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In cholesteric liquid crystals with a positive dielectric anisotropy, the relaxation from the electric field-aligned director configuration to the stable zero field director configuration proceeds via a metastable transient planar director configuration which has a pitch distinct from the equilibrium state. The transition from the transient planar to the equilibrium zerofield state is shown here to occur via a Helfrich-type instability which continuously leads to an in-plane helical structure. The equilibrium planar state is then seen to grow continuously from the in-plane state, leaving behind walls whose length then spontaneously shrinks.  相似文献   

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Photosensitive organosilicon monomers and polymers containing furylacrylate, cinnamate or methacrylate groups were synthesized. The chemical structure of these organosilicon monomers were confirmed by 1H NMR and elemental analysis.The curing rates of these photosensitive polysiloxanes were also determined, all of them show a good UV-sensitivity. The UV-sensitivity of polysiloxanes containing pendent furylacrylates are comparable to that of polysiloxanes with either pendent cinnamate or pendent methacrylate groups.  相似文献   

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Three kinds of metal catalysts Ni/D_4, Ni-Mn/D_4, Ni-Mn-La/D_4, wrapped in organosilicon compound were prepared by metal vapor synthesis. Their feature was characterized with XRD, TEM, XPS, FMR and static magnetic measurement. The metal particle size in catalysts was less than 3.5 am. The results of XPS showed that the metals in the catalysts existed in zero and other valent state. Inner metal, as an organosilicon compound folded around the metal particle, was protected from oxidation. FMR and static magnetic measuremeat revealed that metal particles were spheroidal and of superparamagnetism. Of all the caralysts the catalytic activity of Ni-Mn-La/D_4 was the highest in hydrogenating furfuraldehyde into furfuralcohol.  相似文献   

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The integral absorptivities of shape-characteristic (CC) bands in the IR spectra of 66 acetylene derivatives RCCX (R = H, Me3M; X are inorganic and organic substituents) are related by a common linear equation to the R 0 constants of the R and X substituents. The R R0 constants of 10 Alk3M substituents were calculated. The R 0, R , and R + constants of Me3M substituents were analyzed. The positive R 0 values (0.12, 0.06, and 0.04 for R = Si, Ge, and Sn, respectively) suggest that in the ground electronic state of Me3MCCX molecules the resonance acceptor effect of the Me3M substituents (d, conjugation) prevails over donor (, conjugation). The first effect attenuates and the second enhances as the atomic number of M increases.  相似文献   

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Sonnenfeld  A.  Tun  T. M.  Zajíčková  L.  Kozlov  K. V.  Wagner  H.-E.  Behnke  J. F.  Hippler  R. 《Plasmas and Polymers》2001,6(4):237-266
Dielectric barrier discharges (DBD) at atmospheric pressure are presented as a tool to create organosilicon deposits on technical planar aluminium substrates (up to 15 × 8 cm2) by admixing small amounts of hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) to the carrier gas of the discharges. Using barrier materials of different specific capacities (2.6 × 104 and 3.2 pF/cm2) in two electrode arrangements operated at less than 1 W, the influence of the filament properties on the deposition is studied. In comparison to these arrangements, a third electrode setup with a barrier of the specific capacity of 2.9 pF/cm2 is operated at approximately 50 W to study the influence of the specific energy of the plasma (energy per molecule) on the deposition process. The plasma chemical process was studied qualitatively by Gas Chromatography, and properties of the plasma-treated substrates were examined by means of X-ray Photoelectron Spectroscopy (XPS), Fourier Transform Infrared (FTIR) spectroscopy, as well as visually.  相似文献   

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