average diameter 15 nm were observed for the quantum nanopillars.     

Photoinduced non-linear optical diagnostic of SiNxOy/Si111 interfaces

Anisotropic (elliptically polarized) photoinduced second harmonic generation (PISHG) in SiN_xO_y/Si1 1 1 films was proposed for contact-less monitoring of specimens with different nitrogen to oxygen (N/O) ratios. As a source for the photoinducing light, we used a nitrogen Q-switched pulse laser at wavelengths of 315, 337 and 354 nm as well as doubled frequency YAG–Nd laser wavelength (λ=530 nm). The YAG : Nd pulse laser (λ=1.06 μm; W=30 MW; τ=10–50 ps) was used to measure the PISHG. All measurements were done in a reflected light regime. We found that the output PISHG signal was sensitive to the N/O ratio and the film thickness. Measurements of the PISHG versus pumping wavelengths, powers, incident angles as well as independent measurements of the DC-electric field induced second harmonic generation indicate the major role played in this process by axially symmetric photoexcited electron–phonon states. The SiN_xO_y films were synthesized using a technique of chemical evaporation at low pressures. Films with thickness varying between 10 and 30 nm and with an N/O ratio between 0 and 1 were obtained. Electrostatic potential distribution at the Si1 1 1–SiN_xO_y interfaces was calculated. Comparison of the experimentally obtained and quantum chemically calculated PISHG data are presented. High sensitivity of anisotropic PISHG to the N/O ratio and film thickness is revealed. The role of the electron–phonon interactions in the dependencies observed is discussed. We have shown that the PISHG method has higher sensitivity than the traditional extended X-ray absorption fine structure spectroscopic and linear optical method for films with the N/O ratio higher than 0.50.     

Electronic states of self-organized InGaAs quantum dots on GaAs (3 1 1)B studied by conductive scanning probe microscope

We have used conductive scanning probe microscope (SPM) in high vacuum and operated at 173 K in order to investigate the electronic properties of self-organized InGaAs quantum dots (QDs) grown on GaAs (3 1 1)B and (0 0 1) substrates. Ordered InGaAs quantum dot arrays on GaAs (3 1 1)B surface were fabricated by atomic-H assisted molecular beam epitaxy (H-MBE), and Si SPM tips coated with Au which warrants electrical conductivity were used to measure simultaneously both the topographic and current images of QDs surface. From the current–voltage (I–V) curves, unique and different plateau features were observed for QDs formed on GaAs (3 1 1)B and (0 0 1) substrates. The results suggested that a high degree of symmetry of InGaAs QDs on (3 1 1)B was responsible for the observed degeneracy of electronic states and artificial atom-like states. We demonstrate that this conductive SPM technique becomes a powerful tool in studies of single electron charging of individual dots.     

Resonant Raman scattering of discrete hole states in self-assembled Si/Ge quantum dots

We report the first resonant electronic Raman spectroscopy study of discrete electronic transitions within small p-doped self-assembled Si/Ge quantum dots (QDs). A heavy hole (hh) to light hole (lh) Raman transition with a dispersionless energy of 105 meV and a resonance energy of the hh states to virtually localised electrons at the direct band gap of 2.5 eV are observed. The hh–lh transition energy shifts to lower values with increasing annealing temperature due to significant intermixing of Si and Ge in the QDs. Structural parameters of the small Si/Ge dots have been determined and introduced into 6-band k·p valence band structure calculations. Both the value of the electronic Raman transition of localised holes as well as the resonance energy at the E₀ gap are in excellent agreement with the calculations.     

Tunneling current-voltage characteristics of Ti-silicide/p− Si/p+ Si Schottky diodes

The tunneling current-voltage characteristics of Ti-silicide/p^– Si/p⁺ Si Schottky diodes are analyzed to study the Ti/Si interface properties. By using an MBE-grown 7 nm p^– Si spacer layer, well-defined tunneling structures are obtained. The sharply peaked density of states in a Ga-impurity band is used as a tunneling probe. A state density gap 100 meV around the Fermi energy is observed for a rapidly (20s) annealed (T=550°C) reacted sample. The gap is interpreted by a Ti-rich interfacial silicide film of about 1 nm.     

Analysis of thermionic emission from electrodeposited Ni–Si Schottky barriers

Ni–Si Schottky barriers are fabricated by electrodeposition using n on n+ Si substrates. I–V, C–V and low temperature I–V measurements are presented. A high-quality Schottky barrier with extremely low reverse leakage current is revealed. The results are shown to fit an inhomogeneous barrier model for thermionic emission over a Schottky barrier proposed by Werner and Guttler [J.H. Werner, H.H. Guttler, Barrier inhomogeneities at Schottky contacts, J. Appl. Phys. 69 (3) (1991) 1522–1533]. A mean value of 0.76 V and a standard deviation of 66 mV is obtained for the Schottky barrier height at room temperature with a linear bias dependence. X-ray diffraction and scanning electron microscopy measurements reveal a polycrystalline Ni film with grains that span from the Ni–Si interface to the top of the Ni layer. The variation in Ni orientation is suggested as a possible source of the spatial distribution of the Schottky barrier height.     

Optical properties of Stranski–Krastanov grown three-dimensional Si/Si1−xGex nanostructures

Detailed Raman and photoluminescence (PL) measurements are reported for Si/Si_1−xGe_x nanostructures grown by molecular beam epitaxy under near Stranski–Krastanov (S–K) growth mode conditions. In samples with x ranging from 0.096 to 0.53, we observe that an increase in the Raman signal related to Ge–Ge vibrations correlates with (i) a red shift in the PL peak position, (ii) an increase in the activation energy of PL thermal quenching, and (iii) an increase in the PL quantum efficiency. The results indicate that for x>0.5 Ge atoms form nanometer size clusters with a nearly pure Ge core surrounded by a SiGe shell. Time-resolved PL measurements reveal a stretched-exponential long-lived PL component that is associated with compositional and dimensional fluctuations in the SiGe dots.     

Potential of Si1−xGex alloys for Auger generation in highly efficient solar cells

Recent investigation on Si solar cells demonstrated the utility of Auger generation for the creation of more than merely one electron/hole pair per absorbed photon. The semiconductor Si requires a minimum photon energy of about 3.4 eV for this internal carrier multiplication. The current of a Si cell is therefore not significantly increased by Auger generation when the cell is illuminated by an air mass 1.5 spectrum, which contains only few photons with energies above 3.4 eV. Use of Si_1–x Ge _x alloys promises a lower onset energy. Unfortunately, incomplete data on band structures ofrandom Si_1–x Ge _x alloys preclude a detailed quantitative discussion of the full potential for these materials. Nevertheless, (i) analogies to our own quantum efficiency data from pure Si, (ii) the calculated band structure of the hypothetical,ordered zincblende type Si_0.5Ge_0.5 crystal, and (iii) optical data for Si_1–x Ge _x alloys indicate an optimum Ge content ofx=0.6 tox=0.7.     

Optical properties of InAs quantum dots in a Si matrix

We report on the optical properties of nanoscale InAs quantum dots in a Si matrix. At a growth temperature of 400°C, the deposition of 7 ML InAs leads to the formation of coherent islands with dimensions in the 2–4 nm range with a high sheet density. Samples with such InAs quantum dots show a luminescence band in the 1.3 μm region for temperatures up to 170 K. The PL shows a pronounced blue shift with increasing excitation density and decays with a time constant of 440 ns. The optical properties suggest an indirect type II transition for the InAs/Si quantum dots. The electronic structure of InAs/Si QDs is discussed in view of available band offset information.     

Formation of silicon oxide nanowires directly from Au/Si and Pd–Au/Si substrates

Amorphous silicon oxide (SiO_x) nanowires were directly grown by thermal processing of Si substrates. Au and Pd–Au thin films with thicknesses of 3 nm deposited on Si (0 0 1) substrates were used as catalysts for the growth of nanowires. High-yield synthesis of SiO_x nanowires was achieved by a simple heating process (1000–1150 °C) in an Ar ambient atmosphere without introducing any additional Si source materials. The as-synthesized products were characterized by field-emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, and transmission electron microscopy measurements. The SiO_x nanowires with lengths of a few and tens of micrometers had an amorphous crystal structure. The solid–liquid–solid model of nanowire formation was shown to be valid.     

Diffusion of gold in dislocation-free or highly dislocated silicon measured by the spreading-resistance technique

The diffusion of Au in dislocation-free or plastically deformed Si (10¹¹ to 10¹³ dislocations/m²) was measured with the aid of the spreading-resistance technique. The Au profiles produced indislocation-free Si slices by in-diffusion from both surfaces possess nonerfc-type U shapes as predicted by the so-called kick-out diffusion model. This model is used to calculate the contribution of self-interstitials to the (uncorrelated) Si self-diffusion coefficient,D _I ^SD =0.064×exp(–4.80 eV/kT)m² s^–1, from the present and previous data on the diffusivity and solubility of Au in Si in the temperature range 1073–1473 K. Inhighly dislocated Si the diffusion of Au is considerably faster than in dislocation-free Si. From the erfc-type penetration profiles found in this case, effective Au diffusion coefficients were deduced and combined with data on the solubility of Au in Si. ThusC _i ^eq D _i=0.0064 ×exp(–3.93 eV/kT)m² s^–1 was obtained in the temperature range 1180–1427 K, whereC _i ^eq andD _i are the solubility and diffusivity of interstitial Au in Si.     

Fir spectroscopy on shallow donor states in GaAs:Si

Far infrared spectroscopy experiments on the shallow donor states of GaAs:Si are presented. Transitions between shallow donor levels are induced by F.I.R. radiation from an optically pumped molecular gas laser. The measurements are performed by measuring the electrical conductivity of the GaAs:Si sample at fixed laser frequencies by sweeping an external applied magnetic field up to 12 T. In total about 30 different transitions are observed using radiation between 60 m and 1.8 mm. In low magnetic fields and at high frequencies a series of photoconductivity signals are observed, which we ascribe to transitions from the ground state towards bound donor levels with hydrogen quantum numbers n, l=n–1, and m=n–1.     

X-ray photoelectron spectroscopy investigations of Si in non-stoichiometric SiNx LPCVD multilayered coatings

Si nanocrystals were formed in the non-stoichiometric Si-enriched SiN_x low-pressure chemical vapor deposited (LPCVD) coatings on Si wafers treated by various modes. The coating structure as a function of technological conditions was investigated by ellipsometry and X-ray photoelectron spectroscopy (XPS) depth profiling. It was found that nanocomposites on base of SiN_x films enriched by Si have a complex multilayered structure varying in dependence of deposition and annealing parameters. Analysis of the XPS spectra and Si 2s peaks shows the existence and quantity of four chemical structures corresponding to the Si–O, Si–N states, nanocrystalline and amorphous Si. The XPS results show evolution of the chemical structure of silicon nitride and formation of Si nanocrystals. It was found:

• The LPCVD technology of nanocrystals formation allows to get enough high concentration of Si nanocrystals on different depths from the sample surface.

• The volume fraction of nanocrystalline and amorphous Si is changed with depth; this relation depends from SiN_x composition and annealing parameters.

• XPS detects these two phase compositions of Si nanoparticles in SiN_x and SiO₂ layers. The ellipsometry, HR-TEM, and XPS results are in good agreement.

Temperature-dependent conductance of quasi-one-dimensional electrons in a novel constricted channel with corrugated interfaces

Transport properties of a novel quasi-ballistic quantum wire field-effect transistor are studied experimentally and then discussed in relation to a theory for dirty Tomonaga–Luttinger (T–L) liquids. The sample was prepared by constricting lithographically an epitaxially grown In_0.1Ga_0.9As/GaAs quantum well channel, whose bottom interface is corrugated by a quasi-periodic array of multi-atomic steps of 20 nm in periodicity. A quasi-one-dimensional channel of about 200 nm in metallurgical width and in length was formed and its conductance parallel to the steps was measured at temperatures between 4 and 0.3 K as a function of gate voltage. Plateau-like structures substantially lower than 2e²/h were observed. The conductance at each gate voltage decreases sensitively as temperature lowers until it gets nearly constant below a critical temperature. These tendencies are found to be qualitatively consistent with the theory of Ogata and Fukuyama for dirty T–L liquids. The temperature dependence above the critical temperature is found to fit quantitatively with the formula of Ogata and Fukuyama, if the parameters are suitably chosen.     

Intraband photoresponse of SiGe quantum dot/quantum well multilayers

In this contribution we study the intravalence band photoexcitation of holes from self-assembled Ge quantum dots (QDs) in Si followed by spatial carrier transfer into SiGe quantum well (QW) channels located close to the Ge dot layers. The structures show maximum response in the important wavelength range 3–5 μm. The influence of the SiGe hole channel on photo- and dark current is studied depending on temperature and the spatial separation of QWs and dot layers. Introduction of the SiGe channel in the active region of the structure increases the photoresponsivity by up to about two orders of magnitude to values of 90 mA/W at T=20 K. The highest response values are obtained for structures with small layer separation (10 nm) that enable efficient transfer of photoexcited holes from QD to QW layers. The results indicate that Si/Ge QD structures with lateral photodetection promise very sensitive large area mid-infrared photodetectors with integrated readout microelectronics in Si technology.     

Dependence on temperature of homogeneous broadening of InGaAs/InAs/GaAs quantum dot fundamental transitions

We report systematic temperature-dependent measurements of photoluminescence spectra in self-assembled InGaAs/InAs/GaAs quantum dots (QDs). We have studied the rise in temperature of the ground-state homogeneous linewidth.A theoretical model is presented and accounts for the phonon-assisted broadening of this transition in individual QD. We have estimated the homogeneous linewidth of an individual QD from PL spectra of self-organized InAs/GaAs QDs by isolating the PL of each individual QD and fitting the narrow line associated with self-organized QDs through a Lorentzian convoluted by a Gaussian. We have observed a strong exciton–LO–phonon coupling (γ_LO) which becomes the dominating contribution to the linewidth above the temperature of 45 K. We have also derived the activation energy (ΔE) of the exciton–LO–phonon coupling, zero temperature linewidth (Γ₀) and the exciton-LA-phonon coupling parameter (γ_Ac). We report that our values are close to the values found in the literature for single InGaAs QD and InAs QD.     

Landau-level lifetimes in PbTe nipi superlattices, PbTe/PbEuTe and InAs/AlSb quantum wells

Landau-level lifetimes are determined from saturation cyclotron resonance (CR) in wide parabolic wells, quantum wells and bulk PbTe–Pb_1−xEu_xTe systems. These narrow gap structures exhibit strong band non-parabolicity necessary to terminate the normally equi-spaced Landau-level ladder. It was not possible to saturate the bulk sample, but short lifetimes, of between 1.5 and 8 ps, were obtained for the wide parabolic well and the quantum well, respectively, utilising a multi-level rate equation model. We also report the first pump–probe cyclotron resonance result in an InAs–AlSb quantum structure. The pump–probe experiment provides a direct determination of the lifetime, giving τ=40 ps in this InAs–AlSb sample. This shows good agreement with an 8×8k·p calculation.     

Impurity distribution and electrical characteristics of boron-doped Si1−x Ge x /Si p +/N heterojunction diodes produced using pulsed UV-laser-induced epitaxy and Gas-immersion laser doping

A two-step pulsed UV-laser process which independently controls the metallurgical and electrical junction depth of a Si_1–x Ge _x /Si heterojunction diode has been implemented. Pulsed Laser-Induced Epitaxy (PLIE) combined with Gas-immersion Laser Doping (GILD) are used to fabricate boron-doped heteroepitaxial p ⁺/N Si_1–x Ge _x /Si layers and diodes. Borontrifluoride is used as the gaseous dopant source in the GILD process step. Boron incorporation and activation are investigated as a function of laser energy fluence and the number of laser pulses using SIMS and Halleffect measurements. The dose of incorporated dopant is on the order of 10¹³ cm^–2 per pulse. The B profiles obtained are flat except for a peak at the interface resulting from segregation effects. The B and Ge distributions are compared with shifts in the turn-on voltage of p ⁺/N Si_1–x /Si heterojunction diodes produced by the process. The GILD/PLIE process is spatially selective with the resulting diodes fabricated being quasiplanar. Hole mobilities in the heavily doped Si_1–x Ge _x films are found to be slightly lower than in comparable Si films.Presently at the Oregon Graduate Institute, Beaverton, OR 97006, USA