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1.
Thin films of eight metals with a thickness of 150 nm were deposited on mica substrates by thermal evaporation at various temperatures in a high vacuum. The surface morphology of the metal films was observed by atomic force microscopy (AFM) and the images were characterized quantitatively by a roughness analysis and a bearing analysis (surface height analysis). The films of Au, Ag, Cu, and Al with the high melting points were prepared at homologous temperatures T/Tm = 0.22-0.32, 0.40, and 0.56. The films of In, Sn, Bi, and Pb with the low melting points were prepared at T/Tm = 0.55-0.70, where T and Tm are the absolute temperatures of the mica substrate and the melting point of the metal, respectively. The surface morphology of these metal films was studied based on a structure zone model. The film surfaces of Au, Ag, and Cu prepared at the low temperatures (T/Tm = 0.22-0.24) consist of small round grains with diameters of 30-60 nm and heights of 2-7 nm. The surface heights of these metal films distribute randomly around the surface height at 0 nm and the morphology is caused by self-shadowing during the deposition. The grain size becomes large due to surface diffusion of adatoms and the film surfaces have individual characteristic morphology and roughnesses as T increases. The surface of the Al film becomes very smooth as T increases and the atomically smooth surface is obtained at T/Tm = 0.56-0.67 (250-350 °C). On the other hand, the atomically smooth surface of the Au film is obtained at T/Tm = 0.56 (473 ± 3 °C). The films of In, Sn, Bi, and Pb prepared at T/Tm = 0.55-0.70 also show the individual characteristic surface morphology.  相似文献   

2.
We carefully studied the nonsuperconducting sample of the magneto-superconducting RuSr2(Eu1−xCex)Cu2O10−δ series with composition RuSr2EuCeCu2O10−δ. This compound seems to exhibit a complex magnetic state as revealed by host of techniques like resistivity, thermopower, magnetic susceptibility, and MR measurements. The studied compound exhibited ferromagnetic like M(H) loops at 5, 20, and 50 K, and semiconductor like electrical conduction down to 5 K, with −MR7 T of up to 4% at low temperatures. The −MR7 T decreases fast above 150 K and monotonically becomes close to zero above say 230 K. Below, 150 K −MR7 T decreases to around 3% monotonically down to 75 K, with further increase to 4% at around 30 K and lastly having a slight decrease below this temperature. The thermopower S(T) behavior closely followed the −MR7 T steps in terms of d(S/T)/dT slopes. Further, both MR7 T steps and d(S/T)/dT slopes are found in close vicinity to various magnetic ordering temperatures (Tmag) of this compound.  相似文献   

3.
Considering certain interesting features in the previously reported 166Er Mössbauer effect, and neutron diffraction data on the polycrystalline form of ErPd2Si2 crystallizing in the ThCr2Si2-type tetragonal structure, we have carried out magnetic measurements (1.8–300 K) on the single crystalline form of this compound. We observe significant anisotropy in the absolute values of magnetization (indicating that the easy axis is c-axis) as well as in features due to magnetic ordering in the plot of magnetic susceptibility χ versus temperature T at low temperatures. The χ(T) data reveal that there is a pseudo-low-dimensional magnetic order setting in at 4.8 K, with a three-dimensional antiferromagnetic order setting in at a lower temperature (3.8 K). A new finding in the χ(T) data is that, for H∥〈1 1 0〉 but not for H∥〈0 0 1〉, there is a broad shoulder in the range 8–20 K, indicative of the existence of magnetic correlations above 5 K as well, which could be related to the previously reported slow-relaxation-dominated Mössbauer spectra. Interestingly, the temperature coefficient of electrical resistivity is found to be isotropic; no feature due to magnetic ordering could be detected in the electrical resistivity data at low temperatures, which is attributed to magnetic Brillioun-zone boundary gap effects. The results reveal the complex nature of magnetism of this compound.  相似文献   

4.
Two different potential models of molecular dynamics (MD) simulations have been applied to investigate the pressure-volume-temperature (P-V-T) relationship and lattice parameter of NaCl under high pressure and temperature. The first one is the shell model (SM) potentials in which due to the short-range interaction pairs of ions are moved together as is the case in polarization of a crystal due to the motion of the positive and negative ions, and the second one is the two-body rigid-ion Born-Mayer-Huggins-Fumi-Tosi (BMHFT) potentials with full treatment of long-range Coulomb forces. The P-V relationship at 300 K, T-V relationship at zero pressure, and lattice parameter a, have been obtained and compared with the available experimental data and other theoretical results. Compared with SM potentials, the MD simulation with BMHFT potentials is very successful in reproducing accurately the measured volumes of NaCl. At an extended pressure and temperature ranges, P-V relationship under different isotherms at selected temperatures, T-V relationship under different pressures, and lattice parameter a have also been predicted. The properties of NaCl are summarized in the pressure range 0-30 GPa and the temperature up to 2000 K.  相似文献   

5.
In order to study the mechanism behind the phase separation scenario in the Sm0.15Ca0.85MnO3 compound, magnetization and resistivity measurements have been carried out in pulsed magnetic fields up to 50 T at temperatures 4.2 K<T<200 K. It is found that external magnetic field causes a collapse of a C-type AFM (P21/m) phase resulting in field-induced insulator-metal transition, which is irreversible below T1=75 K. In zero field the content of a G-type phase in the mixed C-G state can vary from 10 to 17% at T=10 K. A set of metastable states with different volume ratios of G-type to C-type phases is observed below T1 depending on the history of the sample. The obtained results indicate that the phase separation plays a dominant role for the electric and the magnetic properties of this material.  相似文献   

6.
To compare the annealing effects on GaMnAs-doped with Zn (GaMnAs:Zn) and undoped GaMnAs (u-GaMnAs) epilayers, we grew GaMnAs thin films at 200 °C by molecular beam epitaxy (MBE) on GaAs substrates, and they were annealed at temperatures ranging from 220 °C to 380 °C for 100 min in air. These epilayers were characterized by high-resolution X-ray diffraction (XRD), electrical, and magnetic measurements. A maximum resistivity at temperatures Tm close to the Curie temperatures Tc was observed from the measurement of the temperature-dependent resistivity ρ(T) for both the GaMnAs:Zn and the u-GaMnAs samples. We found, however, that the maximum temperature Tm observed for GaMnAs:Zn epilayers increased with increasing annealing temperature, which was different from the result with the u-GaMnAs epilayers. The formation of GaAs:Zn and MnAs or Mn-Zn-As complexes with increasing annealing temperature is most likely responsible for the differences in appearance.  相似文献   

7.
8.
The linear and nonlinear low field AC susceptibilities of Zn0.75Co0.25Fe0.5Cr1.5O4 show peaks due to non-critical contributions, which mask the peak due to spin glass ordering. They extend into the region of temperatures in which Mössbauer spectra do not show any magnetic component. When a DC field of 200 Oe suppresses the non-critical contributions, peak due to spin glass ordering is clearly visible. The spin glass ordering is thus shown to be a thermodynamic transition. The critical exponent is found to fall within the range found using other spin glasses. Mössbauer spectra in zero fields provide TSG, which agrees with the peak temperature of AC susceptibilities in the absence of non-critical contributions. 〈SZ〉 determined using Mössbauer spectra does not show any anomaly. In the presence of a field of 5 T, the spectra show SG ordering at 4.2 K, which converts into ferrimagnetic ordering at higher temperatures.  相似文献   

9.
Yttrium iron garnet (YIG) thin films were deposited on fused quartz substrate at different substrate temperatures (Ts) varying from room temperature (RT) to 850 °C using pulsed laser deposition (PLD) technique. All the films in the as-deposited state were X-ray amorphous and non-magnetic at RT. The film deposited at RT after annealing at temperatures Ta?700 °C showed both X-ray peaks and the magnetic order. The films deposited at higher Ts (500–850 °C) and then annealed at 700 °C resulted in better-quality films with higher 4πMs value. The highest value of magnetization was for the sample deposited at 850 °C and annealed at 700 °C, which is 68% of the bulk 4πMs value.  相似文献   

10.
Temperature dependence of conduction noise and low field magnetoresistance of layered manganite La1.4Ca1.6Mn2O7 (DLCMO) are reported and compared with the infinite layered manganite La0.7Ca0.3MnO3 (LCMO). The double layered manganite was prepared using standard solid state reaction method and had a metal-insulator transition temperature (TM-I) of 155 K. The temperature dependence of susceptibility showed evolution of ferromagnetic ordering at 168 K. The observed voltage noise spectral density (SV) shows 1/fα type of behaviour at all temperatures from 77 K to 300 K. In the ferromagnetic region (T<168 K), SV/V2 shows two peaks at 164 K and 114 K. The observed two peaks in normalised conduction noise of DLCMO is attributed to the excess noise generated due to setting up of short range 2D-ferromagnetic ordering and long range 3D-ferromagnetic ordering at two different temperatures TC2 and TC1. In temperature range between TC1 and TC2, the magnetoresistance (MR) showed a gradual increase with the magnetic field. The observed MR has been explained in the framework of the two phase model [ferromagnetic (FM) domains and paramagnetic (PM) regions].  相似文献   

11.
We evidenced an early-stage ordering (ESO) in Fe51Pt49 film before the appearance of superlattice diffraction (long-range-order, LRO) using 40-nm-thick films prepared by magnetron sputtering onto quartz substrate. The appearance of L10 phase for samples deposited at substrate temperatures (Ts) 400 °C and higher was verified by X-ray diffraction. Surface roughness of Fe51Pt49 films, obtained via X-ray specular reflectivity with computational fitting, increases from 3.8 to 11 Å as Ts is increased from 25 to 275 °C. As further increase of Ts to 375 °C, the roughness drops to 3.2 Å and then increases again to 38 Å with Ts up to 700 °C. Measurement on residual strain demonstrates that it is initially compressive at Ts<400 °C. Thereafter the strain transfers to a tensile one and increases in magnitude as increasing Ts up to 700 °C corresponding to LRO transformation. Local atomic rearrangement is observed for samples deposited at Ts>250 °C by using extended X-ray absorption fine structure. Coercivity of films increases from 10 to 460 Oe as Ts increase from 25 to 375 °C (ESO) and then from 460 to 10,700 Oe with Ts 375-700 °C (normal LRO). The worked out quantitative estimation of ESO engages with that of LRO before Ts 400 °C.  相似文献   

12.
The purely electronic linewidth δ of terrylene impurity molecules in monocrystalline biphenyl is studied at temperatures T between 1.7 and 3.5 K using the technique of single-molecule spectroscopy (SMS). Based on the data obtained, individual molecules appear to have their own law of δ(T) dependence; further, hysteresis effects have been observed in thermocycling experiments. The single-molecule (SM) lines investigated quickly broaden and vanish at temperatures between 3 and 3.5 K and reappear after the sample is cooled down again. At T≈2 K, a slow process of spectral diffusion (SD) was observed on timescales longer than 10 s. To learn about the role of faster SD processes, the technique of intensity-time-frequency correlation (ITFC) SMS was applied to a stable SM line after it had been broadened by 75% as a result of a thermocycling experiment. At 2 and 2.3 K, no significant line broadening could be revealed on timescales between 0.16 ms and 10 s.  相似文献   

13.
We have investigated the structural and electrical transport properties of Nb-doped TiO2 films deposited on (1 0 0) LaAlO3 substrates by rf magnetron sputtering at temperatures ranging from 873 K to 1073 K. Films deposited below 998 K are anatase, and mixed phases between anatase and rutile exist in the film grown at higher temperatures. We find that films deposited at low temperatures exhibit semiconductor behavior, while metallic conductivity is observed in the most conducting film deposited at 998 K. For this sample, compared to electron-phonon scattering mechanism, electron-phonon-impurity interference effect plays an important role in its electron transport process. Moreover, the temperature coefficient of the resistivity for the film deposited at 1073 K is negative from 2 K to 300 K. The temperature dependence of resistivity for the film is described by ∼exp(b/T)1/2 at temperatures from 80 K down to 30 K, and by the fluctuation induced tunneling model from 80 K to 300 K.  相似文献   

14.
Strain relaxation of the epitaxial SiGe layer and Ge diffusion during nickel silicidation by rapid thermal annealing the structure of Ni(≅14 nm)/cap-Si(≅26 nm)/Si0.83Ge0.17/Si(0 0 1) at the elevated annealing temperatures, TA, were investigated by X-ray diffraction analyses of high-resolution ω-2θ scan and reciprocal space mapping. The analyses showed a much larger strain relaxation at a lower TA and a reduction in Ge content in the SiGe layer of Ni/SiGe/Si(0 0 1) after thermal annealing compared to the case of cap-Si/SiGe/Si(0 0 1). The results indicate that the strain relaxation of the SiGe layers in NiSi/SiGe/Si(0 0 1) is related to the phenomena of NiSi agglomeration and penetration into the SiGe layer during silicidation at elevated anneal temperatures ≥750 °C. At elevated TA ≥ 750 °C, Ge diffused into the intact cap-Si area during silicidation.  相似文献   

15.
The influence of highly diluted impurities (Cu, Mn, Fe, Ni) on the temperature (T) dependence of the specific heat (cp) of l-arginine phosphate monohydrate (LAP) was investigated in the temperature range 1.8-300 K. The doped samples yielded values for cp in excess to those obtained for a pure LAP sample. The melting temperatures (Tm≈420 K) obtained by differential scanning calorimetry for pure and doped LAP samples were found not to be significantly affected by the impurities. The T-dependence of cp was fully accounted for by taking into consideration the Debye contribution, an Einstein term and a contribution due to both Frenkel and Schottky defects. The model fit all cp versus T data using a single value for both the Debye (θD=160 K) and the Einstein (TE=376.8 K) temperatures, and for the energy (εd=157.9 meV) required to create the defects.  相似文献   

16.
MgO-based magnetic tunnel junctions were fabricated, with a thin pinned CoFeB layer in the unbalanced synthetic antiferromagnet part of the stack FeMn/CoFe/Ru/CoFeB. Inverted and normal tunneling magnetoresistance (TMR) values occur at low and high annealing temperatures (Ta), respectively. The TMR ratio remains inverted up to Ta=300 °C and it becomes normal around Ta=350 °C. The exchange bias of FeMn disappears at high Ta. The sign reversal of the TMR ratio is mainly attributed to the disappearance of the exchange bias due to manganese diffusion during the annealing process.  相似文献   

17.
Thin niobium (Nb) films (thickness 350-400 nm) were prepared on (1 0 0)Si substrate in a UHV chamber using the cathode beam sputtering. The sputtering temperature Ts was varied from 40 up to 500 °C and the influence of the sputtering temperature on the microstructure of thin Nb films was investigated. Defect studies of the thin Nb films sputtered at various temperatures were performed by slow positron implantation spectroscopy (SPIS) with measurement of the Doppler broadening of the annihilation line. SPIS was combined with transmission electron microscopy (TEM) and X-ray diffraction (XRD). We have found that the films sputtered at Ts = 40 °C exhibit elongated, column-like nanocrystalline grains. No significant increase of grain size with Ts (up to 500 °C) was observed by TEM. The thin Nb films sputtered at Ts = 40 °C contain a high density of defects. It is demonstrated by shortened positron diffusion length and a high value of the S parameter for Nb layer compared to the well-annealed (defect-free) bulk Nb reference sample. A drastic decrease of defect density was found in the films sputtered at Ts ≥ 300 °C. It is reflected by a significant increase of the positron diffusion length and a decrease of the S parameter for the Nb layer. The defect density in the Nb layer is, however, still substantially higher than in the well-annealed reference bulk Nb sample. Moreover, there is a layer at the interface between the Nb film and the substrate with very high density of defects comparable to that in the films sputtered at Ts < 300 °C. All the Nb films studied exhibit a strong (1 1 0) texture. The films sputtered at Ts < 300 °C are characterized by a compressive macroscopic in-plane stress due to lattice mismatch between the film and the substrate. Relaxation of the in-plane stress was observed in the films sputtered at Ts ≥ 300 °C. The width of the XRD profiles of the films sputtered at Ts ≥ 300 °C is significantly smaller compared to the films sputtered at lower temperatures. This is most probably due to a lower defect density which results in reduced microstrains in the films sputtered at higher temperatures.  相似文献   

18.
The Ruddlesden–Popper (RP) phase compounds (Sr0.95R0.05)3Ti2O7 (R=Er, Y, Dy, Gd, Eu, Sm, Nd and La) were prepared, and their transport and thermoelectric properties were investigated. The results indicate that high-T electrical resistivity ρ (300 K<T<1000 K) increases monotonically with temperature and basically has a relation ρTM, with M varying from 0.91 to 1.92 at temperatures T>~650 K, suggesting acoustic phonon scattering is dominant. At low temperatures (5 K<T<300 K), ρ for (Sr0.95R0.05)3Ti2O7 (R=Nd and La) decreases monotonously with decreasing temperature, whereas ρ for (Sr0.95R0.05)3Ti2O7 (R=Er, Y, Dy, Gd, Eu and Sm) decreases first, and then increases instead as T decreases to a critical temperature Tc. Moreover, electrical conductivity σT1/2 holds at lower temperatures, indicating that the electron–electron interaction caused by the presence of disorder dominates the transport process at the low temperatures. Besides, experiments show that at T<~400 K the lattice thermal conductivity of the doped compounds basically decreases with increase of the atomic mass of dopants. Generally, the figure of merit (ZT) at 1000 K increases first, and then decreases with the increase of the dopants' ionic radius, and the largest ZT is achieved in (Sr0.95Gd0.05)3Ti2O7 mainly owing to its lower lattice thermal conductivity.  相似文献   

19.
Heat-capacity investigations on the ferrimagnetic spinel FeCr2S4 poly- and single crystals provide experimental evidence of orbital liquid and orbital glass states. The low-temperature transition in the polycrystals at 10 K arises from orbital order and is very sensitive to the sample stoichiometry. In the single crystals the orbital order is fully suppressed resulting in an orbital glass state with the heat capacity following a strict T2 dependence towards zero temperature. At elevated temperatures, FeCr2S4 exhibits an unexpected large linear term of about 100 mJ mol−1 K−2 as the fingerprint of the orbital liquid.  相似文献   

20.
Results of the thermoelectric power (TEP) measurements done on monocrystalline samples of RESn3 compounds (RE=La, Pr, Nd, and Gd) are presented for the temperature range of 5.5-300 K. It was found that the TEP is positive and weakly temperature dependent at temperatures T>100 K. For T<100 K pronounced anomalies have been observed for the PrSn3 and the NdSn3 compounds in the vicinity of 10 K.We argue that the Kondo and crystal field effects cause these anomalies. A shape of the TEP anomaly found for PrSn3 resembles very much that observed in the electrical resistivity.  相似文献   

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