含有倾斜界面硅/锗超晶格的导热性能

采用非平衡分子动力学(NEMD)方法模拟含有倾斜界面的硅/锗(Si/Ge)超晶格在不同倾斜角、不同周期长度、不同样本长度和不同温度下的导热性能.模拟结果表明, Si/Ge超晶格的热导率随着界面倾斜角的增加而非单调变化.当周期长度为4—8原子层时,界面倾斜角为45°的热导率比其他界面倾斜角时热导率增大了一个数量级,且热导率随样本长度的增加而增加,随温度的增加而减小.然而当周期长度为20原子层时,由于声子局域化的存在,热导率对样本长度和温度的依赖性都较弱.     

基于界面原子混合的材料导热性能

构造了界面具有原子混合的硅锗(Si/Ge)单界面和超晶格结构.采用非平衡分子动力学模拟研究了界面原子混合对于单界面和超晶格结构热导率的影响,重点研究了界面原子混合层数、环境温度、体系总长以及周期长度对不同晶格结构热导率的影响.结果表明:由于声子的“桥接”机制,2层和4层界面原子混合能提高单一界面和少周期数的超晶格的热导率,但是在多周期体系中,具有原子混合时的热导率要低于完美界面时的热导率;界面原子混合会破坏超晶格中声子的相干性输运,一定程度引起热导率降低;完美界面超晶格具有明显的温度效应,而具有原子混合的超晶格热导率对温度的敏感性较低.     

超晶格和层状结构传热特性的连续模型及其在能源材料设计中的应用

层状材料和超晶格结构为提高热电材料和隔热涂层提供了新的设计思路, 并成为最近的研究热点. 应用连续波动方程和线性阻尼理论, 本文研究了此类材料中的声子输运特性. 给出了在整个相空间里的界面调制和声子局域化效应, 得出了超晶格材料热导率的上极限和下极限; 同时, 分析表明界面锐化加强了声子带隙, 使得部分模态的声子局域化加强. 最后, 通过对石墨烯/氮化硼超晶格(G/hBN)和硅/锗超晶格的分子模拟(Si/Ge), 验证了该理论模型. 该方法适用于所有的层状材料和超晶格结构, 对此类新能源材料的设计提供了普适的设计思路.     

随机硅–锗超晶格高通量筛选和热导率优化

低维热电材料往往可以通过降低声子热导率实现其热电性能的提升。由两种材料交替生长获得的超晶格薄膜较单一材料薄膜具有更低的热导率,通过改变材料的厚度排布,随机排列的非周期性超晶格甚至可以实现更低的热导率。本文基于非平衡分子动力学模拟计算了硅和锗薄膜热导率和非对称界面热阻,构建了随机硅–锗超晶格热导率的数值拟合等效介质模型。引入邻间因子和修正函数后,获得了可以更为准确预测随机排列硅–锗超晶格热导率的修正等效介质模型。将此模型与遗传算法相结合,可以对大量随机超晶格结构进行高通量筛选,实现了热导率的快速优化。结果表明,即使总厚度大的超晶格最低热导率仍能维持在1.4～1.8 W·m^-1·K^-1,平均周期厚度稳定在2.0～2.5 nm。     

Ge_xSi_1-x_/Si应变层超晶格的分子束外延生长及其特性研究

在 Si (l00) 衬底上用分子束外延在不同的温度下生长了不同组份的GeGe_xSi_1-x_/Si 应变层超晶格.用反射式高能电子衍射、x 射线双晶衍射、卢瑟福背散射、透射电子显微镜以及Raman散射等侧试方法研究了Ge Ge_xSi_1-x_/Si超晶格的生长及其结构特性. 结果表明, 对不同合金组份的超晶格, 其最佳生长温度不同. x值小, 生长温度高; 反之, 则要求生长温度低. 对于x为0. 1-0. 6 , 在400-600℃ 的生长温度范围能够长成界面平整、晶格完好和周期均匀的GeGe_xSi_1-x_/Si应变层超晶格. 关键词：     

分形结构纳米复合材料热导率的分子动力学模拟研究

提出了一基于Sierpinski分形结构的Si/Ge纳米复合材料结构,以调控纳米复合材料的热导率.采用非平衡分子动力学方法模拟研究了分形结构Si/Ge纳米复合材料的导热性能,给出了硅原子百分比、轴向长度以及截面尺寸对分形结构纳米复合材料热导率的影响规律,并与传统矩形结构进行了对比.研究结果表明,分形结构纳米复合材料增强了Si/Ge界面散射作用,使得热导率低于传统矩形结构,这为提高材料的热电效率提供了有效途径.Si原子百分比、截面尺寸、轴向长度皆对分形结构纳米复合材料热导率存在着重要影响.纳米复合材料热导率随着Si原子百分比的增加呈先减小后增加的趋势,随轴向长度的增加则呈单调增大趋势.     

微尺度下硅锗合金热导率的分子动力学模拟

采用非平衡分子动力学(NEMD)方法研究了微尺度下硅锗合金的热导率变化情况.结果表明,硅锗合金热导率具有明显的尺寸效应,显著小于大体积晶体的实验值;并且受边界散射效应的影响,热导率值随硅锗原子百分比的不同发生变化;同时热导率随温度的升高而增大,与实验值比较大致吻合.     

纳米尺度下Si/Ge界面应力释放机制的分子动力学研究

采用分子动力学方法研究了纳米尺度下硅(Si)基锗(Ge)结构的Si/Ge界面应力分布特征,以及点缺陷层在应力释放过程中的作用机制.结果表明:在纳米尺度下, Si/Ge界面应力分布曲线与Ge尺寸密切相关,界面应力下降速度与Ge尺寸存在近似的线性递减关系;同时,在Si/Ge界面处增加一个富含空位缺陷的缓冲层,可显著改变Si/Ge界面应力分布,在此基础上对比分析了点缺陷在纯Ge结构内部引起应力变化与缺陷密度的关系,缺陷层的引入和缺陷密度的增加可加速界面应力的释放.参考对Si/Ge界面结构的研究结果,可在Si基纯Ge薄膜生长过程中引入缺陷层,并对其结构进行设计,降低界面应力水平,进而降低界面处产生位错缺陷的概率,提高Si基Ge薄膜质量,这一思想在研究报道的Si基Ge膜低温缓冲层生长方法中初步得到了证实.     

微尺度下硅锗合金热导率的分子动力学模拟

采用非平衡分子动力学（NEMD）方法研究了微尺度下硅锗合金的热导率变化情况。结果表明,硅锗合金热导率具有明显的尺寸效应,显著小于大体积晶体的实验值;并且受边界散射效应的影响,热导率值随硅锗原子百分比的不同发生变化;同时热导率随温度的升高而增大,与实验值比较大致吻合。     

Si(111)-(7×7)表面上Ge量子点的自组织生长

用扫描隧道显微镜研究了Si(111)(7×7)表面上Ge量子点的自组织生长.室温下用固相外延法在硅基底上沉积亚单层的Ge,然后在适当的温度下退火可以聚集形成有序的Ge量子点.由于Ge在Si(111)(7×7)表面选择性的吸附而形成有序的Ge量子点. 关键词： 锗 硅 扫描隧道显微镜 自组织生长     

Phonons in Ge/Si superlattices with Ge quantum dots

Ge/Si superlattices containing Ge quantum dots were prepared by molecular beam epitaxy and studied by resonant Raman scattering. It is shown that these structures possess vibrational properties of both two-and zero-dimensional objects. The folded acoustic phonons observed in the low-frequency region of the spectrum (up to 15th order) are typical for planar superlattices. The acoustic phonon lines overlap with a broad emission continuum that is due to the violation of the wave-vector conservation law by the quantum dots. An analysis of the Ge and Ge-Si optical phonons indicates that the Ge quantum dots are pseudoamorphous and that mixing of the Ge and Si atoms is insignificant. The longitudinal optical phonons undergo a low-frequency shift upon increasing laser excitation energy (2.54–2.71 eV) because of the confinement effect in small-sized quantum dots, which dominate resonant Raman scattering.     

Thermal conductivity of symmetrically strained Si/Ge superlattices

This paper reports temperature-dependent thermal conductivity measurements in the cross-plane direction of symmetrically strained Si/Ge superlattices, and the effect of doping, period thickness and dislocations on the thermal conductivity reduction of Si/Ge superlattices. The Si/Ge superlattices are grown by molecular beam epitaxy on silicon and silicon-on-insulator substrates with a graded buffer layer. A differential 3 ω method is used to measure the thermal conductivity of the buffer and the superlattices between 80 and 300 K. The thermal conductivity measurement is carried out in conjunction with X-ray and TEM sample characterization. The measured thermal conductivity values of the superlattices are lower than those of their equivalent composition bulk alloys.     

Low-temperature anisotropy of the thermal conductivity of single-crystal nanofilms and nanowires

The effect of phonon focusing on the phonon transport in single-crystal nanofilms and nanowires is studied in the boundary scattering regime. The dependences of the thermal conductivity and the free path of phonons on the geometric parameters of nanostructures with various elastic energy anisotropies are analyzed for diffuse phonon scattering by boundaries. It is shown that the anisotropies of thermal conductivity for nanostructures made of cubic crystals with positive (LiF, GaAs, Ge, Si, diamond, YAG) and negative (CaF₂, NaCl, YIG) anisotropies of the second-order elastic moduli are qualitatively different for both nanofilms and nanowires. The single-crystal film plane orientations and the heat flow directions that ensure the maximum or minimum thermal conductivity in a film plane are determined for the crystals of both types. The thermal conductivity of nanowires with a square cross section mainly depends on a heat flow direction, and the thermal conductivity of sufficiently wide nanofilms is substantially determined by a film plane orientation.     

Folded acoustic phonons in Si/Ge superlattices with Ge quantum dots

The spectra of Raman scattering by folded acoustic phonons in Si/Ge superlattices with pseudomorphic layers of Ge quantum dots (QDs) grown by low-temperature (T = 250°C) molecular beam epitaxy are studied. New features of the folded phonon lines related to the resonant enhancement and unusual intensity ratio of the doublet lines that cannot be explained by the existing theory have been observed. The observed modes are shown to be related to the vibrations localized to the QDs and induced by the folded phonons of the Si spacer layers. The calculations performed in the model of a one-dimensional chain of atoms have allowed the nature of the localization of acoustic phonons attributable to a modification of the phonon spectrum of a thin QD layer to be explained. The observed intensity ratio of the folded phonon doublet lines is caused by asymmetry of the relief of the QD layers.     

Long-wavelength nonpolar phonons in semiconductor heterostructures

Employing a phenomenological long-wavelength approach recently developed, both acoustic and optical phonons in nonpolar heterostructures are studied. Phonon modes in an arbitrary direction can be calculated without additional effort respect to high symmetry directions. A simple analytical expression for the dispersion relation in superlattices guides the physical discussion. We apply this to the calculation of phonon modes in unstrained short period isotopic Ge superlattices, in quantum wells and in strained short period Si/Ge superlattices. We find very good agreement with the results of other, more elaborated and costly calculations.Received: 21 July 2004, Published online: 5 November 2004PACS: 63.20.Dj Phonon states and bands, normal modes, and phonon dispersion - 63.22. + m Phonons or vibrational states in low-dimensional structures and nanoscale materials - 68.65.Cd Superlattices     

Characteristic temperature θ1 and lattice thermal conductivity of a doped sample: Application to P-doped Ge

Role of the characteristic temperature θ¹ which differentiates non-peripheral phonons from peripheral phonons, in the estimation of the total lattice thermal conductivity of the doped sample has been studied by calculating the total phonon conductivity of P-doped Ge in the temperature range 1–5 K for the different values of θ¹, for the first time.     

Peripheral phonons and phonon conductivity of the doped semiconductor

The percentage contribution of the peripheral phonons towards the total phonon conductivity of P-doped Ge has been studied with the help of the Ziman expression of the electron-phonon scattering relaxation rate and the Callaway integral of the lattice thermal conductivity. It is found that the percentage contribution of the peripheral phonons increases with the increase of temperature. The entire study is limited to the temperature range 1–5 K.     

Raman scattering of Ge dot superlattices

Self-organised Ge dot superlattices grown by molecular beam epitaxy of Ge and Si layers utilizing Stranski-Krastanov growth mode were investigated by Raman spectroscopy. An average size of Ge quantum dots was obtained from transmission electron microscopy measurements. The strain and interdiffusion of Ge and Si atoms in Ge quantum dots were estimated from the analysis of frequency positions of optical phonons observed in the Raman spectra. Raman scattering by folded longitudinal acoustic phonons in the Ge dot superlattices was observed and explained using of elastic continuum theory. Received 25 January 2000